Niederenergie-IBAD: Zusammenhang zwischen Prozeßparametern und Schichteigenschaften bei ionenstrahlunterstützten Aufdampf-und Sputtertechniken

Low energy IBAD: correlation between process parameters ans film properties for ion beam assisted evaporation and sputter deposition Binary nitride films with Al, Cr and Ti as metal components have been deposited with ion beam assisted evaporation and sputtering (IBAD) and the film properties are investigated in terms of the individual deposition parameters. In the case of ion beam assisted evaporation the flux ratio between the film forming metal atoms and the nitrogen ions from the ion source was shown to enable a quantitative control of the composition and the chemical phases of the films. Detailed studies for TiN reveal the possibilities to manipulate texture and stress, the average grain size and the morphology of the films. Such results are discussed with an extended structure zone model, introducing the energy input per film forming particle as the relevant parameter. Also, the structural film properties and the deposition parameters are quantitatively correlated with the hardness and the beginning of TiN deposition on stainless steel resulted in distinctly improved adhesion properties. For the deposition of TiN with a dual ion beam arrangement in which one beam bundle was directed onto a Ti-target and an other onto the substrate with the growing film, a strong influence of the particle energies and the incidence angles on the film texture and its directional orientation was found. Such effects are quantitatively related to the minimization of the free energy of the films and the influence of preferential re-sputtering effects. For ion beam sputter deposition without simultaneous ion bombardment of the growing film, the texture and the film stress are found to be controlled by energetic particles resulting from elastic backscattering at the target surface.     

Beschichten transparenter Kunststoffe mit Kratzschutz und AR in einer kombinierten InLine‐Anlage

For the last decades, both the ophthalmic and the precision optics industries have been relying on vacuum evaporation on the production floor. This particular thin film process is not very suitable for mass production. A major problem in mass production of high quality consumer products is the lack of automatic operation in single chamber evaporation coaters. This article describes a new coating process for lenses which uses both PECVD and sputtering technologies. A new InLine machine equipped with these technologies is presented. This machine meets all requirements with respect to process stability and automation for the respective industry. With its modular design concept, this coating machine can be totally integrated into an InLine factory floor. It can also easily be scaled up or down for a wide range of applications. Given the excellent quality that has been achieved for hardcoat and antireflective coating of plastic eyeglass lenses, similar results can be expected in other thin film applications for a wide range of temperature sensitive substrates in precision optics.     

Lichtbogengestützte Prozesse zur Beschichtung von Kunststoffen

In the past ten years plasma enhanced deposition techniques have gained much increased importance due to the possibilities of improving and developing new film properties. Among these properties are adhesion and film structure. One of the new plasma assisted film deposition techniques is the Arc enhanced thermal evaporation technique. This new deposition technique and the film properties that are possible with this technique and its applications are described in this paper.     

Study of solid lubrication with MoS<Subscript>2</Subscript> coating in the presence of additives using reciprocating ball-on-flat scratch tester

Molybdenum disulphide (MoS₂) based solid lubricant mixtures containing zirconia and graphite were prepared in the laboratory and coated on steel specimens. The experiments were done using reciprocating scratch test for various numbers of cycles. The results showed that the addition of zirconia and graphite into the MoS₂ lubricant has improved its properties in terms of both friction and wear. In addition, it was observed that the presence of moisture affects the life of the lubricating film. It was shown that at high temperature the moisture evaporation enhanced the coating performance of the film.     

Thermal Deposition of Intact Tetrairon(III) Single‐Molecule Magnets in High‐Vacuum Conditions

A tetrairon(III) single‐molecule magnet is deposited using a thermal evaporation technique in high vacuum. The chemical integrity is demonstrated by time‐of‐flight secondary ion mass spectrometry on a film deposited on Al foil, while superconducting quantum interference device magnetometry and alternating current susceptometry of a film deposited on a kapton substrate show magnetic properties identical to the pristine powder. High‐frequency electron paramagnetic resonance spectra confirm the characteristic behavior for a system with S = 5 and a large Ising‐type magnetic anisotropy. All these results indicate that the molecules are not damaged during the deposition procedure keeping intact the single‐molecule magnet behavior.     

Technisch‐wirtschaftlicher Review der Herstellung tetraedrisch‐amorpher Kohlenstoffschichten durch Lichtbogenverdampfen

Technical and economical review of the production of tetrahedral‐amorphous carbon films by vacuum arc evaporation Due to the high energy of the depositing species, vacuum arc evaporation is suited for the production of tetrahedral‐amorphous carbon coatings (ta‐C). As besides, the process allows for high deposition rates, it seems to be ideal for the deposition of ta‐C in industrial mass production. However, during the evaporation process inevitably macroparticles are formed, which also deposit on the parts to be coated, degrading the coating properties considerably. Therefore, measures are necessary in order to counter the formation and/or deposition of these particles. The following article intents to give an overview of possible measures and to subject them to a technical and economical evaluation in regard to their application in industrial mass production.     

钛氧化物的蒸发特性

试验以Ti2O3、Ti3O5和TiO2作为初始膜料，在ZZS7OO—6／G型真空镀膜机上采用O^2-离子束辅助蒸发制备氧化钛薄膜。用XRD检测方法确定各种膜料和薄膜的相成分，并全面的分析了各种膜料的蒸发特性和薄膜；用分光光度计测量薄膜的透射率，并分析薄膜的光学性能。试验表明，在采用Ti2O3、Ti3O5和TiO2作为蒸发制备氧化钛薄膜时，在钛的氧化物中存在Ti3O5固态同一蒸发相；各种膜料在蒸发时，发生分解，熔池中的物质的成分逐渐转变并晟终完全成同一蒸发相成分。     

水浸腐蚀对SiO_2/Ag/SiO_2复合膜光学特性的影响

用蒸镀法制备了SiO2 Ag SiO2 复合膜 ,探讨了水浸腐蚀和薄膜厚度对该复合膜光学特性的影响。试验结果表明 :适当增加复合膜中SiO2 膜层的厚度不但可以提高SiO2 Ag SiO2 复合膜可见光的透光率 ,而且可以相对有效地防止复合膜进一步被氧化 ,提高SiO2 Ag SiO2 复合膜的抗水浸腐蚀性能     

Rückseitenmetallisierung Wafer‐basierter Si‐Solarzellen mittels EB‐PVD

Back Side Metallization of Wafer Based Silicon Solar Cells by Means of Electron Beam Evaporation Electron beam evaporation is an innovative vacuum deposition technology regarding the wafer backside metallization of crystalline silicon solar cells. The motivation for the consideration of electron beam evaporation as cell finishing step is based on the one hand on the competition with thin film photovoltaic modules and on the other on the remarkable cost reduction potential by applying EB‐PVD (Electron Beam Physical Vapor Deposition). This article presents a highly productive coater concept and gives an explanation of important aspects for the adaption of the coater concept to typical solar cell features. Various PVD technologies are compared concerning their possible use as wafer backside metallization method. Challenges and chances of the introduction of EB‐PVD in the wafer based solar cell production are considered.     

共蒸发制备GaSb多晶薄膜的研究

GaSb的禁带宽度为0.72eV,是热光伏电池的理想材料。采用共蒸发的方法,在普通玻璃衬底上生长GaSb多晶薄膜。通过XRD谱、Hall及透射反射谱测试,研究了Ga、Sb源的蒸发温度、衬底温度以及薄膜厚度对薄膜的结构特性和光电特性的影响。研究表明,随衬底温度的升高、薄膜厚度的增加,晶粒尺寸逐渐增大;随衬底温度的升高、Ga源温度的降低以及厚度的增加,迁移率逐渐上升,迁移率最高可达172cm2/(V.s);随衬底温度的降低、Ga源温度的提高以及厚度的增加,载流子浓度逐渐增加。     

Optical properties of CeO<Subscript>2</Subscript> thin films

Cerium oxide (CeO₂) thin films have been prepared by electron beam evaporation technique onto glass substrate at a pressure of about 6 × 10⁻⁶ Torr. The thickness of CeO₂ films ranges from 140–180 nm. The optical properties of cerium oxide films are studied in the wavelength range of 200–850 nm. The film is highly transparent in the visible region. It is also observed that the film has low reflectance in the ultra-violet region. The optical band gap of the film is determined and is found to decrease with the increase of film thickness. The values of absorption coefficient, extinction coefficient, refractive index, dielectric constant, phase angle and loss angle have been calculated from the optical measurements. The X-ray diffraction of the film showed that the film is crystalline in nature. The crystallite size of CeO₂ films have been evaluated and found to be small. The experimental d-values of the film agreed closely with the standard values.     

铜薄膜与Al_2O_3陶瓷界面结合力的IBAD过渡层增强

利用离子束辅助淀积(IBAD)方法在Al_2O_3陶瓷基片上镀制过渡金属层,然后在此过渡层上进一步用电子束蒸发镀制铜导电薄膜。这种复合方法镀制的铜膜在具有低电阻率的同时,界面附着力有大幅度增加。在本文实验条件下,有IBAD铜或钛过渡层薄膜的附着力比没有过渡层的薄膜附着力分别增加了5倍和8倍。     

Herstellung funktionaler organischer Dünnschichten durch Vakuumverdampfung

Depositing of functional organic thin films by vacuum evaporation Material evaporation under high or ultra‐high vacuum conditions has been a well known method of thin film coating since nearly a hundred years. Since discovery of semiconducting organics in the 1970s and 1980s, this technology has been increasingly applied to deposit organic molecular compounds. At the moment especially materials for organic LEDs (OLEDs) and for thin‐film solar cells are in the focus of interest. While organics evaporation makes use of advantages of high‐vacuum coating (purity, compatible processing, masking etc.) there are also dedicated demands on process control coming up. The article describes basic requirements, capabilities of present temperature‐controlled evaporation sources, material‐related features, as well as typical applications.     

Untersuchungen über herstellung und eigenschaften aufgedämpfter magnetschichten als speicherschichten für magnetbänder

Conditions for producing Fe-Ni-Co alloy films on polyester tape by evaporation were studied as to their suitability as magnetic tape storage films. Evaporated films were tested for mechanical and chemical properties as well as magnetic and storage behavior. For achievable storage density the ratio of coercive field strength to saturation remanence is of essential importance. Alloys having high stress anisotropy show the most favorable ratio. Such alloys with a suitable selected film thickness enable a pulse storage of high density. Measures were also tested to obtain highly coercive evaporated films.     

Caractères spécifiques des empilements de couches minces métalliques déposées sur des supports à 10 K et à 293 K

In this paper we show that different results are obtained when a silver film of given thickness is deposited in a single evaporation and when it is deposited by the stacking of successive layers. With stacking, the formation of continuous film is delayed. Specific properties are observed for layers evaporated onto substrates at 10 K. In the absence of free electron absorption (very thin films) our results for these films, when analysed according to the theory of David, seem to indicate that the grains grow by maintaining their ellipsoidal shape and the corresponding ratio of the axes. These grains begin to flatten only under Drude absorption. This effect does not seem to occur for the evaporation of successive layers on substrates which are not cooled; here, the grain shape seems to change in a continuous manner.     

Investigation of the interfacial structure of ultra-thin platinum film deposited by cathodic–arc

Ultra-thin films are of interest in the production of X-ray mirrors that use a multilayer structure. The most commonly used deposition techniques are dc magnetron sputtering and electron beam evaporation; this paper presents results of cathodic–arc deposition. Ultra thin films of platinum with nominal thicknesses in the range 15–65 Å were deposited on silicon substrates and the film structure investigated using X-ray reflectivity and X-ray photoelectron spectroscopy. It has been found that the structure of the deposited films consists of three layers—the platinum film, a silicon oxide layer and a platinum silicide layer. In contrast to dc magnetron and electron beam deposited films, the silicide layer of cathodic–arc deposited films have a higher density and greater thickness, which is attributed to the higher energy process of this deposition technique. These attributes of the cathodic–arc deposited films suggest that the deposition technique is not suitable for production of mirrors of materials that react with each other, but for materials that do not the deposition technique is potentially more favourable than that of e-beam and magnetron sputtering.     

Laser-Induced Phase Transitions in Vitreous Se Films Obtained by Vacuum-Thermal Evaporation

The results of the study of vitreous Se films obtained by a method of vacuum-thermal evaporation after their laser modification are presented. It is shown for the first time that a low-power laser irradiation of the film at a wavelength of 632.8 nm and room temperature results in a nucleation and growth of nanocrystallites of monoclinic and rhombohedral Se in an amorphous matrix of the film. The formation of the stable hexagonal Se phase is not observed. The appearance of nanocrystallites with an average size of ~20–30 nm is accompanied by a growth of a reflection coefficient of the film. The established new optical and structural properties of the formed films are stable in time at room temperature.     

单源热蒸发制备有机无机杂化CH3NH3PbI3薄膜及其性能表征

采用全真空单源热蒸发沉积技术直接制备钙钛矿太阳电池用有机无机杂化CH₃NH₃PbI₃薄膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能量色散谱仪(EDS)和分光光度计对制备的CH₃NH₃PbI₃薄膜微结构、表面形貌、化学成分和光学性能进行表征分析, 并与非真空旋涂法制备的CH₃NH₃PbI₃薄膜性能进行比较。结果表明: 单源热蒸发法制备的CH₃NH₃PbI₃薄膜呈现单一的钙钛矿四方晶体结构, 且与蒸发源材料的晶体结构同源性高, 没有出现杂质相偏析; 对比旋涂法制备的CH₃NH₃PbI₃薄膜表面均匀致密平整, 且薄膜结晶度更高; 单源热蒸发法制备的CH₃NH₃PbI₃薄膜禁带宽度为1.57 eV, 符合钙钛矿太阳电池吸收层光学性能要求。     

低电压驱动微流控芯片二氧化硅绝缘薄膜的研究

采用电子束蒸发法在玻璃基底上制备了二氧化硅薄膜,利用原子力显微镜(AFM)、台阶仪、X射线衍射仪(XRD),分别对不同条件下制备的二氧化硅薄膜的表面形貌、膜厚、结构进行了表征,并采用金属/绝缘膜/金属(MIM)结构对薄膜的I-V电学特性进行了分析。结果表明玻璃基底温度在300℃条件下生长的4μm厚度的二氧化硅薄膜,其表面均匀平整,耐压能力>200V,能够承受500kV/cm以上的场强,满足作为低电压驱动微流控芯片绝缘薄膜的要求,并在样品驱动的应用中得到验证。     

前驱体温度对激光化学气相沉积YBa2Cu3O 7δ超导薄膜结构及性能的影响

采用激光化学气相沉积法在Al2O3基底上以49μm·h-1的沉积速率高速制备了c-轴取向的YBa2Cu3O 7-δ薄膜,其中,激光功率为133 W,沉积温度1103 K,腔体压强800 Pa。研究了前驱体蒸发温度及薄膜退火温度对薄膜电学性能的影响。研究表明,Ba、Cu、Y前驱体加热温度分别为603、478、459 K时制备的薄膜在经813 K高温热处理12 h后,临界温度可达83 K。