Design optimization of bifacial HIT solar cells on p-type silicon substrates by simulation

Heterojunction with intrinsic thin layer (HIT) solar cells fabricated on p-type silicon substrates usually demonstrate inferior performance than those formed on n-type substrates. The influence of various structure parameters on the performance of the c-Si(p)-based bifacial HIT solar cell, i.e., the TCO/a-Si:H(n)/a-Si:H(i)/c-Si(p)/a-Si:H(i)/a-Si:H(p⁺)/TCO solar cell, was investigated in detail by computer simulation using the AFORS-HET software. The work function of the transparent conductive oxide was found to be a key factor to affect the solar cell performance. Detailed influence mechanisms were analysed. Accordingly, the design optimization of the bifacial HIT solar cells on c-Si(p) substrates was provided.     

TCO and light trapping in silicon thin film solar cells

For thin film silicon solar cells and modules incorporating amorphous (a-Si:H) or microcrystalline (μc-Si:H) silicon as absorber materials, light trapping, i.e. increasing the path length of incoming light, plays a decisive role for device performance. This paper discusses ways to realize efficient light trapping schemes by using textured transparent conductive oxides (TCOs) as light scattering, highly conductive and transparent front contact in silicon p–i–n (superstrate) solar cells. Focus is on the concept of applying aluminum-doped zinc oxide (ZnO:Al) films, which are prepared by magnetron sputtering and subsequently textured by a wet-chemical etching step. The influence of electrical, optical and light scattering properties of the ZnO:Al front contact and the role of the back reflector are studied in experimentally prepared a-Si:H and μc-Si:H solar cells. Furthermore, a model is presented which allows to analyze optical losses in the individual layers of a solar cell structure. The model is applied to develop a roadmap for achieving a stable cell efficiency up to 15% in an amorphous/microcrystalline tandem cell. To realize this, necessary prerequisites are the incorporation of an efficient intermediate reflector between a-Si:H top and μc-Si:H bottom cell, the use of a front TCO with very low absorbance and ideal light scattering properties and a low-loss highly reflective back contact. Finally, the mid-frequency reactive sputtering technique is presented as a promising and potentially cost-effective way to up-scale the ZnO front contact preparation to industrial size substrate areas.     

Preparation of (n) a-Si: H/(p) c-Si heterojunction solar cells

Heterojunction solar cells have been manufactured by depositing n-type a-Si: H on p-type 1–2Ω cm CZ single crystalline silicon substrates. Although our cell structure is very simple - neither a BSF nor a surface texturing is used - a conversion efficiency of 13.1% has been achieved on an area of 1 cm². In this paper the technology is described and the dependence of the solar cell parameters on the properties of the n-type a-Si: H layer is discussed. It is shown that this cell type exhibits no degradation under light exposure.     

Amorphous silicon/p-type crystalline silicon heterojunction solar cells with a microcrystalline silicon buffer layer

Undoped hydrogenated amorphous silicon (a-Si:H)/p-type crystalline silicon (c-Si) structures with and without a microcrystalline silicon (μc-Si) buffer layer have been investigated as a potential low-cost heterojunction (HJ) solar cell. Unlike the conventional HJ silicon solar cell with a highly doped window layer, the undoped a-Si:H emitter was photovoltaically active, and a thicker emitter layer was proven to be advantageous for more light absorption, as long as the carriers generated in the layer are effectively collected at the junction. In addition, without using heavy doping and transparent front contacts, the solar cell exhibited a fill factor comparable to the conventional HJ silicon solar cell. The optimized configuration consisted of an undoped a-Si:H emitter layer (700 Å), providing an excellent light absorption and defect passivation, and a thin μc-Si buffer layer (200 Å), providing an improved carrier collection by lowering barrier height at the interface, resulting in a maximum conversion efficiency of 10% without an anti-reflective coating.     

Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power

The intrinsic a-Si:H passivation layer inserted between the doped a-Si:H layer and the c-Si substrate is very crucial for improving the performance of the a-Si:H/c-Si heterojunction (SHJ) solar cell. The passivation performance of the a-Si:H layer is strongly dependent on its microstructure. Usually, the compact a-Si:H deposited near the transition from the amorphous phase to the nanocrystalline phase by plasma enhanced chemical vapor deposition (PECVD) can provide excellent passivation. However, at the low deposition pressure and low deposition power, such an a-Si:H layer can be only prepared in a narrow region. The deposition condition must be controlled very carefully. In this paper, intrinsic a-Si:H layers were prepared on n-type Cz c-Si substrates by 27.12 MHz PECVD at a high deposition pressure and high deposition power. The corresponding passivation performance on c-Si was investigated by minority carrier lifetime measurement. It was found that an excellent a-Si:H passivation layer could be obtained in a very wide deposition pressure and power region. Such wide process window would be very beneficial for improving the uniformity and the yield for the solar cell fabrication. The a-Si:H layer microstructure was further investigated by Raman and Fourier transform infrared (FTIR) spectroscopy characterization. The correlation between the microstructure and the passivation performance was revealed. According to the above findings, the a-Si:H passivation performance was optimized more elaborately. Finally, a large-area SHJ solar cell with an efficiency of 22.25% was fabricated on the commercial 156 mm pseudo-square n-type Cz c-Si substrate with the opencircuit voltage (V_oc) of up to 0.732 V.     

Optimization of interface structures in crystalline silicon heterojunction solar cells

In heterojunction solar cells consisting of hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si), suppression of epitaxial growth at the heterointerface is found to be crucial to achieve high solar cell efficiencies. In order to avoid the epitaxial growth, wide-gap hydrogenated amorphous silicon oxide (a-SiO:H) has been applied to the heterojunction solar cells. We have fabricated a-SiO:H/c-Si solar cells using n-type and p-type c-Si substrates and demonstrated that incorporation of the a-SiO:H i layer prevents the harmful epitaxial growth at the heterointerface completely.     

氢等离子体处理钝化层对高效晶硅异质结太阳电池性能的影响

研究不同时间氢等离子体处理（HPT）氢化非晶硅a-Si:H（i）钝化层对高效晶硅异质结太阳电池（效率>23％）性能的影响。发现适当时间的HPT可改善钝化效果提升电池性能,但过长时间的HPT可导致薄膜钝化效果变差,有效少数载流子寿命降低。分析认为HPT时间过长,H原子进入到a-Si:H（i）薄膜层中,导致薄膜内部SiH₂增多,微结构因子（R）增大,薄膜质量变差。并且,适当时间的HPT改善太阳电池性能的幅度有限,而过长时间的HPT导致电池性能下降却很明显。因此,针对高效率的晶硅异质结太阳电池,应对钝化层沉积之后的HPT工艺进行谨慎控制。     

Development of high efficiency p-i-n amorphous silicon solar cells with the p-μc-Si:H/p-a-SiC:H double window layer

A structure is developed to help improve the TCO/p contact and efficiency of the solar cell. A p-i-n amorphous silicon (a-Si:H) solar cell with high-conversion efficiency is presented via use of a double p-type window layer composed of microcrystalline silicon and amorphous silicon carbide. The best efficiency is obtained for a glass/textured TCO/p-μc-Si:H/p-a-SiC:H/buffer/i-a-Si:H/n-μc-Si:H/GZO/Ag structure. Using a SnO₂/GZO bi-layer and a p-type hydrogenated microcrystalline silicon (p-μc-Si:H) layer between the TCO/p-a-SiC:H interface improves the photovoltaic performance due to reduction of the surface potential barrier. Layer thickness, B₂H₆/SiH₄ ratio and hydrogen dilution ratio of the p-μc-Si:H layer are studied experimentally. It is clearly shown that the double window layer can improve solar cell efficiency. An initial conversion efficiency of 10.63% is achieved for the a-Si:H solar cell.     

The influence of operation temperature on the output properties of amorphous silicon-related solar cells

The influence of the operation temperature on the output properties of solar cells with hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon germanium (a-SiGe:H) photovoltaic layers was investigated. The output power after longtime operation of an a-Si:H single junction, an a-Si:H/a-Si:H tandem, and an a-Si:H/a-SiGe:H tandem solar cell was calculated based on the experimental results of two types of temperature dependence for both conversion efficiency and light-induced degradation. It was found that the a-Si:H/a-SiGe:H tandem solar cell maintained a higher output power than the others even after longtime operation during which a temperature range of 25°C to 80°C. These results confirm the advantages of the a-Si:H/a-SiGe:H tandem solar cell for practical use, especially in high-temperature regions.     

Flexible amorphous and microcrystalline silicon tandem solar modules in the temporary superstrate concept

Encapsulated and series-connected amorphous silicon (a-Si:H) and microcrystalline silicon (μc-Si:H) based thin film silicon solar modules were developed in the superstrate configuration using an aluminum foil as temporary substrate during processing and a commodity polymer as permanent substrate in the finished module. For the development of μc-Si:H single junction modules, aspects regarding TCO conductivity, TCO reduction, deposition uniformity, substrate temperature stability and surface morphology were addressed. It was established that on sharp TCO morphologies where single junction μc-Si:H solar cells fail, tandem structures consisting of an a-Si:H top cell and a μc-Si:H bottom cell can still show a good performance. Initial aperture area efficiencies of 8.2%, 3.9% and 9.4% were obtained for fully encapsulated amorphous silicon (a-Si:H) single junction, microcrystalline silicon (μc-Si:H) single junction and a-Si:H/μc-Si:H tandem junction modules, respectively.     

Fabricating high performance a-Si solar cells by alternately repeating deposition and hydrogen plasma treatment method

The performance of a p-i buffer layer in pin amorphous silicon solar cell was improved by the “alternately repeating deposition and hydrogen plasma treatment method (ADHT)”. The optical bandgap of the a-Si film was increased by hydrogen plasma treatement. The wide optical bandgap and the high photoconductive a-Si:H films without carbon could be fabricated by the ADHT method. The conversion efficiency of the solar cell with a-Si:H buffer layer was almost the same as that using an a-SiC:H buffer layer. Second, the a-Si (ADHT) films were applied to the n-i buffer layer. The insertion of a-Si (ADHT) films between the i-layer and the n-layer was effective to improve the cell performance, especially the fill factor. With the use of high performance a-Si p-i and n-i buffer layer deposited by ADHT method, a cell conversion efficiency of 12.9% was obtained.     

Productivity potential of an inline deposition system for amorphous and microcrystalline silicon solar cells

Amorphous and microcrystalline silicon single layers and p-i-n solar cells were produced dynamically using an inline deposition system called “line source”. A highly uniform deposition of thin-film silicon layers with layer-thickness variations of less than ±5% was achieved. Amorphous and microcrystalline silicon single junction solar cells were dynamically fabricated with initial efficiencies of 8.3% and 6.3%, respectively. The dynamic deposition rate of these solar cells is 6.75 nm m/min in case of a-Si:H and 3.3 nm m/min for μc-Si:H. In this work it will be shown that an enhancement of the deposition rate up to 15.6 nm m/min during the i-layer deposition of a-Si:H solar cells has only a weak negative influence on the initial efficiencies of the cells. Further on, the effect of substrate velocity on solar cell characteristics of a-Si:H solar cells is investigated. Finally, a productivity estimation of the line source concept is presented.     

Fabrication of microcrystalline silicon solar cells on a SnO2 coated substrate using seed layer insertion

We fabricated hydrogenated microcrystalline silicon (μc-Si:H) solar cells on SnO₂ coated glass using a seed layer insertion technique. Since rich hydrogen atoms from the μc-Si:H deposition process degrade the SnO₂ layer, we applied p-type hydrogenated amorphous silicon (p-a-Si:H) as a window layer. To grow the μc-Si:H layer on the p-a-Si:H window layer, we developed a seed layer insertion method. We inserted the seed layer between the p-a-Si:H layer and intrinsic bulk μc-Si:H. This seed layer consists of a thin hydrogen diluted silicon buffer layer and a naturally hydrogen profiled layer. We compared the characteristics of solar cells with and without the seed layer. When the seed layer was not applied, the fabricated cell showed the characteristics of a-Si:H solar cell whose spectral response was in a range of 400-800 nm. Using the seed layer, we achieved a μc-Si:H solar cell with performance of V_oc=0.535 V, J_sc=16.0 mA/cm², FF=0.667, and conversion efficiency=5.7% without any back reflector. The spectral response was in the range of 400-1100 nm. Also, the fabricated device has little substrate dependence, because a-Si:H has weaker substrate selectivity than μc-Si:H.     

Amorphous silicon/p-type crystalline silicon heterojunction solar cells

We have investigated the photovoltaic (PV) characteristics of both glow discharge deposited hydrogenated amorphous silicon (a-Si:H) on crystalline silicon (c-Si) in a n⁺ a-Si:H/undoped a-Si:H/p c-Si type structure, and DC magnetron sputtered a-Si:H in a n-type a-Si:H/p c-Si type solar cell structure. It was found that the PV properties of the solar cells were influenced very strongly by the a-Si/c-Si interface. Properties of strongly interface limited devices were found to be independent of a-Si thickness and c-Si resistivity. A hydrofluoric acid passivation prior to RF glow discharge deposition of a-Si:H increases the short circuit current density from 2.57 to 25.00 mA/cm² under 1 sun conditions.DC magnetron sputtering of a-Si:H in a Ar/H₂ ambient was found to be a controlled way of depositing n type a-Si:H layers on c-Si for solar cells and also a tool to study the PV response with a-Si/c-Si interface variations. 300 Å a-Si sputtered onto 1–10 ω cm p-type c-Si resulted in 10.6% efficient solar cells, without an A/R coating, with an open circuit voltage of 0.55 V and a short circuit current density of 30 mA/cm² over a 0.3 cm² area. High frequency capacitance-voltage measurements indicate good junction characteristics with zero bias depletion width in c-Si of 0.65 μm. The properties of the devices have been investigated over a wide range of variables like substrate resistivity, a-Si thickness, and sputtering power. The processing has focused on identifying and studying the conditions that result in an improved a-Si/c-Si interface that leads to better PV properties.     

Deposition of thin film silicon using the pulsed PECVD and HWCVD techniques

We report on the use of pulsed plasma-enhanced chemical vapor deposition (P-PECVD) technique and show that “state-of-the-art” amorphous silicon (a-Si:H) materials and solar cells can be produced at a deposition rate of up to 15 Å/s using a modulation frequency in the range 1–100 kHz. The approach has also been developed to deposit materials and devices onto large area, 30 cm×40 cm, substrates with thickness uniformity (<5%), and gas utilization rate (>25%). We have developed a new “hot wire” chemical vapor deposition (HWCVD) method and report that our new filament material, graphite, has so far shown no appreciable degradation even after deposition of 500 μm of amorphous silicon. We report that this technique can produce “state-of-the-art” a-Si:H and that a solar cell of p/i/n configuration exhibited an initial efficiency approaching 9%. The use of microcrystalline silicon (μc-Si) materials to produce low-cost stable solar cells is gaining considerable attention. We show that both of these techniques can produce thin film μc-Si, dependent on process conditions, with 1 1 1 and/or 2 2 0 orientations and with a grain size of approx. 500 A. Inclusion of these types of materials into a solar cell configuration will be discussed.     

Application of real-time spectroscopic ellipsometry for characterizing the structure and optical properties of microcrystalline component layers of amorphous semiconductor solar cells

Over the past few years, we have applied real-time spectroscopic ellipsometry (RTSE) to probe hydrogenated amorphous silicon (a-Si:H)-based solar cell fabrication on the research scale. From RTSE measurements, the microstructural development of the component layers of the cell can be characterized with sub-monolayer sensitivity, including the time evolution of (i) the bulk layer thickness which provide the deposition rates, and (ii) the surface roughness layer thickness which provide insights into precursor surface diffusion. In the same analysis, RTSE also yields the optical properties of the growing films, including the dielectric functions and optical gaps. Results reported earlier have been confined to p-i-n and n-i-p cells consisting solely of amorphous layers, because such layers are found to grow homogeneously, making data analysis relatively straightforward. In this study, we report the first results of an analysis of RTSE data collected during the deposition of an n-type microcrystalline silicon (μc-Si:H) component layer in an a-Si:H p-i-n solar cell. Such an analysis is more difficult owing to (i) the modification of the underlying i-layer by the H₂-rich plasma used in doped μc-Si:H growth and (ii) the more complex morphological development of μc-Si:H, including surface roughening during growth.     

Low-temperature growth of thick intrinsic and ultrathin phosphorous or boron-doped microcrystalline silicon films: Optimum crystalline fractions for solar cell applications

The growth kinetics and optoelectronic properties of intrinsic and doped microcrystalline silicon (μc-Si:H) films deposited at low temperature have been studied combining in situ and ex situ techniques. High deposition rates and preferential crystallographic orientation for undoped films are obtained at high pressure. X-ray and Raman measurements indicate that for fixed plasma conditions the size of the crystallites decreases with the deposition temperature. Kinetic ellipsometry measurements performed during the growth of p-(μc-Si:H) on transparent conducting oxide substrates display a remarkable stability of zinc oxide, while tin oxide is reduced at 200°C but stable at 150°C. In situ ellipsometry, conductivity and Kelvin probe measurements show that there is an optimum crystalline fraction for both phosphorous- and boron-doped layers. Moreover, the incorporation of p-(μc-Si:H) layers produced at 150°C in μc-Si:H solar cells shows that the higher the crystalline fraction of the p-layer the better the performance of the solar cell. On the contrary, the optimum crystalline fraction of the p-layer is around 30% when hydrogenated amorphous silicon (a-Si:H) is used as the intrinsic layer of p–i–n solar cells. This is supported by in situ Kelvin probe measurements which show a saturation in the contact potential of the doped layers just above the percolation threshold. In situ Kelvin probe measurements also reveal that the screening length in μc-Si:H is much higher than in a-Si:H, in good agreement with the good collection of microcrystalline solar cells     

Titanium-containing amorphous hydrogenated silicon carbon films (a-Si:C:H/Ti) for durable solar absorber coatings

By the incorporation of silicon into titanium-containing amorphous hydrogenated carbon films (a-C:H/Ti), the lifetime stability at 250°C in air can be strongly enhanced. A combined PVD/PECVD process for the vacuum deposition of these titanium-containing amorphous hydrogenated silicon carbon films (a-Si:C:H/Ti) is described. Elemental compositions of the deposited films have been determined by in situ core-level photoelectron spectroscopy (XPS). Optical constants for these films have been determined in the wavelength range from 400 to 2500 nm by means of spectrophotometry. Single layers of a-Si:C:H/Ti and a-C:H/Ti deposited on aluminum and copper substrates have been subjected to comparative aging tests. At 250°C in air, the stability of the a-Si:C:H/Ti films is significantly higher than that of the a-C:H/Ti films. If the silicon content is not too high, the aging properties under humid conditions do not suffer a lot from the incorporation of silicon. However, if the silicon content is clearly higher than the carbon content, the humidity resistance will decrease. For an absorber coating for flat plate solar collectors, the optimized silicon content is expected to be in the range where the high-temperature stability in air is already improved, and where the humidity resistance is still good. For vacuum collectors, a higher silicon content might be advantageous.     

Intrinsic microcrystalline silicon: A new material for photovoltaics

Microcrystalline silicon (μc-Si:H) prepared by plasma-enhanced chemical vapor deposition (PECVD) has been investigated as material for absorber layers in solar cells. The deposition process has been adjusted to achieve high deposition rates and optimized solar cell performance. In particular, already moderate variations of the crystalline vs. amorphous volume fractions were found to effect the electronic material – and solar cell properties. Such variation is readily achieved by changing the process gas mixture of silane to hydrogen. Best cell performance was found for material near the transition to the amorphous growth regime. With this optimized material efficiencies of 7.5% for a 2 μm thick μc-Si:H single solar cell and 12% for an a-Si:H/μc-Si:H stacked solar cell have been achieved.     

Influence of defects and band offsets on carrier transport mechanisms in amorphous silicon/crystalline silicon heterojunction solar cells

We have investigated the carrier transport mechanisms in undoped a-Si:H/p-type c-Si heterojunctions with and without a μc-Si buffer layer, as well as their effects on the photovoltaic properties of the junction. The conduction behavior of the junction is strongly affected by the defect state distribution and band offset at the hetero-interface. The recombination process involving the interface states on the thin film silicon (a-Si:H/μc-Si) side dominates at low forward bias (V<0.3 V), whereas multistep tunneling capture emission (MTCE) dominates in the higher bias region (0.3<V<0.55 V) until the conduction becomes space charge limited (V>0.55 V). The MTCE process seems to be more closely related to the bulk defects in the thin film silicon than the interface states. In addition, the position of a trapping level, where the tunneling process occurs, seems to be determined by the hole energy at the edge of the c-Si and the trap distribution in the thin film silicon. Despite the domination of MTCE in the indicated voltage range, the reduced band offset at the interface increases current levels by the enhanced diffusion and/or emission processes. The insertion of a 200 Å thick μc-Si buffer layer between the a-Si:H (700 Å)/c-Si increases the solar cell efficiency to 10%, without an antireflective coating, by improving both the carrier transport and the red response of the cell.