基于UC3843的反激式开关电源反馈电路的设计

介绍了UC3843的工作特点,利用UC3843设计了反激式开关稳压电源,分析了新型反馈电路的工作过程及优点,与传统方法相比,此方法使电源的动态响应更快,调试更简单。最后提出了反馈电路详细的设计方法,仿真结果证明了设计的可行性。     

光伏逆变器辅助电源设计

介绍了光伏逆变器的辅助电源设计方法,设计了一款单端反激式多路输出的辅助电 源、 同时给出了具有二级隔离功能的RS485通信供电电源的一种新颖的实现电路．分析了光伏系统 辅助电源 打嗝 的愿因 设计了辅助电源的防打嗝电路 实验结果表明 该辅助电源输入电压 范围宽、 输出电压纹波低、 防打嗝电路可以有效避免辅助电源反复启停。     

一种基于UC3843的单端反激式开关电源

本文介绍了一种电流控制型PWM控制器UC3843的特点和工作原理,并分析了其构成开关电源的整体电路结构和工作原理,最后提出了一种基于UC3843的单端反激式开关电源的设计方法     

基于峰值电流控制的反激变换辅助电源设计

介绍一种利用UC3844集成芯片实现的多路输出单端反激式开关电源。采用基于峰值电流检测方法控制,并加入低电压保护功能。该电源适用于IGBT开关管等驱动电路供电,可作为高压大功率场合辅助电源使用。文章给出了电路原理及实测波形,此电路目前已成功应用在一台软开关全桥PWM变换器的辅助电源中。     

一种小功率直流传动系统开关电源设计

基于小功率直流传动系统要求驱动电源输出稳定、抗干扰强的特点,设计了一种多路输出型的单端反激式开关电源。主电路采用多路输出单端反激式变换器结构,并采用软启动回路,防止负载电流或电源输入电流的大电流损坏开关电源,同时设计了过压、欠压等保护等辅助电路,完整地构建了开关电源的电路系统。     

光伏逆变辅助电源的设计

为了设计光伏逆变器的辅助开关电源,电路结构采用电流型隔离式单端反激的控制方式,通过实验得出设计的电路适合光伏逆变电源的结论。该实验涉及开关电源的一些基本设计指标、变压器磁芯及绕组的设计、反馈及稳压电路的设计。设计的辅助电源已经用于光伏逆变器上,运行稳定,输出纹波小,变压器无发热现象,达到了设计目标。     

基于UC3843反激式开关电源的设计

单端反激开关电源具有输出纹波小、输出稳定、体积小、重量轻、效率高以及良好的动态响应性能等许多优点,被广泛应用在小功率开关电源的设计中。文中首先对UC3843芯片做了简单的介绍,描述了其在电路中的主要功能;设计了电路原理图,并对电路原理图进行了简单介绍;再根据反激式开关电源电路设计公式详细介绍了各部分参数,最后给出了电路的测试结果。实验表明,该开关电源输出电压平稳,性能稳定。     

基于UC1823J多路输出开关电源模块的分析与设计

文章设计了一种基于UC1823J控制多路输出的电源模块,主电路采用单端反激式变换器。重点介绍了控制电路的设计方法,提出了一种多路输出电压加权取样方法,实验结果表明该方法提高了多路输出电压交叉调整率。     

多路输出反激式开关电源设计研究

三相变频器逆变环节IGBT的稳定可靠性,很大程度上依赖于其驱动模块供电电源性能。全面分析了多路输出反激式开关电源的设计流程和关键要点,重点分析了反激变压器和电压反馈电路的设计计算方法,给出了用于优化反射电压的匝比调整具体计算公式。基于UC3842电源控制芯片完成了4路输出反激式开关电源设计实例,为该类电源设计提供了理论指导和实际样例参考。通过Saber仿真软件验证了设计实例的可行性,并根据所设计电路制作了样机,进行了关键性能测试。实验结果表明所设计电路输出电压稳定,纹波小,达到了设计要求。     

星用基于UC1845多路输出双管反激开关电源设计

为了解决航天器DC/DC变换器高压输入多路输出时,开关管电压应力以及多路输出稳定度问题,设计了一种基于UC1845的多路输出双管反激开关电源。主电路采用双管反激式变换器,使主开关管上的电压应力仅为输入电压Vin,满足航天器高可靠性的应用需求;同时电路采用磁隔离反馈稳压控制,通过一个反馈控制量实现多路输出,输出端配合应用低压差三端稳压器,各路输出负载稳定度优于±1%。控制电路采用电流型控制器UC1845,其具有电压调整率高、负载调整率高和瞬态响应快等优点。实验结果表明,该电源安全可靠、稳定性好、纹波小、效率高,达到了设计要求。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.