InP/InGaAsP条形半导体激光器中的瞬态温度特性理论计算

本文首次通过建立二维热传导模型,给出了条形InP/InGaAsP四元系半导体激光器中的瞬态热特性的理论计算结果,它包括了在几种条件下,激光器管芯内温度的空间分布随阶跃电注入的时间变化关系.计算结果表明四元系条形激光器体内温度升高比三元系GaAs/GaAlAs激光器的温升低,有关原因在文中给予讨论.     

InGaAsP/InP separated multiclad layer stripe geometry laser emitting at 1.5 µm wavelength

We have developed an InGaAsP/InP separated multiclad layer (SML) stripe geometry laser emitting at 1.5 μm wavelength. In this laser, the optical confinement is done by the effective refractive index step owing to the formation of the coupled waveguide outside the stripe region. The current confinement is done by the p-n-p-n structure outside the stripe region. The CW threshold current at 25 °C is only 82 mA for the stripe width and the cavity length of 6 μm and 250 μm, respectively. The maximum temperature where the CW lasing is obtained is 65°C. The characteristic temperature of the threshold current is 60 K. The transverse mode is fundamental up to 1.8 times the threshold. Ten samples are operated at 50°C with constant optical output of 5 mW/facet. These samples are still operating at over 10 000 h with a slight increase in the driving current. The appreciable change in the characteristics due to aging is not observed.     

Oscillation characteristics in InGaAsP/InP DH lasers with self-aligned structure

This paper presents new stripe geometry InGaAsP/InP DH lasers having mechanisms for suppressing current spreads and for controlling the transverse mode parallel to the junction plane. The theoretical study for optimum design of these lasers from which the analytic method of oscillation characteristics, including control of the transverse mode parallel to the junction plane attributable to refractive index and gain, was derived is discussed. The oscillation characteristics, especially the waveguide properties of the transverse mode are reported. Experimental results show excellent agreement with the theory and show that the transverse mode is totally confined by the built-in passive waveguide for a stripe width of 5 μm.     

Characteristics of diffused-stripe InP/InGaAsP/InP lasers emitting around 1.55 µm

Fabrication and lasing characteristics of InGaAsP/InP lasers emitting around 1.55 μm are described. Zn-diffused stripe-geometry lasers with emission wavelengths in the1.53-1.60mum range were fabricated from InP/InGaAsP/InP DH epitaxial wafers prepared by a low temperature LPE technique. The dependence of the lasing charaeteristics on the stripe width was examined. The lowest threshold current (≃160 mA under CW operation at 27°C) was obtained for a laser with a 13 μm stripe. CW operation of the laser has been achieved at a heat-sink temperature as high as 53°C. For sufficiently narrow stripe widths (simeq6 mum), fundamental-transverse mode and single-longitudinal mode operation was obtained under CW operation. Moreover, the lasers have good high-frequency performance. The lasers showed excellent dynamic properties without waveform distortion under high-frequency (800 Mbits/s) large-signal pulse modulation. The full width at half maximum of the longitudinal mode envelope was approximately 30 Å at 800 Mbits/s.     

InGaAsP/InP separated multiclad layer stripe geometry lasers emitting at 1.5 ?m

InGaAsP/InP separated multiclad layer stripe geometry lasers emitting at 1.5 ?m are reported. The CW threshold current at 25°C is only 82 mA and the maximum temperature where CW lasing is obtained is 65°C. The characteristic temperature of the pulsed threshold current is 60 K. The transverse mode is fundamental and the longitudinal mode is single up to 1.5 times the threshold under CW operation. A few samples operated for over 1000 h at 50°C under constant optical power operation of 5 mW/facet.     

Direct observation of the spatial hole burning and the saturation of the spontaneous emission in InGaAsP/InP lasers

The saturation behavior of the spontaneous emission intensity from a diffused-stripe InGaAsP/InP laser is studied. In InGaAsP/ InP DH lasers, a spontaneous emission can be observed through the InP substrate without any optical loss. The spatial distribution and the spectrum of the emission were directly observed from the substrate surface. The spatial hole burning was observed in the wider stripe lasers but in the case of narrow stripe lasers, the spontaneous emission almost uniformly saturates. The spectrum of the emission from the center of the narrow stripe lasers was analyzed and it was confirmed that, above the threshold current, the spectra in the lasing region saturated over the entire spectral region.     

InGaAsP InP current confinement mesa substrate buried heterostructure laser diode fabricated by one-step liquid-phase epitaxy

New InGaAsP/InP buried heterostructure laser diodes fabricated by one-step liquid-phase epitaxy are described, in which the InGaAsP active region completely embedded in InP is grown on the top of the mesa stripe formed on the InP substrate while, simultaneously, current confinement structure is automatically formed on both sides of the mesa stripe. These current confinement mesa substrate buried heterostructure laser diodes (CCM-LD's) have current confinement structure which very effectively blocks unwanted leakage current bypassing the light emitting region which has enabled laser operation with a threshold current as low as 20 mA, 70-mW maximum CW output at room temperature, and 125°C maximum CW operation temperature. Life tests over 6000-h CW operation at 70°C and 5 mW/facet have confirmed good reliability of these devices.     

Measurement of beam parameters of index-guided and gain-guided single-frequency InGaAsP injection lasers

A value of 1.8 for the astigmatism factor K in narrow stripe InGaAsP/InP lasers is obtained by direct measurement of the beam parameters. Previously, values from 10 to 30 were found for AlGaAs/GaAs lasers of similar geometry.     

InAs/InP量子点激光器制备工艺研究

报道了通过化学湿刻蚀制备窄脊条InAs/InP量子点激光器的方法。激光器脊条主要是由半导体材料InGaAs和InP构成,通过选择合适配比的H2SO4∶H2O2∶H2O和H3PO4∶HCl腐蚀溶液和InP的腐蚀方向,在室温下选择性地腐蚀了InGaAs和InP,获得了窄脊条宽为6μm的量子点激光器。此激光器能够在室温连续波模式下工作,激射波长在光纤通信重要窗口1.55μm,单面最大输出功率超过12mW。     

Room temperature c.w. operation of InGaAsP/InP heterostructure lasers emitting at 1.56 ?m

Room-temperature c.w. operation of InGaAsP/InP heterostructure lasers grown by liquid-phase epitaxy was achieved at 1.56 ?m. An active InGaAsP layer was essentially sandwiched by InP, though a thin InGaAsP buffer layer was deposited to prevent the melt-back of the active layer. Threshold current was typically 300 mA for a 17 ?m wide oxide-defined stripe laser.     

Gain spectra in GaInAsP/InP proton-bombarded stripe-geometry DH lasers

We have measured gain spectra for TE polarization in a GaInAsP/InP laser as a function of dc bias current below laser threshold. The measurements were made on a low-threshold device with a stripe geometry defined by proton bombardment. A number of other characteristics of this and similar devices from the same wafer are also reported. These data permit the maximum gain coefficient of the active layer gmaxto be evaluated as a function of nominal current density Jnom. We obtain the linear relationshipg_{max} = (3.1 times 10^{-2}/eta_{r})(J_{nom} - eta_{r} 5.4 times 10^{3}), where ηris the radiative quantum efficiency. Our data apply only for large gain (g gsim 150cm^-1) and large Jnombecause the active layer of the test device is thin (0.1 μm).     

GSMBE-Grown InGaAs/InGaAsP Strained Quantum Well Lasers at 1.84 Micron Wavelength

报道了GSMBE方法生长波长1.84μm的InGaAs/InGaAsP/InP应变量子阱激光器．40μm条宽、800μm腔长的平面电极条形结构器件,室温下以脉冲方式激射,20℃下阈值电流密度为3.8kA／cm2,外微分量子效率为9.3%．     

Theoretical and experimental study of threshold characteristics in InGaAsP/InP DH lasers

Threshold characteristics of stripe-geometry InGaAsP/InP double-heterostructure injection lasers have been analytically derived as a function of active layer thickness and stripe width. The effects of stripe width, refractive index in the active layer, diffusion of injected carriers, carrier lifetime, absorption loss in the cladding layer, gain coefficient, and cavity length on the optimum thickness of the active layer which gives minimum threshold or on threshold current density were studied. These lasers were fabricated on     

Chemically etched-mirror GaInAsP/InP lasers--Review

Detailed results on stripe GaxIn1-xAsyP1-y/InP lasers (lambda = 1.3 mum) with chemically etched-mirrors are reviewed. These devices are fabricated from GaInAsP/InP wafers grown by liquid phase epitaxy. A simple stripe laser structure with one etched mirror and one cleaved mirror is proposed. Monolithic passivation has been achieved using a Si3N4film and metal coatings on the etched facets. These processes not only increase the reflectivity of the etched mirrors, resulting in threshold currents even lower than uncoated cleaved devices, but also ease the problem of bonding of the chips on heat sinks. CW operation at room temperature has been achieved. Threshold currents of devices with 10 μm stripe electrodes were about 180-200 mA. Short cavity lasers and integrated monitoring detectors have also been demonstrated.     

Carrier loss resulting from Auger recombination in InGaAsP/InP double heterojunction laser diodes: Spectroscopy of 950 nm high energy emission

From 1.3 μm stripe InGaAsP/InP DH lasers, we observed a 950 nm emission band which originates from band-to-band recombination in InP confinement layers. This experimental result can be well explained by considering the overflow of injected carriers from InGaAsP into InP. The overflowed energetic carriers were created by Auger recombination in InGaAsP.     

Room-temperature operation of InP-based InAs quantum dot laser

A ridge waveguide quantum dot (QD) laser with a stripe width of 15 /spl mu/m was fabricated by using the seven-stacked InAs QD layers based on the InAlGaAs-InAlAs material system on InP [001] substrate. Room-temperature lasing operation was observed at 1.501 /spl mu/m, which is the first observation from the InAs QDs with the InAlGaAs-InAlAs structure. The characteristic temperature of the InAs QD laser calculated from the temperature dependence of threshold current density was 135 K in the temperature range from 200 K to room temperature.     

Direct modulation characteristics of GaInAsP/InP d.h. lasers with various stripe widths measured by sharp-pulse method

The direct modulation characteristics of GaInAsP/InP d.h. lasers emitting at 1.3 ?m with various stripe widths were measured by the proposed sharp-pulse method. As a result, a flat modulation frequency response up to 1.9 GHz was observed in a laser diode with 5 ?m stripe width.     

InGaAs／InP分别限制量子阱激光器的阱数优化设计和实验制备

根据对ＩｎＧａＡｓＰ－ＩｎＰ分别限制量子阱激光器结构的注入效率的分析和利用Ｘ射线衍射结ＩｎＧａＡｓＰ－ＩｎＰ２０个周期的多量子阱结构异质界面的研究，设计，制备了４个阱的ＩｎＧａＡｓＰ－ＩｎＰ分别限制量子阱激光器结构，利用质子轰击制得条形激光器，阈值电流为１００ｍＡ，直流室温连续工作，单面输出外微分子效率为３６％。     

Zn-diffused, stripe-geometry, double-heterostructure GaInAsP/InP diode lasers

Deep Zn diffusion from a ZnP2source has been used to fabricate stripe-geometry double-heterostructure GaInAsP/InP diode lasers with emission wavelengths in the1.2-1.3 mum range. These devices exhibit good electrical and optical confinement. For sufficiently narrow stripe widths (<10 mum), emission is usually single mode and linear. CW outputs up to ∼8 mW per facet have been observed. In initial life tests, two Zn-diffused lasers have operated CW at room temperature for over 5000 h without appreciable degradation.     

Room-temperature pulsed operation of triple-quantum-well GaInNAslasers grown on misoriented GaAs substrates by MOCVD

The lasing operation of three-quantum-well GaInNAs stripe geometry lasers grown by MOCVD on 0° and 6° misoriented (100) GaAs substrates, respectively, have been demonstrated and their performance is compared for the first time. Both devices achieved room temperature, pulsed lasing operation at an emission wavelength of 1.17 μm, with a threshold current density of 667 A/cm² for lasers grown on 6° misoriented substrates, and 1 kA/cm² for lasers grown on 0° misoriented substrates. The threshold for the lasers grown on 6° misoriented substrates compares favorably with the best results for GaInNAs lasers. Lasers with narrower stripe width and a planar geometry have also been demonstrated by the use of lateral selective wet oxidation for current confinement, with a threshold current density of 800 A/cm² for 25-μm-wide devices