Low Pressure Hexamethyldisiloxane (HMDSO)/Nitrogen Plasma Treatment on the Wettability and Surface Free Energy of Biaxial-Oriented Polypropylene (BOPP) Films

In this paper the influence of DC glow discharge HMDSO-N₂ plasma on wettability and surface properties of Biaxial-oriented polypropylene (BOPP) polymeric surfaces, has been investigated. The effects of plasma exposure time and HMDSO percent on the surface energy and wettability of the BOPP films were characterized using Fourier transform infrared spectroscopy (FTIR), Atomic force microscopy (AFM) and contact angle measurement. A clear change in the surface energy of BOPP films due to plasma treatment was observed. In this work we report changing surface properties of BOPP films instead of plasma treatment time and HMDSO ratios.     

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50kHz/33MHz dual-frequency atmospheric-pressure plasma jet

The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency (50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component (-CHx) and hydroxyl functional group(-OH) connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.     

Effect of inductively coupled plasma surface treatment on silica gel and mesoporous MCM-41 particles

Silica gel and MCM-41 synthesized mesoporous materials were treated with either oxygen (O2),hexamethyldisiloxane (HMDSO) and organic vapors like ethanol (EtOH),and acrylonitrile (AN) inductive plasma.The radiofrequency power for the modification was fixed to 120 W and 30 min,assuring a high degree of organic ionization energy in the plasma.The surface properties were studied by infrared spectroscopy (FTIR),scanning electron microscopy,x-ray photoelectron spectroscopy and dynamic light scattering technique was used for characterizing size distributions.When the silica and MCM-41 particles were modified by AN and HMDSO plasma gases,the surface morphology of the particles was changed,presenting another color,size or shape.In contrast,the treatments of oxygen and EtOH did not affect the surface morphology of both particles,but increased the oxygen content at the surface bigger than the AN and HMDSO plasma treatments.In this study,we investigated the influence of different plasma treatments on changes in morphology and the chemical composition of the modified particles which render them a possible new adsorbent for utilization in sorptive extraction techniques for polar compounds.     

乙烯基三甲基硅烷与苯、苯乙烯及六氟丙烯等离子体共聚物的结构表征

采用外部电极电容耦合的RF辉光放电装置研究了乙烯基三甲基硅烷(VTMS)与苯(Bz)、苯乙烯(St)以及六氟丙烯(HFP)的等离子体共聚合。用IR、ESCA、PGC/MS和X射线对聚合物结构进行表征,证明乙烯基三甲基硅烷与苯、苯乙烯以及六氟丙烯可进行共聚合。C/Si比的增加表明苯、苯乙烯和六氟丙烯的嵌入导致聚合物组成的变化,Si含量相对较低。共聚物中无Si-H键的形成。     

在含氮气体中六甲基环三硅氧烷的等离子体聚合

用外部电极电容耦合式辉光放电装置研究了六甲基环三硅氧烷在NH_3或N_2中的等离子体聚合。用红外光谱,X线光电子能谱研究了聚合物结构,并测定了聚合物的热稳定性及对水的接触角,计算了聚合物的表面能。结果表明,NH_3和N_2都参加了聚合反应,N在聚合物中的存在形式主要为C=NH,随NH_3在反应体系中浓度的增加,聚合物中的N含量也增加,在NH_3中制备的聚合膜有很好的疏水性。     

Investigation of Microwave Surface-Wave Plasma Deposited SiOxCoatings on Polymeric Substrates简

In this paper, we reported nano-scale SiOx coatings deposited on polyethylene terephthalate （PET） webs by microwave surface-wave assisted plasma enhanced chemical vapor deposition for the purpose of improving their barrier properties. Oxygen （O2） and hexamethyl- disiloxane （HMDSO） were employed as oxidant gas and Si monomer during SiOx deposition, re- spectively. Analysis by Fourier transform infrared spectroscope （FTIR） for chemical structure and observation by atomic force microscopy （AFM） for surface morphology of SiO~ coatings demon- strated that both chemical compounds and surface feature of coatings have a remarkable influence on the coating barrier properties. It is noted that the processing parameters play a critical role in the barrier properties of coatings. After optimization of the SiOx coatings deposition conditions, i.e. the discharge power of 1500 W, 2 ： 1 of O2 ： HMDSO ratio and working pressure of 20 Pa, a better barrier property was achieved in this work.     

EACVD沉积金刚石过程中气相化学研究

利用热阴极直流等离子体化学气相沉积技术分别在ＣＨ４－Ｈ２和Ｃ２Ｈ５ＯＨ－Ｈ２两种不同的工作环境中沉积金刚石膜,同时利用发射光谱对等离子体气相环境进行了原位诊断。在ＣＨ４－Ｈ２和Ｃ２Ｈ５ＯＨ－Ｈ２两种体系中,探测到Ｈ原子和ＣＨ、ＣＨ＾＋、Ｃ２等多种碳氢粒子,发现ＣＨ和ＣＨ＾＋有益于金刚石生长,而Ｃ２是非金刚石相的生长基团。与ＣＨ４－Ｈ２体系所不同的是,在Ｃ２Ｈ５ＯＨ－Ｈ２体系中,还产生了ＣＨＯ、ＣＨ     

Investigation of working pressure on the surface roughness controlling technology of glow discharge polymer films based on the diagnosed plasma

The effects of working pressure on the component, surface morphology, surface roughness, and deposition rate of glow discharge polymer(GDP) films by a trans-2-butene/hydrogen gas mixture were investigated based on plasma characteristics diagnosis. The composition and ion energy distributions of a multi-carbon(C_4H_8/H_2) plasma mixture at different working pressures were diagnosed by an energy-resolved mass spectrometer(MS) during the GDP film deposition process. The Fourier transform infrared spectroscopy(FT–IR), field emission scanning electron microscope(SEM) and white-light interferometer(WLI) results were obtained to investigate the structure, morphology and roughness characterization of the deposited films, respectively. It was found that the degree of ionization of the C_4H_8/H_2 plasma reduces with an increase in the working pressure. At a low working pressure, the C–H fragments exhibited small-mass and high ion energy in plasma. In this case, the film had a low CH_3/CH_2 ratio, and displayed a smooth surface without any holes, cracks or asperities. While the working pressure increased to 15 Pa,the largest number of large-mass fragments led to the deposition rate reaching a maximum of 2.11 μm h~(-1), and to hole defects on the film surface. However, continuing to increase the working pressure, the film surface became smooth again, and the interface between clusters became inconspicuous without etching pits.