Piezoelectric Study of 0.65Pb(Mg1/3,Nb2/3)O3-0.35PTO3 Nanopoder Ceramics

The piezoelectric properties of relaxor ferroelectric 0.65Pb(Mg1/3Nb2/3)O3-0.35PbTiO3 ceramic prepared by a sol-gel combustion method have been investigated as function of sintering temperature. The results show that its phase structure is near the morphoteropic phase boundary (MPB), and outstanding electrical properties are obtained with this composition. The highest piezoelectric coefficients were observed for the samples sintered at temperature of 1200oC. In comparison with pure PMN ((1-x)Pb(Mg1/3Nb2/3)O3(x)PbTiO3), the substitution of 35% PT results in the decrease of sintered temperature and improved the relaxation behavior.     

太赫兹瞬态光谱研究La0.7Ca0.3MnO3薄膜的温度相关相变

利用太赫兹瞬态光谱研究了La_0.7Ca_0.3MnO₃薄膜的热力学性质。La_0.7Ca_0.3MnO₃薄膜的金属-绝缘体相变温度在260 K左右,与铁磁-顺磁相变温度几乎相同。结果表明,La_0.7Ca_0.3MnO₃薄膜的电导率与薄膜中磁矩取向密切相关。研究发现在40～200 K的低温范围内,La_0.7Ca_0.3MnO₃薄膜的电导率可以用Drude模型拟合,在210～290 K的高温范围内可以用Drude-Lorentz模型拟合。     

TiO2薄膜CMP 抛光液组分的研究

在本文中,采用化学机械抛光(CMP)对TiO2薄膜进行平坦化处理,以降低TiO2薄膜表面粗糙度和提升抛光去除速率。实验基于优化的TiO2薄膜CMP工艺参数,通过研究抛光液组分：硅溶胶浓度、螯合剂和活性剂浓度以及抛光液pH值对材料去除速率和表面粗糙度的影响,获得最佳的抛光液组分。实验结果表明：在磨料SiO2浓度为8 %、螯合剂为10 ml/L、活性剂为50 ml/L,pH = 9.0时,TiO2薄膜材料去除速率(MRR)为65.6 nm/min,表面粗糙度(Ra)为1.26 ?(测试范围: 10 μm×10 μm),既保证了较高去除速率又降低了表面粗糙度。     

New dielectric material system of Nd(Mg1/2Ti1/2)O3–CaTiO3 at microwave frequency

The microwave dielectric properties of (1 − x)CaTiO₃–xNd(Mg_1/2Ti_1/2)O₃ (0.1  x  1.0) ceramics prepared by the conventional solid state method have been investigated. The system forms a solid solution throughout the entire compositional range. The dielectric constant decreases from 152 to 27 as x varies from 0.1 to 1.0. In the (1 − x)CaTiO₃–xNd(Mg_1/2Ti_1/2)O₃ system, the microwave dielectric properties can be effectively controlled by varying the x value. At 1400 °C, 0.1CaTiO₃–0.9Nd(Mg_1/2Ti_1/2)O₃ has a dielectric constant (ε_r) of 42, a Q × f value of 35 000 GHz and a temperature coefficient of resonant frequency (τ_f) of −10 ppm/°C. As the content of Nd(Mg_1/2Ti_1/2)O₃ increases, the highest Q × f value of 43 000 GHz for x = 0.9 is achieved at the sintering temperature 1500 °C.     

TiO2 薄膜CMP表面粗糙度的研究

Abstract： Surface roughness by peaks and depressions on the surface of titanium dioxide （TiO2） thin film, which was widely used for an antireflection coating of optical systems, caused the extinction coefficient increase and affected the properties of optical system. Chemical mechanical polishing （CMP） is a very important method for surface smoothing. In this polishing experiment, we used self-formulated weakly alkaline slurry. Other process parameters were working pressure, slurry flow rate, head speed, and platen speed. In order to get the best surface roughness （1.16 A, the scanned area was 10 × 10 μm2） and a higher polishing rate （60.8 nm/min）, the optimal parameters were： pressure, 1 psi; slurry flow rate, 250 mL/min; polishing head speed, 80 rpm; platen speed, 87 rpm.     

原子层沉积方法制备低温多层Al2O3/TiO2复合封装薄膜的研究

原子层沉积(ALD)方法可以制备出高质量薄膜,被认为是可应用于柔性有机电致发光器件(OLED)最有发展前景的薄膜封装技术之一。本文采用原子层沉积(ALD)技术,在低温(80℃)下,研究了Al₂O₃及TiO₂薄膜的生长规律,通过钙膜水汽透过率(WVTR)、薄膜接触角测试等手段,研究了不同堆叠结构的多层Al₂O₃/TiO₂复合封装薄膜的水汽阻隔特性,其中5 nm/5 nm×8 dyads(重复堆叠次数)的Al₂O₃/TiO₂叠层结构薄膜的WVTR达到2.1×10^-5 g/m²/day。采用优化后的Al₂O₃/TiO₂叠层结构薄膜对OLED器件进行封装,实验发现封装后的OLED器件在高温高湿条件下展现了较好的寿命特性。     

低温处理的TiO2纳米颗粒薄膜作为缓冲层的有机光伏电池

通过溶胶凝胶法(sol-gel)合成了TiO₂纳米颗 粒(NPs),制备了结构为 ITO/PEDOT:PSS/P3HT:PCBM/TiO₂/Al的有机太阳能电池(OSC)器件。通过优化阴极缓冲 层TiO₂NPs的 热处理温度,考察了温度以及溶剂对TiO₂NPs薄膜的光学性能、形貌结构和电学 性能的影响,并研究了其对OSC性能的影响及作用机理。实验发现,TiO₂NPs处理温度 为80℃时,器件 的效率达到了2.52%。相对于参比器件,器件的光电转换效率(PCE) 、填充因子(FF)分别提高了60%、64.7%。     

Water-soluble poly(3,4-ethylenedioxythiophene)/nano-crystalline TiO2 heterojunction solar cells

Nanocrystalline titanium dioxide (TiO₂) thin films were prepared by the sol-gel method and were then used to fabricate an indium-tin oxide (ITO)/nano-crystalline TiO₂/poly(3,4-ethylenedioxythiophene) (PEDOT)/Au device. The junction thus obtained shows a rectifying behavior. Their current-voltage (I-V) characteristics in dark indicate that a heterojunction at the nano-crystalline TiO₂/PEDOT interface has been created. The measured open-circuit voltage (V_oc) and short-circuit current (I_sc) for the device under illumination with 50 mW/cm² light intensity under AM 1.5 conditions (device dimension was 1 cm²) are V_oc=0.39 V, I_sc=54.9 μA/cm², the filling factor (FF)=0.429 and the energy conversion efficiency (η)=0.03%.     

介稳态TiCl4醇水溶液水解制备TiO2致密层及其在无机-有机杂化异质结钙钛矿太阳电池中的应用

致密层作为钙钛矿太阳电池的重要组成部分, 对其制备方法, 工艺及微结构等性质的研究对提高钙钛矿太阳电池的光伏性能具有重要影响. 本文利用介稳态的TiCl₄醇水溶液作为前驱体溶液, 通过旋涂水解制备TiO₂致密层, 并研究了前驱体溶液不同醇水比对致密层微结构及其相应太阳电池光伏性能的影响. 结果表明, 将2 mol.L_-1的TiCl₄的水溶液按醇水体积比3:1的比例用异丙醇稀释后所制备的TiO₂致密层其厚度为126 nm, 且相应的太阳电池取得最高的光电转换效率10.6 %.     

Photoelectrochemical performance of La3+-doped TiO2

La-doped TiO₂ thin films on titanium substrates were prepared by the sol-gel method with titanium tetrachloride as a precursor and La₂O₃ as a source of lanthanum. The heat-treatment temperature dependence of the photoelectrochemical performance of the La-doped TiO₂ film in 0.2 mol/L Na₂SO₄ was investigated by the Mott-Schottky equation, electrochemical impedance spectroscopy, and the open-circuit potential test. The results from the Mott-Schottky curves show that the obtained films all were n-type semiconductors, and the film at 300 ℃ had the highest conduction band position and the widest space charge layer. The electrochemical impendence spectroscopy (EIS) tests of the 300 ℃ film decreased most during the change from illuminated to dark. The potential of the La-TiO₂ thin film electrode was the lowest after the 300 ℃ heat treatment. The open-circuit potential indicated that the photoelectrical performance of the La-TiO₂ films was enhanced with the addition of the La element and the largest decline (837.8 mV) in the electrode potential was achieved with the 300 ℃ heat treatment.     

Controllable nanostructures on La0.7Sr0.3MnO3 thin film surfaces formed by scanning tunneling microscopy

Nanoscale structuring on La_0.7Sr_0.3MnO₃ (LSMO) thin film surfaces has been performed by scanning tunneling microscopy (STM) under ambient conditions. From line etching experiments we found that the line-depth increases in a stepwise fashion with increasing bias voltage. It also increases with decreasing scan speed and increasing scan repetition. We observed that the line-depth is an integral multiple of the LSMO out-of-plane lattice constant about 0.4 nm. Lateral structure with minimum feature size of 1 nm is possible to obtain. In addition, a four-level inverse-pyramid structure has been created on LSMO thin film surfaces. Our work shows the feasibility of using STM to fabricate controllable and complex nanostructures in LSMO thin film.     

Effect of Ge-GeO2 co-doping on non-ohmic behaviour of TiO2-V2O5-Y2O3 varistor ceramics

An investigation was made into the effect of doping with the elemental crystal Ge or/and GeO₂ on the TiO₂-V₂O₅-Y₂O₃ varistor ceramics. The result shows that as the doping contents of V₂O₅ and Y₂O₃ are 0.5 mol%, respectively, co-doping with 0.3 mol% Ge and 0.9 mol% GeO₂ makes the highest α value (α = 12.8), the lowest breakdown voltage V_1mA (V_1mA = 15.8 V/mm) and the highest grain boundary barrier Φ_B (Φ_B = 1.48 eV), which is remarkably superior to the TiO₂-V₂O₅-Y₂O₃ varistor ceramics undoped with Ge and GeO₂ and mono-doped with Ge or GeO₂. The TiO₂-V₂O₅-Y₂O₃-Ge-GeO₂ ceramic has the prospect of becoming a novel varistor ceramic with excellent electrical properties.     

The slabs for the rutile TiO2(110) surface

Traditionally, we use a slab to mimic a surface and we constrain the slab to have the bulk-terminated 2D lattice constants. Here we propose a different model in which we impose no constraints, allowing all coordinates including the 2D slab itself to relax. We perform DFT calculations on both models. We find that the unconstrained slabs yield better agreement with experimental results and they have lower total energies. The optimized 2D lattice constants of the unconstrained slabs eventually converge to the attached bulk value. The total energy difference reveals that, with odd number trilayers, the unconstrained slab is much closer to the corresponding constrained slab. The surface energies both converge to the individual values with the number of atomic layers.     

电子束辐照下的石墨烯上的原子层沉积Al2O3介质层

为了研究石墨烯与高k介质的结合,使用原子层沉积氧化铝在石墨衬底上。沉积前使用电子束辐照,观测到了氧化铝明显改善的形貌。归因于电子束辐照过程中的石墨层的无定形变化过程。     

Electrical properties of Pb(Zr,Ti)O3 films prepared on ITO glass

Pb(Zr,Ti)O₃ thin films were successfully prepared on a Pt bottom electrode with indium tin oxide coated glass substrates using RF magnetron sputtering. Use of the indium tin oxide coated glass substrate reduced the fatigue characteristics and provided for excellent crystallization of the Pb(Zr,Ti)O₃ thin films. The polarization versus fatigue characteristics showed 10% degradation after 10⁹ cycles. These results indicate that Pt/indium tin oxide double electrodes can be improved both in terms of fatigue and ferroelectric properties through the use of Pb(Zr,Ti)O₃ thin films on glass substrates, resulting in better performance than metal electrodes.     

MgF2/Se薄膜封装层对OLED性能及寿命的影响

有机电致发光器件(OLEDs)在使用过程中,易受到 空气中水汽、氧气及其它污染物的影响从而导致其工作寿命降低。本文将具有良好光透过率 和热稳定性的MgF₂薄膜与在水汽和氧气中具有良好稳定性的Se薄膜通过真空蒸镀制成复 合薄膜作为OLEDs的封装层,以达到提高器件使用寿命的目的。器件各功能层蒸镀完成后, 保持真空度(3×10－4 Pa)不变,在阴极表面蒸镀MgF₂/Se薄 膜封装层。比较 了绿光OLED器件(器件结构为ITO/CuPc/NPB/Alq₃:C-545T/Alq ₃/LiF/Al)封装前后的亮度-电压-电流密度特性、电致发光光谱及寿命。研究 发现,经过MgF₂/Se封装后,器件的电流密度-电压特性、亮度和发光光谱几乎没 有受到影响,二者的光谱峰都在528 nm处,色坐标(CIE)分别为(0.3555,0.6131)和(0.3560,0.6104),只是起亮电压由3V变为4V;器件的寿命由原来的175h变为300h,提高了1.7倍 。因此,MgF₂/Se薄膜是一种有效的OLEDs无机薄膜封装层。     

Beam-Mode Piezoelectric Properties of Ternary Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 Single Crystals for Medical Linear Array Applications

In this work, the dielectric and beam-mode piezoelectric properties of ternary 0.35Pb(In_1/2Nb_1/2)O₃-0.35Pb(Mg_1/3Nb_2/3)O₃-0.30PbTiO₃ (PIMNT35/35/30) piezoelectric single crystals were investigated. The Curie temperature (T _C) and rhombohedral-to-tetragonal phase-transition temperature (T _rt) are 187°C and 127°C, about 30°C higher than those of PMNT crystals. The beam-mode coupling coefficient k ₃₃ ^w was found to be 90.3%. Furthermore, 3.5-MHz linear arrays based on PIMNT35/35/30 crystals and Pb(Zr_1−x Ti _x )O₃ ceramic (PZT-5H) were simulated using PiezoCAD software. The results indicate that the sensitivity and −6 dB bandwidth of a PIMNT35/35/30 transducer would be approximately 4 dB and 20% higher, respectively, compared with a traditional PZT transducer.     

Enhanced photovoltaic performance in TiO2/P3HT hybrid solar cell by interface modification

A TiO2/P3HT hybrid solar cell was fabricated by infiltrating P3HT into the pores of TiO2 nanorod arrays. To further enhance the photovoltaic performance, anthracene-9-carboxylic acid was employed to modify the interface of TiO2/P3 HT before P3HT was coated. Results revealed that the interface treatment significantly enhances the photovoltaic performance of the cell. The efficiency of the hybrid solar cells reaches 0.28% after interface modification, which is three times higher compared with the un-modified one. We find that except for the increased exciton dissociation efficiency recognized by the previous reports, the suppressing of electron back recombination is another important factor leading to the enhanced photovoltaic performance.     

原子层沉积氧化铝薄膜对多晶太阳能电池表面钝化的影响

A stack of Al2O3/SiNx dual layer was applied for the back side surface passivation of p-type multi-crystalline silicon solar cells, with laser-opened line metal contacts, forming a local aluminum back surface field （local Al-BSF） structure. A slight amount of Al2O3, wrapping around to the front side of the wafer during the thermal atomic layer deposition process, was found to have a negative influence on cell performance. The different process flow was found to lead to a different cell performance, because of the Al2O3 wrapping around the front surface. The best cell performance, with an absolute efficiency gain of about 0.6% compared with the normal full Al-BSF structure solar cell, was achieved when the Al2O3 layer was deposited after the front surface of the wafer had been covered by a SiNx layer. We discuss the possible reasons for this phenomenon, and propose three explanations as the Ag paste, being hindered from firing through the front passivation layer, degraded the SiNx passivation effect and the Al2O3 induced an inversion effect on the front surface. Characterization methods like internal quantum efficiency and contact resistance scanning were used to assist our understanding of the underlying mechanisms.