Nitrogenated nanocrystalline diamond films: Thermal and optical properties

Ultrananocrystalline diamond films have been grown by microwave plasma CVD using CH₄/H₂/Ar mixtures with N₂ added in plasma in amounts up to 25%. The films were characterized with AFM, Raman, XRD, and UV–IR optical absorption spectroscopy mainly focusing on optical and thermal properties. In comparison with polycrystalline CVD diamond the UNCD are very smooth (R_a < 10 nm), have low thermal conductivity ( 0.10 W/cm K), high optical absorption ( 10³ cm^− 1 at 500 nm) and high concentration of bonded hydrogen ( 9 at.%). The nitrogen presence in the plasma has a profound impact on UNCD structure and properties, particularly leading to a decrease in resistivity (by 12 orders of magnitude), thermal conductivity, Tauc band gap, optical transmission and H content. The UNCD demonstrated rather good thermal stability in vacuum: the diamond phase still was present in the films subjected to annealing to 1400 °C.     

Wettability of nanocrystalline diamond films

The wettability of nanocrystalline CVD diamond films grown in a microwave plasma using Ar/CH₄/H₂ mixtures with tin melt (250–850 °C) and water was studied by the sessile-drop method. The films showed the highest contact angles θ of 168 ± 3° for tin among all carbon materials. The surface hydrogenation and oxidation allow tailoring of the θ value for water from 106 ± 3° (comparable to polymers) to 5° in a much wider range compared to microcrystalline diamond films. Doping with nitrogen by adding N₂ in plasma strongly affects the wetting presumably due to an increase of sp²-carbon fraction in the films and formation of C–N radicals.     

Improvement of field emission performance on nitrogen ion implanted ultrananocrystalline diamond films through visualization of structure modifications

The relationship between the electron field emission properties and structure of ultra-nanocrystalline diamond (UNCD) films implanted by nitrogen ions or carbon ions was investigated. The electron field emission properties of nitrogen-implanted UNCD films and carbon-implanted UNCD films were pronouncedly improved with respect to those of as-grown UNCD films, that is, the turn-on field decreased from 23.2 V/μm to 12.5 V/μm and the electron field emission current density increased from 10E−5 mA/cm² to 1 × 10E−2 mA/cm². The formation of a graphitic phase in the nitrogen-implanted UNCD films was demonstrated by Raman microscopy and cross-sectional high-resolution transmission electron microscopy. The possible mechanism is presumed to be that the nitrogen ion irradiation induces the structure modification (converting sp³-bonded carbons into sp²-bonded ones) in UNCD films.     

Effect of titanium metal in the prenucleation of ultrananocrystalline diamond film growth at low substrate temperature

Ultrananocrystalline diamond (UNCD) film is usually grown in methane–argon plasma unlike methane–hydrogen plasma conventionally used to deposit microcrystalline diamond film. The prenucleation and growth mechanism of these two types of diamond films are different as well. The present study introduces titanium metal powder during ultrasonication of silicon substrate to enhance the nucleation density of UNCD. A titanium thin film was also used at the interface to find the effect of metal on the growth of diamond film. The nucleation density of as-grown film was estimated from the FE-SEM images. After 20 min of growth, nucleation density reaches to 10¹¹/cm² on a surface pretreated by titanium mixed nanodiamond powder. Raman study was carried out for qualitative analysis of different carbon phase present in the UNCD films. X-ray photoelectron spectroscopy (XPS) was used to understand the growth mechanism by detecting the formation of carbon phase and metal carbide formation at the surface after stopping the growth at different time intervals.     

Evolution of the opto-electronic properties of amorphous carbon films as a function of nitrogen incorporation

The present work provides correlations between the optical, electronical and microstructural properties of amorphous carbon nitride films (a-CN_x) deposited by Direct Current (DC) magnetron sputtering technique versus the N₂/Ar + N₂ ratio. The microstructure of the films was characterized by Raman spectroscopy and optical transmission measurements. The evolution of both the density of states (DOS) located between the bandtail states and the density of states around the Fermi level N(E_f), have been investigated by electrical measurements versus temperature varying the N₂/Ar + N₂ ratio. The evolution of the microstructure versus N reveals a continuous structural ordering of the sp² phase, which is confirmed by the optical and the conductivity measurements. The conductivity variation was interpreted within the framework of the band structure model of the π electrons in a disordered carbon with the presence of localized states.     

High dose N ion implantation effects on surface treated UNCD films

Ion implantation is commonly used to modify the surface or near-surface properties of materials. In this work, plasma treated ultrananocrystalline diamond (UNCD) films were implanted using 100 and 200 keV high dose (10¹⁶ ions/cm²) nitrogen ions and annealed. Detailed studies have been carried out to reveal the structural and chemical states of the surface treated UNCD films before implantation, as-implanted, and after annealing by using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and electron field emission (EFE) measurements. The high dose N ion implantation induced the formation of amorphous phase, which are converted into graphitic phase after annealing, and improved the field emission properties of UNCD films. The improved field emission is attributed to the surface charge transfer doping mechanism.     

Optical properties of ultrananocrystalline diamond/amorphous carbon composite films prepared by pulsed laser deposition

Ultrananocrystalline diamond (UNCD)/amorphous carbon (a-C) composite thin films were grown in ambient hydrogen by pulsed laser deposition using a graphite target, and their optical properties were determined by optical absorption spectroscopy and Raman scattering spectroscopy. Three optical bandgaps exist. Two bandgaps are indirect and their values were estimated to be 1.0 eV and 5.4 eV; these bandgaps correspond to the a-C surrounding the UNCDs and the UNCDs respectively. The third bandgap is direct and has a value of 2.2 eV, which significantly contributes to a large absorption coefficient, (10⁶ cm^− 1 at 3.0 eV). Possible origins of the third bandgaps are the grain boundaries (GBs) between the UNCDs and the a-C since they are specific to the UNCD/a-C composite films. The infrared absorption spectrum and the Raman scattering spectrum revealed the incorporation of hydrogen in the GBs. The hydrogen incorporated in the GBs might also have some influence on the appearance of the direct bandgap and its value.     

Correlation between viscosity and absorption of electromagnetic waves in an aqueous UNCD suspension

A model of ultrananocrystalline diamond (UNCD) particle in an aqueous suspension produced by a stirred-media milling process of detonation nanodiamonds has been suggested for the first time. This model is based on a hypothesis that surface of the single UNCD particle contains partly disconnected sp² hybridized carbon regions. These regions are formed due to the sp³–sp² phase transition on a surface of UNCD particle as result of local heating of that surface during the stirred-media milling process. Unusual high viscosity, UV–Vis absorption, black color in visible region of the UNCD suspension and difficulty of plasmon resonance absorption observation have been explained in the suggested model.

The percolation between the sp² regions has explained small conductivity of UNCD powder and suggests a dependence of the conductivity on conditions of the milling process.

Our model fits well with recent characterization of UNCD powder by NMR and computer simulation.     

Structural features of diamond layers photo-emitting at sub-band gap energies

The photoemission behaviour of a series of diamond-based polycrystalline films irradiated by the second (2.3 eV), third (3.5 eV) and fourth (4.7 eV) harmonics produced by a Q-switched-mode-locked Nd: Yag laser has been investigated and related to the structural and compositional characteristics of the layers. The materials were polycrystalline undoped diamond films as well as Nd- and N-containing diamond films grown by CVD techniques, diamond-like and amorphous carbon layers. The morphological and structural characteristics of the films were investigated by electron microscopy, Raman spectroscopy and electron diffraction. The analysis of the photoemission curves does not evidence any improvement of the emission efficiency in the case of Nd-containing films nor for the diamond films grown in the presence of N_2. The results evidence conversely a strong correlation between the characteristics of the photoemission process at sub-band gap energies and the presence of amorphous sp²-C patches located at the diamond film surfaces. The photoemitting properties of our samples are discussed and rationalized by considering charge emission occurring at the sp²-diamond-vacuum border and the emission process governed by the ratio of amorphous sp²-C to crystalline sp³-C. The rather high values of quantum efficiency measured in the course of the present research at 3.5 and 4.7 eV suggest that a proper distribution of amorphous carbon onto a good quality diamond surface is the key factor for the preparation of efficient and stable photocathode materials.     

Investigation of the initial growth of ultrananocrystalline diamond films by multiwavelength Raman spectroscopy

The initial growth phase of ultrananocrystalline diamond/amorphous carbon nanocomposite films (UNCD/a-C) has been investigated by scanning electron microscopy, atomic force microscopy and especially Raman spectroscopy. As due to resonance effects Raman spectra of carbon materials strongly depend on the excitation wavelength, a multiwavelength analysis has been performed with λ_exc ranging from the UV region (325 nm) over the visible range (488 and 514 nm) to the IR region (785 nm). In addition, a set of measurements has been performed with a confocal Raman microscope, i.e. depth resolved, with a wavelength of 532 nm. The samples investigated were deposited with constant parameters, the deposition time being the only parameter varied, resulting in film thicknesses from 100 to 500 nm. It turned out that the diamond fraction and also the grain boundary material do not vary during that stage whereas there are slight but distinct changes of the nature of the amorphous matrix which reflect, among others, in a shift of the graphite-related G band to higher wavenumbers and in an increase of the ratio of D and G bands with increasing film thickness. These changes are discussed in terms of the above mentioned resonance effects; the major changes are a transition of hydrogen containing sp² chains to hydrogen-free condensed sp² rings when the material is no longer in the surface region of the films but becomes incorporated within the film bulk.     

The influence of dark feature on optical and thermal property of DC Arc Plasma Jet CVD diamond films

Different grades of CVD diamond films were prepared by 100 kW DC Arc Plasma Jet system. The films were characterized using optical microscope (OM), high-resolution transmission electron microscopy (HRTEM), electron energy-loss spectroscopy (EELS), and Raman spectroscopy. The results show that dark feature mainly is inclusions in CVD diamond films, the concentration are amorphous carbon and nitrogen. As for transparent optical grade diamond film, it has very high IR transparency and high thermal conductivity. The appearance of dark feature degraded the quality of CVD diamond film, apparently influencing IR transparency and thermal conductivity. But even in optical grade diamond film, there are very strong absorption features in the 7–9 μm region, this will limit the practical applications of diamond films grown by Plasma Jet as IR windows for CO₂ lasers.     

Plasma amination of ultrananocrystalline diamond/amorphous carbon composite films for the attachment of biomolecules

Ultrananocrystalline diamond/amorphous carbon nanocomposite films (UNCD/a-C) have been deposited by microwave plasma chemical vapour deposition at 600 °C from 17% CH₄/N₂ mixtures. The as-grown films turned out to be hydrogen terminated and very stable. Photochemical amination of H-terminated diamond is a well-established route to attach functional groups to such surfaces for applications in biosensors. Here we report on experiments to aminate UNCD surfaces directly by exposure to ammonia plasmas. Thereafter the surfaces were reacted with the heterobifunctional crosslinker molecule SSMCC bearing a N-hydroxysuccinimide (NHS) ester group which should react with the surface NH₂ groups. By means of X-ray photoelectron spectroscopy (XPS), contact angle measurements and fluorescence microscopy it is shown that both steps, plasma amination and SSMCC attachment lead to the desired aims. On the other hand, experiments to attach a thiol-bearing fluorescein molecule directly to H-terminated UNCD films turned out to be partially successful although according to literature such a reaction should be very unlikely.     

Formation of ultrananocrystalline diamond films with nitrogen addition

Nitrogen-doped ultrananocrystalline diamond (UNCD) films have been prepared by the microwave plasma jet chemical vapor deposition system (MPJCVD) using a gas mixture of Ar-1%CH₄-10%H₂ and addition of 0.5-7% nitrogen. This growth process by MPJCVD with 10% hydrogen addition that yields UNCD films compared with those UNCD films produced by MPCVD with a high Ar/CH₄ ratio due to the focused microwave plasma jet greatly enhanced the enough dissociation of react gases and formed C₂ species with an energetic state at lower argon concentration. The surface morphologies were changed drastically from continuous to rough granular surface with increasing the nitrogen content due to the great rise of CN species in the plasma. The width of grain boundaries composed of sp²-bonded carbon increased with increasing nitrogen content in the films. Moreover, the seldom defects in the UNCD films induced by the addition of nitrogen in the plasma were identified and investigated by using a scanning transmission electron microscope (STEM). The highest nitrogen-doped benefit with a N/C atomic ratio of 3.25% in UNCD films was reached by addition of only 3% N₂ in plasma (Ar-1%CH₄-10%H₂-3%N₂), showing the MPJCVD can greatly reduce the used amount of nitrogen in the synthesis of nitrogen-doped UNCD films.     

基于富勒烯液态源的超纳米晶金刚石薄膜生长

通过微波等离子体化学气相沉积技术(MWPCVD),以富勒烯(C60)甲苯饱和溶液为碳源,用载气携带的方式通入反应腔中生长金刚石膜。Raman光谱、SEM和AFM表征结果表明得到的超纳米晶金刚石薄膜相组成纯度较高,其平均晶粒尺寸约为15 nm,表面粗糙度为16.56 nm,薄膜平均生长速率约为0.6μm/h。此方法较其他以C60为碳源生长超纳米晶金刚石薄膜的方法更为简便,且容易控制富勒烯碳源的浓度,沉积速率更高,是一种新型的制备超纳米晶金刚石薄膜的可控工艺方法。     

Growth of faceted, ballas-like and nanocrystalline diamond films deposited in CH4/H2/Ar MPCVD

The influence of Ar addition to CH₄/H₂ plasma on the crystallinity, morphology and growth rate of the diamond films deposited in MPCVD was investigated using scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy. X-Ray diffraction patterns indicate that diamond films of strong (111) and weak (400) texture are produced in these samples. Faceted diamond gradually turns into ballas-like diamond with graphitic inclusions when the Ar concentration increases to above 30 vol.%, as indicated by Raman spectra. As the Ar concentration goes above 90 vol.%, nanocrystalline diamond films are formed, characterized by a 1150-cm⁻¹ peak in the Raman spectra and morphology observation. Diamond growth by CH₃ or by C₂ mechanism is proposed to interpret the change in the growth rate of diamond films with the variation of Ar content in the plasma.     

Deposition of carbon nitride films by filtered cathodic vacuum arc combined with radio frequency ion beam source

Atomically smooth carbon nitride films were deposited by an off-plane double bend filtered cathodic vacuum arc (FCVA) technique. A radio frequency nitrogen ion source was used to supply active nitrogen species during the deposition of carbon nitride films. The films were characterized by atomic force microscopy (AFM), XPS and Raman spectroscopy. The internal stress was measured by the substrate bending method. The influence of nitrogen ion energy (0–1000 eV) on the composition, structure and properties of the carbon nitride films was studied. The nitrogen ion source greatly improves the incorporation of nitrogen in the films. The ratio of N/C atoms in the films increases to 0.40 with an increase in the ion beam energy to 100 eV. Further increase in the ion beam energy leads to a slight decrease in the N/C ratio. XPS results show that nitrogen atoms in the films are chemically bonded to carbon atoms as C---N, C=N, and CN bonds, but most of nitrogen atoms are bonded to sp² carbon. The increase in nitrogen ion energy leads to a decrease in the content of nitrogen atoms bonded to sp² carbon, and an increase in the content of nitrogen atoms bonded to sp³ and sp¹ carbon. Raman spectra indicate an increase in the sp² carbon phase in carbon nitride films with an increase in nitrogen ion energy. The increase in sp² carbon fraction is attributed to the decrease in internal stress with increasing nitrogen ion energy.     

The effects of nitrogenation on the electrochemical properties of nanocrystalline diamond films

The effect of the nitrogenation on the electrochemical properties of nanocrystalline diamond films produced by microwave plasma CVD in CH₄–Ar–H₂–N₂ gas mixtures was studied systematically, using cyclic voltammetry and electrochemical impedance spectroscopy measurements, for the first time. Differential capacitance, kinetic parameters of reactions in [Fe(CN)₆]^3-/4-redox system and potential window were found to be sensitive to the nitrogen concentration in the process gas. With its increase (from 0 to 25%), a transition of the NCD film behavior from “poor conductor” to metal-like character takes place. The heavily N-doped nanocrystalline diamond films have satisfactory electrochemical properties to be used as electrodes.     

Pre-nucleation techniques for enhancing nucleation density and adhesion of low temperature deposited ultra-nanocrystalline diamond

Effect of pre-nucleation techniques on enhancing nucleation density and the adhesion of ultra-nanocrystalline diamond (UNCD) deposited on the Si substrates at low temperature were investigated. Four different pre-nucleation techniques were used for depositing UNCD films: (i) bias-enhanced nucleation (BEN); (ii) pre-carburized and then ultrasonicated with diamond powder solution (PC-U); (iii) ultrasonicated with diamond and Ti mixed powder solution (U-m); (iv) ultrasonicated with diamond powder solution (U). The nucleation density is lowest for UNCD/U-substrate films ( 10⁸ grains/cm²), which results in roughest surface and poorest film-to-substrate adhesion. The UNCD/PC-U-substrate films show largest nucleation density ( 1 × 10¹¹ grains/cm²) and most smooth surface (8.81 nm-rms), whereas the UNCD/BEN-substrate films exhibit the strongest adhesion to the Si substrates (critical loads =  67 mN). Such a phenomenon can be ascribed to the high kinetic energy of the carbon species, which easily form covalent bonding, Si–C, and bond strongly to both the Si and diamond.     

Low-Temperature Synthesis of Diamond-like Carbon Films on Steel Substrates by Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapor Deposition

Using microwave electron-cyclotron-resonance plasma-enhanced chemical vapor deposition, diamond-like carbon films were directly grown at low temperatures (lessthan equal to400°C) on Fe-based alloy substrates without diamond seeding or use of a template layer. A single, broad line in the Raman spectra was observed in the region of 1328-1335 cm^-1 for films grown in gas mixtures with a ratio of CH₄:H₂ greaterthan equal to 2%. In contrast, disordered carbon and graphite phases appeared in the spectra for film grown with a concentration of 20% CH₄ in hydrogen. Diamond nucleation with an amorphous carbon layer was observed in the initial growth stage, while many diamond particles with irregular morphological features were observed on the surface of thicker films. These growth features are a consequence of the catalytic nature of the Fe-based substrate.     

Influence of nitrogen ion energy on the Raman spectroscopy of carbon nitride films

Carbon nitride films were deposited by filtered cathode vacuum arc combined with radio frequency nitrogen ion beam source. Both visible Raman spectroscopy and UV Raman spectroscopy are used to study the bonding type and the change of bonding structure in carbon nitride films with nitrogen ion energy. Both C–N bonds and CN bonds can be directly observed from the deconvolution results of visible and UV Raman spectra for carbon nitride films. Visible Raman spectroscopy is more sensitive to the disorder and clustering of sp² carbon. The UV (244 nm) Raman spectra clearly reveal the presence of the sp³ C atoms in carbon nitride films. Nitrogen ion energy is an important factor that affects the structure of carbon nitride films. At low nitrogen ion energy (below 400 eV), the increase of nitrogen ion energy leads to the drastic increase of sp²/sp³ ratio, sp² cluster size and C---N bonds fraction. At higher nitrogen ion energy, increase leads to the slight increase of CN bonds fraction and sp² cluster size, slight decrease of C---N bonds fraction and sp²/sp³ ratio.