Contribution of dielectric and metallic losses in RF/microwave tunable varactors using (Ba,Sr)TiO3 thin films

Abstract

Recently, there has been significant interest in use of (Ba,Sr)TiO₃ (BST) thin films for tunable high frequency (RF and microwave) components. In a previous work we have shown that BST thin films grown by metalorganic chemical vapor deposition (MOCVD) exhibit films very low losses (as low as 0.003–0.004) and tunabilities over 50% at low operation voltages.

In order to integrate BST thin films in tunable devices, the objectives of this work are : (i) study the effect of bottom and top electrode on the performance of thin film based capacitors, (ii) correlate low frequency (10 kHz) and high frequency (45 MHz - 1 GHz) measurements, (iii) separate the contribution of dielectric losses and metallic losses at both low and high frequency and finally (iv) show the potential usefulness of series capacitors structures.     

Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors

Abstract

We propose Ir thin films as new electrode materials for high dielectric BST capacitors. Ir was found to be superior to Pt in a number of aspects such as resistivity, adhesion and surface roughness. The Pt/BST/Ir/SiO₂/Si capacitors showed leakage currents as low as Pt/BST/Pt/SiO₂/Si ones, but higher capacitance resulted. For endurance properties with +5V unipolar pulse trains, the dielectric constant of BST films on Ir decreased by only 10% below its initial value after switching of 10⁹ cycles while that on Pt degraded by 30% after 10⁸ cycles. Ir bottom electrode effects on BST film properties were well explained by the formation of IrO₂ phases on the surface of Ir electrodes.     

Characterization of Ni/Ce Co-Doped BST Thin Film Grown on LSCO/Pt Electrodes Prepared by Pulsed Laser Deposition

Perovskite (Ba_0.6Sr_0.4)TiO₃ (BST) thin films doped with Ni, Ce and Ni/Ce codopants were prepared on LSCO/Pt/SiO₂/Si substrates by pulsed laser deposition method. In this study, La_0.5Sr_0.5CoO₃ (LSCO) bottom electrodes were used to improve the crystallinity and dielectric properties of BST films. Single ion doped(1 mol%Ni doped,1 mol%Ce doped) BST films showed more improved crystallinity, smoother surface, and smaller grain size than that with 1 mol%Ni/1 mol%Ce. The dielectric constant and loss of Ni/Ce co-doped BST films were about 298 and 1.8%, respectively. In addition, tunability and figure of merit of co-doped BST films showed minimum values of approximately 9.3% and 5, respectively. With 1% Ni-doped BST thin films, results gave a tunability of 54.2% and a loss tangent of 1.8% while a figure of merit was 30. Correlation of the material properties with dielectric and tunable properties suggests the 1 mol%Ni-doped BST films are effective potential candidate for tunable device applications.     

Microwave Characterization of BST Thin Films on LAO Interdigital Capacitor

The dielectric properties of (Ba_0.5Sr_0.5)TiO₃ (BST) thin films on LaAlO₃ (LAO) single crystals were studied over a wide frequency range. The samples with interdigital electrodes were prepared by microelectronic processing. The dielectric characterizations were carried out in the following steps: 1) the standard calibration of the instrument, 2) the removal of parasitic capacitance and the extraction of the capacitance of the interdigital capacitor (IDC) and 3) the extraction of the dielectric permittivity (?) of BST. It was found that ? of BST has a constant value (about 400) from 50 MHz to 2 GHz; at higher frequencies, ? gradually decreases. The BST interdigital capacitors exhibited good dielectric tunability.     

Tunable Voltage-Controlled Oscillator (VCO) with High Dielectric Constant BCTZ Capacitors

This paper presents a voltage-controlled oscillator (VCO) where the resonant circuit consists of a high dielectric constant Ba_0.96Ca_0.04Ti_0.84Zr_0.16O₃ (BCTZ) tunable capacitor and an inductor. The tunable capacitors are fabricated by spin-on MOD on SiO₂/Si substrate with titanium/platinum as the bottom electrode and platinum as the top electrode. The tunability of the capacitors annealed at a temperature 800°C to 900°C is 35% for an applied voltage of ±3 volts. Low frequency VCOs built with discrete bipolar junction transistors (BJTs), MOSFETs, inductors and high dielectric tunable capacitors shows a frequency tuning range from 2.52 MHz to 2.32 MHz for an applied tuning voltage of ?3 V to 0 V and for a power supply voltage of +3 V.     

Microwave Tunable Properties of Ni-Doped (Ba0.5Sr0.5)TiO3 Thin Films Grown by Pulsed Laser Deposition

(Ba_0.5Sr_0.5)TiO₃ (BST) thin films were deposited by pulsed laser deposition (PLD) and investigated as a function of Ni dopant concentration in low and high frequency regions. In low frequency region (<10 MHz), the Ni-dopant concentration in BST films has a strong influence on the material properties including dielectric and tunable properties. Ni-doped (≤3 mol%) BST films showed denser, smoother morphologies and smaller grain sizes than those with 6 and 12 mol% Ni. Dielectric constant and loss of 3 mol% Ni-doped BST films were about 980 and 0.3%, respectively. In addition, tunability and figure of merit of 3 mol% doped BST films showed maximum values of approximately 39% and 108, respectively. In high frequency region (>1 GHz), the frequency tunability range at center frequency of undoped BST and 3 mol% Ni-doped BST coplanar waveguide (CPW) resonators showed 102 and 152 MHz, respectively at 30 V dc bias. The Ni-doped BST thin films are possible in applications of microwave tunable capacitors.     

Influence of Y and Mn alternately doped order on the microstructures and dielectric properties of Ba0.6Sr0.4TiO3 films

ABSTRACT

The influences of Y and Mn alternately doped order on the microstructures and dielectric properties of the Ba_0.6Sr_0.4TiO₃ (BST) films were reported in this paper. The Y and Mn alternately doped BST films were designed as YBST/MnBST/… and MnBST/YBST…multilayer films orderly expressed as (Y/Mn)_M and (Mn/Y)_M for short, and prepared on Pt/Ti/SiO₂/Si wafers by an improved sol-gel method, where Y and Mn represent yttrium doped BST layer and manganese doped BST layer, and M is cycle unit, respectively. The microstructures of the alternately doped BST films were observed by SEM and the capacitance-voltage curves at 100 kHz or 1 MHz were measured by a HP4284A LCR meter and the dielectric properties in the range of 1GHz were measured by an E4991A impedance analyzer. Compared to Y or Mn doped multilayer BST film, (Y/Mn)_M and (Mn/Y)_M show higher dielectric tunability and lower dielectric loss with higher dielectric constant. Moreover, (Y/Mn)_M show better dielectric properties than (Mn/Y)_M because (Y/Mn)_M show granular microstructures independent of M, while the (Mn/Y)_M show granular microstructures when M is 2 and add to a surface layer of columnar microstructures on the granular microstructures when M is 4. The related mechanisms were obtained in terms of the XRD phase structures, the cross-sectional SEM microstructures and the AFM morphologies.     

Structure and dielectric properties of Ca-doped (Ba0.7Sr0.3) TiO3 thin films fabricated by sol–gel method

A wide range of Ca-doped (Ba_0.7Sr_0.3)TiO₃ (BST) thin films (from 0 to 20 mol%) have been prepared on Pt/Ti/SiO₂/Si (100) substrates by sol–gel technique. The structural and dielectric properties of BST thin films were investigated as a function of Ca dopant concentration. The results showed that the microstructure and dielectric properties of the BST films were strongly dependent on the Ca contents. With the Ca dopant concentration increasing, the grain size, dielectric constant and dielectric loss of the BST thin films decreased. As the content of Ca dopant reaches 10 mol%, the dielectric constant, dielectric loss, tunability, the value of FOM and the leakage current density are 281, 0.0136, 16.7%, 12.3 and 5.5?×?10^?6 A/cm², respectively.     

Preparation of BST thin films on Pt electrode on Si wafer with down-flow LSMCVD reactor

Abstract

A novel type of down-flow LSMCVD (Liquid Source Mist CVD) reactor was developed to prepare a high dielectric BST thin film on Pt electrode on Si wafer. Barium acetate [Ba (OOCCH₃)₂], strontium acetate [Sr (OOCCH₃)₂], and titanium isoproxide [Ti (OC₃H₇ ⁱ )₄] were used as metal sources. Metal sources were dissolved in acetic acid, 1-butanol, or 2-methoxyethanol. BST [Ba/(Ba + Sr) = 0.7] film annealed on Pt/Ti/SiO₂/Si above 650°C was polycrystalline. BST film has a (110) preferred orientation with increasing temperature. Surface roughness of BST film and grain size increased with increasing temperature. The metal-oxygen bond was formed at 650°C as shown in the spectra of FTIR. The depth profiles of elements of BST thin films indicated a uniform composition throughout the film. BST films annealed at 750°C showed a dielectric constant and a tanδ of 390 (thickness: 150 nm) and 0.06 at a frequency of 100 kHz, respectively. The behavior of capacitance of the BST film with bias voltage showed paraelectric property. BST film annealed at 750°C had the leakage current density of 3.2 (μA/cm²) at a bias voltage of 2V.     

Microstructural and Electrical Properties of (Ba x Sr 1 − x )Ti 1 + y O 3 + z Thin Films Prepared by RF Magnetron Sputtering

The electrical and microstructural properties of (Ba x Sr 1 m x )Ti 1+y O 3+z (BST) thin films prepared by RF magnetron sputtering were investigated as a function of deposition temperature over the range of 100 C to 650 C. Films deposited above approximately 350 C on Pt/TiO 2 /SiO 2 /Si substrates were polycrystalline with relative permittivites of 100 nm thick BST thin films varying from 100 at 350 C to 600 at 650 C. For deposition temperatures below approximately 350 C, the electrical properties were strongly influenced by the presence of a less crystalline BST layer. Films deposited at 250 C were comprised of a multilayer polycrystalline/less crystalline BST structure. The less crystalline BST layer strongly affected both measured dielectric permittivity and leakage properties. Leakage characteristics of Pt/BST(250C)/Pt capacitors exhibited a power law dependence on voltage or an exponential dependence on square root of the applied voltage depending on whether the top Pt electrode adjacent ot the polycrystalline BST layer was biased at a high or low electric potential, respectively. Mechanisms for the observed leakage behavior are discussed.     

MOCVD (BaxSr1−x)Ti1+yO3+z (BST) thin films for high frequency tunable devices

Abstract

We have investigated the structural and electrical characteristics of (Ba_xSr_1?x)Ti_1+yO_3+z (BST) thin films synthesized at 650°C on Pt/SiO₂/Si substrates using a large area, vertical metalorganic chemical vapor deposition (MOCVD) reactor equipped with a liquid delivery system. Films with a Ba/Sr ratio of 70/30 were studied, as determined using X-ray fluorescence spectroscopy (XRF) and Rutherford backscattering spectrometry (RBS). A substantial reduction of the dielectric loss was achieved when annealing the entire capacitor structure in air at 700°C. Dielectric tunability as high as 2.3:1 was measured for BST capacitors with the currently optimized processing conditions.     

High quality BaxSr1-xTiO3 films grown by mocld and novel ferroelectric/ferrite structures for dual-tuning microwave devices

Abstract

Excellent single crystal Ba_xSr_1-xTiO₃ (BST) films were grown on LaAlO₃ substrates using the metal-organic chemical liquid deposition (MOCLD) method. Very low losses (tanδ ∽0.002-0.008) were measured from these films at 400 KHz. Biaxially oriented BST films were successfully grown on polycrystalline YIG substrates using both MOCLD and pulsed laser deposition methods with biaxially oriented MgO and YSZ buffer layers. The dielectric losses of the films range from 0.005 to 0.015 while 25% of dielectric constant change was observed with 40V bias voltage up to 10 MHz. Both the dissipation and dielectric constant of the films remained nearly constants over a wide temperature range (77 K to 380 K). A dual-tuning microwave coplanar phase shifter using a BST film grown on a MgO buffered polycrystalline YIG substrate was fabricated. A significant phase shift was observed in GHz frequency range when an electric bias or a magnetic field was applied to the device.     

Synthesis and characterization of (BaxSr1−x)Ti1+yO3+z thin films and integration into microwave varactors and phase shifters

Abstract

Precise control of composition and microstructure is critical for the production of (Ba_xSr_1?x)Ti_1+yO_3+z (BST) dielectric thin films with the large dependence of permittivity on electric field, low losses, and high electrical breakdown fields that are required for successful integration of BST into tunable high frequency devices. Here we review recent results on composition-microstructure-electrical property relationships of polycrystalline BST films produced by magnetron sputter deposition, that are appropriate for microwave devices such as phase shifters. Films with controlled compositions were grown from a stoichiometric Ba_0.5Sr_0.5TiO₃ target by control of the background processing gas pressure. It was determined that the (Ba+Sr)/Ti ratios of these BST films could be adjusted from 0.73 to 0.98 by changing the total (Ar+O₂) process pressure, while the O₂/Ar ratio did not strongly affect the metal ion composition. Film crystalline structure and dielectric properties as a function of the (Ba+Sr)/Ti ratio are discussed. Optimized BST layers yielded capacitors with low dielectric losses (0.0047), among the best reported for sputtered BST, while still maintaining tunabili-ties suitable for device applications. These BST films were used to produce distributed-cir-cuit phase-shifters, using a discrete periodic loading of a coplanar waveguide with integrated BST varactors on high-resistivity silicon. Phase shifters yielding 30 degrees of phase shift per dB of insertion loss were demonstrated at 20GHz.     

Structure and electrical properties of Ba0.67 Sr0.33TiO3 thin film fabricated by sol-gel based composite technique

A sol-gel based novel technique is used to fabricate Ba_0.67Sr_0.33TiO₃ (BST) thin films with thickness up to several microns. In this technique, surface-modified fine BST particles are dispersed in a sol-gel precursor solution. The pH value of the precursor solution is modified to achieve high zeta potential for the dispersed powder, hence a very stable and uniform slurry can be produced. The slurry is then spin-coated onto Pt/Ti/SiO₂/Si substrate, pre-heated and annealed as in conventional sol-gel process. The resulting films show well-developed dense polycrystalline structure with uniform grain distribution. The metal-BST-metal structure of the films displays good dielectric properties.     

Alternative choices for voltage-tunable dielectrics

Abstract

Barium strontium titanate (BST) has been exhaustively studied as a voltage tunable dielectric to the apparent exclusion of other materials. Since undoped BST shows dielectric losses which are higher than desirable, it is reasonable to seek alternative materials with characteristically lower losses. In this paper alternative dielectrics are introduced and compared with BST for their use in frequency-agile applications. Data are presented (capacitance and loss tangent as a function of field) for lead magnesium niobate and cadmium niobate materials which suggest that these dielectrics can be used to provide satisfactory levels of voltage tunability whilst at the same time exhibiting lower dielectric losses than BST.     

EFFECTS OF PZT BUFFER LAYERS ON PZFNT FERROELECTRIC THIN FILMS

ABSTRACT

PZFNT thin films were fabricated on 5-inch Pt/Ti/SiO₂/Si and PZT/Pt/Ti/SiO₂/Si substrates by RF magnetron sputtering method and rapid thermal annealing process. By investigating the two thin films at various annealing temperatures, the results show that the annealing temperature of PZFNT thin films without PZT buffer layers is about 730°C, which is higher than that of PZFNT films with PZT buffer layers. By use of PZT buffer layers, the annealing temperature of PZFNT films is decreased greatly, and the dielectric and ferroelectric properties are improved. In the optimum process, the thin films with PZT buffer layers have a dielectric constant of 1199 and dielectric loss of 3.0% at 1 KHz. The remanent polarization and coercive field of the thin films are 21.1 μC/cm² and 53.5 KV/cm respectively. The films have the significant potential for FRAM and pyroelectric infrared detectors.     

Planar and Parallel Dielectric Properties of Compositionally Graded (Ba,Sr)TiO3 Thin Films for Tunable Microwave Applications

Compositionally graded (Ba_x,Sr_{1 ? x})TiO₃ [BST] ferroelectric thin films have been received much attention in graded ferroelectric devices due to their unique properties, such as large pyroelectric coefficients, large polarization offset and small temperature coefficient of dielectric constant for microwave tunable devices. Compositionally graded BST thin films were deposited epitaxially on LaAlO₃ [LAO] and Nb-doped SrTiO₃ [STO:Nb] substrates by pulsed laser deposition. The planar and parallel dielectric properties of compositionally graded BST epitaxial thin films ware investigated in the frequency ranges of 100 Hz ～ 1 MHz as a function of the direction of the composition gradient with respect to the substrate at room temperature. The dielectric properties of the graded BST films depended strongly on the direction of the composition gradient with respect to the substrate. The graded ST → BT films grown on LAO and STO:Nb substrates exhibited a excellent dielectric properties than the graded BT → ST films.     

Preparation of Zr-rich PZT and La-doped PbTiO3 thin films by RF magnetron sputtering and their properties for pyroelectric applications

Abstract

Zr-rich PZT and La-doped PT films were fabricated on a PLT/Pt/Ti/SiO₂/Si or Pt/Ti/SiO₂/Si substrate by an RF planar magnetron sputtering equipment using powder targets with compositions of PbZr_{0 94}Ti_0.06O₃, PbZr_0.92Ti_0.08O₃ and Pb_0.85La_0.15 Ti_0.96O₃ with excess PbO of 20 mol%. The dielectric constants of PZT and PLT films showed anomalies at the transition temperatures of around 246 and 300°C, and their dielectric constants at room temperature were 350 and 1070, respectively. Significant pytroelectric currents were observed in both as-grown PZT and PLT films even without a poling treatment. The pyroelectric coefficients of those films were 10 and 30 nC/cm²K, respectively. Therefore, Zr-rich PZT and [111]-oriented PLT films sputtered on Pt/Ti/SiO₂/Si substrates possess desirable properties for potential applications to pyroelectric devices.     

Enhancement of Ferroelectric Properties of Pb(Zr,Ti)O3 Films Grown by Metal-Organic Chemical Vapor Deposition on Noble-Alloy Bottom Electrodes

Pb(Zr,Ti)O₃ (PZT) films grown on Ir electrodes by a metal-organic chemical vapor deposition (MOCVD) have suffered from high leakage and rough surface. We sputtered Pt and Ir simultaneously onto Ti/SiO₂/Si substrates and formed Ir-Pt alloy bottom electrodes with various compositions. With an optimal composition of Ir and Pt, PZT films grown by MOCVD on this substrate showed smoother surface and suppressed leakage via the bottom interface. At the specific composition of Ir and Pt, two different phases seemed to be acquired. They constituted the electrodes and affected the PZT grain nucleation independently so that the grains with different origins grew and restrained the vicinal grains, and finally soothed the faceted-grain-formation. No fatigue was observed even in PZT on Ir-Pt alloy with much Pt content.     

Dielectric and Ferroelectric Properties of Ba(Zr0.35Ti0.65)O3 Thin Films Grown by a Sol-Gel Process

The Ba(Zr_0.35Ti_0.65)O₃ (BZT) thin films were deposited via sol-gel process on LaNiO₃-coated silicon substrates. XRD showed that the crystallinity of BZT film grown on LaNiO₃ coated silicon substrates is better than that of BZT film grown on Pt. Both films showed perovskite phase and polycrystalline structure. The temperature dependent dielectric measurements revealed that the thin films had the relaxor behavior and diffuse phase transition characteristics. The capacitor tuning was about 44% for each BZT film grown on LaNiO₃/Pt and Pt electrodes at 1 MHz. Especially, the values of dielectric loss at 1 MHz ranged from 0.02 to 0.009 in the bias range of 0 to 514 kV/cm, respectively. The leakage currents density of thin films grown on LaNiO₃/Pt and Pt electrodes at 300 kV/cm was about 8.5 × 10^–7 and 1.1 × 10^–5 A/cm², respectively. This work demonstrates a potential use of BZT films for application in tunable microwave devices.