YBa2Cu3O7-x/SrTiO3//LaAlO3 heterostructures obtained by injection MOCVD

Abstract

YBa₂Cu₃O_7-x /Ba_xSr_1-xTiO₃ /LaAlO₃ heterostructures can be used as a basis for devices with voltage control in microwave circuits.

Ba_xSr_1-xTiO₃ (x=0–0.1) (BST) thin films have been epitaxially grown on LaAlO₃ substrates using injection MOCVD. The excellent crystalline quality of the obtained BST films can be proven by a FWHM of <0,2° for the rocking curve of the (002) BST reflection. An AFM study revealed flat surfaces, showing a surface roughness R_s as low as 1nm. YBa₂Cu₃O_7-x/Ba_xSr_1-x TiO₃//LaAlO₃ heterostructures were than optimised. The YBa₂Cu₃O_7-x (YBCO) layers obtained on Ba_xSr_1-xTiO₃ films are epitaxial with a FWHM of 0.45° for the (005) YBCO rocking curve and display very promising superconducting properties of T_c=92K.

Finally the microwave properties of the superconducting films were studied. For YBa₂Cu₃O_7-x layers directly deposited on LaAlO₃, surface resistance values of 0,32mΩ were obtained, while for YBa₂Cu₃O_7-x /SrTiO₃//LaAlO₃ heterostructures, higher values of 1mΩ at 8.5GHz were measured.     

Thin film BaxSr1-xTiO3 ku- and k-band phase shifters grown on MgO substrates

Abstract

We report measurements of gold circuits fabricated on four Ba_xSr_1-xTiO₃ ferroelectric films doped with 1% Mn grown on MgO substrates by laser ablation. Low frequency (1 MHz) measurements of σ_T and tanδ on interdigital capacitors are compared with high frequency measurements of phase shift and insertion loss on coupled microstrip phase shifters patterned onto the same films. The variation in temperature of both high and low frequency device parameters is compared. Annealed with amorphous buffer layer and unannealed films are compared. Room temperature figures of merit of phase shift per insertion loss of up to 58.4°/dB at 18 GHz and 400 V dc bias were measured.     

MOCVD of (Ba,Sr)TiO3: Nucleation and Growth

(Ba_0.7Sr_0.3)TiO₃ and SrTiO₃ thin films were deposited on Pt electrodes in a planetary multi-wafer MOCVD reactor. The nucleation behavior and the size of the stable nuclei were investigated by different SPM techniques. Characteristic differences were observed for different deposition temperatures, i.e. a homogeneous nucleation of small BST grains on the larger Pt grains at 565°C and a dominating nucleation at the grain boundaries at 655°C. The micro structural evolution after further film growth was investigated by HRTEM and revealed randomly oriented grains (typical inplane size 10–20 nm) with a high density of twins at 565°C and (100)-oriented defect free grains of only slightly increased size at 655°C. For SrTiO₃ the inplane grain size was increased, however, the (100) texture was less perfect. As the electrical properties like permittivity and also leakage current depend on film thickness the final discussions of the electrical properties are based on thickness series (5 nm–100 nm films) and evaluated within the phenomenological dead layer model.     

Preparation of (PbxBa1-x)TiO3 thin films by MOCVD using an aerosol-assisted liquid delivery system

Abstract

Thin films of PbTiO₃, BaTiO₃ and (Pb_xBa_1-x)TiO₃ (PBT) have been prepared by metal-organic chemical vapor deposition using a horizontal reactor with an aerosol-assisted liquid delivery system. Structural and electrical properties have been investigated as a function of the lead content x. First results on PBT thin films grown on platinized silicon substrates show, for x < 0.8, an increasing tetragonal distortion of the lattice cell (c/a >1), and accompanying ferroelectric behavior which is similar to the bulk material. For smaller lead content (x < 0.8) no ferroelectric behavior is established and a small tetragonal distortion of opposite type (c/a <1) is observed. This distortion is attributed to a thermally induced tensile film stress and may be responsible for the suppression of the ferroelectric phase transition.     

Effects of oxidants on the deposition and dielectric properties of the SrTiO3 thin films prepared by liquid source metal-organic chemical vapor deposition (MOCVD)

Abstract

SrTiO₃ thin films are deposited by a liquid source metal-organic chemical vapor deposition (MOCVD). The effects of oxidants on the deposition characteristics and dielectric properties of the films are mainly tested. O₂, N₂O and O₂ + N₂O gases are used as the oxidants and the films with Ti-rich and Sr-rich compositions are obtained when O₂ and N₂O is used, respectively. Deposition of thin initial layer under O₂ atmosphere is very effective to obtain large dielectric constant of the SrTiO₃ thin film when the main layer is deposited under O₂ + N₂O atmosphere. The dielectric constants of 40 nm thick SrTiO₃ films with thin O₂, N₂O initial layers and without the initial layers are 235, 145 and 210, respectively.     

Microwave Tunable Properties of Ni-Doped (Ba0.5Sr0.5)TiO3 Thin Films Grown by Pulsed Laser Deposition

(Ba_0.5Sr_0.5)TiO₃ (BST) thin films were deposited by pulsed laser deposition (PLD) and investigated as a function of Ni dopant concentration in low and high frequency regions. In low frequency region (<10 MHz), the Ni-dopant concentration in BST films has a strong influence on the material properties including dielectric and tunable properties. Ni-doped (≤3 mol%) BST films showed denser, smoother morphologies and smaller grain sizes than those with 6 and 12 mol% Ni. Dielectric constant and loss of 3 mol% Ni-doped BST films were about 980 and 0.3%, respectively. In addition, tunability and figure of merit of 3 mol% doped BST films showed maximum values of approximately 39% and 108, respectively. In high frequency region (>1 GHz), the frequency tunability range at center frequency of undoped BST and 3 mol% Ni-doped BST coplanar waveguide (CPW) resonators showed 102 and 152 MHz, respectively at 30 V dc bias. The Ni-doped BST thin films are possible in applications of microwave tunable capacitors.     

Thick film fabrication of ferroelectric phase shifter materials

Abstract

Various composites of BSTO combined with other nonelectrically active oxide ceramics have been formulated. In general, the composites have adjustable electronic properties which can be tailored for use in phased array antennas and other phase shifting devices. The dielectric constant and the loss tangents have been reduced to enhance the overall impedance matching and thereby lowering the insertion loss of the device. In addition, the overall tunability, the change in the dielectric constant with applied voltage, is maintained at a sufficiently high level. The thickness limitation of the bulk materials is around 3–4 mils which can be used up to approximately 15 GHz. In order to increase the operating frequencies of the phase shifters, thick films were fabricated using non-aqueous tape-casting. The tapes were electrically characterized and compared to bulk ceramics. Also, laminated stacks of high dielectric constant and low dielectric constant alternating layers were fabricated.     

Epitaxial behavior and interface structures of BSTO thin films

Abstract

Ferroelectric Ba_(1-x)Sr_xTiO₃ (x = 0.5 and 0.25) thin films were grown on (001) LaAlO₃ by using pulsed laser ablation. Extensive x-ray diffraction and selected area electron diffraction reveal that the as-grown films were (001) oriented with a good in plane relationship of <100>_BSTO // <100>_LAO. Rutherford Backscattering Spectroscopy ion-channeling studies suggested that the films had excellent epitaxial quality and crystallinity with an ion beam minimum yield χ_min of only 2.6%. Atomically sharp interfaces were seen by cross-sectional high-resolution electron microscopy, indicated that the density of misfit dislocations was consistent with the lattice mismatch from the theoretical calculation.     

Defect Chemistry of Y Doped BaTiO3

Defect chemistry of Y doped BaTiO₃ was investigated as a function of the Ba/Ti ratio. When the Ba/Ti ratio was greater than unity, Y^{3 +} was substituted for the normal Ti site and the equilibrium conductivity showed a strong evidence of acceptor-doped behavior. With the Ba/Ti ratio < 1, Y^{3 +} was substituted for the Ba site and the equilibrium conductivity showed donor-doped behavior. In the case excess Y₂O₃ was added to the stoichiometric BaTiO₃(Ba/Ti = 1), the conductivity profile showed a donor-doped behavior at low concentrations (< 1.0 mol%), whereas, at higher donor levels (> 2.0 mol%), the equilibrium conductivity minimum shifted toward lower Po₂, indicating acceptor doped behavior.     

Dielectric properties of ferroelectric (Ba0.6Sr0.4)TiO3 thick films prepared by tape-casting

Thick BST films have been fabricated by a tape casting and firing method. Dielectric constants of BST films are changed from 5700 to 7000 at 1 MHz after focused beam annealing. Furthermore, surface morphologies and depth profile of chemistry have been altered after annealing. Especially, Sr atoms diffuse out to the surface, while Ba atoms diffuse into the center. The possibility of the surface alteration of the thick films have been clearly demonstrated in this study, which may applied for the integration of ferroelectrics and other dielectrics and/or conductors for low cost microwave tunable devices.     

Effects of molten salt synthesis (MSS) parameters on the morphology of Sr3Ti2O7 and SrTiO3 seed crystals

A two-step molten salt synthesis process was utilized to fabricate Sr₃Ti₂O₇ and SrTiO_3. High aspect ratio SrTiO₃ seed crystals were developed by optimizing processing conditions such as temperature, salt-to-oxide ratio, and flux type in a systematic fashion. Sr₃Ti₂O₇ seeds were synthesized at temperatures ranging from 1050–1350°C, using salt-to-oxide ratios of 3:1, 1:1, and 1:3, and various salt types, including NaCl, KCl, and a 1:1 combination of NaCl and KCl. Sr₃Ti₂O₇ seeds synthesized at 1250°C with a 1:1 salt-to-oxide ratio in 100% NaCl salt resulted in a majority of higher aspect ratio platelets and elongated platelets as opposed to lower aspect ratio cubic-like and tetragonal-like morphologies. The seeds were 10–40 μm in length with aspect ratios of highly elongated platelets as high as 25:1. A second MSS step was used to synthesize SrTiO₃ seeds of the proper composition by TiO₂ addition to the Sr₃Ti₂O₇ seeds and heat treatment at 1100°C. These studies showed that highly anisotropic SrTiO₃ seeds could be produced at 1250°C using a 1:1 salt-to-oxide ratio in 100% NaCl flux. XRD studies of the resulting SrTiO₃ seeds revealed that the increase in aspect ratio for these particular seeds also resulted in the enhancement of (200) peaks, which are of major interest for texturing of PMN-PT.     

Influence of Post-Annealing on the Characteristics of Pb(Zr,Ti)O3 Thin Films Deposited by Liquid Delivery MOCVD Using a Cocktail Solution

Ferroelectric PZT thin films were deposited by liquid delivery MOCVD using a cocktail solution. The cocktail solution consisted of Pb(METHD)₂, Zr(METHD)₄ and Ti(MPD)(METHD)₂ diluted with ethylcyclohexane. The films deposited on Pt/Ti/SiO₂/Si at a substrate temperature of 500°C consisted of PZT, PbO and PbPt_x, and showed poor properties. However, after annealing at 450°C in air for thirty minutes, the PbPt_x phase disappeared while the volume of the PbO phase increased. The hysteresis properties were also improved by annealing at 450°C. After annealing at 600°C in air for thirty minutes, the PbPt_x and the PbO phases disappeared perfectly and the PZT thin films showed good hysteresis properties with the remanent polarization of 30 μC/cm² and the coercive field of 88 kV/cm.     

Modification on PTCR behavior of (Sr0.2Ba0.8)TiO3 materials by post-heat treatment after microwave sintering

Abstract

Effect of post-sintering treatment on PTCR behavior of (Sr_0.2Ba_0.8)TiO₃ materials prepared by microwave-sintering (ms) process was compared to that prepared by rapid thermal sintering (RTS) process. The microwave-sintering process needed only 1130°C-40 min to effectively densify (Sr_0.2Ba_0.8)TiO₃ materials. The grain size was around 6 μm and PTCR characteristics was around ρ_max/ρ_min≈ 10^1.75, with T_c = 50°C. Lowering the cooling rate after sintering substantially increases the resistivity jump (ρ_max/ρ_min) from 10² to 10^3.4, without altering the microstructure. The annealing at 1250°C for 2 h markedly increased the resistivity jump to (ρ_max/ρ_min)≈10⁶. On the other hand, the rapid thermal sintering (RTS) process required 1320°C-30 min to fully develop the good microstructure (～15 μm) and PTCR property (ρ_max/ρ_min ～ 10^3.0). Post-sintering process, including cooling rate control and annealing, did not improve the electrical properties of these samples, that is ascribed to the slow-cooling rate characteristics of RTS-process for a temperature lower than 800°C.     

Characterization of Pb(Zr,Ti)O3 thin films on SOI prepared by excimer laser deposition

Abstract

Ferroelectric Pb(Zr,Ti)O₃ (PZT) thin films were prepared by pulsed excimer laser deposition on Silicon-on-Insulator (SOI) substrates with and without an electrode. Their properties can be improved by rapid thermal annealing, based on the structural and interfacial characteristics analysis by X-ray diffraction, Rutherford backscattering spectroscopy and automatic spreading resistance measurements. The thin films were revealed of to be polycrystalline perovskite structure with mainly ?100? and ?110? orientations; the crystallite size and the structure are dependent on the annealing time. The PZT thin films did not interact with the top silicon layers of SOI, and the composition was on the tetragonal side of the morphotropic phase boundary in the PbTiO₃-PbZrO₃ phase diagram.     

MOCVD of Pb(Zr x Ti1-x )O3 thin films on MgTiO3/Si substrates and their electrical properties

Abstract

Pb(Zh _x , Ti_1-x )O₃(PZT) thin films were deposited on Si substrates using MgTiO₃ as the buffer layer and the electrical properties of those MFIS structures were investigated. PZT and MgTiO₃ films were made by MOCVD using ultrasonic spraying technique. Perovskite PZT films have been succesfully made at the substrate temperature of 550 to 600°C only when using MgTiO₃ buffer layer. AES depth profile analysis and RBS analysis revealed that there is no remarkable interdiffusion and no formation of reaction layer between PZT and MgTiO₃ and/or between MgTiO₃ and Si substrate. The capacitance-voltage (C-V) curves of the MFIS structure which were made with PZT and MgTiO₃buffer layer have shown the hysteresis resulted from the ferroelectric switching of the PZT films.     

Microwave Dielectric Properties of (111) Oriented Ferroelectric (Ba1 − xSrx)TiO3 Thin Films

Epitaxial (111) oriented ferroelectric (Ba_{1 ? x}Sr_x)TiO₃ (BST) films were deposited on MgO (111) single crystals using pulsed laser deposition. Structural properties of BST films were investigated using X-ray diffractometer. The dielectric properties of BST films were investigated under the dc bias field of 0–40 V using interdigital capacitors (IDT) fabricated by photolithography and etching process. The small signal dielectric properties of BST films were calculated by modified conformal mapping both the measured data using an impedance gain/phase analyzer and the reflection coefficient data measured using a HP 8510C vector network analyzer in 0.05–10 GHz at room temperature. The IDT capacitor based on (111) oriented BST film exhibits about 40% of capacitance change with an dc bias of 40 V which value is somewhat smaller than that of the IDT device based on (001) oriented BST film. But the dielectric quality factor value is about twice that of the device based on (001) oriented BST film.     

Dielectric Properties of Homoepitaxial SrTiO3SrTiO3SrTiO3 Thin Films Grown in the Step-Flow Mode

We have deposited SrTiO₃ thin films on Nb-doped SrTiO₃ substrates by pulsed laser deposition at temperatures of up to 1400°C. Reflection high energy electron diffraction was used to monitor the film growth mode at various temperatures and it was shown that growth proceeded in the step-flow mode at above 900°C. Capacitors were formed by evaporating platinum pads on the film surface and gold pads on the substrate. Films grown in the step-flow mode showed consistently higher dielectric constants below 200 K than films grown in the layer-by-layer mode. Films with the highest dielectric constant () were obtained using a stoichiometric ablation target at an oxygen pressure of 10SrTiO₃ ^–6SrTiO₃ Torr.     

Electrical Properties of Acceptor Doped BaTiO3

Electrical properties of acceptor (Mn, Mg or Mn+Mg)-doped BaTiO₃ ceramic have been studied in terms of oxygen vacancy concentration, various doping levels and electrical degradation behaviors. The solubility limit of Mn on Ti sites was confirmed to be close to or less than 1.0 mol%. Oxygen vacancy concentration of Ba(Ti_{0.995 –x}Mg_0.005Mn_x)O_{2.995 –y} (x = 0, 0.005, 0.01) was estimated to be 50 times greater than that of the un-doped BaTiO₃. The leakage current of 0.5 mol% Mn-doped BaTiO₃ was stable with time, which was much lower than that of the un-doped BaTiO₃. The BaTiO₃ specimen co-doped with 0.5 mol% Mg and 1.0 mol% Mn showed the lowest leakage current below 10^{– 10}A. It was confirmed that leakage currents of Mg-doped and un-doped BaTiO₃ under dc field are effectively suppressed by Mn co-doping as long as the Mn doping level is greater than Mg contents.     

Growth and characterization of epitaxial SrBi2Ta2O9 films on (110) SrTiO3 substrates

Abstract

SrBi₂Ta₂O₉ (SBT) is an attractive material for nonvolatile ferroelectric memory applications. In this paper we report on the deposition of highly epitaxial and smooth SrBi₂Ta₂O₉ films on (110) SrTiO₃substrates. The films were grown by pulsed laser deposition at temperatures ranging from 600 to 800°C and at various laser fluences from a Bi-excess SBT target. The background oxygen pressure was maintained at 28 Pa during the film deposition. Structural characterization of the films was performed by x-ray diffraction. Atomic force microscopy was used to investigate morphology and growth of the films. The films grew with preferred (115) or (116) orientation. The roughness was of the order of unit cell height. The films display a growth pattern resulting in corrugated film morphology.     

Composition measurement of paraelectric SrTiO3 layer

Abstract

Since composition is an important parameter affecting the dielectric properties in paraelectric SrTiO₃ layers, composition is determined by Rutherford backscattering spectrometry (RBS) measurement. In this measurement, specifically for achieving precise composition measurement, the RBS spectra of Sr, Ti and O must be separated individually. This spectrum separation can only be attained when thin (800 A[ddot] thick) Sr_xTiO_y layers are deposited on graphite substrate. The measurement is performed for layers deposited at different O₂ partial pressure ratios and sputtering pressures. This measurement indicates that composition of O, y, in Sr_xTiO_y layer decreases from 3.7 to 2.7 with the decrease of O₂ partial pressure raito, R(=O₂/O₂ + Ar) from 1.0 to 0.83. Composition of Sr, x, also changes from 1.1 to 0.6 with this change. With the decrease of sputtering pressure from 10 to 5 mTorr, however, composition, y, is held at 2.7 and only the composition, x, increases from 0.6 to 1.1. This composition measurement is useful for the deposition of optimized dielectric layer employed in the charge storage capacitor.