Characterization of UV photodetectors with MgxZn1−xO thin films

In this study the metal-semiconductor-metal (MSM) structure ultraviolet (UV) photodetectors (PDs) based on Mg_xZn_1−xO thin films were fabricated. The Mg_xZn_1−xO thin films were grown on glass substrates by sol-gel method. The results show that the optical absorption has a blue shift and higher transmittance with increasing Mg dopant. The optical band gap were modified by 3.28-3.52 eV, which corresponded to x = 0 and x = 0.16. For a 10 V applied bias, the dark currents of the Mg_xZn_1−xO MSM-PDs were 637 nA (x = 0) to 0.185 nA (x = 0.16) and showed good Schottky contacts. This UV-visible rejection ratio of the Mg_xZn_1−xO UV PDs at x = 0, 0.16, 0.21 and 0.33 were 18.82, 35.36, 40.91 and 42.92, respectively.     

Growth-Temperature-Controlled Optical Properties of Textured MgxZn1?xO Thin Films

Pulsed laser deposition was used to grow magnesium zinc oxide thin films on amorphous fused silica substrates at several temperatures between room temperature and 750°C. In this study, the effect of growth temperature on the optical properties of textured Mg _x Zn_1−x O thin films was examined. The optical properties of the films were measured using absorption and photoluminescence spectrometry. Absorption spectra revealed that the bandgap values of textured Mg _x Zn_1−x O thin films were enhanced in films grown at higher temperatures. The absorption spectra near the absorption edge were fitted using the Urbach equation in order to investigate the effects of growth temperature on exponential band tail and bandgap. The photoluminescence spectra were measured for magnesium zinc oxide thin films deposited at 250°C, 350°C, 450°C, 550°C, and 650°C. The film grown at 350°C provided the highest excitonic peak intensity. On the other hand, the film grown at 250°C exhibited the lowest excitonic peak intensity. The excitonic peak intensity was considerably reduced in magnesium zinc oxide thin films grown at temperatures greater than 350°C. The ability to perform substrate-temperature-dependent bandgap engineering of Mg _x Zn_1−x O will enable use of this material in next-generation optical and optoelectronic devices.     

Structural and optical properties of Zn<Subscript>1−x</Subscript>Mg<Subscript>x</Subscript>O thin films synthesized with metal organic chemical vapor deposition

We present the structural and optical properties of Zn_1?xMg_xO thin films studied using x-ray diffraction (XRD), extended x-ray absorption fine structure (EXAFS), and photoluminescence (PL) measurements. The Zn_1?xMg_xO films on sapphire [0001] substrates were fabricated with metal organic chemical vapor deposition (MOCVD). The XRD measurements showed that the Zn_1?xMg_xO films (x≤0.05) had a wurtzite structure without any MgO phase and were epitaxially grown along the c-axis of the Al₂O₃ substrate. The lattice constant of the Zn_0.95Mg_0.05O film shrank by 0.023 Å, compared with that of ZnO crystals. From the EXAFS measurements on the Zn_1?xMg_xO films at Zn K-edge, we found a substantial amount of distortion in the bond length of Zn-Zn pairs with a small amount of Mg substitution on the Zn site. The PL measurements showed a gradual increment of the main exciton transitions from 3.36 eV (x=0.0) to 3.57 eV (x=0.05) at 10 K. We also observed a strong deep-level emission near 2.3 eV from the specimen with x=0.05.     

Electrodepositing ZnxMnyOz alloys from zinc oxide to manganese oxide

Electrodeposition has emerged as a practical and simple method to synthesise semiconductor materials under different forms, thin films or nanostructured layers. This work reports on the cathodic electrodeposition of ZnMnO thin layers using both zinc and manganese chlorides as precursors. The composition of thin films can be varied from binary zinc oxide to manganese oxide varying the Mn/(Mn+Zn) ratio between 0 and 1. The composition of Zn_xMn_yO_z films was obtained by energy dispersive spectroscopy. Zn_1−xMn_xO films with Mn/Zn ratio less than 10% exhibit a crystalline wurtzite structure typical of ZnO fully oriented in the (0 0 2) direction. Higher Mn content leads to deformation of the ZnO lattice and the wurtzite structure is no longer maintained. X-ray photoelectron spectroscopy points out that Mn₃O₄ tends to be deposited when a high Mn/Zn ratio is used in the starting solution. Magnetic measurements on films with Mn/(Zn+Mn) ratio near 1 reveal magnetic characteristics similar to Mn₃O₄ compounds. The transmission spectra of Zn_xMn_yO_z show the typical absorption edge of crystalline ZnO while the wurtzite structure is maintained and it shifts to higher wavelengths when Mn content increases.     

Temperature dependent current-voltage characteristics of n-MgxZn1−xO/p-GaN junction diodes

This study investigates the temperature dependence of the current-voltage (I-V) characteristics of n-Mg_xZn_1−xO/p-GaN junction diodes. The n-Mg_xZn_1−xO films were deposited on p-GaN using a radio-frequency (rf) magnetron sputtering system followed by annealing at 500, 600, 700, and 800 °C in nitrogen ambient for 60 s, respectively. The n-Mg_xZn_1−xO/p-GaN diode at a substrate temperature of 25 °C had the lowest leakage current in reverse bias. However, the leakage current of the diodes increased with an increase in annealing temperatures. The temperature sensitivity coefficients of the I-V characterizations were obtained at different substrate temperatures (25, 50, 75 100, and 125 °C) providing extracted values of 26.4, 27.2, 17.9, and 0.0 mV/°C in forward bias and 168.8, 143.4, 84.6, and 6.4 mV/°C in reverse bias, respectively. The n-Mg_xZn_1−xO/p-GaN junction diode fabricated with Mg_xZn_1−xO annealed at 800 °C demonstrated the lowest temperature dependence. Based on these findings, the n-Mg_xZn_1−xO/p-GaN junction diode is feasible for GaN-based heterojunction bipolar transistors (HBTs).     

Structural,optical and electrical properties of MgxZn1−xO ternary alloy films

The structural, optical and electrical properties of Mg_xZn_1−xO (x=0.05–0.3) ternary alloy thin films deposited by the sol–gel method on the glass substrate were investigated. The presence of Mg in deposited samples was confirmed through EDAX. XRD spectra revealed that the deposited Mg doped ZnO films were polycrystalline in nature. The optical band gap of the films was tailored between 3.2 and 3.45 eV by varying Mg mole concentration between 0.05 and 0.3. I–V characteristics showed decrease in current with increase in the Mg mole concentration. These results explore the applicability of MgZnO to form effective and efficient heterostructures with ZnO as an active layer for efficient carrier confinement in light emitting devices.     

Etching characteristics and plasma-induced damage of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma

Sol-gel-derived Ba_0.65Sr_0.35TiO₃ (BST) thin films were etched in CF₄/Ar/O₂ plasma using magnetically enhanced reactive ion etching technology. The maximum etch rate of BST film is 8.47 nm/min when CF₄/Ar/O₂ gas mixing ratio is equal to 9/36/5. X-ray photoelectron spectroscopy analysis indicates the accumulation of fluorine-containing by-products on the etched surface due to their poor volatility, resulting in (Ba,Sr)-rich and (Ti,O)-deficient etched surface. Compared to the unetched counterparts, the etched Ba 3d_5/2, Ba 3d_3/2, Sr 3d_5/2, Sr 3d_3/2, Ti 2p_3/2, Ti 2p_1/2 and O 1s photoelectron peaks shift towards higher binding energy regions by amounts of 1.31, 1.30, 0.60, 0.79, 0.09, 0.46 and 0.50 eV, respectively. X-ray diffraction (XRD) analysis reveals that intensities of the etched BST (1 0 0), (1 1 0), (2 0 0) and (2 1 1) peaks are lowered and broadened. Raman spectra confirm that the Raman peaks of the etched film shift towards lower wave number regions with the values of 7, 6, 4 and 4 cm⁻¹, and the corresponding phonon lifetimes are longer than those of the unetched film because of the plasma-induced damage. When the etched films are postannealed at 650 °C for 20 min under an O₂ ambience, the chemical shifts of Ba 3d, Sr 3d, Ti 2p and O 1s peaks, the variations for atomic concentrations of Ba, Sr, Ti and O, and the Raman redshifts are reduced, while the corresponding XRD peak intensities increase. It is conceivable that the plasma-induced damage of the etched film could be partially recovered during the postannealing process.     

Epitaxial growth and properties of Mg<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Zn<Subscript>1-<Emphasis Type="Italic">x</Emphasis></Subscript>O films produced by pulsed laser deposition

The Mg _x Zn_1-x O thin films with a Mg content corresponding to x = 0–0.45 are grown by pulsed laser deposition on ablation of ceramic targets. The conditions for epitaxial growth of the films on the single-crystal Al₂O₃ (00.1) substrates are established. The record limit of solubility of Mg in hexagonal ZnO, x = 35 is attained. In this case, the lattice mismatch for the parameter a of the ZnO and Mg_0.35Zn_0.65O films does not exceed 1%, whereas the band gaps of the films differ by 0.78 eV. The surface roughness of the films corresponds to 0.8–1.5 nm in the range of x = 0–0.27.     

Evaluating the abrasive wear of Zn1−xMnxO heteroepitaxial layers using a nanoscratch technique

In this study, we used nanoscratch techniques under a ramping load to evaluate the abrasive wear of Zn_1−xMn_xO epilayers (0 ? x ? 0.16) grown through molecular beam epitaxy (MBE) on sapphire substrates. We analyzed the surface roughness and damage using atomic force microscopy (AFM) and nanoindenter techniques. The scratched surfaces of the Zn_1−xMn_xO epilayers were significantly different for the various Mn compositions. AFM imaging of the Zn_1−xMn_xO films revealed that pileup phenomena were important on both sides of each scratch. During the scratching process, we found that cracking dominated in the case of Zn_1−xMn_xO films while ploughing; also we observed lower values of the coefficient of friction and shallower penetration depths for the films upon increasing the Mn content (x) from 0 to 0.16, suggesting that higher Mn contents provided the Zn_1−xMn_xO epilayers with higher shear resistances, enhanced by the presence of MnO bonds.     

Characterization of ternary MgxZn1−xO thin films deposited by electron beam evaporation

Mg_xZn_1−xO (0≤x≤1) thin films were deposited on glass and quartz substrates by electron beam evaporation and effect of the Mg content of the film on its structural, optical and electrical properties were investigated. The structure, surface morphology, optical transmittance, band gap, refractive index and electrical resistivity were found to depend on the Mg content of the film. XRD data revealed that films were polycrystalline in nature. The structure of the films having Mg content in the range of 1–0.74 was cubic, mixed cubic-hexagonal phases for x=0.47 and hexagonal phase for x=0. The composition analysis showed that Mg content in Mg_xZn_1−xO film is high as compared to the corresponding target alloy. It was observed that the optical band gap increases from 3.3 to 6.09 eV, refractive index at 550 nm decreases from 1.99 to 1.75, transmittance increases from about 70% to 90% and electrical resistivity increases from 0.5 to 1.48×10⁶ Ω cm with the increase of Mg concentration in the film from 0 to 1. The results reported in this work are useful for window layer of solar cells and other optoelectronic devices.     

Structural and optical properties of hexagonal MgxZn1−xO thin films

High-quality epitaxial magnesium zinc oxide (Mg_xZn_1-xO) alloy thin films were grown on sapphire (α-Al₂O₃ (0001)) substrates using pulsed laser deposition. The structural and optical properties of these hexagonal films were determined using transmission electron microscopy (TEM), x-ray diffraction (XRD), Rutherford backscattering spectrometry (RBS), absorption, and photoluminescence measurements. XRD and TEM data reveal that magnesium zinc oxide alloy films, grown by domain matching epitaxy, exhibited the following relationships: MgZnO[0001] ∥ α-Al₂O₃ [0001] and MgZnO[01 0] ∥ α-Al₂O₃ [2 0]. RBS data demonstrate that a maximum magnesium content of x=0.34 can be obtained in hexagonal Zn_xMg_1-xO thin films. This value is significantly higher than the thermodynamic limitation of x=0.04. The absorption spectra of magnesium zinc oxide alloy films obtained at room temperature demonstrate significant excitonic behavior. The exciton binding energies have been extracted from the absorption data. Values of the exciton bandgap as a function of magnesium content were determined by fitting the bandgap energies using polynomial fitting. The Zn_xMg_1−xO alloy thin films demonstrate bright room-temperature luminescence and significant excitonic behavior. A shift in the excitonic emission peak as a function of magnesium content was observed.     

Highly (1 0 0)-oriented Pb(Zr0.20Ti0.80)O3/(Pb1−xLax)Ti1−x/4O3 multilayered thin films prepared by RF magnetron sputtering

The Pb(Zr_0.20Ti_0.80)O₃/(Pb_1−xLa_x)Ti_1−x/4O₃ (x = 0, 0.10, 0.15, 0.20) (PZT/PLT_x) multilayered thin films were in situ deposited on the Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by RF magnetron sputtering technique with a PbO_x buffer layer. With this method, all PZT/PLT_x multilayered thin films possess highly (1 0 0) orientation. The PbO_x buffer layer leads to the (1 0 0) orientation of the multilayered thin films. The effect of the La content in PLT_x layers on the dielectric and ferroelectric properties of the PZT multilayered thin films was systematically investigated. The enhanced dielectric and ferroelectric properties are observed in the PZT/PLT_x (x = 0.15) multilayered thin films. The dielectric constant reaches maximum value of 365 at 1 KHz for x = 0.15 with a low loss tangent of 0.0301. Along with enhanced dielectric properties, the multilayered thin films also exhibit large remnant polarization value of 2P_r = 76.5 μC/cm², and low coercive field of 2E_c = 238 KV/cm.     

High-k TixSi1−xO2 thin films prepared by co-sputtering method

We report on high-k Ti_xSi_1−xO₂ thin films prepared by RF magnetron co-sputtering using TiO₂ and SiO₂ targets at room temperature. The Ti_xSi_1−xO₂ thin films exhibited an amorphous structure with nanocrystalline grains of 3-30 nm having no interfacial layers. The XPS analyses indicate that stoichiometric TiO₂ phases in the Ti_xSi_1−xO₂ films increased due to stronger Ti-O bond with increasing TiO₂ RF powers. In addition, the electrical properties of the Ti_xSi_1−xO₂ films became better with increasing TiO₂ RF powers, from which the maximum value of the dielectric constant was estimated to be ∼30 for the samples with TiO₂ RF powers of 200 and 250 W. The transmittance of the Ti_xSi_1−xO₂ films was above 95% with optical bandgap energies of 4.1-4.2 eV. These results demonstrate a potential that the Ti_xSi_1−xO₂ thin films were applied to a high-k gate dielectric in transparent thin film transistors as well as metal-oxide-semiconductor field-effect transistors.     

Properties of NixZn(1−x)Fe2O4 thick films at microwave frequencies

The thick film Ni_xZn_(1−x)Fe₂O₄ on alumina substrate was prepared by screen printing of the ferrite powder synthesized by chemical co-precipitation method using nitrate precursors. These Ni_xZn_(1−x)Fe₂O₄ thick films of varying x were characterized by X-ray diffraction, FTIR spectroscopy and SEM (scanning electron microscopy). The permittivity and permeability were measured by overlay technique. Voltage standing wave ratio method was also used to measure the dielectric constant. The permittivity was found to increase with Ni content varying between 13 and 18. The permeability was ∼3.01. The overlay technique provides an easy method for measurement of permittivity and permeability of ferrite thick film.     

Elaboration and characterization of Co-doped ZnO thin films deposited by spray pyrolysis technique

The structure and the nature of magnetism of ZnO and Zn_1−xCo_xO (CZO) thin films (0?x?0.09) deposited on glass substrate at 450 °C by spray pyrolysis technique is investigated. All the CZO thin films have the ZnO wurtzite structure with a preferential orientation along the c-axis and had no impurity phase. This was also confirmed by transmission electron microscopy analysis. Transmission UV-visible spectroscopy showed that Co²⁺ was well substituted for the Zn²⁺ ions in the ZnO matrix. Magnetization measurements at low temperature show that CZO thin films present a paramagnetic behaviour and no sign of ferromagnetism.     

Atomic layer deposition of Zn1−xMgxO buffer layers for Cu(In,Ga)Se2 solar cells

Fabrication of Zn_1−xMg_xO films by atomic layer deposition (ALD) has been studied for use as buffer layers in Cu(In,Ga)Se₂ (CIGS)‐based solar cell devices. The Zn_1−xMg_xO films were grown using diethyl zinc, bis‐cyclopentadienyl magnesium and water as precursors in the temperature range from 105 to 180°C. Single‐phase ZnO‐like films were obtained for x < 0·2, followed by a two phase region of ZnO‐ and MgO‐like structures for higher Mg concentrations. Increasing optical band gaps of up to above 3·8 eV were obtained for Zn_1−xMg_xO with increasing x. It was found that the composition of the Zn_1−xMg_xO films varied as an effect of deposition temperature as well as by increasing the relative amount of magnesium precursor pulses during film growth. Completely Cd‐free CIGS‐based solar cells devices with ALD‐Zn_1−xMg_xO buffer layers were fabricated and showed efficiencies of up to 14·1%, which was higher than that of the CdS references. Copyright © 2006 John Wiley & Sons, Ltd.     

Field electron emission from amorphous CNx:B films

CN_x:B thin films were prepared on titanium coated ceramic substrate by pulsed laser deposition technique (PLD). The microstructure of the film was examined using scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The analyses indicate that the deposited samples are amorphous CN_x:B thin films. Field electron emission characteristics of amorphous CN_x:B thin films were measured in a vacuum chamber with a base pressure of about 3.2×10⁻⁵ Pa. The turn-on field of the film was 3.5 V/μm. The current density was 60 μA/cm² at an electric field of 9 V/μm. The experimental results indicate that this film could be a promising material applicable to cold cathodes.     

Band-Gap Engineering in ZnO-MgO Films Prepared by Combustion Flame Pyrolysis of Solution Precursors

MgO-doped ZnO films, metastable in nature, are deposited by combustion flame pyrolysis, as this is one of the suitable methods for fabricating such nonequilibrium films. Experiments to alloy ZnO with MgO have been carried out, aiming to expand the band-gap to the ultraviolet region. Structural and optical studies show that Zn_1−x Mg _x O films with various x values (x = 0.2, 0.3, 0.33, and 0.4) could be obtained and the band-gap of ZnO could be tuned from 3.26 eV to 3.76 eV.     

Temperature‐dependent current‐voltage and lightsoaking measurements on Cu(In,Ga)Se2 solar cells with ALD‐Zn1‐xMgxO buffer layers

In this paper, lightsoaking and temperature‐dependent current‐voltage (JVT) measurements on Cu(In,Ga)Se₂ solar cells with atomic layer deposited Zn_1‐xMg_xO buffer layers are presented. A range of Mg concentrations are used, from pure ZnO (x=0) to 26% Mg (x=0·26). Since this kind of solar cells exhibit strong metastable behaviour, lightsoaking is needed prior to the JVT‐measurements to enable fitting of these to the one‐diode model. The most prominent effect of lightsoaking cells with Mg‐rich buffer layers is an increased fill factor, while the effect on cells with pure ZnO buffer is mainly to increase V_oc·. The activation energy is extracted from JVT‐measurement data by applying three different methods and the ideality factors are fitted to two different models of temperature‐dependence. A buffer layer consisting either of ZnO or Zn_1‐xMg_xO with a minor Mg content gives solar cells dominated by interface recombination, which probably can be related to a negative conduction band offset. A relatively high Mg content in the buffer layer (x=0·21) leads to solar cells dominated by recombination in the space charge region. The recombination is interpreted as being tunnelling‐enhanced. The situation in between these Mg concentrations is less clear. Before lightsoaking, the sample with x=0·12 has the highest efficiency of 15·3%, while after lightsoaking the sample with x=0·21 holds the best efficiency, 16·1%, exceeding the value for the CdS reference. The J_sc values of the Zn_1‐xMg_xO cells surpass that of the reference due to the larger bandgap of Zn_1‐xMg_xO compared to CdS. Copyright © 2009 John Wiley & Sons, Ltd.     

Electrical properties of metal-ferroelectric-insulator-semiconductor structure using BaxSr1−xTiO3 for ferroelectric-gate field effect transistor

Perovskite ferroelectric Ba_xSr_1−xTiO₃ (x = 0.5, 0.6, 0.7 and 0.8) thin films have been fabricated as metal-ferroelectric-insulator-semiconductor (MFIS) configurations using a sol-gel technique. The C-V characteristics for different Ba-Sr ratios and different film thicknesses have been measured in order to investigate the ferroelectric memory window effect. The results show that the memory window width increases with the increase both of Ba content and film thickness. This behavior is attributed to the grain size and dipole dynamics effect. It is found also that the memory window increases as the applied voltage increases. In addition, the leakage current density for the films is measured and it is found to be of the order of 10⁻⁸ A/cm² for all tested samples, indicating that the films have good insulating characteristics.