Growth of MgTiO3 thin films by pulsed laser deposition and their electrical properties

Abstract

MgTiO₃ thin films have been grown on various substrates by pulsed laser deposition (PLD) to investigate the application for microwave dielectrics and optical devices. Highly oriented MgTiO₃ thin films were obtained on sapphire (c-plane Al₂O₃). MgTiO₃ thin films deposited on SiO₂/Si and platinized silicon (Pt/Ti/SiO₂/Si) substrates were polycrystalline nature. MgTiO₃thin films grown on sapphire were transparent in the visible and had a sharp absorption edge at 280 nm. These MgTiO₃ thin films had extremely fine feature of surface morphology, i.e., rms roughness of 0.87 nm. Dielectric constant and loss of MgTiO₃ thin films deposited by PLD were about 24 and 1.5% at 1MHz, respectively. These MgTiO₃ thin films also exhibited little dielectric dispersion.     

Epitaxial structure SrBi2Ta2O9<116> /SrTiO3<011> /Ce0.12Zr0.88O2<001> /Si<001> for ferroelectric-gate FET memory

Abstract

Epitaxial thin film growth of SrBi₂Ta₂O₉/SrTiO₃/Ce_0.12Zr_0.88O₂ on Si was studied, and this epitaxial layer structure was applied to fabrication of ferroelectric-gate field effect transistors (FETs). The films were prepared by a pulsed laser deposition technique and epitaxial growth was identified by x-ray diffraction. The devices exhibited excellent electrical performances: Capacitance-voltage characteristic of a metal-ferroelectric-insulator-semiconductor (MFIS) diode showed a retention longer than 10 days and I_d-V_g characteristic of an MFIS-FET showed 1 day retention. It is proved that the crystalline quality of ferroelectric thin films is of great importance to develop integrated devices with high performance.     

Structure and Dielectric Properties of Heteroepitaxial PMNT Thin Films

Thin films of PbMg_1/3 Nb_2/3O₃(PMN) and (1 ? x)PbMg_1/3Nb_2/3O₃-xPbTiO₃ (PMNT) with x = 0.1 to 0.3 were epitaxially grown on (100) MgO and (100) SrTiO₃ (ST) substrates by magnetron sputtering. Typical film thickness was 300 to 900 nm. Pyrochlore free (001) PMN and (001) PMNT thin films were grown on the ST and MgO substrates at narrow temperature window of 500 ± 20°C. The cross-sectional TEM image showed that the sputtered PMN and PMNT thin films comprised high density and continuous structure. These sputtered films showed 3-dimensional epitaxy. The dielectric response of the sputtered thin films showed frequency dispersion similar to bulk relaxor-like behavior with a broad temperature anomaly. PMN-23PT (x = 0.23) thin films showed the temperature of maximum, Tm, at 80°C. The Tm coincided with that of corresponding bulk materials. However, the obtained maximum dielectric permittivity, ?_m, ?_m = 900 to 1000, was considerably smaller than that in the bulk. The relatively low dielectric permittivity was probably due to the presence of strained hetero-epitaxial layer having temperature independent dielectric properties.     

Fatigue and retention of Pb(Zr0.53Ti0.47)O3 thin film capacitors with Pt and RuO2 electrodes

Abstract

Pb(Zr_0.53Ti_0.47)O₃ (PZT) thin films were deposited on Pt and RuO₂ coated Si and MgO substrates using the sol-gel process. Fatigue and retention tests were performed on these samples. The films grown on RuO₂ electrodes are fatigue-free up to nearly 10¹¹ cycles. Their retention life-time extrapolates to more than 10¹⁰ seconds. The fatigue behavior of films grown on Pt electrodes depends on the PZT film orientation. Highly oriented (001) PZT films maintain 50% of their initial P?r-P?r value after 10¹¹ cycles. The randomly oriented films maintain less than 3% of the initial P?r-P?r value after 10¹¹ cycles. However, the retention life-time of both highly oriented and randomly oriented PZT films grown on Pt electrodes extrapolates to higher than 10¹¹ seconds. It appears that fatigue of films grown on RuO₂ is mainly controlled by the film/electrode interface. On the other hand, fatigue of films grown on Pt appears to depend on both the film/electrode interface as well as on bulk effects.     

Preparation of PZT Thin Films by Liquid-Source MOCVD Using of Cyclohexane Solvent

Pb(Zr, Ti)O₃ thin films were grown on 8-inch Ir(111)/SiO₂/Si substrate by a MOCVD system aiming at application utilizing high-density ferroelectric memory (FRAM). Two types of solvents, THF and cyclohexane were used for liquid source delivery. It was found that the ferroelectric properties of the MOCVD-PZT films using cyclohexane solvent were better than them using THF solvent. By choosing cyclohexane as solvent, the MOCVD-PZT thin films showed strong ?111? preferred orientation and the Pt/PZT/Ir capacitors exhibited promising ferroelectric performances, for instance, large switching charge (Qsw) of 56.4 uC/cm².     

Advances in processing and properties of perovskite thin-films for FRAMs,DRAMs, and decoupling capacitors

Abstract

Highly oriented, dense, and crack-free ferroelectric and paraelectric thin-films on three inch diameter Pt/Ti/Si₃N₄/Si (100) substrates were obtained by polymeric sol-gel processing. Ferroelectric PZT thin-films were fabricated at temperatures as low as 550°C within 15 minutes by rapid thermal annealing. The films heat treated at 700°C for 5 minutes were single grain thick and exhibited P_r, P_sp, and E_c in the ranges of 29–32 μC/cm², 44–53 μC/cm², and 50–60 kV/cm, respectively, and high speed switching times below 5 ns on 30×30 μm² electrodes. A switching time of 2.7 ns was observed on 19×19 μm² area electrodes at a field of 200 kV/cm. Results of low and high field characterization on paraelectric PLT thin-films which were conventionally heat treated indicated that it has an excellent potential for use in ULSI DRAMs and as decoupling capacitors. These films showed a high charge storage density (15 μC/cm²) and a low leakage current (0.5 μA/cm²) at a field of 200 kV/cm. Also, the charging time for a capacitor area of 1 μm² at 200 kV/cm was estimated to be 0.10 ns.     

Characterization of conduction in PZT thin films produced by laser ablation deposition

Abstract

Both direct current (d.c.) and alternating current (a.c.) conductivity measurements were undertaken on lead zirconate titanate (PZT) films synthesized by laser ablation deposition. Direct current (I) displayed an initial time dependence of the form I ∝ t^?γ (γ ∝ 0.5–1.0). The possible reasons for this time dependence are discussed. At lower temperatures, the a.c. electrical conductivity shows a frequency dependence of the form σ ∝ ω′ which is explained as electrical charge hopping. At higher temperatures, the d.c. component of electrical conductivity becomes dominant, and is accompanied by a strong low frequency dispersion of the dielectric constant. The results are compared to published data on conductivity in SrTiO₃, and discussed in terms of the latest theories for dielectric response of materials.     

Growth and characterization of epitaxial SrBi2Ta2O9 films on (110) SrTiO3 substrates

Abstract

SrBi₂Ta₂O₉ (SBT) is an attractive material for nonvolatile ferroelectric memory applications. In this paper we report on the deposition of highly epitaxial and smooth SrBi₂Ta₂O₉ films on (110) SrTiO₃substrates. The films were grown by pulsed laser deposition at temperatures ranging from 600 to 800°C and at various laser fluences from a Bi-excess SBT target. The background oxygen pressure was maintained at 28 Pa during the film deposition. Structural characterization of the films was performed by x-ray diffraction. Atomic force microscopy was used to investigate morphology and growth of the films. The films grew with preferred (115) or (116) orientation. The roughness was of the order of unit cell height. The films display a growth pattern resulting in corrugated film morphology.     

Electrical characterizations of MgTiO3 thin films grown on Si

Abstract

We have analyzed MgTiO₃ thin films grown on the Si substrate with/without SiO₂ using pulsed laser deposition (PLD). We find that MgTiO₃ thin films start to crystallize at 600°C, causing electrical instabilities in the MIS capacitors above this temperature. Detailed analysis by XRD technique reveals that structural differences of MgTiO₃ thin films were not obvious below 600°C, whereas the electrical characteristics changes as a function of deposition temperature and the presence of thermally grown SiO₂. We observe that the decrease of deposition temperature results in the increase of leakage current and anomalous positive charge (APC) density. These drawbacks were effectively suppressed by growing 100A SiO₂ layer on the Si substrate prior to the deposition of MgTiO₃ thin films.     

PROPERTIES OF FERROELECTRIC P(VDF-TrFE) 70/30 COPOLYMER FILMS AS A GATE DIELECTRIC

ABSTRACT

We directly formed the organic ferroelectric P(VDF-TrFE) 70/30 copolymer film by the spin coating for making the MFS structure in the silicon wafer. To understand the crystallization behavior of P(VDF-TrFE) 70/30 copolymer, the morphologies of copolymer thin films were studied by AFM and XRD. AFM studies revealed that as grown and annealed films showed surface roughness greater than amorphous films due to crystallization. The XRD spectrum of the films subjected to various annealing temperatures showed β -phase and this phase content was maximum at 140°C annealing. The capacitance shows hysteresis behavior like a buttery shape due to the polarization reversal in the film and this result indicates clearly that the film has a ferroelectric property. The dielectric constants of the P(VF₂-TrFE) copolymer films calculated from the capacitance at the two peak points of the C-V characteristics were about 8.7.     

Epitaxial La0.5Sr0.5CoO3 electrode films for ferroelectric device applications

Abstract

We have grown high quality La_0.5Sr_0.5CoO₃ thin films by Pulsed Laser Deposition. This material is a electrically conducting perovskite which can be used as structurally compatible electrodes for devices using ferroelectric materials such as Pb-La-Zr-Ti-O (PLZT). Oxygen stability was investigated under various annealing conditions. LSCO/PLZT/LSCO heterostructures were grown epitaxially on SrTiO₃ (STO) and MgO substrates. P-E hysteresis loop was observed with P_r = 20 μC/cm² and E_c = 24 kV/cm. Direct observation of the piezoelectric effect in PLZT was made by measuring the PLZT c-axis lattice constant under various electric fields. LSCO/STO superlattice was also grown by PLD. The superlattice showed excellent crystallinity with a Rutherford Backscattering (RBS) channeling minimum yield of only 3.6%.     

Pulsed Laser Deposition of Ba0.6Sr0.4TiO3 Thin Films and Their Optical Properties

ABSTRACT

Barium strontium titanate [Ba_0.6Sr_0.4TiO₃ or BST (60/40)] thin films were deposited on MgO (100) substrates using pulsed laser deposition. X-ray diffraction (XRD) measurements revealed that the BST thin films had epitaxially grown on the MgO (100) substrates. The surface morphology of the thin films was observed using an atomic force microscope and the grain size was found to be about 100–150 nm. The surface roughness was around 4.9 nm for a 250 nm thick film. The optical transmittance of the BST thin film was measured using a transmission mode ellipsometer. The BST/MgO configuration was highly transparent in the visible region. The optical band gap energy of the BST film, calculated by applying the Tauc relation, was 3.56 eV. Optical waveguide characteristics of the BST (60/40) thin film were determined using a prism coupler. The electro-optic (E-O) properties were measured at 632.8 nm wavelength using a phase modulation detection method. The BST film exhibited a predominately quadratic E-O behavior and the quadratic E-O coefficient was found to be 0.58 × 10^{? 17} m²/V².     

Chemical solution processing and properties of tungsten bronze (ba,la)nb2o6 thin films

Abstract

Highly oriented (Ba,La)Nb₂O₆ thin films have been synthesized by a chemical solution deposition method. A homogeneous and stable (Ba_0.75La_0.167)Nb₂O₆ (BLN) precursor solution was prepared by controlling the reaction of metal alkoxides. BLN precursor films crystallized in the tetragonal tungsten bronze phase at 700°C. BLN thin films on MgO(100) and Pt(100)/MgO(100) substrates showed the prominent c-axis preferred orientation. BLN thin films on Pt(100)/MgO(100) exhibited the diffuse phase transition depending upon the frequency.     

Effect of seed layer on electrical properties of Pb(Zr,Ti)O3 films grown by metalorganic chemical vapor deposition

Abstract

Pb(Zr_xTi_1?x)O₃ (PZT) ferroelectric thin films were prepared by metalorganic chemical vapor deposition (MOCVD) on Pt/Ti/SiO₂/Si substrate. Very thin PZT films, which were deposited at a lower temperature and post-annealed at higher temperature for crystallization, were used as a seed layer. PZT films grown on the seed layer exhibited superior characteristics in the crystalline structure and electrical properties, compared to those deposited without seed layer. Depending on the deposition conditions of PZT seed layer, a wide variation of surface morphology and stoichiometry was found between samples, whereas chemical composition was found to be very similar.     

Pulsed laser deposition (PLD) of oriented bismuth titanate films for integrated electronic applications

Abstract

In this paper we describe recent successes of growth of epitaxial bismuth titanate (BTO) films by pulsed laser deposition (PLD) suitable for electro-optic and electrical switching device structures, and fabrication of an improved gate structure for a ferroelectric memory FET (FEMFET). TEM and x-ray results indicate that excellent crystalline quality BTO films were achieved on LaAlO₃. Polarization switching was demonstrated for BTO capacitors with epitaxial superconducting YBa₂Cu₃O₇ as the lower electrode. Using an SiO₂ buffer layer, a BTO/Si structure was fabricated and direct charge modulation in the Si by polarization reversal in the BTO was demonstrated.     

Low-Temperature Process of Ferroelectric (Y0.95,Bi0.05)MnO3 Thin Films and Their Structural and Electrical Properties

[(Y_0.95,Bi_0.05)MnO₃] (YBM) films have been grown on Y₂O₃ buffered Si (001) by pulsed-laser deposition (PLD). We have compared the structural and dielectric properties of YBM films with those of typical YMnO₃ films from the viewpoint of lowering the process temperature. The highly c-axis oriented YBM film have been obtained on Y₂O₃/Si (001) at 700°C, which is a significantly reduced growth temperature from that of typical YMnO₃ films (850°C). The Bi modification was effective for the low temperature processing of YBM films. These highly c-axis oriented YBM films was obtained only at high ambient oxygen pressures, for example above 100 mTorr, contrary to YMnO₃ films which requires low ambient oxygen pressure for the growth of c-axis preferred orientation. The dielectric constant and dissipation factor was 29 and 0.017 at 1 MHz, respectively. The memory window due to ferroelectric polarization switching was found in a capacitance-voltage (C-V) characteristic. The YBM/Y₂O₃/Si structure with above characteristics of YBM films exhibited the C-V memory window of 1.2 V at a sweep voltage of 5 V. The flat-band voltage shifted symmetrically with increasing the sweep voltage up to 8 V due to little charge injection from Si. As a result, the memory window increased progressively with increasing the sweep voltage and amounted to 2 V at a sweep voltage of 8 V. The leakage current density was below 5 × 10^?7 A/cm² at a bias voltage of 8 V.     

(111)-Oriented BaTiO3 thin films hydrothermally formed on TiO2/Si substrate

Abstract

Barium titanate (BaTiO₃) thin films with high (111)-orientation were successfully grown on TiO₂-covered Si(111) substrate using hydrothermal method, where the TiO₂ layer was previously fabricated at room temperature by means of ion-beam-assisted deposition. This processing method provides a simple mild-chemical route for directly producing the analogous crystalline films on different substrates. The BaTiO₃ films did not reach the TiO₂/Si interface even if the hydrothermal treatment was prolonged to 24 hours. Both Rutherford backscattering and spread-resistance profiling characterizations confirmed the diffusion nature of the formed Ba-TiO₃/TiO₂/Si system.     

Enhancement of the surface and structural properties of ZnO epitaxial films grown on Al2O3 substrates utilizing annealed ZnO buffer layers

ZnO films were grown on Al₂O₃ (1000) substrates without and with ZnO buffer layers by using radio-frequency magnetron sputtering. Atomic force microscopy images showed that the surface roughness of the ZnO films grown on ZnO buffer layers annealed in a vacuum was decreased, indicative of an improvement in the ZnO surfaces. X-ray diffraction patterns showed that the crystallinity of the ZnO thin films was enhanced by using the annealed ZnO buffer layer in comparison with the film grown on without a buffer layer. The improvement of the surface and structural properties of the ZnO films might be attributed to the formation of the Zn-face ZnO buffers due to annealing in a vacuum. These results indicate that the surface and structural properties of ZnO films grown on Al₂O₃ substrates are improved by using ZnO buffer layers annealed in a vacuum.     

The Rutile Phase of TiO2/Graphene Films: Sol–Gel Method,Phase Transition,Photocatalytic Properties

Abstract

TiO₂ materials are of great interest in different applications because of the controllable preparation of different structures. In this paper, the TiO₂ and TiO₂/graphene films with different phase structure and inserted graphene layer between Cu substrate and TiO₂ film were prepared by sol–gel method at different annealing temperatures, and then used as catalysts for photo-degradation of methylene blue (MB) dye solution under ultraviolet irradiation using 15?W of ultraviolet lamp. The effects of annealing temperature and graphene layer on the phase structure, morphology, chemical composition, binding energy level, and photocatalytic performance of TiO₂ films were studied in details. XRD results reveal that the anatase phase of TiO₂ films transfers to rutile phase with the increase in annealing temperature, and the introducing of graphene film layer can accelerate the phase transformation of anatase to rutile and improve the crystallization quality of TiO₂ films. It is found that the MB degradation efficiency of TiO₂ and TiO₂/graphene films is enhanced with the increasing annealed temperature, which shows that the existence of rutile phase, well crystalline quality and the better dispersion of the TiO₂ particles are helpful in photocatalytic behavior. In addition, compared to the rutile phase TiO₂ film, the rutile phase TiO₂/graphene films at annealed temperatures of 900?°C exhibit much higher photocatalytic activity due to the introduction of graphene films.     

Ferroelectric effect in spin coated Ba0.9Sr0.1TiO3 thin films

Abstract

The achievement of excellent growth of lead zirconium titanate (PZT) films by various techniques for use as ferroelectric memories has generated an extensive research interest in the synthesis of various other perovskite and layered oxides. Ba_xSr_1?xTiO₃ thin films have also been deposited by various methods to study their dielectric behavior. We report the synthesis of Ba_xSr_1?xTiO₃ (where x ' 0.9, 0.1) by a solution method using hydroxides, acetates, and nitrate salts as precursors for barium and strontium, and titanium isopropoxide for titanium. The films deposited by spin coating on ITO coated glass substrates showed ferroelectric behavior.