Epitaxial Ba0.5Sr0.5TiO3 thin films for microwave phase shifters

Abstract

A tunable phase shifter was fabricated with epitaxial Ba_0.5Sr_0.5TiO₃ (BST) thin film and gold coplanar waveguide. BST thin film of the thickness ～0.5 μm was deposited by laser ablation on the MgO(OOl) single crystalline substrate. Gold electrode of the thickness ～2 μm was prepared by the sequence of thermal evaporation, electroplating, and wet etching. Epitaxial quality of the BST thin film was confirmed by X-ray diffraction. The microwave performance of phase shifter was measured at room temperature in the frequency range of 8–12 GHz, and with applied bias voltage of up to 30 V. Effect of Mn dopant in the epitaxial films was also considered.     

CHARACTERIZATIONS OF W-DOPED (Ba0.5Sr0.5)TiO3 THIN FILMS USING LaNiO3 ELECTRODE

ABSTRACT

The (Ba_0.5Sr_0.5)TiO₃ thin films were deposited onto LaNiO₃ by RF-magnetron sputtering at 550°C. The influence of W content on microstructure and electrical properties of BST films were investigated. The surface and grain size become smoother and smaller as the W content increased. Besides, the dielectric constant, tunability, dissipation factor, and leakage current decreased when the W content increased. The 1% W is the optimal doping concentration. The resultant BST film, with proper dielectric constant and leakage current, has a tunability of 32%, a dissipation factor of 0.006, a FOM value of 53.3 under applied field of 450 kV/cm.     

Preparation of BST thin films on Pt electrode on Si wafer with down-flow LSMCVD reactor

Abstract

A novel type of down-flow LSMCVD (Liquid Source Mist CVD) reactor was developed to prepare a high dielectric BST thin film on Pt electrode on Si wafer. Barium acetate [Ba (OOCCH₃)₂], strontium acetate [Sr (OOCCH₃)₂], and titanium isoproxide [Ti (OC₃H₇ ⁱ )₄] were used as metal sources. Metal sources were dissolved in acetic acid, 1-butanol, or 2-methoxyethanol. BST [Ba/(Ba + Sr) = 0.7] film annealed on Pt/Ti/SiO₂/Si above 650°C was polycrystalline. BST film has a (110) preferred orientation with increasing temperature. Surface roughness of BST film and grain size increased with increasing temperature. The metal-oxygen bond was formed at 650°C as shown in the spectra of FTIR. The depth profiles of elements of BST thin films indicated a uniform composition throughout the film. BST films annealed at 750°C showed a dielectric constant and a tanδ of 390 (thickness: 150 nm) and 0.06 at a frequency of 100 kHz, respectively. The behavior of capacitance of the BST film with bias voltage showed paraelectric property. BST film annealed at 750°C had the leakage current density of 3.2 (μA/cm²) at a bias voltage of 2V.     

Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors

Abstract

We propose Ir thin films as new electrode materials for high dielectric BST capacitors. Ir was found to be superior to Pt in a number of aspects such as resistivity, adhesion and surface roughness. The Pt/BST/Ir/SiO₂/Si capacitors showed leakage currents as low as Pt/BST/Pt/SiO₂/Si ones, but higher capacitance resulted. For endurance properties with +5V unipolar pulse trains, the dielectric constant of BST films on Ir decreased by only 10% below its initial value after switching of 10⁹ cycles while that on Pt degraded by 30% after 10⁸ cycles. Ir bottom electrode effects on BST film properties were well explained by the formation of IrO₂ phases on the surface of Ir electrodes.     

Variations of interface potential barrier height and leakage current of (Ba,Sr)TiO3 thin films deposited by sputtering process

Abstract

Variations of the leakage current behaviors and interface potential barrier height (Φ_B) of rf-sputter deposited (Ba, Sr)TiO₃ (BST) thin films with thicknesses ranging from 20 nm to 150 nm are investigated as a function of the thickness and bias voltages. The top and bottom electrodes are dc-sputter-deposited Pt films. Φ_B critically depends on the BST film deposition temperature, postannealing atmosphere and time after the annealing. The postannealing under N₂ atmosphere results in a high interface potential barrier height and low leakage current. Maintaining the BST capacitor in air for a long time reduces the Φ_B from about 2.4 eV to 1.6 eV due to the oxidation. Φ_B is not so dependent on the film thickness in this experimental range. The leakage conduction mechanism is very dependent on the BST film thickness; the 20 nm thick film shows tunneling current, 30 and 40 nm thick films show Schottky emission current.     

Interface potential barrier height and leakage current behavior of Pt/(Ba,Sr)TiO3/Pt capacitors fabricated by sputtering process

Abstract

Variations of the leakage current behaviors and interface potential barrier height (φ _B ) of rf-sputter deposited (Ba, Sr)TiO₃ (BST) thin films, with thickness ranging from 20nm to 150 nm are investigated as a function of the thickness and bias voltages. The top and bottom electrodes are dc-sputter-deposited Pt films. φ _B critically depends on the BST film deposition temperature, postannealing atmosphere and time after the annealing. The postannealing under N₂ atmosphere results in a high interface potential barrier height and low leakage current. Maintaining the BST capacitor in air for a long time reduces the φ _B from about 2.4 eV to 1.6eV due to the oxidation. φ _B is not so dependent on the film thickness in this experimental range. The leakage conduction mechanism is very dependent on the BST film thickness; the 20nm thick film shows tunneling current, 30 and 40 nm thick films show Schottky emission current and the thicker films show a mixed characteristics and bulk and interface limited currents although the mechanism is not clearly understood at this moment.     

Hysteresis analysis in capacitance-voltage characteristics of Pt/(Ba,Sr)TiO3/Pt structures

Abstract

Capacitance-Voltage (C-V) characteristics of Pt/(Ba, Sr)TiO₃/Pt MIM capacitor were investigated. Hysteresis observed in the C-V characteristics of BST films was analyzed. The dependence of the C-V characteristics on the sweeping direction of applied voltage indicates that the hysteresis is caused by the interface trap charge between the BST film and the Pt electrode. A new method was proposed to characterize the interface traps from the hysteresis of C-V characteristics of MIM capacitor. The trapped electron density near the lower interface of the BST thin films was constant (～ 3 × 10¹²cm^?2) for all the film thickness ranging from 500 Å to 2000 Å, which suggests that the hysteresis is not caused by the bulk property of the BST film but caused by the interfacial property.     

The Effect of Stress on the Microwave Dielectric Properties of Ba0.5Sr0.5TiO3 Thin Films

Single phase, (1 0 0) epitaxial Ba_0.5Sr_0.5TiO₃ (BST) films have been deposited onto (1 0 0) LaAlO₃ and MgO substrates by pulsed laser deposition (PLD). The capacitance and dielectric losses of as-deposited and annealed films have been measured from 1–20 GHz as a function of electric field (0–80 kV/cm) at room temperature. The dielectric properties are strongly affected by the substrate type, post-deposition annealing time (6 h) and temperature (1200°C). For epitaxial BST films deposited onto MgO, it is observed that, after a post-deposition anneal the dielectric constant and the dielectric loss decreases. For epitaxial BST films deposited onto LAO, a post-deposition anneal (1000°C) results in an increase in the dielectric constant and an increase in the dielectric loss. The dc electric field induced change in the dielectric constant tends to increase with the dielectric constant and is largest for as-deposited films on MgO and post-deposited annealed films on LAO. In general, for epitaxial BST films, a large electric field effect is observed in films that have a large dielectric loss and a small electric field effect in films that have a low dielectric loss. High resolution X-ray diffraction measurements indicate that deposited film exhibit a significant tetragonal distortion which is strongly affected by a by a post deposition anneal. The observed differences in dielectric properties of the epitaxial BST films on MgO and LAO are attributed to the differences in film stress which arise as a consequence of the lattice mismatch between the film and the substrate and the differences in the thermal coefficient of expansion between the film and the substrate. A thin amorphous buffer layer of BST has been used to relieve stress induced by the lattice mismatch between the film and the substrate. Unlike epitaxial films, stress relieved films do not show an inverse relationship between dielectric tuning and Q (1/tan) and may be superior materials for tunable microwave devices.     

PREPARATION AND PROPERTIES OF LITHIUM-DOPED K0.5Na0.5NbO3 THIN FILMS BY CHEMICAL SOLUTION DEPOSITION

ABSTRACT

Lithium-doped K_0.5Na_0.5NbO₃ (KLNN) films were fabricated by chemical solution deposition on Pt/TiO₂/SiO₂/Si substrates. Homogeneous and stable precursor solutions were prepared by controlling the reaction of starting metal alkoxides. Perovskite KLNN single-phase thin films were successfully synthesized on Pt/TiO _x /SiO₂/Si substrates. The 0.75-μ m-thick KLNN film annealed at 650°C exhibited ferroelectric polarization hysteresis loops at ?250°C. The loop at room temperature was round, indicating the film contained leakage components. The dielectric constant under zero bias was 490 at room temperature. A typical upside-down butterfly DC bias-capacitance curve was obtained in the KLNN film capacitors at room temperature, indicating that polarization reversal occurred in the obtained KLNN films.     

High quality BaxSr1-xTiO3 films grown by mocld and novel ferroelectric/ferrite structures for dual-tuning microwave devices

Abstract

Excellent single crystal Ba_xSr_1-xTiO₃ (BST) films were grown on LaAlO₃ substrates using the metal-organic chemical liquid deposition (MOCLD) method. Very low losses (tanδ ∽0.002-0.008) were measured from these films at 400 KHz. Biaxially oriented BST films were successfully grown on polycrystalline YIG substrates using both MOCLD and pulsed laser deposition methods with biaxially oriented MgO and YSZ buffer layers. The dielectric losses of the films range from 0.005 to 0.015 while 25% of dielectric constant change was observed with 40V bias voltage up to 10 MHz. Both the dissipation and dielectric constant of the films remained nearly constants over a wide temperature range (77 K to 380 K). A dual-tuning microwave coplanar phase shifter using a BST film grown on a MgO buffered polycrystalline YIG substrate was fabricated. A significant phase shift was observed in GHz frequency range when an electric bias or a magnetic field was applied to the device.     

Self-polarization effect in Pb(Zr,Ti)O3 thin films

Abstract

The self-polarization effect is investigated in Pb(Zr,Ti)O₃ (PZT) thin films deposited by sol-gel and magnetron sputtering techniques. The effective piezoelectric coefficient of as-grown films, which is proportional to their initial polarization (self-polarization), is measured by a sensitive interferometric technique as a function of the annealing temperature, PZT composition, film thickness and bottom electrode material. The results indicate that the films are self-polarized by an internal bias field upon cooling through the phase transition temperature. It is suggested that a built-in field of a Schottky barrier between the PZT film and the bottom electrode is responsible for the observed effect. Self-polarization of the films is found to be very stable and in some cases to be as high as 90% of that produced by the subsequent room temperature poling. This property is very useful for piezoelectric and pyroelectric applications of PZT films since the poling procedure can be avoided. The properties of self-polarization are found to be similar for the films produced by sol-gel and sputtering techniques, suggesting that the same mechanism is operative in both cases.     

Thickness dependent performance of Na0.5K0.5NbO3/sapphire thin film varactors

Abstract

Perfect c-axis oriented Na_0.5K_0.5NbO₃ (NKN) films have been pulsed laser deposited on Al₂O₃(0112) single crystals (r-cut sapphire) for voltage tunable microwave device applications. Thickness dependence of dielectric performance of the NKN/sapphire interdigital capacitors (IDCs) has been studied. 40 V bias tunability and dielectric loss tan δ of 4 μm slot IDCs have been found to be 24.6 % and 2.86 % for 1.2 μm thick NKN film, and 6.1 % and 0.83 % for 0.14 μm thick NKN film, respectively. Low leakage currents and high breakdown voltages are observed in these structures.     

Microwave Tunable Properties of Ni-Doped (Ba0.5Sr0.5)TiO3 Thin Films Grown by Pulsed Laser Deposition

(Ba_0.5Sr_0.5)TiO₃ (BST) thin films were deposited by pulsed laser deposition (PLD) and investigated as a function of Ni dopant concentration in low and high frequency regions. In low frequency region (<10 MHz), the Ni-dopant concentration in BST films has a strong influence on the material properties including dielectric and tunable properties. Ni-doped (≤3 mol%) BST films showed denser, smoother morphologies and smaller grain sizes than those with 6 and 12 mol% Ni. Dielectric constant and loss of 3 mol% Ni-doped BST films were about 980 and 0.3%, respectively. In addition, tunability and figure of merit of 3 mol% doped BST films showed maximum values of approximately 39% and 108, respectively. In high frequency region (>1 GHz), the frequency tunability range at center frequency of undoped BST and 3 mol% Ni-doped BST coplanar waveguide (CPW) resonators showed 102 and 152 MHz, respectively at 30 V dc bias. The Ni-doped BST thin films are possible in applications of microwave tunable capacitors.     

Structural properties and dopant-modified bandgap energies of Ba0.5 Sr 0.5 TiO 3 thin films grown on LaAlO 3 substrates

Ba_0.5Sr_0.5TiO₃ thin films doped with different concentration of Ti, Mg and Al dopants were prepared by pulsed laser deposition technique on LaAlO₃ substrates. The crystalline properties of these doped thin films were studied using X-ray diffraction, micro-Raman scattering, atomic force microscopy, and transmission electron microscopy. The bandgap energies of BST thin films are determined from the transmission and absorption measurements by the ultraviolet-visible spectrophotometer. It was found out that the bandgap energies of the doped BST thin films depend strongly on the dopant concentration.     

Pulsed Laser Deposition of Ba0.6Sr0.4TiO3 Thin Films and Their Optical Properties

ABSTRACT

Barium strontium titanate [Ba_0.6Sr_0.4TiO₃ or BST (60/40)] thin films were deposited on MgO (100) substrates using pulsed laser deposition. X-ray diffraction (XRD) measurements revealed that the BST thin films had epitaxially grown on the MgO (100) substrates. The surface morphology of the thin films was observed using an atomic force microscope and the grain size was found to be about 100–150 nm. The surface roughness was around 4.9 nm for a 250 nm thick film. The optical transmittance of the BST thin film was measured using a transmission mode ellipsometer. The BST/MgO configuration was highly transparent in the visible region. The optical band gap energy of the BST film, calculated by applying the Tauc relation, was 3.56 eV. Optical waveguide characteristics of the BST (60/40) thin film were determined using a prism coupler. The electro-optic (E-O) properties were measured at 632.8 nm wavelength using a phase modulation detection method. The BST film exhibited a predominately quadratic E-O behavior and the quadratic E-O coefficient was found to be 0.58 × 10^{? 17} m²/V².     

Thick electrodes for high frequency high Q tunable ferroelectric thin film varactors

Abstract

Thin film barium strontium titanate (BST) shows great promise for voltage tunable dielectric devices for use at RF and microwave frequencies. An MOCVD process has been developed for production of BST, resulting in films with very low losses (as low as 0.002–0.004) and tunabilities over 50% at low operation voltages. With these values of BST loss, overall device quality factors at RF (100 MHz+) frequencies are primarily limited by losses in the thin metal electrodes, such as Pt, normally used for ferroelectric thin films. The bottom electrode in parallel plate capacitor structures is particularly challenging, since it must provide a good growth surface for BST and be stable at high (>600 °C) growth temperatures in an oxidizing atmosphere yet have high conductivity and compatibility with Si or SiO₂/Si substrates. These challenges have previously prevented use of Pt thicknesses over 0.1–0.2 urn. Our solution to this problem, involves combinations of adhesion layers at the Pt/SiO₂ interface and embedded stabilization layers to make functioning Pt bottom electrodes as thick as 2 μm. Devices with dielectric Q factors over 150 at 100 MHz (tan δ ～ 0.006 as measured and modeled by S-parameters) and overall device Q factors over 50 at 30 MHz are described. We have also inserted these devices into tunable filters, achieving tunabilities of 50% and low insertion losses (0.3 dB) at RF frequencies.     

Dielectric Properties of Ba0.5Sr0.5TiO3 Thin Films from DC to Ka Band

Much of the interest in Ba_0.5Sr_0.5TiO₃ (BST) thin films has focused on DRAM applications. For this application, the most studied characteristics have been the dielectric constant and the leakage current, both of which are usually measured either at DC or at low frequencies. A few studies have made use of impedance measurements in the 100 Hz to 100 MHz range. Unfortunately, all these measurements fall far short of current DRAM speeds, which are quickly approaching 1 GHz. Other technologies, such as digital computing and wireless communications are already well into the microwave range. The importance of microwave characterization of BST films is therefore clear. Such a characterization technique is described and results from DC to Ka band are presented.     

Magnetron sputter-deposited multilayer (BaxSr1x)Ti1+yO3+z thin films for passive and active devices

Abstract

High permittivity (Ba_xSr_1?x)Ti_1+yO_3+z(BST) thin films are being investigated for integration into charge storage dielectrics and electric-field tunable elements for high frequency devices. For the latter application, it is desirable to have BST capacitors with high tunability and low losses. Therefore, we investigated the use of multilayer BST thin films consisting of very low dielectric loss BST/electrode interfacial layers ((Ba+Sr)/Ti = 0.73) sandwiching a high tunability, high permittivity primary BST layer ((Ba+Sr)/Ti = 0.9). BST capacitors with multiple layers of controlled composition can be effectively produced insitu by magnetron sputter deposition, using a single stoichiometric target and controlling the layer composition by changing the total process gas (Ar+O<₂) pressure. The layered BST film capacitors exhibit simultaneous low loss (tan Δ = 0.005), high tunability (76%), high charge storage energy density (34 J/cm³), low leakage, and high dielectric breakdown (>2.8 MV/cm).     

Electro-Optic Properties of Heteroepitaxial Pb(Zr,Ti)O3/La0.5Sr0.5CoO3 Film Structures

Vertical ferroelectric Pb(Zr,Ti)O₃ (PZT) 1 μm thick film capacitor was fabricated by pulsed laser deposition technique (PLD) onto conducting La_0.5Sr_0.5CoO₃(LSCO) 100 nm thick bottom electrode on both side polished YAlO₃ + 1% Nd₂O₃ (Nd:YAlO₃) single crystal substrate to operate as a Pockels cell optical modulator. On top of the PZT film, semitransparent 30 nm thick Au electrode was deposited by thermal evaporation. Intensity of the chopped 670 nm polarized laser radiation transmitted through the Au/PZT/LSCO/Nd:YAlO₃ cell was measured at various temperatures and bias voltage applied. Applying 20 V (200 kV/cm) across the capacitive cell, modulation of the transmitted light as high as 3% was achieved while the voltage tunability measured at 1 kHz from C-V characteristics was about 70%. Thermo-optical measurements performed for PZT/Nd:YAlO₃ sample in the range up to 400°C showed the phenomenon of critical opalescence in the vicinity of Curie temperature at 208°C. Optical transmission through the PZT film biased with electric field was studied in the range 400 to 1000 nm. Film thickness, refraction index and absorption coefficient have been determined from the interference pattern observed in the PZT transmission spectrum. A simple model yields the dispersion relation for the electro-optic coefficient.     

Effects of Long-Time DC Bias on D2O- and D2/N2-Annealed BST Thin Films

Effects of long time dc bias on both D₂O- and D₂-annealed BST thin films were investigated by secondary ion mass spectrometry (SIMS) analysis and electrical measurements before and after bias stressing. Bias conditions were sufficient to cause the degradation of (1) subsequently-measured current density-voltage characteristics and (2) a significant positive shift of the capacitance-voltage curve along the voltage axis. This latter effect may be attributed to the asymmetric space charge distribution in the BST thin film after bias stressing or, possibly, to changes in the interface state density. No significant deuterium motion was observed in D₂O-annealed capacitors biased at an elevated temperature or in D₂/N₂-annealed capacitors biased at room temperature in high electric fields (3.5 × 10⁷ V/m) for more than 8 hours. The small values of the D_i mobility which were inferred from the SIMS results are consistent with recent data on the kinetics of deuterium incorporation in and removal from similar BST thin films.