Influence of annealing temperature on structural,electrical and optical properties of undoped zinc oxide thin films

The undoped zinc oxide thin films were grown on quartz substrate at a substrate temperature of 750 °C by radio frequency magnetron sputtering and post annealed at different temperatures (600–800 °C) for a period of 30 min. The influence of annealing temperature on the structure, electrical and optical properties of undoped ZnO thin films was investigated by X-ray diffraction, Hall-effect, photoluminescence and optical transmission measurements. Results indicated that the electrical properties of the thin films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type when the temperature increased from 600 to 800 °C. Electrical and photoluminescence results indicate that native defects, such as oxygen and zinc vacancies, could play an important role in determining the conductivity of these nominally undoped ZnO thin films. The conversion of the conduction type was attributed to the competition between Zn vacancy acceptor and oxygen vacancy and interstitial Zn donors. At an intermediate annealing temperature of 750 °C, the film behaves the best p-type characteristic, which has the lowest resistivity of 12 Ωcm, hall mobility of 2.0 cm²/V s and carrier concentration of 1.5 × 10¹⁷ cm^?3. The photoluminescence results indicated that the Zn vacancy might be responsible for the intrinsic better p-type characteristic in ZnO thin films.     

Effects of hydrogen annealing on the structural, optical and electrical properties of indium-doped zinc oxide films

Indium-doped zinc oxide (IZO) films were fabricated by radio-frequency magnetron sputtering. The effects of hydrogen annealing on the structural, optical and electrical properties of the IZO films were investigated. The hydrogen annealing may deteriorate the crystallinity of the films. The surfaces of the films would be damaged when the annealing temperature was higher than 350 °C. After the annealing, the surface roughness of the films would decrease, and high transparency of 80–90% in the visible and near-infrared wavelength would be kept. Meanwhile, the resistivity decreased from 1.25 × 10⁻³ Ωcm of the deposited films to 6.70 × 10⁻⁴ Ωcm of the annealed films. The work function of the IZO films may be modulated between 4.6 and 4.98 eV by varying the hydrogen annealing temperature and duration.     

Effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films

The effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films were investigated using spectroscopic ellipsometry in the UV-visible range, reflectance-transmittance spectra at normal incidence in the infrared range, electrical resistivity measurements, and X-ray diffraction. It was found that annealing at 300 °C produces an overall shift to lower photon energies of the optical constant spectra, which is related to the increase in electrical resistivity. The electrical measurements performed in the 25-300 K range show a metallic behavior with large residual resistivity, quantity that increases with annealing temperature and is closely related with the change in the relative intensity of the main diffraction peaks. Also it is shown that under certain conditions of film deposition onto indium-tin oxide, some of its properties can change in a similar way as in air-annealing processing.     

Structural,morphological, optical and electrical properties of spray deposited zinc doped copper oxide thin films

Nanostructured spray deposited zinc (Zn) doped copper oxide (CuO) thin films were characterized by employing X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive X-ray (EDX), atomic force microscopy (AFM) and ultraviolet–visible–near infrared (UV–Vis–NIR) spectroscopy. XRD patterns of CuO and Zn doped CuO thin films indicated monoclinic structure with the preferred orientation along \(\left( {\bar 111} \right)\) plane. Maximum value of crystallite size is found about 28.24 nm for 5 at% Zn doped CuO thin film. In FESEM images, nanoparticles were observed around the nucleation center. EDX analysis confirms the presence of all component elements in CuO and Zn doped CuO thin films. Analysis by AFM of CuO and Zn doped CuO thin films figured out decrease of surface roughness due to Zn doping. UV–Vis–NIR spectroscopy showed that CuO and Zn doped CuO thin films are highly transparent in the NIR region. Optical band gap of CuO thin films decreased with substrate temperature and that of Zn doped CuO thin films increased with Zn concentration. Refractive index of CuO and Zn doped CuO thin films raised with photon wavelength and became constant in the NIR region. 5 at% Zn doped CuO thin film showed the highest optical conductivity and the lowest electrical resistivity at room temperature.     

Effect of thermal annealing treatment on structural, electrical and optical properties of transparent sol-gel ZnO thin films

Effect of thermal annealing in different ambients on the structural, electrical and optical properties of the sol-gel derived ZnO thin films are studied. XRD results show that the annealed ZnO films with wurtzite structure are randomly oriented. Crystallite size, carrier concentration, resistivity and mobility are found to be dependent on the annealing temperature. The change in carrier concentration is discussed with respect to the removal of adsorbed oxygen from the grain boundaries. The highest carrier concentration and lowest resistivity are 8 × 10¹⁸ cm⁻³ and 2.25 × 10⁻¹ Ω cm, respectively, for the film annealed at 500 °C in vacuum. The annealed films are highly transparent with average transmission exceeding 80% in the wavelength region of 400-800 nm. In all three ambients, the optical band gap value does not change much below 500 °C temperature while above this temperature band gap value decreases for nitrogen and air and increases for vacuum.     

Annealing effect on structural, optical and electrical properties of pure and Mg doped tin oxide thin films

This study describes the effect of annealing at different temperatures (400–600 °C) on structural, optical and electrical behaviors of pure and Mg doped tin oxide thin films grown on the glass substrate by electron beam evaporation technique. The transformation of tetragonal to orthorhombic form due to annealing, introduced a change in the optical and electrical properties of pure and Mg doped tin oxide thin films. X-ray diffraction studies or analysis revealed the phase transformation and change in the crystalline size with increase in the annealing temperature. The morphology and roughness of the thin films were studied by Atomic force microscopy. Optical band gap increased with annealing temperature confirms the improvements of crystallinity. The quality of thin films transparency was investigated by UV/Vis-spectroscopy. Photoluminescence of pure and Mg doped tin oxide thin films shows two extra peaks one at 486 nm and other at 538 nm is due to the crystal defect created as a result of annealing temperature. These peaks became stronger and shifted to longer wavelength with increasing the annealing temperature. The complex plot (Nyquist plot) showed the data point laying on two semicircles and the resistance of grains and grain boundaries increases with the increase in annealing temperature for both pure and Mg doped tin oxide thin films.     

Optical properties of zinc oxide thin films doped with aluminum and lithium

Aluminum doped Zinc Oxide (AZO) and Lithium doped Zinc Oxide (LZO) thin films are obtained by Pulsed Laser Deposition (PLD) method. These films are characterized by using Spectroscopic Ellipsometry (SE), X-ray Diffraction (XRD) and Photoluminescence (PL). By modeling the ellipsometry spectra we get the dielectric functions, the optical band gap E_g, and the electrical properties. Our results show the influence of the processing parameters on the optical and structural properties of doped ZnO thin films. The post-annealing treatment applied to AZO thin films, changes strongly the optical properties, by lowering the resistivity and red-shifting the band gap.     

Preparation of aluminum doped zinc oxide films and the study of their microstructure, electrical and optical properties

Aluminum doped zinc oxide (AZO) polycrystalline thin films were prepared by sol-gel dip-coating process on optical glass substrates. Zinc acetate solutions of 0.5 M in isopropanol stabilized by diethanolamine and doped with a concentrated solution of aluminum nitrate in ethanol were used. The content of aluminum in the sol was varied from 1 to 3 at.%. Crystalline ZnO thin films were obtained following an annealing process at temperatures between 300 °C and 500 °C for 1 h. The coatings have been characterized by X-ray diffraction, UV-Visible spectrophotometry, scanning electron microscopy, and electrical resistance measurement. The ZnO:Al thin films are transparent (∼ 90%) in near ultraviolet and visible regions. With the annealing temperature increasing from 300 °C to 500 °C, the film was oriented more preferentially along the (0 0 2) direction, the grain size of the film increased, the transmittance also became higher and the electrical resistivity decreased. The X-ray diffraction analysis revealed single-phase ZnO hexagonal wurtzite structure. The best conductors were obtained for the AZO films containing 1 at.% of Al, annealed at 500 °C, 780 nm film thickness.     

Optical, structural and electrical properties of Mn doped tin oxide thin films

Mn doped SnO_x thin films have been fabricated by extended annealing of Mn/SnO₂ bilayers at 200°C in air for 110 h. The dopant concentration was varied by controlling the thickness of the metal layer. The overall thickness of the film was 115 nm with dopant concentration between 0 and 30 wt% of Mn. The films exhibit nanocrystalline size (10-20 nm) and presence of both SnO and SnO₂. The highest transmission observed in the films was 75% and the band gap varied between 2.7 and 3.4 eV. Significantly, it was observed that at a dopant concentration of ∼4 wt% the transmission in the films reached a minimum accompanied by a decrease in the optical band gap. At the same value of dopant concentration the resistivity also reached a peak. This behaviour appears to be a consequence of valence fluctuation in Sn between the 2+ and 4+ states. The transparent conductivity behaviour fits into a model that attributes it to the presence of Sn interstitials rather than oxygen vacancies alone in the presence of Sn^{2 +}.     

Investigation on structural, electrical and optical properties of tungsten-doped tin oxide thin films

Tungsten-doped tin oxide (SnO₂:W) transparent conductive films were prepared on quartz substrates by pulsed plasma deposition method with a post-annealing. The structure, chemical states, electrical and optical properties of the films have been investigated with tungsten-doping content and annealing temperature. The lowest resistivity of 6.67 × 10^− 4 Ω cm was obtained, with carrier mobility of 65 cm² V^− 1 s^− 1 and carrier concentration of 1.44 × 10²⁰ cm^− 3 in 3 wt.% tungsten-doping films annealed at 800 °C in air. The average optical transmittance achieves 86% in the visible region, and approximately 85% in near-infrared region, with the optical band gap ranging from 4.05 eV to 4.22 eV.     

Influence of thermal annealing on electrical and optical properties of Ga-doped ZnO thin films

Influence of thermal annealing on electrical properties of GZO films has been studied by means of Hall effect measurements and optical characterization based on Drude model analysis for transmission and reflection spectra. Electrical resistivity increased with increasing annealing temperature. Changes of electrical properties were compared between air and N₂ gas atmosphere. Thermal stability in the air was worse compared to the N₂ gas atmosphere. Annealing at rather high temperature caused decrease in the Hall mobility and increase in optical mobility. The difference between the Hall mobility and the optical mobility was attributed to carrier scattering at grain boundaries. Three kinds of deposition method, ion plating using DC arc discharge, DC magnetron sputtering, and RF power superimposed DC magnetron sputtering were compared in terms of the thermal stability.     

Effect of working pressure on the structural, optical and electrical properties of titanium-gallium co-doped zinc oxide thin films

The transparent conducting titanium-gallium co-doped zinc oxide (TGZO) thin films were grown on glass substrates by radio-frequency magnetron sputtering technique. The effects of working pressure on the structural, optical and electrical properties of the films were investigated. The results show that the deposited films are polycrystalline with a hexagonal wurtzite structure and highly textured along the c-axis perpendicular to the substrate. The TGZO film prepared at the working pressure of 0.4 Pa exhibits the best crystallinity, the maximal grain size, the highest transmittance, the lowest resistivity and the highest figure of merit. The optical constants of the films were calculated using the method of optical spectrum fitting. The dispersion behavior of the films was studied by the single-electronic oscillator dispersion model. The oscillator parameters and optical bandgaps were determined. The results demonstrate that the microstructure and optoelectrical properties of the TGZO films are dependent on the working pressure.     

Effects of working pressure on the electrical and optical properties of aluminum-doped zinc oxide thin films

Zinc oxide films have been actively investigated as transparent electrode materials for optical displays. We report the effect of the working pressure on the electrical and optical properties of Al-doped ZnO thin films deposited by D.C. magnetron sputtering. The films were deposited in working pressures ranging from 1 mTorr to 10 mTorr. The effect of the working pressure was determined and the mechanism of the electrical and optical properties was explained. To understand the relationship between the electrical and optical properties of the films and film structure, the film density, resistivity, carrier concentration, carrier mobility, mean free path and optical band-gap in the films were measured as a function of the working pressure.     

Effect of annealing temperature on structural, electrical and optical properties of B-N codoped ZnO thin films

The B-N codoped p-type ZnO thin films have been prepared by radio frequency magnetron sputtering using a mixture of nitrogen and oxygen as sputtering gas. The effect of annealing temperature on the structural, electrical and optical properties of B-N codoped films was investigated by using X-ray diffraction, Hall-effect, photoluminescence and optical transmission measurements. Results indicated that the electrical properties of the films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type in a range from 600 °C to 800 °C. The B-N codoped p-type ZnO film with good structural, electrical and optical properties can be obtained at an intermediate annealing temperature region (e.g., 650 °C). The codoped p-type ZnO had the lowest resistivity of 2.3 Ω cm, Hall mobility of 11 cm²/Vs and carrier concentration of 1.2 × 10¹⁷ cm^− 3.     

Investigation of annealing-treatment on structural and optical properties of sol-gel-derived zinc oxide thin films

The transparent ZnO thin films were prepared on Si(100) substrates by the sol-gel method. The structural and optical properties of ZnO thin films, submitted to an annealing treatment in the 400–700°C ranges are studied by X-ray diffraction (XRD) and UV-visible spectroscopic ellipsometry (SE). XRD measurements show that all the films are crystallized in the hexagonal wurtzite phase and present a random orientation. Three prominent peaks, corresponding to the (100) phase (2θ ≈ 31.8°), (002) phase (2θ ≈ 34.5°), and (110) phase (2θ ≈ 36.3°) appear on the diffractograms. The crystallite size increases with increasing annealing temperature. These modifications influence the optical properties. The optical constants and thickness of the films have been determined by analysing the SE spectra. The optical bandgap has been determined from the extinction coefficient. We found that the refractive index and the extinction coefficient increase with increasing annealing temperature. The optical bandgap energy decreases with increasing annealing temperature. These mean that the optical quality of ZnO films is improved by annealing.     

Changes in electrical and structural properties of indium oxide thin films through post-deposition annealing

The annealing effects on the electrical properties and microstructures of indium oxide (In₂O₃) thin films were investigated. The In₂O₃ thin films with the thickness of about 150 nm were annealed at various temperatures ranging from 100 to 600 °C in air after the sputtering deposition. It was found that the carrier density of the In₂O₃ thin films decreased with increasing in the annealing temperature and then started to increase at a certain temperature. This indicated that the reduction of the In₂O₃ thin films was promoted at high annealing temperature. The Hall mobility of the In₂O₃ thin films increased through the reduction; furthermore, the d-spacing of the In₂O₃ crystal lattice plane tended toward ideal value. It can be believed from these results that one of the principal electron scattering in the In₂O₃ thin films is attributed to excess oxygen atoms that expand the d-spacing.     

Effect of air annealing on structural, optical, microscopic, electrical properties of cadmium selenide thin films

Cadmium selenide films have been deposited on glass substrate dip method. The resultant films were annealed upto 473 K temperature. The structural properties of cadmium selenide thin films have been investigated by X-ray diffraction techniques. The X-ray diffraction spectra showed that cadmium selenide thin films are polycrystalline. As deposited sample shows cubic phase whereas sample annealed at 473 K shows hexagonal phase. The optical properties showed direct band gap values were found to be in the region of 1.82–1.55 eV. The electrical studies shows conductivity increases with increase in annealing temperature. The optoelectric and structural data are discussed from the point of applications based on achieving high performance devices.     

Morphological, optical and electrical properties of samarium oxide thin films

We present here results on samarium oxide thin films, obtained by pulsed laser deposition and by radio frequency assisted pulsed laser deposition. Three different substrate types were used: silicon, platinum covered silicon and titanium covered silicon. The influence of the deposition parameters (oxygen pressure and laser fluence) on the structure and morphology of the thin films was studied. The substrate-thin film interface zone was investigated; the optical and electrical properties (the losses, dielectric constant and leakage currents) were also determined.     

On the structural and electrical characteristics of zinc oxide thin films

ZnO thin films with thickness d = 100 nm were deposited by radio frequency magnetron sputtering onto glass substrate from different targets. The structural analyses of the films indicate they are polycrystalline and have a wurtzite (hexagonal) structure. Crystallites are preferentially oriented with (002) plane parallel to the substrate surface and the samples have low values for surface roughness, between 1.7 nm and 2.7 nm. The mechanism of electrical conduction in the studied films is strongly influenced by this polycrystalline structure and we used Van der Pauw method to analyze these properties. Electrical studies indicate that the ZnO thin films are n-type. For the cooling process, thermal activation energy of electrical conduction of the samples can vary from 1.22 eV to 1.07 eV (for the ZnO layer obtained from for metallic Zn target) and from 0.90 eV to 0.63 eV (for the ZnO layer obtained from ZnO target), respectively. The influence of deposition arrangement and oxidation conditions on the structural and electrical properties of the ZnO films was investigated in detail.     

Effect of film thickness on properties of aluminum doped zinc oxide thin films deposition on polymer substrate

A series of aluminum doped zinc oxide thin films with different thickness (25–150 nm) were deposited on indium tin oxide coated polyethylene terephthalate substrates by radio frequency magnetron sputtering method at room temperature. The structural, optical and electrical properties of the films were investigated by X-ray Diffractometer, UV–Vis spectrometer and Hall Effect Measurement System. All the obtained films were polycrystalline with a hexagonal structure and a preferred orientation along [002] direction with the c-axis perpendicular to the substrate surface. The optical energy band gap (E_g) values of the films were found to be in the range from 3.36 to 3.26 eV, and their average optical transmissions were about 75 % in the visible region. The films had excellent electrical properties with the resistivities in the range from 2.78 × 10^?5 to 2.03 × 10^?4 Ω cm, carrier densities more than 3.35 × 10²¹ cm^?3 and Hall mobilities between 5.77 and 11.13 cm²/V s.