Prospects for the development of high-power field-effect transistors based on heterostructures with donor-acceptor doping

We report the first results on the development of high-power field-effect transistors on gallium-arsenide heterosrtuctures with a quantum well and additional potential barriers, formed from layers with different doping types, optimized to reduce transverse spatial electron transport and enhance quantum confinement. The transistors yield a doubled output power at a trapezoidal gate length of 0.4–0.5 μm and a total gate width of 0.8 mm at a frequency of 10 GHz in the continuous mode of operation. The gain exceeds 9.5 dB at a specific output power above 1.6 W/mm and a power-added efficiency of up to 50%. Prospects for the development of such devices are presented.     

On the intrinsic limits of pentacene field-effect transistors

Performance limits for pentacene based field-effect transistors are investigated using single- and polycrystalline devices. Whereas the charge transport in single crystalline devices is band-like with mobilities up to 10⁵ cm²/V s at low temperatures, temperature-independent or thermally activated charge transport can be observed in polycrystalline thin film transistors depending on the growth conditions. Trapping and grain boundary effects significantly influence the temperature dependence of the field-effect mobility. Furthermore, the device performance of p-channel transistors (mobility, on/off ratio, sub-threshold swing) decreases slightly with increasing trap densities. However, the formation of an electron accumulation layer (n-channel) is significantly stronger affected by trapping processes in the thin film devices. Single crystalline p-channel devices exhibit at room temperature mobilities as high as 3.2 cm²/V s, on/off-ratios exceeding 10⁹, and sub-threshold swings as low as 60 mV/decade. Slightly diminished values are obtained for transistors working as n-channel devices (2 cm²/V s, 10⁸, and 150 mV/decade).     

Frequency limits of GaAs and InP field-effect transistors at 300 K and 77 K with typical active-layer doping

InP FET's with active layer doping of 10¹⁷donors/ cm³have limiting values of fTroughly fifty per cent higher than those of equivalent GaAs devices for lengths ranging from 0.5 µm to 3 µm at 300 K, and from eighty percent to forty percent higher in this gate length range at 77 K.     

Frequency limits of GaAs and InP field-effect transistors

Monte Carlo calculations of electron transport in InP and GaAs short-channel field-effect transisters (FET's) show that a significant departure from the equilibrium velocity-field curve occurs in these devices. On the basis of these calculations, InP FET's should have high-frequency performance superior to that of GaAs FET's only for effective channel lengths in excess of 1.5 µ.     

Influence of nonuniform field distribution on frequency limits of GaAs field-effect transistors

A simple model which describes well the nonequilibrium electron transport in GaAs using the fit to the equilibrium Monte Carlo data is suggested. In the frame of this model, the cutoff-frequency/gate-length curves are calculated for uniform and nonuniform channel field distribution in GaAs f.e.t.s. The results show that the nonhomogeneity of the electric field in the channel can considerably decrease (by 30%) the maximal frequency of GaAs f.e.t.s.     

Study of the effect of the gate region parameters on static characteristics of microwave field-effect transistors based on pseudomorphic AlGaAs-InGaAs-GaAs heterostructures

The results of numerical simulation and experimental study of the effect of the gate region parameters on static characteristics of microwave field-effect transistors based on pseudomorphic AlGaAs-InGaAs-GaAs heterostructures (p-HEMT) are considered. The possibility of correct simulation of static characteristics of actual device structures of p-HEMT transistors using the TCAD software package (SILVACO Inc.) is demonstrated. The essential necessity of using selective gate-groove etching to achieve controllable and reproducible device parameters is shown.     

Comparison of simple models of cylindrical and plane field-effect transistors

The electrical properties of plane field-effect transistors with different assumed impurity-atom distributions in their channel regions, corresponding to either an alloyed- or a diffused-gate p-n junction, are compared with those of the cylindrical type, with a uniform distribution of impurities in the channel. It is shown that the electrical properties of different types of field-effect transistors with the same pinchoff voltage and transconductance are quite similar.     

Effect of electron-donating unit on crystallinity and charge transport in organic field-effect transistors with thienoisoindigo-based small molecules

We report the effect of an electron-donating unit on solid-state crystal orientation and charge transport in organic field-effect transistors (OFETs) with thienoisoindigo (TIIG)-based small molecules. End-capping of different electron-donor moieties [benzene (Bz), naphthalene (Np), and benzofuran (Bf)] onto TIIG (giving TIIG-Bz, TIIG-Np, and TIIG-Bf) is resulted in different electronic energy levels, solid-state morphologies and performance in OFETs. The 80 °C post-annealed TIIG-Np OFETs show the best device performance with a best hole mobility of 0.019 cm² V⁻¹ s⁻¹ and threshold voltage of −8.6 ± 0.9 V using top gate/bottom contact geometry and a CYTOP gate dielectric. We further investigated the morphological microstructure of the TIIG-based small molecules by using grazing incidence wide angle X-ray scattering, atomic force microscopy and a polarized optical microscope. The electronic transport levels of the TIIG-based small molecules in thin-film states were investigated using ultraviolet photoelectron spectroscopy to examine the charge injection properties of the gold electrode.     

Solution-processed low leakage organic field-effect transistors with self-pattern registration based on patterned dielectric barrier

We demonstrated a new type of a solution-processed organic field-effect transistor (OFET) in a bottom-gate, top-contact geometry where low leakage current and self-pattern registration were achieved using a patterned dielectric barrier (PDB). The PDB of a hydrophobic fluorinated-polymer was produced on the top of a polymeric gate insulator of poly(4-vinylphenyl) by transfer-printing. The PDB enables to effectively screen out the vertical charge flow generated from the gate electrode, and thus the vertical leakage current between the gate and the drain was reduced by two orders of the magnitude compared to the leakage current in a conventional OFET without the PDB. Moreover, the PDB defines spontaneously an active channel pattern from a solution of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS PEN) by means of the selective wettability and the geometrical confinement.     

Flexible organic field-effect transistors based on electrospun conjugated polymer nanofibers with high bending stability

We report on flexible, single electrospun nanofiber field-effect transistors made by a blend of poly(3-decylthiophene) and poly(3-hexylthiophene), assessing for the first time the performances of this class of devices in terms of stability upon repeated tensile bending. Charge-carrier mobilities in the nanofiber-based device are estimated of the order of 10⁻³ cm²/(V s). Repeated cycles of bending and relaxing are performed, and the evolution of the device current–voltage characteristics is monitored up to 1000 cycles. We find that during bending the mobility is higher than that measured in planar conditions, and that after about 100 bending cycles it rapidly stabilizes. The here observed bending stability suggests a high compatibility of electrospun nanofibers with devices fabricated by roll-to-roll processes, and with bendable or wearable electronics.     

Organic field-effect transistors based on low-temperature processable transparent polymer dielectrics with low leakage current

A solution-based transparent polymer was investigated as the gate dielectric for organic field-effect transistors (OFETs). Organic thin films (400 nm) are readily fabricated by spin-coating a polyhydrazide solution under ambient conditions on the ITO substrates, followed by annealing at a low temperature (120 °C). The smooth transparent dielectrics exhibited excellent insulating properties with very low leakage current densities of ～10^?8 A/cm². High performance OFETs with evaporated pentacene as organic semiconductor function at a low operate voltage (?15 V). The mobility could reach as high as 0.7 cm²/Vs and on/off current ratio up to 10⁴. Solution-processed TIPS-pentacene OFETs also work well with this polymer dielectric.     

Organic field-effect transistors based on J-aggregate thin films of a bisazomethine dye

We report on the fabrication and the characterization of p-type organic field-effect transistors based on vapor-deposited J-aggregate bisazomethine dye thin films. The absorption spectra of this non-ionic organic semiconductor in the solid state show a strong influence of the film thickness on the J-aggregate formation. However, the electrical characteristics of the devices demonstrate that the hole transport properties do not vary significantly in films thicker than 100 nm. This is due to the fact that the J-aggregates are formed in this material at the surface of the crystalline grains and do not influence the semiconductor/gate dielectric interface and the charge transport properties of the devices. Hole field-effect mobilities as high as 2.4 × 10^?4 cm² V^?1 s^?1 were obtained and could be slightly improved by a solvent vapor treatment due to changes in the film crystallinity. Overall, this study demonstrates that J-aggregate bisazomethine dye thin films are good candidates for the realization of organic electronic devices.     

Methylated conjugated polymers based on diketopyrrolopyrrole and dithienothiophene for high performance field-effect transistors

In this work, a series of conjugated polymers based on diketopyrrolopyrrole (DPP) and dithienothiophene were designed for application in field-effect transistors (FETs). Owing to the synthetic nature of DPP units, the DPP polymers here contain different aromatic linkers with thiophene and methylthiophene, resulting in non-methylated and methylated DPP polymers. Methylated DPP polymers were found to show good crystalline properties and provide high hole mobilties up to 5.32 cm² V⁻¹ s⁻¹ in FETs, while non-methylated polymer exhibits a hole mobility of 3.16 cm² V⁻¹ s⁻¹. Especially, the polymer containing asymmetric linkers presents “face-on” orientation in thin films but provides the highest mobility. Our results reveal that the polymers incorporating methyl units as side chains can be used to realize high carrier mobility in FETs.     

High density 2DEG in III-V semiconductor heterostructures and high-electron-mobility transistors based on them

Situation in high-electron-mobility transistor (HEMT) technology is discussed. The N-AlGaAs/InGaAs/GaAs pseudomorphic HEMT’s are now considered as most advanced for mmwave monolithic circuits, but metamorphic N-In_xAl_1−x As/In_yGa_1−y As/In_xAl_1−x As HEMT’s grown on GaAs substrates are very promising for the future high-frequency devices. High density 2DEG in HEMT’s is analyzed by means of the Hall effect and photoluminescence measurements. Processing technology of the sub-0.25-μm pseudomorphic HEMT’s, metamorphic HEMT’s and their characteristics are also described. Fiz. Tekh. Poluprovodn. 33, 1064–1065 (September 1999) This article was published in English in the original Russian journal. Reproduced here with stylistic changes by the Translation Editor.     

Base transport factor calculations for transistors with complementary error function and Gaussian base doping profiles

By taking account of the carrier mobility degradation at high impurity concentrations, the high-frequency base transport factor of an n-p-n germanium base transistor was computed numerically for different base doping levels. The doping profiles under consideration were Gaussian and complementary error functions. The base doping level adjacent to the emitter was optimized for minimum base transit time. The optimum values are 4×10¹⁷atom/ cm³for complementary error function profile and 2×10¹⁷atom/cm³for Gaussian profile. The effects of emitter barrier capacitance, base resistance, collector barrier capacitance, and the collector depletion layer on the overall frequency response of a junction transistor are also discussed.     

Light emitting field-effect transistors with vertical heterojunctions based on pentacene and tris-(8-hydroxyquinolinato) aluminum

We report a top-contact light emitting field-effect transistor based on an asymmetric vertical heterojunction using pentacene as a field-effect layer and tris-(8-hydroxyquinolinato) aluminum (Alq₃) as an electron transport and luminescent material, which is fabricated on an indium tin oxide (ITO)-coated glass substrate with poly (methyl methacrylate) (PMMA) as a gate dielectric. The Alq₃ layer underneath the drain electrode roughly occupies one half of the pentacene surface forming an asymmetric heterojunction with pentacene. A hole transport layer N,N′-Di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) is introduced to occupy the other half of the pentacene surface underneath the source electrode to allow vertical hole transport in the device. We have realized the electrical switching functionality of a field-effect transistor (FET) and the control of electroluminescence (EL) simultaneously under ambient atmosphere. The device exhibits typical p-channel characteristics and green emission from Alq₃ is observed adjacent to the drain electrode. A working principle of the device is discussed in detail. Furthermore, this device configuration enables high-spatial-resolution fluorescence imaging of device operation, which is a simple and powerful tool for studying organic luminescent materials.     

On the delta-type doping of GaAs-based heterostructures with manganese compounds

Heterostructures, which incorporate GaAs/InGaAs/GaAs quantum wells and are doped with spatially remote monatomic Mn layers, are formed on GaAs(001) substrate under conditions of multilayer buildup by the method of molecular-beam epitaxy. Combined studies of the obtained samples were performed by the method of secondary-ion mass spectrometry, by measurements of X-ray diffraction, and using a transmission electron microscope. The heterostructures under study with a doping impurity concentration amounting to 0.5 single layers are elastically stressed and demonstrate planar clearly defined interfaces without visible extended or point defects. A method for visualization of the distribution of the manganese concentration in the three-dimensional GaAs matrix in the vicinity of a quantum well is suggested. According to experimental results, there is a probability for manganese diffusion into the GaAs/InGaAs/GaAs quantum well when the critical thickness of the GaAs buffer layer is decreased to a value smaller than 3 nm.     

Controlling the crystal formation in solution-process for organic field-effect transistors with high-performance

We control the growth of high-quality organic semiconducting crystals in the aim of transistor application. By finely tuning the processing parameters, both isolated crystals showing characteristic facet angles and irregular-shaped, thin crystalline domains are obtained in large sizes (>400 μm). Structural investigations indicate that the various shapes of crystals are in the same crystal structure, and reveal that the irregular-shaped crystalline domains are composed by terrace of molecularly flat regions, which can be up to hundreds of microns in size. When applied in field-effect transistors, the thin crystalline domains exhibit the best performance showing μ_FET up to 4.4 cm²/V s. This is an order of magnitude higher than that of the transistors made from as-spun films and thick crystals. The approach well demonstrates the importance of fine control of crystal formation and can be generally used for getting organic crystal transistors.     

Ways and peculiarities of submillimeter wavelength detection with short-channel field-effect transistors

The detection properties of some short-channel field-effect transistors (FETs) have been analyzed using the steady-state output characteristics of these devices. The calculated dependences of voltage—power sensitivity on applied voltage are compared with the corresponding curves obtained from high-frequency measurements. It is shown that the nonmonotonic dependence of the FET photosensitivity on gate voltage that is observed in the frequency range of 400–750 GHz is not related to resonant excitation of 2D plasmons in the subgate plasma but is due to the change in the distribution of stationary fields in the structure and, as a result, to the change in the efficiency of nonresonant nonlinearity procedures in the transistor’s electron subsystem with an increase in the gate-channel voltage. This conclusion is confirmed by analysis of the frequency dependences of photoresponse in the range under consideration, which do not exhibit resonant behavior at the frequencies corresponding to the peaks in the curves measured at a fixed frequency and different gate voltages.