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An InP/InGaAs single heterojunction bipolar transistor (SHBT) with high maximum oscillation frequency (fmax) and high cutoff frequency (ft) is reported. Efforts have been made to maximize fmax and ft simultaneously including optimizing the epitaxial structure, base–collector mesa over-etching and base surface preparation. The measured ft and fmax both reached 185 GHz with an emitter size of 1 × 20 μ m2, which is the highest fmax for SHBTs in mainland China. The device is suitable for ultra-high speed digital circuits and low power analog applications. 相似文献
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研制成功了一种无微空气桥的亚微米InP基异质结双极晶体管(HBT).发展了小于100nm的发射极侧向腐蚀工艺,实现了亚微米的InP基HBT.发射极宽度的减小有效提高了频率特性,发射极面积为0.8μm×15μm的HBT的电流增益截止频率达到了238GHz.发展了基极-集电极的侧向过腐蚀工艺,有效减小了结面积,提高了最大振荡频率.Kirk电流密度达到了3.1mA/μm2.据我们所知,电流增益截止频率是目前国内三端器件中最高的,Kirk电流密度是国内报道的HBT中最高的.这对于HBT器件在超高速电路中的应用具有十分重要的意义. 相似文献
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研制成功了一种无微空气桥的亚微米InP基异质结双极晶体管(HBT) . 发展了小于100nm的发射极侧向腐蚀工艺,实现了亚微米的InP基HBT. 发射极宽度的减小有效提高了频率特性,发射极面积为0.8μm×15μm的HBT的电流增益截止频率达到了238GHz. 发展了基极-集电极的侧向过腐蚀工艺,有效减小了结面积,提高了最大振荡频率. Kirk电流密度达到了3.1mA/μm2. 据我们所知,电流增益截止频率是目前国内三端器件中最高的,Kirk电流密度是国内报道的HBT中最高的. 这对于HBT器件在超高速电路中的应用具有十分重要的意义. 相似文献
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InP/InGaAs/InP double heterojunction bipolar transistors (DHBTs) were designed for wide band digital and analog circuits, and fabricated using a conventional mesa structure with benzocyclobutene (BCB) passivation and planarization process techniques. Our devices exhibit a maximum ft of 203 GHz, which is the highest ft for DHBTs in mainland China. The emitter size is 1.0×20 μm2. The DC current gain β is 166, and BVCEO=4.34 V. The devices reported here employ a 40 nm highly doped InGaAs base region and a 203 nm InGaAsP composite structure. They are suitable for high speed and intermediate power applications. 相似文献
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为了适应数字及模拟电路带宽的不断增加,我们在传统的台面结构基础上利用BCB钝化平坦化工艺技术,设计并研制了InP/InGaAs/InP双异质结双极型晶体管。我们研制的晶体管ft达到203GHz,是目前国内InP基DHBT的最高水平,发射极尺寸为1.0μm×20μm,电流增益β为166,击穿电压为4.34V,我们的器件采用了40nm高掺杂InGaAs基区,以及203nm含有InGaAsP复合式结构的集电区。该器件非常适合高速中功耗方面的应用。 相似文献
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正An InGaAs/InP DHBT with an InGaAsP composite collector is designed and fabricated using triple mesa structural and planarization technology.All processes are on 3-inch wafers.The DHBT with an emitter area of 1 x 15μm~2 exhibits a current cutoff frequency f_t = 170 GHz and a maximum oscillation frequency f_(max) = 256 GHz.The breakdown voltage is 8.3 V,which is to our knowledge the highest BV_(CEO) ever reported for InGaAs/InP DHBTs in China with comparable high frequency performances.The high speed InGaAs/InP DHBTs with high breakdown voltage are promising for voltage-controlled oscillator and mixer applications at W band or even higher frequencies. 相似文献
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设计了一种新结构InP/InGaAs/InP双异质结双极晶体管(DHBT),在集电区与基区之间插入n+-InP层,以降低集电结的导带势垒尖峰,克服电流阻挡效应.采用基于热场发射和连续性方程的发射透射模型,计算了n+-InP插入层掺杂浓度和厚度对InP/InGaAs/InP DHBT集电结导带有效势垒高度和I-V特性的影响.结果表明,当n+-InP插入层掺杂浓度为3×1019cm-3、厚度为3nm时,可以获得较好的器件特性.采用气态源分子束外延(GSMBE)技术成功地生长出InP/InGaAs/InP DHBT结构材料.器件研制结果表明,所设计的DHBT材料结构能有效降低集电结的导带势垒尖峰,显著改善器件的输出特性. 相似文献
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带有复合掺杂层集电区的InP/InGaAs/InP DHBT直流特性分析 总被引:1,自引:0,他引:1
设计了一种新结构InP/InGaAs/InP双异质结双极晶体管(DHBT),在集电区与基区之间插入n -InP层,以降低集电结的导带势垒尖峰,克服电流阻挡效应.采用基于热场发射和连续性方程的发射透射模型,计算了n -InP插入层掺杂浓度和厚度对InP/InGaAs/InP DHBT集电结导带有效势垒高度和I-V特性的影响.结果表明,当n -InP插入层掺杂浓度为3×1019cm-3、厚度为3nm时,可以获得较好的器件特性.采用气态源分子束外延(GSMBE)技术成功地生长出InP/InGaAs/InP DHBT结构材料.器件研制结果表明,所设计的DHBT材料结构能有效降低集电结的导带势垒尖峰,显著改善器件的输出特性. 相似文献
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针对毫米波电路对大电流、高截止频率器件的要求,利用平坦化技术,设计并制作成功了结构紧凑的四指合成InGaAs/InP异质结双极晶体管.实验结果表明发射极的宽度可减小到1μm.Kirk电流可达到110wA,电流增益截止频率达到176GI-Iz.这种器件有望在中等功率的毫米波电路中有所应用. 相似文献
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This letter presents a high speed 2:1 regenerative dynamic frequency divider with an active transformer fabricated in 0.7 μm InP DHBT technology with fT of 165 GHz and fmax of 230 GHz. The circuit includes a two-stage active transformer, input buffer, divider core and output buffer. The core part of the frequency divider is composed of a double-balanced active mixer (widely known as the Gilbert cell) and a regenerative feedback loop. The active transformer with two stages can contribute to positive gain and greatly improve phase difference. Instead of the passive transformer, the active one occupies a much smaller chip area. The area of the chip is only 469×414 μm2 and it entirely consumes a total DC power of only 94.6 mW from a single -4.8 V DC supply. The measured results present that the divider achieves an operating frequency bandwidth from 75 to 80 GHz, and performs a -23 dBm maximum output power at 37.5 GHz with a 0 dBm input signal of 75 GHz. 相似文献
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A 3D model simulation of InP/InGaAs/InP DHBT is reported in this paper. A comprehensive set of built-in physical models are described, including Stratton''s hydrodynamic model, high-fields mobility model and thermionic emission model. A mixed-mode environment is required for AC simulation instead of simulating an isolated HBT, in which the HBT is embedded in an external circuit, and the circuit voltage and current equations are solved along with the Poisson equation and transport equations. In AC simulation, simulator Sentaurus provides the computation of the small signal admittance Y matrix. From the results of Y matrix, the small signal equivalent circuit is constructed with the conductance and capacitance obtained from Y matrix, and the AC parameters, such as S-parameters, will be calculated. The small signal AC characteristics of InP/InGaAs DHBTs under proton irradiation are simulated with different fluences of proton irradiation. Simulation results show that the maximum oscillation frequency will be degraded when fluence of proton irradiation is increased. 相似文献
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R. F. Kopf R. A. Hamm R. W. Ryan J. Burm A. Tate Y. -K. Chen G. Georgiou D. V. Lang F. Ren 《Journal of Electronic Materials》1998,27(8):954-960
Device encapsulation and passivation are critical for long-term reliability and stability. Several encapsulation techniques
were evaluated in terms of degradation of electrical characteristics, gap filling under the mesa structures, and adhesion
to the semiconductor and metal surfaces. These included plasma enhanced chemical vapor deposited (PECVD) SiO2, electron cyclotron resonance CVD SiNx, spin-on glass, benzocyclobutene, and polyimide. Damage from plasma exposure caused gain degradation in the devices. Spin-on
coatings cause little to no gain degradation, provided that there is minimal stress in the cured film. SOG and BCB films have
acceptable adhesion properties and were excellent for gap filling. Polyimide films have excellent adhesion properties, however,
they were poor at gap filling and had a great deal of shrinkage during curing. Device passivation was evaluated using double
heterojunction bipolar transistor structures with either an abrupt or graded emitter-base junction. Abrupt junction devices
had the self-aligned base metal directly on the p+ InGaAs base. Graded junction devices had the base metal on top of graded InGaAsP layers, which the metal was diffused through,
to make contact to the base region. Abrupt junction devices stressed at an initial JE of 90 kA/cm2 at a VCE of 2V at 25°C degraded 20% within 70 h of operation, whereas, the graded junction devices show no degradation in dc characteristics
after operation for over 500 h. Typical common emitter current gain was 50. An ft of 80 and fmax of 155 GHz were achieved for 2×4 μm2 emitter size devices. 相似文献
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研究了一种采用新的T型发射极技术的自对准InP/GaInAs单异质结双极晶体管.采用了U型发射极图形结构、选择性湿法腐蚀、LEU以及空气桥等技术,成功制作了U型发射极尺寸为2μm×12μm的器件.该器件的共射直流增益达到170,残余电压约为0.2V,膝点电压仅为0.5V,而击穿电压超过了2V.器件的截止频率达到85GHz,最大振荡频率为72GHz,这些特性使此类器件更适合于低压、低功耗及高频方面的应用. 相似文献
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Static frequency dividers are widely used as a circuit performance benchmark or figure-of-merit indicator to gauge a particular device technology’s ability to implement high speed digital and integrated high performance mixed-signal circuits.We report a 2:1 static frequency divider in InGaAs/InP heterojunction bipolar transistor technology.This is the first InP based digital integrated circuit ever reported on the mainland of China. The divider is implemented in differential current mode logic(CML) with 30 transistors.The circuit operated at a peak clock frequency of 40 GHz and dissipated 650 mW from a single -5 V supply. 相似文献