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1.
用溶胶-凝胶法制备了纯的和5%La掺杂的BiFeO3薄膜,研究了室温下薄膜的介电和铁电性质.介质性质研究表明,在6.8MHz和7.8MHz附近,BiFeO3薄膜和Bi0.95Ia0.05FeO3薄膜分别出现了介电损耗极大和介电常数的正负转变,归结为薄膜的介电性质由容性向感性的转化.而铁电测试表明,通过La掺杂,增强了薄膜的铁电性,同时有效地减少了BiFeO3薄膜的漏导.  相似文献   

2.
刘红日  孙玉霞 《材料导报》2005,19(F11):324-325
用溶胶-凝胶法制备了纯的和5%La掺杂的BiFeO3薄膜,研究了室温下薄膜的介电和铁电性质。介质性质研究表明,在6.8MHz和7.8MHz附近,BiFeO3薄膜和Bi0.95La0.05FeO3薄膜分别出现了介电损耗极大和介电常数的正负转变,归结为薄膜的介电性质由容性向感性的转化。而铁电测试表明,通过La掺杂,增强了薄膜的铁电性,同时有效地减少了BiFeO3薄膜的漏导。  相似文献   

3.
La对BiFeO3薄膜的替代效应   总被引:1,自引:0,他引:1  
用溶胶-凝胶方法在LaNiO3底电极上制备了纯的和10%A位La替代的BiFeO3薄膜.研究了室温下薄膜的介电与铁电性质和漏电流性质.铁电性研究表明,通过La替代,薄膜的铁电性得到显著增强,剩余极化强度由1.67 μC/cm2增加到2.20 μC/cm2.介电性质研究表明,在整个测试频率范围内,La替代的薄膜的介电性得到了增强.低频下的介电损耗增加而高频的介电损耗减少.而漏电流特性测试表明,La替代有效的限制了BiFeO3薄膜的漏电流.  相似文献   

4.
用溶胶一凝胶方法在LaNiO3底电极上制备了500℃退火的BiFeO3薄膜.研究了室温下薄膜的结构,介电与铁电性质和漏电流性质.XRD研究表明薄膜呈R3m结构,没有观察到不纯相.铁电性研究表明,薄膜具有大的剩余极化强度,在600 kV/cm的测试电场下,薄膜的剩余极化强度为20uC/cm2,矫顽场为440 kV/cm.介电性质研究表明,在整个测试频率范围内,薄膜具有小的介电损耗.而漏电流特性测试表明,通过工艺的改进,有效的限制了BiFeO3薄膜的漏电流.  相似文献   

5.
采用溶胶-凝胶方法在FTO/glass底电极上制备了BiFeO3/Bi4Ti3O12和Bi4Ti3O12/BiFeO3多层薄膜。研究了室温下薄膜的结构,铁电性质和介电性质,并将其与纯的BiFeO3薄膜的性质进行了比较。从薄膜的XRD模式中可以观察到共存的BiFeO3相和Bi4Ti3O12相。通过电滞回线测量可以看出,相对于纯的BiFeO3薄膜,BiFeO3/Bi4Ti3O12和Bi4Ti3O12/BiFeO3多层薄膜能够承受更高的测试电场而获得充分极化,从而表现出较强的铁电性,在450kV/cm测试电场下,薄膜的剩余极化强度分别为37μC/cm2和23μC/cm2。  相似文献   

6.
用溶胶一凝胶方法在LaNiO3底电极上制备了BiFeO3/PbTiO3多层薄膜.研究了室温下薄膜的结构,铁电性质和漏电流性质,并将其与纯的BiFeO3薄膜的性质进行了比较.从薄膜的XRD模式中可以观察到共存的BiFe3O相和PbTiO3相.通过电滞回线测量发现,在较低的测试电场下,BiFeO3/PbqTiO3多层薄膜表现出反铁电性;而在较强的测试电场下表现出铁电性.相对于纯的BiFeO3薄膜,BiFeO3/PbTiO3多层薄膜能够承受更高的测试电场而获得充分极化,从而表现出较强的铁电性.漏电流特性测试表明,相对于纯的BiFeO3薄膜,BiFeO3/PbTiO3多层薄膜具有更低的漏电流.  相似文献   

7.
张静  吴玉洁 《材料导报》2012,26(22):35-38
采用溶胶-凝胶法制备了Tb掺杂的BiFeO3粉晶,其掺杂浓度为0≤x≤0.2,分别用X射线衍射仪、Ra-man散射仪和综合物性测量系统对Bi1-xTbxFeO3粉晶样品的结构、Raman活性振动模式和磁性进行了测量和分析。实验结果表明:当Tb掺杂量x在0.10~0.125时,母体BiFeO3的结构由菱形R3c相变为正交Pnma相,同时伴随着铁电-顺电相的变化。另外,随着掺杂浓度的增大,Bi1-xTbxFeO3的磁性逐渐增强,并且在铁电-顺电相相变边界处(x=0.10),剩余磁化强度Mr达到最大值0.223emu/g,约为纯相BiFeO3的8倍。随着Tb掺杂量进一步增大(x≥0.125),样品的剩余磁化强度开始逐渐减小,其原因是在正交相的样品中磁矩逐渐形成了很好的反平行排列。  相似文献   

8.
采用溶胶–凝胶法,用乙二醇甲醚作溶剂溶解Bi(NO3)3、Fe(NO3)3和La(NO3)3制备前体溶液,通过化学溶液沉积法在FTO导电玻璃基板上合成La3+掺杂的BiFeO3(BFO)薄膜,并研究了La3+掺杂对BiFeO3的能带及其光伏性能的影响。BiFeO3薄膜呈多晶钙钛矿结构,且随着La3+掺杂量的增加,BiFeO3的晶格常数依次递减。掺杂10%La3+的BiFeO3的能隙比未掺杂时稍有减小,为2.71 eV,随着La3+掺杂量的增加,BiFeO3的能隙增加到2.76 eV。采用改良法制备的La3+的掺杂量为10%的BiFeO3薄膜的最大开路电压为0.4 V,具有良好的光伏性能。  相似文献   

9.
钛酸锶铅((Pb1-xSrx)TiO3,PST)固溶体材料是一种性能优良的钙钛矿型铁电材料,其形成铁电相的温度较低,且易于和半导体工艺结合,应用潜力较大.本文采用磁控溅射法制备了PST薄膜,并初步研究了其介电和铁电特性.结果表明,磁控溅射得到的PST薄膜必须进行一定的热处理,才能使之转变为具有铁电性的钙钛矿结构的铁电薄膜.其介电特性与测试频率有关,试样的饱和极化强度可达19μC/cm2,剩余极化强度可达6.6μC/cm2,矫顽场强达16kV/cm,热释电系数达10-4C/m2*K量级,表明所制备的PST薄膜具有良好的铁电性.  相似文献   

10.
黄艳芹 《功能材料》2013,44(13):1932-1935
以快速等离子烧结法(SPS)制备的BiFeO3块体为靶材,用激光脉冲沉积(PLD)法在不同衬底上制备了BiFeO3(100)/LaNiO3(100)/Si(100)、BiFeO3(111)/LaNiO3(111)/SrTiO3(111)、BiFeO3(110)/Pt/TiO2/SiO2/Si、BiFeO3(110)LaNiO3(110)/Pt/TiO2/SiO2/Si不同择优取向的薄膜,并对薄膜进行了XRD和SEM分析。X射线衍射结果表明,BiFeO3薄膜外延沉积在导电层衬底上,并且它们具有相同的高度取向。SEM分析表明,薄膜上的晶粒是柱状形态,表面光滑致密且颗粒分布非常均匀,晶粒的边界和尺寸也能被清晰地观察到。通过铁电铁磁性能研究,BiFeO3(111)择优取向性能最佳。SrTiO3衬底上(111)取向的BiFeO3薄膜铁电剩余极化值达到了30.3μC/cm2,漏电流为1.0×10-3 A/cm2,饱和磁化强度为20.0kA/m。  相似文献   

11.
We report on the microstructure and optical properties of AlxOy–Pt–AlxOy interference-type multilayer films, deposited by electron beam (e-beam) deposition onto corning 1737 glass, silicon (1 1 1) and copper substrates. The structural properties were investigated by Rutherford backscattering spectrometry, X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and atomic force microscopy. The optical properties were extracted from specular reflection/transmission, diffuse reflectance and emissometer measurements. The stratification of the coatings consists of a semi-transparent middle Pt layer sandwiched between two layers of AlxOy. The top and bottom AlxOy layers were non-stoichiometric with no crystalline phases present. The Pt layer is in the fcc crystalline phase with a broad size distribution and spheroidal shape in and between the rims of AlxOy. The surface roughness of the stack was found to be comparable to the inter-particle distance. The optical calculations confirm a high solar absorptance of ∼0.94 and a low thermal emittance of ∼0.06 for the multilayer stack, which is attributed not only to the optimized nature of the multilayer interference stacks, but also to the specific surface morphology and texture of the coatings. These optical characteristics validate the spectral selectivity of the AlxOy–Pt–AlxOy interference-type multilayer stack for use in high temperature solar-thermal applications.  相似文献   

12.
A high-pressure technique was adopted to obtain perovskite-type Pb(Li14Nb34)O3. A new perovskite Pb(Li14Nb34)O3 was characterized to have a cubic symmetry with ao = 4.069A?; Li and Nb ions in the B-site of perovskite lattice may be in a random arrangement.  相似文献   

13.
The preparation conditions of the high TC ceramic superconductor Ba(Pb,Bi)O3 is correlated with the superconducting transition. Transition onsets of all materials are similar, but transition widths and transition completeness is strongly dependent on firing temperature. Only materials prepared over a narrow temperature range, resulting in a nearly ideal weight loss, have a complete and narrow transition.  相似文献   

14.
Spectrally selective AlxOy/Pt/AlxOy multilayer absorber coatings were deposited onto corning 1737 glass, Si (111) and copper substrates using electron beam (e-beam) vacuum evaporator at room temperature. The employment of ellipsometric measurements and optical simulation was proposed as an effective method to optimize and deposit multilayer solar absorber coatings. The optical constants (n and k) measured using spectroscopic ellipsometry, showed that both AlxOy layers, which used in the coatings, were dielectric in nature and the Pt layer was semi-transparent. The optimized multilayer coatings exhibited high solar absorptance α ∼ 0.94 ± 0.01 and low thermal emittance ? ∼ 0.06 ± 0.01 at 82 °C. The Rutherford backscattering spectroscopy (RBS) data of AlxOy/Pt/AlxOy multilayer absorber indicated the AlxOy layers present in the coating were nearly stoichiometry. The scanning electron microscope analysis (SEM) result indicated that the average diameter and inter-particles distance of Pt grains were statistically about 146 ± 0.17 nm and 6-10 ± 0.2 nm respectively.  相似文献   

15.
The electrostriction in Pb (Zn13Nb23)O3 crystals has been investigated using a strain gauge method. In the ferroelectric phase below 140 C, the strain vs the electric field shows a hysteresis, which is ascribed to the effect of ferroelectric domains. A quadratic relation holds between the strain x and the electric polarization P as x = QP2 above about 170 C in the paraelectric phase. Values of the electrostrictive Q coefficients are determined from the measurements near 190 C, as Q11 = 1.6·10?2m4/C2, Q12 = ?0.86·10?2m4/C2, and Q44 = 0.85·10?2m4/C2.  相似文献   

16.
The monoclinic-to-tetragonal structure transition of oxides V1?xMox02 with 0≤x≤0.20 has been studied by means of DTA, X-ray diffraction, magnetic susceptibility (powder samples) and electrical conductivity (single crystals) measurements within the temperature region 80 K to 400 K. A linear decrease of the transition temperature of 11 K per atom % Mo was observed. The magnetic susceptibility of the low temperature phase was found to be temperature independent paramagnetic for all preparations. Electrical conductivity measurements on the same phase showed crystals with x ? 0.04 to be semiconducting, while a metallic behavior was observed in the region 0.10 ? x ? 0.14.  相似文献   

17.
n-PbTep+?Pb1?xSnxTe heterojunctions with a long wavelength spectral cutoff (λc ≈ 6 μm) were prepared using the double-channel hot wall technique. The electrical and photoelectrical properties of the heterojunctions at 77, 197 and 300 K were investigated. Detectors with RoA equal to 170 Ω cm2 and a quantum efficiency of 25–40% were obtained. Reasons for the shift of the long wavelength spectral cutoff of the heterojunctions towards shorter wavelengths are given.  相似文献   

18.
SixCyHz films have been prepared at 200°C by reactive plasma deposition from SiH4 and CH4 diluted in helium in a tubular reactor. These films have a ratio s (equal to Si(Si+C)) ranging from 0.2 to 0.8, a refractive index ranging from 1.96 to 2.6 and an optical energy band gap in the range 2.7-2.2 eV. The total quantity of hydrogen in the film is 40% when s=0.5. Infrared analysis shows that these films have large fractions of homonuclear bonds and that this material is best described as a polymer. Mass spectrometric measurements of the gaseous products formed in the SiH4-CH4-He plasma have been performed and the results are related to the composition of the deposited layers.  相似文献   

19.
We have studied the influence of surface fields H/sub p/ (generated by either direct or alternating core current) on soft magnetic properties of amorphous and nanocrystalline Fe/sub 73.5/Cu/sub 1/Nb/sub 3/Si/sub 15.5/B/sub 7/ ribbon. While in an amorphous ribbon the coercive field H/sub c/ decreases with H/sub p/, in the same optimally annealed ribbon (H/sub c/=1.3 A/m, M/sub m//spl ap/M/sub s/) H/sub c/ increases with H/sub p/ for all the explored types of H/sub p/ (static and dynamic with different phases with respect to that of the magnetizing field H). The unexpected increase of H/sub c/ in nanocrystalline ribbon is associated with the influence of H/sub p/ on the surface and main (inner) domain structure. Here, we develop a model that takes into account this influence and explains the experimental results.  相似文献   

20.
Integration of NiSix based fully silicided metal gates with HfO2 high-k gate dielectrics offers promise for further scaling of complementary metal-oxide- semiconductor devices. A combination of high resolution transmission electron microscopy and small probe electron energy loss spectroscopy (EELS) and energy dispersive X-ray analysis has been applied to study interfacial reactions in the undoped gate stack. NiSi was found to be polycrystalline with the grain size decreasing from top to bottom of NiSix film. Ni content varies near the NiSi/HfOx interface whereby both Ni-rich and monosilicide phases were observed. Spatially non-uniform distribution of oxygen along NiSix/HfO2 interface was observed by dark field Scanning Transmission Electron Microscopy and EELS. Interfacial roughness of NiSix/HfOx was found higher than that of poly-Si/HfO2, likely due to compositional non-uniformity of NiSix. No intermixing between Hf, Ni and Si beyond interfacial roughness was observed.  相似文献   

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