首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到19条相似文献,搜索用时 174 毫秒
1.
目的研究离子源功率对a-C:H(Al)薄膜结构及性能的影响。方法采用阳极离子源离化CH_4气体,中频磁控溅射Al靶,通过改变离子源功率,在n(100)型单晶硅及16Mn Cr5钢基体上沉积a-C:H(Al)薄膜。利用扫描电镜、维氏显微硬度计、摩擦磨损试验机和表面轮廓仪等设备对a-C:H(Al)薄膜的结构及性能进行表征。结果薄膜的硬度均在1000HV以上。摩擦系数较低,为0.05~0.15。离子源功率为450 W时,薄膜摩擦系数和结合力均出现了最优值,分别为0.05和21.46 N。离子源功率在550 W时,磨损率达到最低值,为3.59×10~(-7) mm~3/(N·m)。结论离子源功率较低时,薄膜表面较疏松,随着离子源功率的增加,薄膜逐渐趋于平整致密。随离子源功率的增加,薄膜的硬度增大,薄膜的结合力先增大后减小,而薄膜的摩擦系数先减小后增大,磨损宽度减小,磨损深度降低,磨损率减小。  相似文献   

2.
利用非平衡磁控溅射技术在镜面抛光的SCM415渗碳淬火钢基片上沉积了无掺杂类金刚石(DIE)薄膜和不同含量Ti掺杂类金刚石(Ti-DIE)薄膜.利用AFM、SEM、TEM对薄膜的微观结构与形貌进行了观察,利用纳米硬度计、摩擦磨损试验仪及纳米划痕仪测试了薄膜的显微硬度、摩擦系数及薄基结合强度.结果表明:随着Ti的掺杂,薄膜硬度先迅速降低,然后保持不变,在Ti含量为25at%时薄膜硬度出现回升,膜基结合强度随Ti的掺杂呈单调增强趋势.与无掺杂类金刚石薄膜相比,掺杂Ti后薄膜表面微观凸凹增多,摩擦系数增大.对于Ti-DIE薄膜来说,随着Ti掺杂量的增加,摩擦系数出现减小的趋势.其原因在于Ti掺杂量的增加使Ti-DLC薄膜变得更加致密,同时Ti的掺杂还有利于弥补基体表面的凸凹缺陷,使薄膜变得更平滑.  相似文献   

3.
采用直流脉冲电源,以甲醇有机溶液作为碳源,通过电化学沉积法在不锈钢表面制备了类金刚石碳(DLC)薄膜.用扫描电镜和拉曼光谱分析了薄膜的形貌和结构,用MTS纳米压痕仪测试DLC薄膜的硬度和Young's模量,在CERT微摩擦系统上测试了薄膜的摩擦学性能.结果表明:电化学沉积含氢类金刚石碳薄膜的硬度较高(约7GPa),薄膜均匀、致密,表面粗糙度小;拉曼光谱在1332.51 cm-1处出现金刚石的特征峰;在室温干摩擦条件下,薄膜同WC钢球对摩时的摩擦系数随载荷增加而略微减小,抗磨性能则随着载荷的增加而变差,对摩时发生转移并形成转移膜,耐磨寿命缩短.  相似文献   

4.
对直流磁控溅射法制备Nd-Fe-B薄膜工艺进行了研究.在不同的溅射功率、溅射气压、溅射时间等条件下制备薄膜,并对薄膜进行了AFM、XRD分析.结果表明,Nd-Fe-B薄膜的沉积速率、表面形貌及相结构与溅射功率、溅射气压、溅射时间密切相关.薄膜的沉积速率随磁控溅射功率的增加而增加,薄膜表面晶粒尺寸和表面粗糙度随溅射功率增加而增大.沉积速率随溅射气压的升高先增大后减小.低功率溅射时,薄膜中出现α-Fe、Nd2Fe14B相相对较少,随溅射功率增加,α-Fe相消失,Nd2Fe14B相增多.综合考虑各种因素,最佳溅射功率为100~130 W.  相似文献   

5.
采用磁控溅射方法在1Cr18Ni9Ti不锈钢基体上沉积Ti-Si-N纳米薄膜。结果发现:随着Si含量增加,薄膜的晶粒尺寸逐渐变小,晶粒尺寸范围在3nm~20nm之间。薄膜的显微硬度相对于TiN有明显增加,最大硬度可达43.5GPa。Si元素的加入亦改善了膜基结合强度。同时发现,Ti-Si-N纳米薄膜的摩擦系数和比磨损率随着Si含量的增加先减小后增加,其高温摩擦系数明显低干常温,但比磨损率却有显著提高。  相似文献   

6.
生物医用类金刚石薄膜的力学性能评价   总被引:5,自引:0,他引:5  
用射频等离子体增强化学气相沉积在钛合金表面制备类金刚石薄膜,利用原子力显微镜、纳米力学探针、划痕仪、滑动摩擦和微动摩擦等研究了涂层的表面形貌和力学性能。结果表明:随涂层厚度的增加,表面粗糙度先增后降,最后趋于稳定,硬度和划痕临界载荷提高,室温空气条件下的滑动摩擦系数减小;对于确定的膜厚,随相对湿度增加,摩擦系数降低,这有利于其在体液环境中的应用。  相似文献   

7.
多组分缓冲层W梯度掺杂DLC复合薄膜研究   总被引:2,自引:0,他引:2  
用离子束辅助非平衡中频磁控溅射技术, 在Si, 高速钢或不锈钢基体上分别沉积得到了具有多组分过渡金属层缓冲的W梯度掺杂类金刚石碳(DLC)膜, 研究了W靶电流对DLC膜组成、结构和性能的影响. 实验表明, 随着W靶电流增大, 薄膜中W掺杂量增加, W的碳化物含量增加, sp3结构含量减少; 薄膜的纳米硬度和弹性模量逐渐增大, 且材料抗塑性参数H/E随之增大; 随W靶电流增大, 材料与基体结合力增强, 划痕实验临界载荷在80-100 N之间, 材料摩擦系数增大; 但磨损率因W掺杂而明显减小, 且随W靶电流增大而减小. 样品表面元素分布均匀, 粗糙度(Ra)较小, Ra值在7.56-15.8 nm之间.  相似文献   

8.
刘保国  林玥  张世宏 《表面技术》2016,45(6):119-124
目的 探究湿度和加载载荷对氮化高速钢基体上沉积掺钨类金刚石薄膜的摩擦磨损性能的影响.方法 通过非平衡磁控溅射技术在氮化处理后的高速钢基体上制备了掺钨类金刚石(W-DLC)薄膜.利用纳米压痕仪和划痕实验检测了薄膜的硬度和结合力,通过摩擦磨损实验检测了不同湿度(30%和60%)和不同载荷(10、20、30、40 N)条件下薄膜的摩擦系数和磨损率,利用扫描电子显微镜对摩擦磨损后的形貌与成分进行了观察与分析,并利用拉曼光谱对磨屑的结构进行了分析.结果 在湿度为30%和60%的条件下,薄膜的摩擦系数均随着摩擦载荷的增加呈现先增加后降低的规律,且在载荷为30N取得最小值;磨损率均随着载荷的增大而增加,且湿度为60%条件下薄膜的磨损率大于湿度为30%条件下的磨损率.磨屑产物的拉曼光谱结果显示,摩擦过程导致薄膜发生石墨化转变,而载荷和湿度对磨屑结构的影响不大.结论 高速钢基体进行离子氮化后,可以明显提高掺钨类金刚石薄膜的硬度和结合力.  相似文献   

9.
直流反应磁控溅射制备氧化铝薄膜   总被引:1,自引:0,他引:1  
采用直流反应磁控溅射,以高纯Al为靶材,高纯O2为反应气体,在镍基合金和单晶硅基片上制备了氧化铝薄膜,并对氧化铝薄膜的沉积速率和表面形貌进行了研究.结果表明,氧化铝薄膜的沉积速率随溅射功率的增大先几乎呈线性增大而后增速趋缓;随溅射气压的增加,沉积速率先增大,在1.0Pa时达到峰值,而后随气压继续增大而减小;随Ar/O2流量比的不断增加,沉积速率也随之不断增大,但是随着负偏压的增大,沉积速率先急剧减小而后趋于平缓.用扫描电子显微镜对退火处理前后的氧化铝薄膜表面形貌进行观察,发现在500℃退火1h能够使氧化铝薄膜致密化和平整化.  相似文献   

10.
为了提高复合镀层的耐磨性、改善复合镀层的结合力、硬度,在不同的磁场强度和不同的金刚石添加量下进行了化学复合镀,于铜基体表面制备了一层镍-磷-金刚石复合镀层,然后对镀层性能进行表征。结果表明,金刚石粒子含量为2g/L^4g/L时,随着磁场强度的增大,镀层的厚度逐渐增大,而当金刚石粒子含量增加到6g/L时,镀层的厚度逐渐减小;金刚石含量4g/L时,镀层摩擦系数随磁场增大而降低;结合力在各金刚石含量下随磁场的增大先略微减小后大幅增加;各金刚石含量下镀层硬度随磁场的增大先增大后减小,磁场强度2.6m T、金刚石粒子含量为4g/L时最大。  相似文献   

11.
Diamond-like carbon (DLC), also known as amorphous hydrogenated carbon (a-C:H), are a class of materials with excellent mechanical, tribological and biological properties. When the DLC films are enhanced with other elements, all of these properties can be changed within a certain range.In this work, reactive magnetron sputtering was used to deposit W-DLC (hydrogenated tungsten carbide) films on Ti6Al4V (implant material). Many films were made using pure tungsten (99.99%) target and different plasmas processes, with different ratio among argon and methane. It was possible to change the films composition (from pure amorphous carbon to carbon enhanced with tungsten) according to ratio of argon and methane plasma. Between all films processed, the carbon films enhanced with tungsten showed good results in the “in vitro” cytotoxicity testing. Raman spectroscopy was used to analyze the chemical bonds kinds and the chemical bonds quantities. The Rutherford Back Scattering (RBS) was used to analyze the films compositions. The chemical inertness was analyzed by scanning voltametry. W-DLC thin films obtained in these processes have low roughness, high chemical resistance, good adhesion and show a high biocompatibility, when compared with common DLC thin films. Hence we have concluded that the tungsten concentrations in the DLC films make an important role to improve the properties of the DLC layers.  相似文献   

12.
Nickel doped diamond-like carbon (DLC:Ni) thin films were fabricated on conductive p-Si (100) substrates with DC magnetron sputtering deposition by varying DC power applied to a Ni target. The bonding structure, surface morphology, scratch resistance and corrosion resistance of the DLC:Ni films were studied using X-ray photoelectron spectroscopy (XPS), micro-Raman spectroscopy, atomic force microscopy (AFM), micro-scratch test, potentiodynamic polarization test and open circuit potential measurement. The results indicated that the corrosion resistance of the DLC:Ni films in a 0.6 M NaCl solution decreased with increased Ni content in the films though the films showed good passivation behavior in the NaCl solution.  相似文献   

13.
Diamond-like carbon (DLC) films have been widely used for many industrial applications due to their outstanding physical properties such as high hardness, wear resistance and biological compatibility. The DLC films coated on polymer substrates have also been extensively used and investigated because recently, quite a few applications for the use of these polymer-DLC composites have been proposed and actively discussed. The applications range from DLC-coated Polyethylene Terephthalate film (DLC-PET), through DLC-coated Polycarbonate (DLC-PC) to other DLC-coated rubbers. In this work, thin DLC films coated on several polymer substrates possessing different chemical structures and Young's moduli were introduced. The DLC-polymer films were stretched to different strains and the extended surface was investigated by optical microscopy and scanning electron microscopy (SEM) to study the fracture mechanics of the DLC-coated polymer films. Horizontally and vertically aligned micro-cracks and micro-buckling were observed, constructing periodic lattice-like fracture patterns on the surface of the extended DLC-polymer films. It was found that the lattice patterns were significantly influenced by Young's moduli of polymer substrates and DLC films, and that the patterns were also dependent on the adhesion between the DLC films and the polymers.  相似文献   

14.
在大气下,采用大气压介质阻挡放电(DBD)等离子体枪在低温下(350℃),以甲烷为单体,氩气为工作气体,在Ti6Al4V钛合金表面制备一层类金刚石薄膜(DLC),以期改善钛合金表面摩擦学性能。利用激光拉曼(Raman)光谱和X射线光电子能谱(XPS)分析了所制备DLC薄膜的结构;利用扫描电子显微镜(SEM)观察DLC薄膜的表面形貌;利用划痕仪测量了DLC薄膜与基体的结合力;利用球-盘摩擦磨损实验仪对DLC薄膜的耐磨性能进行了研究。结果表明:在本实验工艺条件下沉积的类金刚石薄膜厚度约为1.0μm,薄膜均匀且致密,表面粗糙度Ra为13.23nm。类金刚石薄膜与基体结合力的临界载荷达到31.0N。DLC薄膜具有优良的减摩性,Ti6Al4V表面沉积DLC薄膜后摩擦系数为0.15,较Ti6Al4V基体的摩擦系数0.50明显减小,耐磨性能得到提高。  相似文献   

15.
不同掺杂对类金刚石薄膜的影响   总被引:1,自引:1,他引:0  
目的研究单掺Si和共掺Ag、Si对类金刚石薄膜的结构、摩擦学性能和耐腐蚀性能的影响。方法以高纯石墨靶、石墨与金属复合靶、Si靶作为靶材,采用射频增强磁控溅射技术制备不同掺杂种类的薄膜。通过XPS、拉曼光谱仪对薄膜的化学组成和结构进行分析,通过纳米压痕仪、摩擦磨损试验机、电化学工作站等,对薄膜的力学性能、摩擦学性能及耐腐蚀性能进行了系统研究。结果 Si元素单掺DLC会引起薄膜中sp~3C含量增加。Ag、Si共掺DLC后,由于Ag以金属相分布在薄膜中,并促进sp~2相的形成,导致sp~3C含量降低。掺杂元素后的DLC薄膜,硬度下降,但韧性提高,其中Ag、Si共掺的DLC薄膜的弹性恢复系数达到79%。此外,Ag、Si共掺DLC薄膜在多种气氛(Ar、O_2、N_2)中都具有优异的摩擦学性能,磨损寿命均超过30 min,其中在N_2气中的摩擦系数最低(0.1),并在NaCl溶液中的腐蚀电流密度比304不锈钢基体降低了近2个数量级,具有良好的耐腐蚀性。结论 Si与Ag共掺DLC薄膜较Si单掺薄膜具有更好的摩擦环境适应性和耐腐蚀性能。  相似文献   

16.
类金刚石(DLC)薄膜是一种良好的固体润滑剂,能够有效延长机械零件、工具的使用寿命。DLC基纳米多层薄膜的设计是耐磨薄膜领域的一项研究热点,薄膜中不同组分层具备不同的物理化学性能组合,能从多个角度(如高温、硬度、润滑)进行设计来提升薄膜力学性能、摩擦学性能以及耐腐蚀性能等。综述了DLC多层薄膜的设计目的与研究进展,以金属/DLC基纳米多层膜、金属氮化物/DLC基纳米多层膜、金属硫化物/DLC基纳米多层膜以及其他DLC基纳米多层膜为主,对早期研究成果及现在的研究方向进行了概述。介绍了以上几种DLC基纳米多层膜的现有设计思路(形成纳米晶/非晶复合结构、软/硬交替沉积,诱导转移膜形成,实现非公度接触)。随后对摩擦机理进行了分析总结:1)层与层间形成特殊过渡层,提高了结合力;2)软/硬的多层交替设计,可以抵抗应力松弛和裂纹偏转;3)高接触应力和催化作用下诱导DLC中的sp3向sp2转化,形成高度有序的转移膜,从而实现非公度接触。最后对DLC基纳米多层膜的未来发展进行了展望。  相似文献   

17.
Diamond like carbon (DLC) thin films with metallic interfacial layers of aluminum and nickel-chromium (Al and Ni-Cr) were grown using a low cost hybrid technique involving a resistive heating thermal evaporator and radio frequency plasma enhanced chemical vapor deposition techniques. Stress, hardness, elastic modulus, bonding, phase, and electrical conductivity of these films were investigated. Introduction of interfacial Al and Ni-Cr layers in DLC led to drastic improvement of its conductivity along with a significant reduction in residual stress but with some reduction of hardness and the elastic modulus. The structural and surface properties of thin films were studied using X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy techniques.  相似文献   

18.
IN the last twenty years,amorphous carbon film due toits particular diamond-like performance has beenattracting much attention.As the deposition process isgradually perfected,the DLC film,with highmechanical hardness,chemical inertness,opticaltransparency,and its wide band gap,is becoming thefocus of thin film area I1>21.At present,DLC film haswidespread applications for its peculiarities ofdecoration and function,such as optical windows,magnetic storage disks,biomedical coatings,micro-elec…  相似文献   

19.
目的研究具有选择性键合作用的掺杂金属元素(Cu、Al、Ti)对类金刚石(DLC)薄膜的结构和摩擦学性能的影响。方法以高纯石墨及其与金属复合靶作为靶材,采用离子源镀膜技术分别在n-型(100)单晶硅片和抛光304不锈钢片基体上制备金属-DLC复合膜。采用514.6 nm氩离子激发源的Raman光谱仪,对金属-DLC复合薄膜进行拉曼光谱分析。采用努氏硬度计和表面轮廓仪测量计算薄膜的硬度和残余应力。采用原子力显微镜(AFM)观察DLC薄膜的表面形貌和结构。使用球-盘滑动磨损试验机对DLC复合薄膜进行摩擦学性能分析。结果类金刚石薄膜中掺入不同金属元素掺杂后,摩擦系数保持相对稳定,但磨损率存在较大差异。无掺杂DLC膜中的sp~3键含量最高,薄膜硬度高,残余应力大,在摩擦过程中易脱落。Ti-DLC金属复合膜的表面质量最好,结构致密,残余应力释放的同时保持较高的硬度,测得其磨损率最低,为0.13×10~(-15) m~3/nm。结论通过在DLC膜中掺杂不同键合能力的金属元素能够调控DLC薄膜的微观结构,改善薄膜的力学性能(硬度、残余应力),提高薄膜的抗磨损性能。薄膜的摩擦学性能与薄膜的微观结构与金属掺杂元素的存在形态有关。  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号