On the size and temperature dependence of the energy gap in cadmium-selenide quantum dots embedded in fluorophosphate glasses

The temperature and size dependences of the energy gap in CdSe quantum dots with diameters of 2.4, 4.0, and 5.2 nm embedded in fluorophosphate glasses are investigated. It is shown that the temperature coefficient of the band gap dE _g /dT in the quantum dots differs from the bulk value and depends strictly on the dot size. It is found that, furthermore, the energy of each transition in these quantum dots is characterized by an individual temperature coefficient dE/dT.     

Excition states in semiconductor quantum dots in the modified effective mass approximation

A new modified effective mass approximation is suggested to describe the excitonic energy spectrum of quantum dots of radii a comparable to the exciton Bohr radius a _ex ⁰ . It is shown that, for quantum dots simulated by infinitely deep potential wells, the effective mass approximation is appropriate for describing excitons in quantum dots of radii a ≈ a _ex ⁰ , if the reduced effective mass of the excitons, μ, is considered as a function of the radius of the quantum dot a, μ = μ(a).     

Electrical properties and luminescence spectra of light-emitting diodes based on InGaN/GaN heterostructures with modulation-doped quantum wells

The distribution of charged centers N(w), quantum efficiency, and electroluminescence spectra of blue and green light-emitting diodes (LED) based on InGaN/AlGaN/GaN p-n heterostructures were investigated. Multiple InGaN/GaN quantum wells (QW) were modulation-doped with Si donors in GaN barriers. Acceptor and donor concentrations near the p-n junction were determined by the heterodyne method of dynamic capacitance to be about N _A ≥ 1 × 10¹⁹ cm^?3 ? N _D ≥ 1 × 10¹⁸ cm^?3. The N(w) functions exhibited maxima and minima with a period of 11–18 (±2–3 nm) nm. The energy diagram of the structures has been constructed. The shifts of spectral peaks with variation of current (J=10^?6–3×10^?2 A) are smaller (13–12 meV for blue and 20–50 meV for green LEDs) than the corresponding values for the diodes with undoped barriers (up to 150 meV). This effect is due to the screening of piezoelectric fields in QWs by electrons. The dependence of quantum efficiency on current correlates with the charge distribution and specific features in the current-voltage characteristics.     

Optical properties of hybrid quantum-well–dots nanostructures grown by MOCVD

The deposition of In _x Ga_1–x As with an indium content of 0.3–0.5 and an average thickness of 3–27 single layers on a GaAs wafer by metalorganic chemical vapor deposition (MOCVD) at low temperatures results in the appearance of thickness and composition modulations in the layers being formed. Such structures can be considered to be intermediate nanostructures between ideal quantum wells and quantum dots. Depending on the average thickness and composition of the layers, the wavelength of the photoluminescence peak for the hybrid InGaAs quantum well–dots nanostructures varies from 950 to 1100 nm. The optimal average In _x Ga_1–x As thicknesses and compositions at which the emission wavelength is the longest with a high quantum efficiency retained are determined.     

Sol–Gel Grown SnO<Subscript>2</Subscript> Nanoparticles: Evaluation of Structure,Morphology, and Raman Spectra

Tin oxide (SnO₂) nanoparticles (TONPs) were prepared using sol–gel method under different growth conditions. The influence of calcination temperature (450°C and 600°C) and molecular weight of polyethylene glycol (PEG 300 and PEG 4000) on the nanocrystallinity, surface morphology, and Raman spectra of as-prepared TONPs were evaluated. Variation of calcination temperature and dopant (sulfosuccinic acid, SA) was found to affect considerably the structure, surface morphology, and Raman activities of the TONPs. The size of TONPs estimated using Scherrer equation was discerned to be in the range of 15–32 nm. The observed intensity enhancement in the Raman vibrational modes at lower calcination temperature was attributed to the enlargement of TONPs size. The absorption of molecules at the TONPs surface led to a quenching in the A ₂ g and Eu Raman peaks. Raman peaks centered around 673 cm^?1, 799 cm^?1, 640 cm^?1 , and 432 cm^?1 corresponding to A1g, B2g, A1g, and Eg modes, respectively have manifested highest peaks intensity. Furthermore, the enhancement of the Eg mode due to the addition of SA dopant was ascribed to the Jahn–Teller distortion mechanism.     

Interaction of charge carriers with the localized magnetic moments of manganese atoms in <Emphasis Type="Italic">p</Emphasis>-GaInAsSb/<Emphasis Type="Italic">p</Emphasis>-InAs:Mn heterostructures

Transport properties of p-Ga_1?xIn_xAs_ySb_1?y/p-InAs:Mn heterostructures with undoped layers of solid solutions similar in composition to GaSb (x?0.22) grown by liquid-phase epitaxy on substrates with a Mn concentration of (5–7)×10¹⁸ cm^?3 are studied. It is ascertained that there is an electron channel at the interface (from the InAs side). The anomalous Hall effect and negative magnetoresistance are observed at relatively high temperatures (77–200) K. These phenomena can be attributed to the s-d-exchange interaction between Mn ions of the substrate and s electrons of the two-dimensional channel. The effective magnetic moment of Mn ions was evaluated as μ=200µ_B at T=77 K.     

Temperature dependence of the optical energy gap for the CdS<Subscript>x</Subscript>Se<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript> quantum dots

A temperature dependence of the optical energy gap E _g (T) for the CdS_xSe_1?x quantum dots synthesized in a borosilicate glass matrix was investigated in the range of 4.2–500 K. It was demonstrated that this dependence reproduced the dependence E _g (T) for bulk crystals and is described by the Varshni formula for \(\bar r > a_B \) over the entire temperature range. Here, \(\bar r\) is the average dot radius, and a_B is the Bohr radius for the exciton in a bulk crystal. With the transition to quantum dots with \(\bar r > a_B \), a decrease in the thermal coefficient of the band gap and a deviation from the Varshni dependence were observed in the temperature range of 4.2–100 K. The specific features observed are explainable by a decrease in the resulting macroscopic potential of the electron-phonon interaction and by modification of the vibration spectrum for dots as their volume decreases.     

Electron mobility in the inversion layers of fully depleted SOI films

The dependences of the electron mobility μ_eff in the inversion layers of fully depleted double–gate silicon-on-insulator (SOI) metal–oxide–semiconductor (MOS) transistors on the density N _e of induced charge carriers and temperature T are investigated at different states of the SOI film (inversion–accumulation) from the side of one of the gates. It is shown that at a high density of induced charge carriers of N _e > 6 × 10¹² cm^–2 the μeff(T) dependences allow the components of mobility μ_eff that are related to scattering at surface phonons and from the film/insulator surface roughness to be distinguished. The μ_eff(N _e ) dependences can be approximated by the power functions μ_eff(N _e) ∝ N _e ^?n . The exponents n in the dependences and the dominant mechanisms of scattering of electrons induced near the interface between the SOI film and buried oxide are determined for different N _e ranges and film states from the surface side.     

Effect of multicomponent InAsSbP matrix surface on formation of InSb quantum dots at MOVPE growth

Indium-antimonide quantum dots (7–9 × 10⁹ cm²) are produced on an InAs(001) substrate by metal-organic vapor-phase epitaxy at a temperature of T = 440°C. Epitaxial deposition occurred simultaneously onto an InAs binary matrix and an InAsSbP quaternary alloy matrix layer lattice-matched to the InAs substrate in terms of the lattice parameter. Transformation of the quantum-dot shape and size is studied in relation to the chemical composition of the working matrix surface, onto which the quantum dots are deposited. The use of a multicomponent layer makes it possible to control the lattice parameter of the matrix and the strains produced in the system during the formation of self-assembled quantum dots.     

The effect of neutron irradiation on the properties of <Emphasis Type="Italic">n</Emphasis>-InSb whisker microcrystals

The results of studying the effect of irradiation with fast neutrons in an IBR-2 reactor on the characteristics of magnetic-field sensors based on n⁺-InSb whisker microcrystals are reported (the measurements were carried out in the course of the irradiation). The optimum concentration of free electrons n for providing the highest possible radiation resistance of the InSb sensors is estimated (n ≈ (6–7) × 10¹⁷ cm^?3). The contributions of two competing processes to variation in the electrical properties of InSb under neutron irradiation (transmutation-related doping of InSb with a Sn shallow-level donor impurity and compensation of the initial n⁺-InSb conductivity as a result of generation of deep-level acceptor-type radiation defects) are determined separately.     

Conductivity of Ga<Subscript>2</Subscript>O<Subscript>3</Subscript>–GaAs Heterojunctions

The effect of annealing in argon at temperatures of T_an = 700–900°C on the I–V characteristics of metal–Ga₂O₃–GaAs structures is investigated. Samples are prepared by the thermal deposition of Ga₂O₃ powder onto GaAs wafers with a donor concentration of N _d = 2 × 10¹⁶ cm^–3. To measure theI–V characteristics, V/Ni metal electrodes are deposited: the upper electrode (gate) is formed on the Ga₂O₃ film through masks with an area of S _k = 1.04 × 10^–2 cm² and the lower electrode in the form of a continuous metallic film is deposited onto GaAs. After annealing in argon at T_an ≥ 700°C, the Ga₂O₃-n-GaAs structures acquire the properties of isotype n-heterojunctions. It is demonstrated that the conductivity of the structures at positive gate potentials is determined by the thermionic emission from GaAs to Ga₂O₃. Under negative biases, current growth with an increase in the voltage and temperature is caused by field-assisted thermal emission in gallium arsenide. In the range of high electric fields, electron phonon-assisted tunneling through the top of the potential barrier is dominant. High-temperature annealing does not change the electron density in the oxide film, but affects the energy density of surface states at the GaAs–Ga₂O₃ interface.     

Exchange enhancement of the <Emphasis Type="Italic">g</Emphasis> factor in InAs/AlSb heterostructures

The evolution of the Shubnikov-de Haas oscillations in InAs/AlSb heterostructures with twodimensional electron gas in InAs quantum wells 12–18 nm wide with considerable variation in the electron concentration (3–8) × 10¹¹ cm^?2 due to the effect of negative persistent photoconductivity is studied. The values of the effective Landé factor for electrons g* = ?(15–35) are determined. It is shown that the value of the g* factor increases as the quantum well width increases.     

Special features of annealing of radiation defects in irradiated <Emphasis Type="Italic">p</Emphasis>-Si crystals

p-Si single crystals grown by the Czochralski method were studied; the hole concentration in these crystals was p = 6 × 10¹³ cm^?3. The samples were irradiated with 8-MeV electrons at 300 K and were then annealed isochronously in the temperature range T _ann = 100–500°C. The studies were carried out using the Hall method in the temperature range of 77–300 K. It is shown that annealing of divacancies occurs via their transformation into the B _s V ₂ complexes. This complex introduces the energy level located at E _v + 0.22 eV into the band gap and is annealed out in the temperature range of 360–440°C. It is assumed that defects with the level E _v + 0.2 eV that anneal out in the temperature range T _ann = 340–450°C are multicomponent complexes and contain the atoms of the doping and background impurities.     

Electron emission from multilayer ensembles of vertically coupled InAs quantum dots in an <Emphasis Type="Italic">n</Emphasis>-GaAs matrix

Electron emission from multilayer arrays of vertically coupled InAs quantum dots into the n-GaAs matrix in Schottky-barrier structures (electron concentration n ≈ 2 × 10¹⁶ cm^?3) is studied by admittance spectroscopy. It is established that, in the temperature region below ～70 K, electron emission in a rate range of 3 × 10⁴–3 × 10⁶ s^?1 proceeds via thermally activated tunneling through intermediate virtual states. As the number of layers in the quantum dot array increases from three to ten, a decrease in the electron emission rate is observed.     

Effect of electron-electron and electron-hole collisions on intraband population inversion of electrons in stepped quantum wells

The effect of intersubband electron-electron (e-e) and electron-hole (e-h) scattering on intraband population inversion of electrons in a stepped InGaAs/AlGaAs quantum well is investigated. The characteristic times of the most probable e-e and e-h processes, which affect the electron densities on the excited levels, are calculated for the temperature range 80–300 K. Dependences of these times on the electron and hole density on the ground levels are studied. Temperature dependences of the intraband inversion of population for two nonequilibrium densities are calculated by solving a system of rate equations. It is shown that the intersubband e-e and e-h scattering only slightly affects the population inversion for electron densities below 1×10¹² cm^?2.     

Diffusion of interstitial magnesium in dislocation-free silicon

The diffusion of magnesium impurity in the temperature range T = 600–800°C in dislocation-free single-crystal silicon wafers of p-type conductivity is studied. The surface layer of the wafer doped with magnesium by the ion implantation technique serves as the diffusion source. Implantation is carried out at an ion energy of 150 keV at doses of 5 × 10¹⁴ and 2 × 10¹⁵ cm^–2. The diffusion coefficient of interstitial magnesium donor centers (D _i ) is determined by measuring the depth of the p–n junction, which is formed in the sample due to annealing during the time t at a given T. As a result of the study, the dependence D _i (T) is found for the first time. The data show that the diffusion process occurs mainly by the interstitial mechanism.     

Effect of Dislocation-related Deep Levels in Heteroepitaxial InGaAs/GaAs and GaAsSb/GaAs <Emphasis Type="Italic">p</Emphasis>–<Emphasis Type="Italic">i</Emphasis>–<Emphasis Type="Italic">n</Emphasis> Structures on the Relaxation time of Nonequilibrium Carriers

The results of an experimental study of the capacitance–voltage (C–V) characteristics and deep-level transient spectroscopy (DLTS) spectra of p⁺–p⁰–i–n⁰ homostructures based on undoped dislocationfree GaAs layers and InGaAs/GaAs and GaAsSb/GaAs heterostructures with homogeneous networks of misfit dislocations, all grown by liquid-phase epitaxy (LPE), are presented. Deep-level acceptor defects identified as HL2 and HL5 are found in the epitaxial p⁰ and n⁰ layers of the GaAs-based structure. The electron and hole dislocation-related deep levels, designated as, respectively, ED1 and HD3, are detected in InGaAs/GaAs and GaAsSb/GaAs heterostructures. The following hole trap parameters: thermal activation energies (E _t ), capture cross sections (σ _p ), and concentrations (N _t ) are calculated from the Arrhenius dependences to be E _t = 845 meV, σ _p = 1.33 × 10^–12 cm², N _t = 3.80 × 10¹⁴ cm^–3 for InGaAs/GaAs and E _t = 848 meV, σ _p = 2.73 × 10^–12 cm², N _t = 2.40 × 10¹⁴ cm^–3 for GaAsSb/GaAs heterostructures. The concentration relaxation times of nonequilibrium carriers are estimated for the case in which dislocation-related deep acceptor traps are involved in this process. These are 2 × 10^–10 s and 1.5 × 10^–10 s for, respectively, the InGaAs/GaAs and GaAsSb/GaAs heterostructures and 1.6 × 10^–6 s for the GaAs homostructures.     

Room temperature de Haas–van Alphen effect in silicon nanosandwiches

The negative-U impurity stripes confining the edge channels of semiconductor quantum wells are shown to allow the effective cooling inside in the process of the spin-dependent transport. The aforesaid also promotes the creation of composite bosons and fermions by the capture of single magnetic flux quanta at the edge channels under the conditions of low sheet density of carriers, thus opening new opportunities for the registration of quantum kinetic phenomena in weak magnetic fields at high temperatures up to the room temperature. As a certain version noted above, we present the first findings of the high temperature de Haas–van Alphen (300 K) and quantum Hall (77 K) effects in the silicon sandwich structure that represents the ultranarrow, 2 nm, p-type quantum well (Si-QW) confined by the delta barriers heavily doped with boron on the n-type Si (100) surface. These data appear to result from the low density of single holes that are of small effective mass in the edge channels of p-type Si-QW because of the impurity confinement by the stripes consisting of the negative-U dipole boron centers which seems to give rise to the efficiency reduction of the electron–electron interaction.     

Valence-band offsets in strained SiGeSn/Si layers with different tin contents

Admittance spectroscopy is used to study hole states in Si_0.7–y Ge_0.3Sn _y /Si quantum wells in the tin content range y = 0.04–0.1. It is found that the hole binding energy increases with tin content. The hole size-quantization energies in structures containing a pseudomorphic Si_0.7–y Ge_0.3Sn _y layer in the Si matrix are determined using the 6-band kp method. The valence-band offset at the Si_0.7–y Ge_0.3Sn _y heterointerface is determined by combining the numerical calculation results and experimental data. It is found that the dependence of the experimental values of the valence-band offsets between pseudomorphic Si_0.7–y Ge_0.3Sn _y layers and Si on the tin content is described by the expression ΔE _V ^exp = (0.21 ± 0.01) + (3.35 ± 7.8 × 10^–4)y eV.     

The effect of damaging radiation (<Emphasis Type="Italic">p,e, γ</Emphasis>) on photovoltaic and tunneling GaAs and GaSb <Emphasis Type="Italic">p-n</Emphasis> junctions

The properties of multiple-junction solar cells depend on the properties of the constituent photovoltaic and tunneling p-n junctions. In this study, the properties of the space-charge region for photovoltaic and tunneling p-n junctions were examined using the dark current-voltage characteristics for two semiconductors: GaSb (a narrow-gap semiconductor) and GaAs (a wide-gap semiconductor). The effects of irradiation with protons (the energy of 6.78 MeV and the maximum fluence of 3 × 10¹² cm^?2), electrons (the energy of 1 MeV and the maximum fluence of 3 × 10¹⁶ cm^?2), and γ-ray photons (the energy of 1.17–1.33 MeV and the maximum dose of 17 Mrad) on the lifetime of charge carriers in the space-charge region of photovoltaic p-n junctions and on the peak current of connecting tunneling p-n junctions were studied. The coefficients of the damage for the inverse lifetime are determined for photovoltaic p-n junctions. The coefficients of equivalence between the used types of radiation are determined; these coefficients are found to be almost independent, on the order of magnitude, of the type and material of the p-n-junction (and nearly equal for photovoltaic GaAs p-n junctions and tunneling GaAs and GaSb p-n junctions).