偏振光波的矩孔矢量夫琅禾费衍射

利用瑞利—索末菲矢量衍射公式导出偏振光波矩孔矢量夫琅禾费衍射的解析计算式,通过模拟实验研究了椭圆偏振光的一般孔和亚波长孔的矢量夫琅禾费衍射情形,可应用于偏振光波偏振度检测和偏振成像等方面,表明所得计算式的有效性和可靠性,可在微光学、近场光学、衍射成像、光束传输变换以及光信息处理等方面发挥作用。     

透镜模型下基于色散和强度传输方程的相位恢复技术

针对基于强度传输方程（Transport of Intensity Equation, TIE）的非干涉相位恢复技术要求光源是单色的限制,以及强度采集过程移动CCD或物体而引入的机械误差,提出了一种适用于透镜模型下的色散相位恢复技术。该方法基于透镜成像系统的相位变换特性,将色散与TIE结合在一起, 使不同波长的光经过透镜系统后在同一位置成像,从而在不机械移动的情况下获得聚焦和散焦强度图像。再利用散焦量与波长的关系结合TIE计算出物体的相位信息。模拟实验中用该方法恢复物体的相位与原始相位的相关性系数为0.970 7,均方根误差为0.061 8;同时真实实验对透镜阵列相位进行了恢复,实验结果与真实参数误差为1.74%,证明了所提方法的正确性和有效性。     

基于FPGA的数字相机自动曝光技术研究

针对传统的自动曝光算法不能满足特殊光照条件的场合,在研究数字相机的工作原理及特点的基础上,实现一种以现场可编程逻辑器件(FPGA)为控制核心的数字相机自动曝光系统,提出了基于图像熵的一种新的自动曝光算法.工作在外触发下的数字相机通过CameraLink接口作为图像数据的输入,利用FPGA的高速并行性完成了数字图像数据的采集、数据流的缓存控制,并且综合分析了基于图像熵的图像分区自动曝光算法的原理和过程,给出了该算法具体的实现方法,最后将得出的曝光参数输出给相机以达到合适的曝光.经实验验证:该算法的曝光效果不但适用于普通光照,而且在特殊光照条件下同样能很好的曝光,不受光照条件的影响,提高了相机系统输出图像的动态范围.     

三维传感中衍射型结构照明光场的应用

在基于结构照明的三维传感系统中，产生结构照明的方法和装置对正确和有效的三维重建具有重要的意义。本文提出了一种新颖的产生结构照明的方法－基于衍射，特别是菲涅耳衍射原理的结构照明方法，利用角谱理论，通过分析在激光光刀照明条件下，两种不同正弦型光栅的菲涅耳衍射光场的强度分布情况，提出了基于衍射原理的结构照明的原理和方法，并且给出了适用于三维传感的结构照明方案，并通过对实物模型的三维面形测量证实，本文提出的原理和方法是正确的有效的。     

低照度背景下弱小目标的成像实验研究

无人机等弱小目标具有飞行高度低、反射截面小、热信息弱等特点,尤其在低照度背景下,单一成像方式难以实现对弱小目标的探测和识别。实验对比了可见光成像、微光夜视成像、长波红外成像、激光主动照明成像等对弱小目标的成像效果,目的是研究适用于不同照度背景下弱小目标的探测识别方法。外场实验中,被测目标为小型四旋翼无人机,尺寸为290 mm×290 mm×196 mm,实验环境照度在10?2~10?4 lx之间,作用距离范围0.5~2 km。成像实验结果表明:普通可见光系统无法在环境照度低于10?2 lx时成像;环境照度为10?3 lx时,微光夜视和长波红外热系统的识别距离仅为0.5 km;近红外激光（中心波长808 nm）主动照明与微光夜视结合的主动成像方式可增加对弱小目标的识别距离,同等条件下主动照明成像作用距离是被动成像的3倍。     

Estimation of wave fields of incident beams in a transmission electron microscope by using a small selected-area aperture

The direction of an electron beam in a nanometer-sized area is measured directly by utilizing a selected-area aperture. By the measurements at several areas in a beam, the wavefront curvature and thus the defocus value of the beam are detected. From the defocus value, the wave field at the specimen plane is also reproduced in consideration of the influences of the condenser aperture and spherical aberration of the illumination lens. The result shows that phase deviation of 2π is caused only at about 10?nm apart from the beam center in a beam with a typical diameter for high-resolution transmission electron microscopy. Based on the defocus value, the convergence angle of the beam is also estimated to be about 6?mrad without being influenced by the partial coherence, that is, independently of the type of the electron gun. Measuring the defocus values for only two beam diameters enables us to determine geometrical parameters peculiar to the illumination system, based on which wave fields of any beam diameters by any condenser aperture sizes can be estimated. The technique proposed in this paper is effective in evaluating the influence of wavefront curvature of incident beams on various kinds of precise measurements conducted in transmission electron microscopes.     

1×11亚波长结构Dammann光栅的研制

论文基于严格耦合波理论（Rigorous Coupled-Wave Analysis,RCWA）,并采用遗传算法进行优化,设计并制作了一种具有高衍射效率的亚波长结构Dammann 光栅。光栅的分束比为111,最小特征尺寸为0.95 m,衍射效率设计值达到95%,优于传统Dammann 光栅约15%,且均匀性设计值小于2%。论文采用电子束光刻直写技术和反应离子刻蚀技术在石英基底上制作出亚波长结构图形。实验结果表明,电子束扫描曝光可以获得纳米级的图形分辨率。对石英基底的反应离子刻蚀中,射频功率、工作气压及气体流量均对刻蚀速率和栅线的表面形貌产生不同程度的影响,论文主要针对该问题进行了讨论。同时,论文也对电子束光刻直写过程中产生的线宽误差因素进行了分析。     

Models for characterizing phase-shift defects in optical projectionprinting

An algebraic model is developed for characterizing the printability, inspection, and repair of phase-shift defects in optical projection printing. Phase-shift defects are particularly difficult to characterize because of the many parameters associated with the exposure tool and with the attenuating phase shift mask (PSM) pattern. Furthermore, the parameters change during inspection of the attenuating PSM because the mask is examined under illumination conditions which differ from the exposure illumination. An algebraic model which encompasses this large set of variables is derived by considering the electric fields under the mask to be a combination of the electric fields from the feature and defect. These fields are then combined according to the mutual coherence function for the mask illumination. A notable difficulty is the relative phase shift due to defocus between large and small features. The model is shown to be valid for defects up to 0.35 λ/NA by comparison to SPLAT. Experimental verification is made for defects impacting a 6% transmitting PSM for 0.35-μm features at i-line. The reliability of the model is illustrated by giving rules of thumb for defect printing in attenuating PSM's     

An absorber tip diffraction coefficient

The UTD corner diffraction solution for a perfectly conducting corner is empirically modified for the case of a dielectric corner. The dielectric may be lossless or lossy, but is assumed to be homogeneous. This modified solution is used to calculate the bistatic scattering from the tip of a dielectric pyramid. Sample calculations display some features of the scattering from a single lossy dielectric pyramid. To verify the solution, calculations are compared with backscatter measurements of a single pyramid that is cut from a homogeneous lossless dielectric (polyethylene). Calculations are then compared with measurements for the more pertinent case of bistatic scattering from a wall of pyramidal radar absorbing material     

Densification of Oxide Nanoparticle Thin Films by Irradiation with Visible Light

A technique is presented that allows for altering of the physical characteristics of films of TiO₂ nanoparticles by exposure to visible light. In this technique, dye‐sensitized oxide nanoparticles are deposited on a substrate by dip‐coating. Photodissociation of the organic ligand layer leads to cross‐linking of the nanoparticles. Consequently, irradiated films have a decreased porosity, an increased index of refraction and an increased hydrophobicity. Films irradiated with green light are compared to films irradiated with UV light. Within experimental error, visible‐ and UV‐illumination induces the same changes in the films. The mechanism of surfactant elimination in dye‐sensitized oxide particles is discussed, patterning is demonstrated, and prospective applications of the technique are considered.     

Rigorous diffraction simulations of topographic wafer stacks in double patterning

Double patterning is regarded as a potential candidate to achieve the 32 nm node in semiconductor manufacturing. A key problem for a standard litho-etch–litho-etch (LELE) double patterning process is to evaluate and tackle the impact of the wafer topography resulting from the hardmask pattern on the second lithography step. In this paper, we apply rigorous electromagnetic field (EMF) solvers to investigate the wafer topography effects. At first, the studied 3D mask is split into two masks. The topography resulting from the exposure with the first split mask is described by a patterned hardmask. Based on that, the bottom antireflective coating (BARC) thickness of the second wafer stack is optimized. Alternatively, a two beam interference and the full diffraction spectrum of the second mask are used as the illumination of the wafer stacks, respectively. Finally, simulated 3D resist profiles for different BARC thicknesses are shown. The importance of wafer topography impact, the optimization of topographic wafer stacks, and the possible solutions to compensate for the impact of the wafer topography are discussed.     

宽带消色差红外光学超构透镜研究进展（特邀）

超构透镜是由亚波长散射单元结构排列而成的具有聚焦功能的平面二维超构表面。超构表面能够在亚波长尺度上操控光场的振幅、相位、色散和偏振态,是近年来迅速发展起来的新型光场调控载体。亚波长共振纳米结构使得高阶衍射被抑制,入射光场可以完美地被调制到设计的衍射级次上,从而确保了超构表面器件具有高的光子调控效率。同时,超构单元在设计上的灵活性及其特定的电磁响应使得超构表面可以实现对光场多个维度的定制化操控。不同于传统光学透镜依赖光传播的相位累积效应,宽带消色差超构透镜通过对光场相位和相位色散的同时独立调控解决了传统通过级联多个透镜修正色差造成的光学系统复杂和体积庞大限制,为发展小型化片上集成光学提供了全新的思路。文中围绕超构透镜的相关研究,首先介绍了超构表面调控光场振幅、相位和偏振态的基本原理,在此基础上,重点回顾了近年来关于超透镜的研究发展,包括通过单一参量调控的单波长超透镜的实现,以及通过对光场偏振、相位及相位色散的多参量联合调控的多功能宽带消色差超构透镜的发展现状,最后讨论其进一步发展的可能挑战与应用前景。     

Mining the Smartness of Insect Ultrastructures for Advanced Imaging and Illumination

Biological wonders, found in insects such as antireflecting moth eyes, compound eyes in a honey bee, firefly lanterns, and iridescent butterfly wings, inspire human beings for advanced light imaging and illumination technologies. Dazzling advances of micro‐ and nanofabrication technologies allow insect‐inspired structures, for example, artificial compound eyes with a wide field of view and low aberration, bioinspired light‐emitting diode lenses, and structural coloration templates, featuring miniaturization. Besides, plasmonics and metamaterials offer an unprecedented approach that overcomes the diffraction limit and unveils unknown optical phenomena in ultrastructures inspired by insects. Here, insect‐inspired photonic structures for light imaging, light extraction, and structural coloration are reviewed, and photonic functions and structure fabrications inspired by insects that can be applied in advanced imaging and illumination applications are discussed.     

具有光束偏转功能的亚波长光栅偏振分束器

针对亚波长光栅偏振分束器无法实现垂直出射光 、集成耦合效率低的问题,本文设计了 一种具有光束偏转功能的亚波长光栅偏振分束器,可实现偏振分束且能获得垂直出射光。器 件上 层采用光栅衍射理论设计了可实现偏振分束的周期亚波长光栅,下层通过严格耦合波法与波 前相 位控制理论设计了具有光束偏转功能的非周期亚波长光栅。基于有限元软件COMSOL对设计 的器 件进行仿真分析,结果表明该器件可分开TE与TM混合偏振光且能实现光束垂直出射,两种 偏振 光的总透射率在1550nm处超过了76.5%,偏振 消光比为14.0 dB。因此通过该偏振分束器不但可 以获得垂直出射的单偏振光,而且能有效提高垂直耦合型器件的工作效率,有望应用在面向 光纤通信的集成光电器件中。     

柯林斯公式及其逆运算在处理离焦图像中的应用

给出描述光波通过傍轴光学系统衍射的柯林斯公式及其逆运算表达式。根据在数字全息研究中可以将物平面及CCD平面视为ABCD系统的输入平面及输出平面,本文提出通过柯林斯公式的逆运算进行离焦图像复原的一种计算方法,并且,基于相移法和计算机编程技术,给出离焦图像复原的计算机模拟实例,证明了算法的可行性。     

基于LED阵列的可视信道室内可见光通信系统设计

随着固态光源的发展,大功率LED已被广泛应用到照明中。将照明功能与通信功能结合的室内可见光通信系统将有广泛的应用前景。为了满足室内照明和通信要求,通过使用大功率LED构成阵列,设计发射端、接收端,接口模块,构建了基于强度调制及直接检测方法的全双工可见光通信系统。并对系统信道模型进行分析,对单向链路实际光强分布及其可靠通信范围进行实际测量。实验证明该系统的可行性和可靠性。     

Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner

In this paper we describe the use of an Excimer laser for full-field lithography in a Mask Aligner. The DUV light from the Excimer laser is homogenized by using micro lens based optical integrators instead of a macro lens array. A simulation of the intensity distribution for 5 μm squares was performed to visualize the diffraction effects and to show the potential of 193 nm illumination. It is demonstrated that compared to the conventional homogenization optics the MO Exposure Optics further improves the illumination uniformity, calculated as 1.8% for MO Exposure Optics and 2.9% for the A-Optics. Moreover the improved optical setup allows a modification of the angular spectrum by using exchangeable illumination filter plates (IFP). Compared to the A-Optics the main improvement effect of MO Exposure Optics is detectable in the patterning of layouts containing critical dimension from 8 μm down to 2 μm.     

基于亚波长光栅结构的折射率传感研究进展

新一代片上传感系统提出了微型化、集成化、低成本等发展需求,硅基集成波导器件适应其发展趋势,其中亚波长光栅结构因独特的模场分布特性在折射率传感领域备受青睐。文章首先对亚波长光栅波导的工作原理进行了介绍,阐述其在折射率传感领域的优势,然后按器件结构分类梳理了亚波长光栅结构折射率传感的最新研究进展,并分析和总结了不同器件结构的优缺点,最后展望了基于亚波长光栅结构的折射率传感未来的发展方向。     

基于光栅侧面耦合的宽光带集光技术

利用光栅侧面耦合技术多为单波长或窄带光耦合,用于光纤激光器泵浦、光波导集成等领域,而用于可见光宽带耦合的研究很少。通过在波导上集成亚波长衍射光栅结构,可以引导太阳光在波导的侧面进行出光汇集,作为一种新型的太阳能集光器结构。利用时域有限差分算法软件(FDTD)对光栅结构进行仿真,以获得最大衍射效率的光栅结构参数,并对不同入射角度下的衍射耦合效率进行了分析。结果显示,在宽波段的光谱范围内,以上光栅结构均达到较好的衍射效率,其中闪耀光栅衍射效率最大,其衍射效率可达48.8%。这种利用亚波长衍射光栅结构的小型集光器有望应用在有关太阳能能量的收集应用中,例如照明、太阳能电池等。     

Defocusing image to pattern contact holes using attenuated phase shift masks

The patterning of contact holes by selecting out-of-focus image plane (defocus) using attenuated phase shift masks (APSM) has been studied. Defocus is found to enhance the image modulation at low partial coherence for contact holes with negative local average of mask function. Semi-dense holes up to 130 nm in 8% APSM have been printed by 0.5 μm defocus at a partial coherence of 0.31 using KrF scanner with highest numerical aperture of 0.68. However, these holes were closed with in-focus imaging. Defocus is also found to be beneficial for patterning the pitches that have extensive side lobes with in-focus imaging.