GaInAsSb/GaSb heterostructures grown in the spinodal decay region by liquid-phase epitaxy from Sb-enriched solution-melts

Nearly isoperiodic solitary Ga_1−x In_xAs_ySb_1−y /GaSb heterostructures, in which the composition of the solid solution should be found inside the region of spinodal decay (x⩽0.4), were grown by liquid-phase epitaxy from solution-melts enriched with antimony. On the basis of the results of a study of structural and luminescence properties of Ga_1−x In_xAs_ySb_1−y /GaSb heterostructures we have determined the main conditions ensuring reproducible growth of epitaxial layers, homogeneous in the composition of their solid solutions in the region where the existence of processes of spinodal and binodal decay have been theoretically predicted. It is shown that the magnitude and sign of the deformation which the layer undergoes during growth and also the thickness of the layer are the main factors influencing the properties of the growing GaInAsSb solid solutions in the spinodal-decay zone. Fiz. Tekh. Poluprovodn. 33, 1134–1136 (September 1999)     

Erbium-doped silicon epilayers grown by liquid-phase epitaxy

A careful analysis of the features of the spectroscopic properties of Er-doped and undoped epitaxial silicon films grown by liquid-phase epitaxy at 950 °C in silicon-saturated indium melts shows that threading dislocations work as effective gettering sites for erbium and oxygen. The last impurity is incorporated in the epitaxial film by back diffusion from the Czochralski substrate during the growth. The photoluminescence emitted by these films appears to be related to the dislocation and is enforced by the presence of erbium-oxygen complexes. Fiz. Tekh. Poluprovodn. 33, 642–643 (June 1999) Published in English in the original Russian journal. Reproduced here with stylistic changes by the Translation Editor.     

KTN optical waveguides grown by liquid-phase epitaxy

Single-crystal optical waveguiding KTa1-xNbxO3layers have been successfully grown on to a (100)-KTaO3 substrate from a K2O-V2O5 flux by liquid-phase epitaxy.     

Formation of InSb quantum dots in a GaSb matrix

InSb nanoislands in a GaSb matrix have been fabricated and their structural and luminescence properties have been studied. The deposition of ∼1.7 monolayers of InSb in a GaSb(100) matrix has been found by transmission electron microscopy to result in a 2D-3D growth mode transition and formation of small InSb quantum dots (QDs) with lateral sizes of ∼10 nm. Bright luminescence due to these QDs is observed. Stacking of the QDs results in a formation of vertical-coupled QD planes and leads to a long wavelength shift of photoluminescence line associated with the QDs. Increase in the InSb layer thickness above ∼2 monolayers results in formation of 3D dislocated InSb islands with a lateral size above 60 nm and the dramatic drop of photoluminescence intensity.     

Photoluminescence of InSb quantum dots in GaAs and GaSb matrices

The photoluminescent properties of quantum dots formed in the deposition of an InSb thin film (1–3 monolayers) on GaAs(100) and GaSb(100) surface are investigated. The results indicate the importance of As-Sb substitution reactions in the formation of quantum dots on a GaAs surface. Fiz. Tekh. Poluprovodn. 31, 68–71 (January 1997)     

InSb,GaSb, and GaInSb grown using trisdimethylaminoantimony

GalnSb alloys as well as the constituent binaries InSb and GaSb have been grown by organometallic vapor phase epitaxy using the new antimony precursor trisdimethylaminoantimony (TDMASb) combined with conventional group III precursors trimethylindium (TMIn) and trimethylgallium (TMGa). InSb layers were grown at temperatures between 275 and 425°C. The low values of V/III ratio required to obtain good morphologies at the lowest temperatures indicate that the pyrolysis temperature is low for TDMASb. In fact, at the lowest temperatures, the InSb growth efficiency is higher than for other antimony precursors, indicating the TDMASb pyrolysis products assist with TMIn pyrolysis. A similar, but less pronounced trend is observed for GaSb growth at temperatures of less than 500°C. No excess carbon contamination is observed for either the InSb or GaSb layers. Ga_1-xIn_xSb layers with excellent morphologies with values of x between 0 and 0.5 were grown on GaSb substrates without the use of graded layers. The growth temperature was 525°C and the values of V/III ratio, optimized for each value of x, ranged between 1.25 and 1.38. Strong photoluminescence (PL) was observed for values of x of less than 0.3, with values of halfwidth ranging from 13 to 16 meV, somewhat smaller than previous reports for layers grown using conventional precursors without the use of graded layers at the interface. The PL intensity was observed to decrease significantly for higher values of x. The PL peak energies were found to track the band gap energy; thus, the luminescence is due to band edge processes. The layers were all p-type with carrier concentrations of approximately 10¹⁷ cm³. Transmission electron diffraction studies indicate that the Ga_0.5In_0.5 Sb layers are ordered. Two variants of the Cu-Pt structure are observed with nearly the same diffracted intensities. This is the first report of ordering in GalnSb alloys.     

Indium phosphide and quaternary doping superlattices grown by liquid-phase epitaxy

Stacks containing from 20 to 100 alternating n and p-layers, each less than 100 nm thick, have been produced by liquid-phase epitaxy in both InP and in the quaternary alloy Int?x GaxAsyP1?y. Increasing the excitation intensity shifts the photoluminescence (PL) towards shorter wavelengths by the expected magnitude. Hetero-nipi quaternary structures displaying two PL peaks have also been grown. The relative intensities of the two peaks depend strongly on the excitation intensity.     

Investigation of HgCdTe p-n device structures grown by liquid-phase epitaxy

The microstructure of p-n device structures grown by liquid-phase epitaxy (LPE) on CdZnTe substrates has been evaluated using transmission electron microscopy (TEM). The devices consisted of thick (∼21-μm) n-type layers and thin (∼1.6-μm) p-type layers, with final CdTe (∼0.5 μm) passivation layers. Initial observations revealed small defects, both within the n-type layer (doped with 8×10¹⁴/cm³ of In) and also within the p-type layer but at a much reduced level. These defects were not visible, however, in cross-sectional samples prepared by ion milling with the sample held at liquid nitrogen temperature. Only isolated growth defects were observed in samples having low indium doping levels (2×10¹⁴/cm³). The CdTe passivation layers were generally columnar and polycrystalline, and interfaces with the p-type HgCdTe layers were uneven. No obvious structural changes were apparent in the region of the CdTe/HgCdTe interfaces as a result of annealing at 250°C.     

InSb quantum dot LEDs grown by molecular beam epitaxy for mid-infrared applications

We report the molecular beam epitaxial growth of InSb quantum dots (QD) inserted as sub-monolayers in an InAs matrix which exhibit intense mid-infrared photoluminescence up to room temperature. The InSb QD sheets were formed by briefly exposing the surface to an antimony flux (Sb₂) exploiting an As-Sb anion exchange reaction. Light emitting diodes were fabricated using 10 InSb QD sheets and were found to exhibit bright electroluminescence with a single peak at 3.8 μm at room temperature.     

New system of self-assembled GaSb/GaP quantum dots

The atomic structure and energy spectrum of self-assembled GaSb/GaP quantum dots are discussed. It is shown that the quantum dots consist mainly of fully relaxed GaSb and have type-I band alignment with the ground electron state at the indirect valley of the GaSb conduction band.     

Ferromagnetic-resonance linewidth of thick yttrium?iron-garnet films grown by liquid-phase epitaxy

Films of yttrium?iron garnet have been grown on gadolinium-gallium-garnet substrates by liquid-phase epitaxy with thickness up to 100 ?m. Measurements by the bandstop-filter technique in the frequency range 2?8 GHz have shown resonance line-widths as low as 20 A/m(0.25 Oe). These results are compared with measurements of linewidth by the cavity-resonance technique at 9.5 GHz.     

Properties of manganese-doped gallium arsenide layers grown by liquid-phase epitaxy from a bismuth melt

The electrical and photoluminescence properties of p-GaAs: Mn(100) layers grown by liquid-phase epitaxy from a bismuth solvent at various temperatures are investigated. It is shown that such layers have a low concentration of background impurities and a low degree of electrical compensation up to a hole concentration of p=1×10¹⁸ cm⁻³ at 295 K. As the concentration of manganese in the liquid phase increases, the concentration of donors in the GaAs: Mn layers increases superlinearly, while the concentration of ionized acceptors increases sublinearly. This leads to an increase in the compensation factor. The donor and acceptor concentrations, as well as the degree of compensation, increase more slowly with increasing temperature. Reasons for the donor compensation are discussed from a crystal-chemical point of view, and it is shown that the preassociation of manganese and arsenic atoms in the liquid phase could be responsible for generating these compensated donors. It is postulated that the compensating donors are nonradiative recombination centers, whose concentration increases with increasing doping level more rapidly than does the concentration of Mn_Ga acceptors. Fiz. Tekh. Poluprovodn. 32, 791–798 (July 1998)     

Morphology and defect structures of GaSb islands on GaAs grown by metalorganic vapor phase epitaxy

The initial nucleation of GaSb on (001) GaAs substrates by metalorganic vapor phase epitaxy has been investigated using transmission electron microscopy (TEM) and high resolution electron microscopy (HREM). TEM results showed that the GaSb islands experience a morphological transition as the growth temperature increases. For growth at 520°C, the islands are longer along the [110] direction; at 540°C, they are nearly square, and at 560°C, they are longer along the direction. Possible mechanisms are proposed to describe such a transition. TEM and HREM examination showed that lattice misfit relaxation mechanisms depend on the growth temperature. For the sample grown at 520°C, the lattice mismatch strain was accommodated mainly by 90° dislocations; for the sample grown at 540°C, the misfit strain was relieved mostly by 90° dislocations with some of 60° dislocations, and for the sample grown at 560°C, the strain was accommodated mainly by 60° dislocations which caused a local tilt of the GaSb islands with respect to the GaAs substrate. The density of threading dislocations was also found to be dependent on the growth temperature. Mechanisms are proposed to explain these phenomena.     

Specific features of nanosize object formation in an InSb/InAs system by metal-organic vapor-phase epitaxy

InSb quantum dashes (up to 4 × 10⁹ cm^?2) and quantum dots (QDs) (7 × 10⁹ cm^?2) were produced on InAs (100) substrates by the standard method of metal-organic vapor-phase epitaxy in the temperature range 420–440°C. A transformation of the shape and size of the quantum dashes is observed depending on the technological conditions of epitaxial deposition (quality of the matrix surface, growth temperature, flow rate, ratio between Group-V and -III elements in the gas phase, etc.). Control over the diffusion rate of reagents on the surface of the matrix based on an InAs epitaxial layer leads to a change in the transverse dimensions of the quantum dashes being deposited within the range 150–500 nm in length and 100–150 nm in width, respectively, with their height remaining at 50 nm. InSb QDs are grown on the surface of the InAs substrate at T = 440°C. A bimodal size distribution of the nano-objects is observed: there are small (average height 15 nm; average diameter 60 nm) and large (average height 25 nm; average diameter 110 nm) QDs.     

Structural and optical properties of InAs quantum dots grown by molecular beam epitaxy

In this work, we have studied the dependence of the size and luminescence of self-assembled InAs quantum dots (SAQDs) on the growth conditions. The SAQDs were grown on GaAs (1 0 0) substrates by molecular beam epitaxy (MBE). Their structural and optical properties were studied by atomic force microscopy (AFM), and photoluminescence spectroscopy (PL). The growth of the InAs SAQDs was in situ monitored by reflection high-energy electron diffraction (RHEED). The shape and size of the InAs SAQDs were significantly affected by the growth temperature and the arsenic over-pressure. We observe a decrease of the SAQDS density and an increase in their height by increasing the growth temperature, and/or decreasing the arsenic over-pressure. This is accompanied by a remarkable red-shift of the PL emission energy from 1.3 to .     

Properties of Mn-doped p-type InxGa1-xAsyP1-y grown by liquid-phase epitaxy

Epitaxial layers of p-type In_xGa_1-xAs_yP_1-y doped with Mn were grown by liquid-phase epitaxy on (111)-B oriented InP substrates at a growth temperature of 635°C. The doping characteristics and electrical and luminescent properties were studied and compared with those in Zn-doped epilayers. The distribution coefficient of Mn was about 0.1–0.3. The p-type epilayers with hole concentration of up to 3 × 10¹⁸ cm^?3 could be easily obtained by Mn doping. The activation energy of the Mn acceptor was about 40 meV. Mn doping yielded a broad photoluminescent emission spectrum which probably arises from d-shell interaction of the Mn as well as strong phonon coupling. From electron beam-induced current measurements in p-n heterojunctions utilizing Mn, a value of L_n = 2 μm was obtained for the minority carrier diffusion length of electrons in the p-type region.     

Monolithic LED arrays by selective liquid-phase epitaxy in GaP

Progress in the fabrication of monolithic matrix-addressed arrays of light-emitting diodes (LED's) in GaP using selective liquid-phase epitaxy is reviewed. The structures of two red arrays and one green array are discussed in detail. Photographs of the arrays are shown to demonstrate their capability as alphanumeric displays which may be easily interfaced with silicon integrated circuits. The use of selective liquid-phase epitaxy (LPE) to make flip-chip bonded displays is also discussed.     

Influence of segregation on the composition of GaAs1−x Sbx solid solutions grown by liquid-phase epitaxy

Physical and physicochemical processes potentially responsible for the gradient in the composition of the liquid phase in epitaxial growth of GaAs_1?x Sb_x films were analyzed. It is shown that gravity-induced liquation is the dominant mechanism in the case under consideration.     

Silicon carbide blue-emitting diodes produced by liquid-phase epitaxy

Silicon carbide light-emitting diodes with emission in the blue range of the spectrum have been produced by two versions of the LPE process. Emission spectra and efficiency data are presented for diodes with different impurity levels. The highest external quantum efficiency observed so far at room temperature is 4 × 10^?5. The highest luminosity is 0.5 mcd at 100 mA, corresponding to a current density of 20 A/cm² and a beam of about one steradian. A brightness of 15 ftl/A/cm² is obtained.     

Optical properties of CdSe quantum dots grown on ZnSe and ZnBeSe by molecular beam epitaxy

We report detailed studies of the optical properties of CdSe quantum dots (QDs) grown on ZnSe and ZnBeSe by molecular-beam epitaxy (MBE). We performed steady-state and time-resolved photoluminescence (PL) measurements and observe that nonradiative processes dominate at room temperature (RT) in the CdSe/ZnBeSe QDs structures, though these nonradiative processes do not dominate in the CdSe/ZnSe QDs structures up to RT. We performed secondary ion-mass spectrometry (SIMS) measurement and propose that the oxygen incorporation in the ZnBeSe layers (possibly caused by the reactivity of Be) may contribute to the dominant nonradiative processes at high temperatures in the QDs grown on ZnBeSe.