Ka-band monolithic amplifier using 0.5 mu m gate length ion-implanted GaAs/AlGaAs heterojunction FET technology

Monolithic, two-stage amplifiers using 0.5*80 mu m/sup 2/ gate GaAs/AlGaAs heterojunction FETs have been developed for Ka-band operation. These monolithic two-stage amplifiers were fabricated using ion implantation for the active layer and optical lithography for the 0.5 mu m gate length. MMIC two-stage amplifiers achieved average gains of 12.6+or-1.4 dB at 30 GHz and 8.8+or-2.0 dB at 40 GHz, respectively, for all 39 sites across a three inch diameter wafer. These are the first reported results for MMIC two-stage amplifiers using 0.5 mu m gate length ion-implanted GaAs/AlGaAs heterojunction FETs achieving over 10 dB gain at Ka band.<>     

（英）D波段InP基高增益、低噪声放大芯片的设计与实现

利用90-nm InAlAs/InGaAs/InP HEMT工艺设计实现了两款D波段（110~170 GHz）单片微波集成电路放大器。两款放大器均采用共源结构,布线选取微带线。基于器件A设计的三级放大器A在片测试结果表明：最大小信号增益为11.2 dB@140 GHz,3 dB带宽为16 GHz,芯片面积2.6×1.2 mm2。基于器件B设计的两级放大器B在片测试结果表明：最大小信号增益为15.8 dB@139 GHz,3dB带宽12 GHz,在130~150 GHz频带范围内增益大于10 dB,芯片面积1.7×0.8 mm2,带内最小噪声为4.4 dB、相关增益15 dB@141 GHz,平均噪声系数约为5.2 dB。放大器B具有高的单级增益、相对高的增益面积比以及较好的噪声系数。该放大器芯片的设计实现对于构建D波段接收前端具有借鉴意义。     

Design of high-power, high-efficiency 60-GHz MMICs using animproved nonlinear PHEMT model

This work describes the design and nonlinear modeling of two V-band monolithic microwave integrated circuit (MMIC) power amplifiers using a nonlinear high electron mobility transistor (HEMT) model developed specifically for very short gate length pseudomorphic HEMTs (PHEMTs). Both circuits advance the state-of-the-art of V-band power MMIC performance. The first, a single-ended design, produced 293 mW of output power with a record 26% power-added efficiency (PAE) and 9.9 dB of power gain at 62.5 GHz when measured on-wafer. The second MMIC, a balanced design with on-chip input and output Lange couplers for power combining, generated a record 564 mW of output power (27.5 dBm) with 21% PAE and 9.8 dB power gain. The MMIC's are passivated, thinned to 2 mils, and down-biased to 4.5 V for high reliability space applications. These excellent first-pass MMIC results are attributed to the use of an optimized 0.1-/μm PHEMT cell structure and a design based on millimeter-wave on-wafer device characterization, together with a new and very accurate large signal analytical FET model developed for 0.1-/μm PHEMTs     

A 4-W X-band compact coplanar high-power amplifier MMIC with 18-dB gain and 25% PAE

The performance of a compact coplanar microwave monolithic integrated circuit (MMIC) amplifier with high output power in the X-band is presented. Based on our 0.3-/spl mu/m gate-length GaAs power pseudomorphic high electron mobility transistor (PHEMT) process on 4-in wafer, this two-stage amplifier, having a chip size of 16 mm/sup 2/, averages 4-W continuous-wave (CW) and 25% mean power-added efficiency (PAE) in the X-band, with more than 18-dB linear gain. Peak output powers of P/sub -1dB/=36.3dBm (4.3 W) and P/sub sat/ of 36.9 dBm (4.9 W) at 10 GHz with a PAE of 50% were also measured. Compared to previously reported X-band coplanar high-power amplifiers, this represents a chip size reduction of 20%, comparable to the size of compact state-of-the-art microstrip power amplifiers.     

Ka波段5W GaAs PHMET功率MMIC

报道了一款采用0.15μm GaAs功率MMIC工艺研制的Ka波段功率放大器芯片。芯片采用四级放大拓扑结构,在29～32GHz频带范围内6V工作条件下线性增益25dB,线性增益平坦度小于±0.75dB;饱和输出功率大于5W,饱和效率大于20%,功率增益大于22dB;1dB压缩点输出功率大于36.5dBm,效率大于18%。     

X波段及DBS接收用PHEMT单片低噪声放大器

报道了X波段及DBS接收用单片低噪声放大器的研制结果。利用CAD软件对单片电路进行优化设计，设计工作包括MBE材料、PHEMT器件和单片电路三部分。在研制过程中，开展了关键工艺的专题研究。研究结果为：单级单片放大器在10：5－11．6GHz范围内，NF≤1．82dB，G≥7.72dB；在11．7－12．2GHz范围内，NF≤1．80dB，G≥6．8dB；双级放大器在10．4－11．1GHz范围内，NF≤1．96dB，G≥15．3dB，最低噪声系数为1．63dB，最高增益为16．07dB。     

X波段宽带单片低噪声放大器

从获取放大器的等噪声系数圆最大半径的角度来进行电路设计,设计了工作于X波段9～14GHz的宽带低噪声单片放大器,采用法国OMMIC公司的0.2μmGaAsPHEMT工艺(fT=60GHz)研制了芯片。在片测试结果为在9～14GHz,噪声系数<2.5dB,最小噪声系数在10.4GHz为2.0dB,功率增益在所需频段9～14GHz大于21dB,输入回波损耗<-10dB,输出回波损耗<-6dB。在11.5GHz,输出1dB压缩点功率为19dBm。     

Ka频段PHEMT 1W功率单片放大器

设计制作了Ka频段高输出功率的单片功率放大器.基于河北半导体研究所的0.25μm栅长的75mm GaAsPHEMT工艺制作的三级功率放大器,芯片尺寸为19.25mm2(3.5mm×5.5mm).在32.5～35.5GHz的频率范围内,小信号线性增益大于16dB,带内平均1dB增益压缩点输出功率为29.8dBm,最大饱和输出功率为31dBm.     

4～8GHz宽带单片集成低噪声放大器设计

基于0.15μm GaAs PHEMT工艺设计了一款C波段宽带单片集成低噪声放大器。电路由三级放大器级联而成,三级电路结构均使用电阻自偏压技术来实现单电源供电,它既可保证PHEMT管处于低噪声高增益的工作点,又可将所有元器件集成在单片GaAs衬底上,解决了供电复杂的问题。第三级电路采用了并联负反馈结构,降低了带内低频端...     

采用电流复用拓扑的宽带收发一体多功能电路

基于标准的GaAs赝配高电子迁移率晶体管(PHEMT)单片微波集成电路(MMIC)工艺设计并制备了一款宽带收发一体多功能电路芯片.该多功能芯片包含了功率放大器、低噪声放大器和收发开关.放大器采用电流复用拓扑结构实现了低功耗的目标.收发开关采用浮地结构避免了使用负电源.芯片在14～ 24 GHz工作频率的实测结果显示:接收支路噪声系数小于3.0dB,增益大于18 dB,输入及输出电压驻波比(VSWR)均小于2.0,1 dB压缩点输出功率大于0 dBm,直流功耗为60 mW;发射支路增益大于21 dB,输入输出VSWR均小于1.8,1dB压缩点输出功率大于10 dBm,直流功耗为180 mW.芯片尺寸为2 600 μm×1 800 μm.该多功能收发电路的在片测试结果和仿真结果一致,性能达到了设计要求.     

一种极低噪声高增益微波单片低噪声放大器

报道了一种用于卫星通讯系统,基于0.5μm栅长增强型赝配高电子迁移率晶体管的两级级联微波单片低噪声放大器.采用集总参数元件来缩小电路面积进而在整个芯片内完成阻抗匹配.在50Ω端口测试条件下,该低噪声放大器在3.5～4.3GHz频率范围内,噪声系数小于0.9dB,增益大于26dB,回波损耗小于-10dB.这是至今为止报道的增益高于20dB的低噪声放大器中具有最小噪声系数的微波单片低噪声放大器,它主要归因于采用具有优异噪声性能的增强型赝配高电子迁移率晶体管以及本文提出的源极串联电感结合漏极应用一个小的稳定电阻来减小输入匹配网络寄生电阻的电路结构.     

具有带外抑制特性的Ka波段低功耗低噪声放大器

基于0.15μm GaAs赝配高电子迁移率晶体管(PHEMT)工艺,成功研制了一款30~34 GHz频带内具有带外抑制特性的低功耗低噪声放大器(LNA)微波单片集成电路(MMIC)。该MMIC集成了滤波器和LNA,其中滤波器采用陷波器结构,可实现较低的插入损耗和较好的带外抑制特性;LNA采用单电源和电流复用结构,实现较高的增益和较低的功耗。测试结果表明,该MMIC芯片在30~34 GHz频带内,增益大于28 dB,噪声系数小于2.8 dB,功耗小于60 mW,在17~19 GHz频带内带外抑制比小于-35 dBc。芯片尺寸为2.40 mm×1.00 mm。该LNA MMIC可应用于毫米波T/R系统中。     

Super low noise C-band PHEMT MMIC low noise amplifier with minimuminput matching network

A two-stage PHEMT MMIC low noise amplifier with a very low noise figure as low as 0.76 dB and gain >16 dB at 5.4 GHz has been implemented using a minimum input matching network. It is believed that the noise figure of 0.76 dB is the best result ever reported to date from MMIC LNAs over this frequency range. This is attributed to the low noise performance of the PHEMT transistor and minimised parasitic resistance of the input matching network     

Millimeter Wave MMIC Low Noise Amplifiers Using a 0.15 µm Commercial pHEMT Process

This paper presents millimeter wave monolithic microwave integrated circuit (MMIC) low noise amplifiers using a 0.15 µm commercial pHEMT process. After carefully investigating design considerations for millimeter-wave applications, with emphasis on the active device model and electomagnetic (EM) simulation, we designed two singleended low noise amplifiers, one for Q-band and one for V-band. The Q-band two stage amplifier showed an average noise figure of 2.2 dB with an 18.3 dB average gain at 44 GHz. The V-band two stage amplifier showed an average noise figure of 2.9 dB with a 14.7 dB average gain at 65 GHz. Our design technique and model demonstrates good agreement between measured and predicted results. Compared with the published data, this work also presents state-of-the-art performance in terms of the gain and noise figure.     

An X-Band High-Power and High-PAE PHEMT MMIC Power Amplifier for Pulse and CW Operation

An X-band high-power and high power added efficiency (PAE), two-stage AlGaAs/InGaAs/GaAs psuedomorphic high electronic mobility transistor (PHEMT) monolithic microwave integrated circuit (MMIC) power amplifier is presented. The amplifier is designed to fully match a 50 Omega input and output impedance. Based on a 0.35 mum gate-length power PHEMT technology, the MMIC is fabricated on a 3 mil thick wafer. Under an 8 V DC bias condition, the characteristics of 17.5 dB small-signal gain, 10 W continuous wave mode saturation output power of 42% PAE, and 12.6 W pulse saturation output power of 52.6% PAE at 9.4 GHz can be achieved.     

C波段高增益低噪声放大器单片电路设计

主要介绍了C波段高增益低噪声单片放大器的设计方法和电路研制结果。电路设计基于Agilent ADS微波设计环境,采用GaAs PHEMT工艺技术实现。为了消除C波段低噪声放大器设计中在低频端产生的振荡,提出了在第三级PHEMT管的栅极和地之间放置RLC并联再串联电阻吸收网络的方法,降低了带外低频端的高增益,从而消除了多级级联低噪声放大器电路中由于低频端增益过高产生的振荡。通过电路设计与版图电磁验证相结合的方法,使本产品一次设计成功。本单片采用三级放大,工作频率为5～6GHz,噪声系数小于1.15dB,增益大于40dB,输入输出驻波比小于1.4∶1,增益平坦度ΔGp≤±0.2dB,1dB压缩点P-1≥10dBm,直流电流小于90mA。     

基于GaAs PHEMT工艺的60~90GHz功率放大器MMIC

研制了一款60~90 GHz功率放大器单片微波集成电路(MMIC),该MMIC采用平衡式放大结构,在较宽的频带内获得了平坦的增益、较高的输出功率及良好的输入输出驻波比(VSWR)。采用GaAs赝配高电子迁移率晶体管(PHEMT)标准工艺进行了流片,在片测试结果表明,在栅极电压为-0.3 V、漏极电压为+3 V、频率为60~90 GHz时,功率放大器MMIC的小信号增益大于13 dB,在71~76 GHz和81~86 GHz典型应用频段,功率放大器的小信号增益均大于15 dB。载体测试结果表明,栅极电压为-0.3 V、漏极电压为+3 V、频率为60~90 GHz时,该功率放大器MMIC饱和输出功率大于17.5 dBm,在71~76 GHz和81~86 GHz典型应用频段,其饱和输出功率可达到20 dBm。该功率放大器MMIC尺寸为5.25 mm×2.10 mm。     

Ka波段低噪声放大器的设计

利用pHEMT工艺设计了一个Ka波段微波单片低噪声放大器电路。电路采用四级放大的结构形式。利用微带电路实现射频输入、输出和级间匹配。采用多目标优化方法对电路增益、噪声系数、驻波比、稳定系数和输出1dB压缩点等特性进行了研究。设计出一个增益大于20dB,噪声系数小于1．0dB,1dB压缩点的输出功率在10dBm以上,性能优异的LNA。     

用于被动式毫米波成像的小型化Ka波段接收机

研制了一种工作于Ka波段用于被动式毫米波成像的基于单片微波集成电路(MMIC)的小型化接收机.该接收机主要由毫米波宽带低噪声放大器模块、毫米波小信号二极管检波器和视频放大电路组成.设计、制作、测试了接收机各个组成模块,对接收机的整体特性进行了测试.测试结果表明,该接收机的有效带宽约为7.4GHz、噪声小于3.8dB、增益约为30dB.应用喇叭天线和该接收机获得的一些毫米波图像表明,该接收机可以应用于被动毫米波成像.     

Millimeter-wave wide-band amplifiers using multilayer MMICtechnology

This paper describes millimeter-wave wide-band single-ended and balanced amplifiers using novel multilayer monolithic microwave/millimeter-wave integrated circuit (MMIC) technology. The fundamental characteristics of thin-film transmission lines and a 50-GHz-band multilayer MMIC directional coupler are described through measurements up to 60 GHz. A single-ended amplifier fabricated in a 1.1 mm×0.8 mm area, shows a gain of about 12 dB with a noise figure of better than 5 dB around 50 GHz. A balanced amplifier fabricated using the multilayer MMIC directional couplers and single-ended amplifiers, shows a gain of 10-17 dB with input and output return losses of better than 14 dB from 33 to 53 GHz. The transmission lines and directional couplers can be effectively combined with millimeter-wave active circuits without degrading the circuit performance or increasing the circuit area. To our knowledge, these are the first millimeter-wave active circuits employing multilayer MMIC technology