共查询到20条相似文献,搜索用时 15 毫秒
1.
Nishi S. Seki S. Saito T. Fujishiro H.I. Sano Y. 《Electron Devices, IEEE Transactions on》1989,36(10):2191-2195
A gate recess process for a 0.5-μm I-HEMT (inverted high electron mobility transistor) has been developed. A drain conductance for the 0.5-μm I-HEMT as small as 2 mS/mm was achieved, indicating a small short-channel effect. The threshold voltage uniformities were studied in microscopic and macroscopic areas in a 2-in wafer. The uniformities are very high, i.e. the standard deviations of microscopic and macroscopic areas are 10 and 30 mV, respectively, at a threshold voltage of 0.1 V. An 8×4 parallel multiplier was fabricated, and a multiplication time of 1.67 ns was obtained at room temperature. An 8-b digital/analog converter (DAC) was fabricated and operated at a clock rate of 1.2 GHz. The DC linearity of the DAC is better than 0.18 LSB. These results confirm that an I-HEMT is very well suited for high-speed integrated circuits 相似文献
2.
An improved technique has been developed to measure source and drain parasitic resistances of AlGaAs/GaAs HEMTs. Similar to the measurement technique typically used for MESFETs, a positive d.c. gate crowding current is applied. Because of the structure of the HEMT, this gate current must be kept very small in order to prevent significant leakage into the AlGaAs layer, which would result in current paths not present in normal operation of the device. The small d.c. gate current necessary to limit the current in this leakage path did not yield a usable signal-to-noise ratio of the measured gate-source, gate-drain and drain-source voltages needed to calculate the parasitic resistances. To overcome this problem, modulation of the drain current with a low-frequency a.c. signal coupled with lock-in techniques to measure the desired voltages was implemented. The resulting improvement in signal-to-noise ratio has made the gate crowding technique suitable for measuring the parasitic resistances of AlGaAs/GaAs HEMTs. 相似文献
3.
为了研究量子阱结构对半导体环形激光器阈值电流的影响,从F-P腔激光器的振荡条件出发,分析了半导体环形激光器的阈值电流密度与量子阱结构参量的函数关系,并推导出最佳量子阱数的表达式。利用器件仿真软件ATLAS建立环形激光器的等效模型,仿真、分析了不同工作温度下,量子阱数、阱厚及势垒厚度对阈值电流的影响。结果表明,阈值电流随量子阱数和阱厚的增加先减小后增大,存在一组最佳值;在确定合适的量子阱数和阱厚后,相对较窄的势垒厚度有助于进一步降低阈值电流;采用GaAs/AlGaAs材料体系和器件结构,其最佳量子阱结构参量为M=3,dw=20nm及db=10nm。 相似文献
4.
K. A. Jones R. T. Lareau T. Monahan J. R. Flemish R. L. Pfeffer R. E. Sherriff C. W. Litton R. L. Jones C. E. Stutz D. C. Look 《Journal of Electronic Materials》1995,24(11):1641-1648
Symmetric δ-doped InGaP and AlGaAs PHEMT structures have been grown by organometallic vapor phase epitaxy with properties
that approach those of MBE grown AlGaAs structures. The 300 and 77K carrier concentrations for the InGaP PHEMT were 2.72 and
2.56 × 1012 cm2
−2 and the mobilities were 5,920 and 22,000 cm2
2/V.s. These excellent values suggest that problems associated with switching the anion at the channel heterojunction have
been overcome. The corresponding values for the AlGaAs PHEMT were 2.51 and 2.19 × 1012 cm2
−2 and 6,500 and 20,400 cm2/V.s. The uniformity in the indium concentration in the InGaAs layer as determined by photoluminescence, photoreflection,
double crystal x-ray diffraction, and Rutherford backscattering was found to be good, but the percent In in the AlGaAs pseudo-morphic
high electron mobility transistor (PHEMT) was less than that in the InGaP PHEMT even though the programmed values were the
same. The uniformity in the doping distribution as determined by secondary ion mass spectroscopy and electrochemical capacitance-voltage
measurements was found to be good, but it decreased with distance from the center of the susceptor. Also, most of the dopants
in the δ-doped InGaP and AlGaAs layers were activated. 相似文献
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6.
《Electron Device Letters, IEEE》1985,6(7):359-362
Detailed understanding of the MODFET inverter chains is lacking and present designs are based on ground rules developed by trial and error. We developed a simple and straightforward model for the current-voltage characteristics using results from numerical solutions of the quantum mechanical problem; this model agrees very well with experimental results obtained in our laboratory. High-frequency gate capacitance voltage characteristics for a wide gate voltage range was modeled for the first time in a similar fashion. These models were used to simulate a chain of inverters at 77 and 300 K for a wide range of supply voltage and load current. The maximum device speed is obtained for small supply voltages, ≤ 1 V both at 300 and 77 K, where the effects of transconductance degradation and large gate capacitance are minimized. The devices exhibit under 10-ps switching times both at 300 and 77 K, with 77 K logic swing being much larger. The results are in qualitative agreement with the reported experimental results. 相似文献
7.
Kuroda S. Harada N. Katakami T. Mimura T. Abe M. 《Electron Devices, IEEE Transactions on》1989,36(10):2196-2203
The authors studied the nonalloyed ohmic characteristics of HEMTs (high electron mobility transistors). At high integration levels, nonalloyed ohmic contacts were found to have two advantages: an extremely short ohmic length with low parasitic source series resistance and direct connection between the source/drain and gate with the same metal. The propagation delay in a ring oscillator with a single-metal source/drain and gate formed simultaneously was 37 ps/gate (L g=0.9 μm). The very short ohmic metal contacts and just three contact holes made it possible to reduce the memory cell area greatly. The cell is 21.5×21.5 μm2, one of the smallest ever reported for a GaAs-based static RAM. Using smaller load HEMTs or resistor loads in the memory cell, combined with nonalloyed ohmic technology with quarter- or subquarter-micrometer-gate HEMTs it is possible to fabricate a very-high-speed LSI such as a 64-kb static RAM with a reasonable chip size 相似文献
8.
Bushehri E. Thiede A. Staroselsky V. Timochenkov V. Lienhart H. Bratov V. Jakobus T. 《Electronics letters》1998,34(10):934-936
A T&H circuit with a sampling rate of 6 Gsample/s has been experimentally demonstrated in AlGaAs/GaAs/AlGaAs HEMT technology. The circuit utilises a dual bridge topology suitable for interleaved ADC circuits, doubling the effective sampling rate with an insignificant increase in area compared to the previously reported solutions 相似文献
9.
《Electron Devices, IEEE Transactions on》1985,32(6):1037-1041
GaAs MESFET ring oscillators were fabricated on a Si substrate and successfully operated. Epitaxial techniques to grow a GaAs layer on a Si substrate were investigated. The device-quality GaAs epitaxial layer was obtained by introducing a Ge layer (by ionized cluster-beam deposition) and alternating GaAs/GaAIAs layers (by MOCVD). The typical transconductance of 140 mS/mm was obtained for the FET with a 0.5 µm × 10 µm gate. The minimum delay time was 66.5 ps/ gate at a power consumption of 2.3 mW/gate. 相似文献
10.
A voltage-controlled ring oscillator (VCO) based on a full enhancement-mode InAlAs/InGaAs/InP high electron mobility transistor (HEMT) logic is proposed. An enhancement-mode HEMT (E-HEMT) is fabricated, whose threshold is demonstrated to be 10 mV. The model of the E-HEMT is established and used in the SPICE simulation of the VCO. The result proves that the full E-HEMT logic technology can be applied to the VCO. And compared with the HEMT DCFL technology, the complexity of our fabrication process is reduced and the reliability is improved. 相似文献
11.
A voltage-controlled ring oscillator (VCO) based on a full enhancement-mode InAIAs/InGaAs/InP high electron mobility transistor (HEMT) logic is proposed. An enhancement-mode HEMT (E-HEMT) is fabricated, whose threshold is demonstrated to be 10 mV. The model of the E-HEMT is established and used in the SPICE simulation of the VCO. The result proves that the full E-HEMT logic technology can be applied to the VCO. And compared with the HEMT DCFL technology, the complexity of our fabrication process is reduced and the reliability is improved. 相似文献
12.
T. Takagi H. Imamoto F. Sato K. Imanaka M. Shimura 《Photonics Technology Letters, IEEE》1989,1(1):14-15
An edge-emitting light-emitting diode (LED) with a wide emitting region for optical sensing and information processing which requires slit-shaped light sources is discussed. Through the use of a high-quantum efficiency single-quantum-well structure grown by molecular beam epitaxy an output power as high as 3 mW at an injected current of 100 mA with a 50- mu m-wide mesa structure is achieved at the 780-nm emission wavelength. A uniform and rectangular intensity profile, which is suitable for practical use, is obtained with a mesa-restricted structure.<> 相似文献
13.
Effect of GaAs/AlGaAs quantum-well structure on refractive index 总被引:1,自引:0,他引:1
Chih-Hsiang Lin Meese J.M. Wroge M.L. Chun-Jen Weng 《Photonics Technology Letters, IEEE》1994,6(5):623-625
We investigate the refractive index difference between the GaAs/AlGaAs quantum wells (QWs) and bulk AlGaAs. We find the refractive index difference is smaller when the electric field in the nominally intrinsic MQW region is larger, or when the well (GaAs) thickness of the QW's is larger, or when the Al fraction of the QWs is smaller. The maximum refractive index difference between the 100 Å GaAs/100 Å Al0.2Ga0.8As QWs at zero electric filed and bulk Al0.1Ga0.9As is about 0.044. Even with a small refractive index difference of 0.0132, the OFF-state reflectance of a normally-off MQW modulator at the designed photon wavelength will increase from the desired value of 0% to 90% when the reflectivity of the bottom mirror is 0.99 相似文献
14.
A planar structure AlGaAs/GaAs PIN photodiode was fabricated by first using MOCVD. The p+-region was formed by Zn-diffusion in a high-resistivity AlGaAs window layer. The internal quantum efficiency, close to unity, and the cut-off frequency, as high as 1.2 GHz, have been demonstrated by 280 ?m diameter devices. 相似文献
15.
Jing-Kaung Chen Si-Chen Lee 《Quantum Electronics, IEEE Journal of》1987,23(8):1283-1286
Ridge waveguide lasers of two different cavity configurations are described. First is the multisection ridge laser structure in which the longitudinal mode selection due to the coupled-cavity effect was observed and single-frequency operation was achieved. In this structure, stable single-transverse-mode operation was ensured by the central 5 μm wide section, and the beam waist and power output were enlarged by the outer 10 μm wide sections. Output power of more than 13 mW under pulsed excitation was obtained. The second configuration is the shallow groove ridge laser in which the 5 μm wide shallow groove terminates slightly above the active region and provides an index perturbation that contributes to mode selection. All the lasers are designed to emil in the visible range between 7600 and 7900 Å. The shortest observed wavelength is 7570 Å, and can be seen by the naked eye. 相似文献
16.
Experiments of gate leakage current in a double-channel n-AlGaAs/GaAs FET with SiNx film passivation indicated that the gate leakage current and its stability depend critically on the stoichiometry of the surface. The content of NH4 OH in the etching solution prior to the SiNx film deposition and the NH 3/SiH4 gas content ratio, particularly at the initial stage of plasma-CVD SiN, deposition, should be selected to minimize the surface state density of possible antisite defects. Extremely low gate leakage currents of 50 nA/mm have been obtained with an improved process, which is useful to realize low-distortion FETs 相似文献
17.
P. N. Brunkov A. A. Gutkin M. E. Rudinsky O. I. Ronghin A. A. Sitnikova A. A. Shakhmin B. Ya. Ber D. Yu. Kazantsev A. Yu. Egorov V. E. Zemlyakov S. G. Konnikov 《Semiconductors》2011,45(6):811-817
The depth distribution of free carriers over the HEMT structures with quantum-well layers is studied by electrochemical capacitance-voltage profiling. It is shown that the actual distribution of the concentration of free carriers and their energy spectrum in the HEMT structure channel can be obtained by numerical simulation of the results of profiling based on the self-consistent solution of one-dimensional Schrödinger and Poisson equations. 相似文献
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Ultra-submicrometer-gate AlGaAs/GaAs high-electron-mobility transistors (HEMTs) that have gate lengths ranging from 25 to 85 nm and were fabricated using electron-beam lithographic techniques on epitaxial wafers grown by molecular beam epitaxy are discussed. These devices show that velocity overshoot and short-gate geometry effects play an important role for the gate lengths less than 100 nm. The maximum intrinsic transconductance is 215 mS/mm, and the effective saturated electron velocity reaches 3×107 cm/s for a 30-nm HEMT 相似文献