Measurement of Microwave Dielectric Properties of (Sr,Ba)Nb2O6 Thin Films

(001) oriented (Sr,Ba)Nb₂O₆ (SBN) thin films were deposited on MgO (001) single crystal substrates by the pulsed laser deposition method. Structural properties of SBN films were investigated using X-ray diffractometer. The microwave dielectric properties of SBN films were examined by calculating the scattering parameter obtained using a HP 8510C vector network analyzer with the frequency range 0.5–20 GHz at room temperature under the dc bias field of 0–80 kV/cm for interdigital capacitors (IDT) and coplanar waveguide (CPW) device based on SBN/MgO layer structure. Thick metal electrode patterns were fabricated by dc sputtering deposition, photolithography and etching process. The IDT device based on (001) oriented SBN films exhibited about 40% capacitance tunability with an electric field change of 80 kV/cm at room temperature, and the dielectric quality factor was about 20 at 12 GHz with no dc bias.     

Electrically tunable Ag(Ta,Nb)O3 thin film structures on oxide substrates

Abstract

We report on design, fabrication, and comparative test of three different types of voltage-variable interdigital capacitors made on ferroelectric Ag(Ta,Nb)O₃ films deposited on MgO and A1₂O₃ substrates. X-ray diffraction patterns show that ATN films pulsed laser deposited on MgO(001) and Al₂O₃(0112) single crystals have preferential (00/) and (0kk) orientation. Capacitance and loss tangent in interdigital capacitors were measured as the functions of frequency and applied dc voltage bias. Loss tangent was as low as 0.0025 and 0.0034 and AT-factor (tunability/tanδ) was around 26.2 and 20.0 for MgO and A1₂O₃, respectively, @ ± 40 V (maximum electric field 200 kV/cm), 300 K, and 1 MHz. Both of polarization and steady leakage currents were observed in the current-time domain measurements. 0.1 pF interdigital capacitors have pA leakage current level @ ± 40 V.     

Microwave Characterization of BST Thin Films on LAO Interdigital Capacitor

The dielectric properties of (Ba_0.5Sr_0.5)TiO₃ (BST) thin films on LaAlO₃ (LAO) single crystals were studied over a wide frequency range. The samples with interdigital electrodes were prepared by microelectronic processing. The dielectric characterizations were carried out in the following steps: 1) the standard calibration of the instrument, 2) the removal of parasitic capacitance and the extraction of the capacitance of the interdigital capacitor (IDC) and 3) the extraction of the dielectric permittivity (?) of BST. It was found that ? of BST has a constant value (about 400) from 50 MHz to 2 GHz; at higher frequencies, ? gradually decreases. The BST interdigital capacitors exhibited good dielectric tunability.     

Microwave Dielectric Properties of (111) Oriented Ferroelectric (Ba1 − xSrx)TiO3 Thin Films

Epitaxial (111) oriented ferroelectric (Ba_{1 ? x}Sr_x)TiO₃ (BST) films were deposited on MgO (111) single crystals using pulsed laser deposition. Structural properties of BST films were investigated using X-ray diffractometer. The dielectric properties of BST films were investigated under the dc bias field of 0–40 V using interdigital capacitors (IDT) fabricated by photolithography and etching process. The small signal dielectric properties of BST films were calculated by modified conformal mapping both the measured data using an impedance gain/phase analyzer and the reflection coefficient data measured using a HP 8510C vector network analyzer in 0.05–10 GHz at room temperature. The IDT capacitor based on (111) oriented BST film exhibits about 40% of capacitance change with an dc bias of 40 V which value is somewhat smaller than that of the IDT device based on (001) oriented BST film. But the dielectric quality factor value is about twice that of the device based on (001) oriented BST film.     

Growth and characterization of non-c-axis-oriented SrBi2Ta2O9 epitaxial thin films on Si(100) substrates with SrRuO3 bottom electrodes

Abstract

We have successfully grown non-c-axis-oriented epitaxial ferroelectric SrBi₂Ta₂O₉ (SBT) films with (116) and (103) orientations on Si(100) substrates using epitaxial (110)- and (111)-oriented SrRuO₃ (SRO) bottom electrodes, respectively. The SRO orientations have been induced by coating the Si(100) substrates with epitaxial YSZ(100) and MgO(111)/ YSZ(100) buffer layers, respectively. All films were sequentially grown by pulsed laser deposition. Specific in-plane orientations of the epitaxial SBT films were found, which are in turn determined by specific in-plane orientations of the epitaxial SRO bottom electrodes. These include a diagonal rectangle-on-cube epitaxy of SRO(110) on YSZ(100) and a triangle-on-triangle epitaxy of SRO(111) on MgO(111).     

Frequency and Voltage Dependent Dielectric Properties of Ni-doped Ba0.6Sr0.4TiO3 Thin Films

Highly (100) preferred undoped and 1–5% Ni-doped Ba_1–xSr_xTiO₃ (BST) thin films were deposited onto MgO (100) single crystal substrate at 750°C using pulsed laser deposition. BST thin film-based interdigital capacitors (IDC) were prepared by standard photolithography process. The microwave properties of BST films were measured at 10 GHz. Ni-doped BST films showed better dielectric properties by exhibiting improved dielectric Q while retaining an appropriate capacitance tuning compared to undoped BST films. 1% Ni-doped BST film showed the maximum figure of merit of 2896.1. It is suggested that 1 mol% Ni doped BST film is an effective candidate for high performance tunable device applications.     

Characterization of Ni/Ce Co-Doped BST Thin Film Grown on LSCO/Pt Electrodes Prepared by Pulsed Laser Deposition

Perovskite (Ba_0.6Sr_0.4)TiO₃ (BST) thin films doped with Ni, Ce and Ni/Ce codopants were prepared on LSCO/Pt/SiO₂/Si substrates by pulsed laser deposition method. In this study, La_0.5Sr_0.5CoO₃ (LSCO) bottom electrodes were used to improve the crystallinity and dielectric properties of BST films. Single ion doped(1 mol%Ni doped,1 mol%Ce doped) BST films showed more improved crystallinity, smoother surface, and smaller grain size than that with 1 mol%Ni/1 mol%Ce. The dielectric constant and loss of Ni/Ce co-doped BST films were about 298 and 1.8%, respectively. In addition, tunability and figure of merit of co-doped BST films showed minimum values of approximately 9.3% and 5, respectively. With 1% Ni-doped BST thin films, results gave a tunability of 54.2% and a loss tangent of 1.8% while a figure of merit was 30. Correlation of the material properties with dielectric and tunable properties suggests the 1 mol%Ni-doped BST films are effective potential candidate for tunable device applications.     

Annealing Effects on Structural and Dielectric Properties of Tunable BZT Thin Films

Ba(Zr, Ti)O₃ thin films have attracted great attention in recent years for their potential use in DRAMs and MCMs due to their high dielectric constant and relatively low leakage current. However, their tunable dielectric properties were rarely investigated and the corresponding potential for tunable microwave applications was seldom reported. In this paper, we present the tunable dielectric behavior of BZT thin films deposited by RF magnetron sputtering from a Ba(Zr_0.3Ti_0.7)O₃ ceramic target on MgO single crystal substrates. The composition, thickness and crystallinity of the thin films were analyzed by Rutherford backscattering (RBS), scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. The dielectric constant and loss tangent were measured as a function of electric field (0–7 kV/mm) and temperature (–140 to +160°C) at frequencies up to 1 MHz, using interdigital capacitors (IDC) with Au electrodes on thin films. By optimizing the preparation process, a tunability {defined as = [ (0) – (E_max)]/ (0)} of 76% at E_max = 7 kV/mm and a low loss tangent of 0.0078 can be achieved. In addition, the influence of annealing temperature on the dielectric properties of the thin films is also discussed.     

Improvement on ferroelectric properties of metal-organic decomposited PZT thin film prepared by using prenucleation layer

Abstract

Perovskite SrRuO₃ (SRO) layer was, for the first time, been successfully synthesized by using metal-organic decomposition (MOD) process. The presence of SRO buffer layer on Pt(Si) substrates has significantly enhanced the crystallization and densification behavior of the subsequently deposited Pb(Zr_0.52Ti_0.48)O₃ films. The pyrochlore free perovskite phase can be obtained by post-annealing the PZT/SRO/Pt(Si) films at 500°C, which is 50°C lower than that needed in PZT/Pt(Si) films. The fine grain (～0.3 μm) microstructure can be attained by post-annealing at 650°C for PZT/SRO/Pt(Si) films and 700°C for PZT/Pt(Si) films. The ferroelectric hysteresis properties of the two PZT films are comparable to each other. The leakage current properties of PZT/SRO/Pt(Si) films increased pronouncedly with post-annealing temperature, resulting in inferriar leakage behavior to PZT/Pt(Si) films.     

Thickness dependent performance of Na0.5K0.5NbO3/sapphire thin film varactors

Abstract

Perfect c-axis oriented Na_0.5K_0.5NbO₃ (NKN) films have been pulsed laser deposited on Al₂O₃(0112) single crystals (r-cut sapphire) for voltage tunable microwave device applications. Thickness dependence of dielectric performance of the NKN/sapphire interdigital capacitors (IDCs) has been studied. 40 V bias tunability and dielectric loss tan δ of 4 μm slot IDCs have been found to be 24.6 % and 2.86 % for 1.2 μm thick NKN film, and 6.1 % and 0.83 % for 0.14 μm thick NKN film, respectively. Low leakage currents and high breakdown voltages are observed in these structures.     

Microwave Dielectric Properties of Ferroelectric BaTiO3 Thin Film

The dielectric properties of c-axis epitaxial BaTiO₃ thin film on LaAlO₃ are investigated at frequencies of 0.5–30 GHz. For the measurements, interdigital capacitors with the Au/Ti electrode configurations of five fingers pairs that are 15 m wide and spaced 2 m apart are prepared by photolithography and lift-off patterning. Finger length varies from 20 to 80 m. The capacitance of epitaxial BaTiO₃ films exhibited no frequency dependence up to 10 GHz with the exception of slightly upward tendency of capacitance in BaTiO₃ film with a finger length of 80 m due to the self resonant frequency at 20 GHz. The Q-factors of the capacitors, defined as Q = 1/CR, are decreased up to 10 GHz with increased frequency. At 10 GHz, the BaTiO₃ film has a tunability [defined as k(V) = [C(0)–C(V)]C(0)] of 1.5% at 15 V, a loss tangent of 0.2 at room temperature. The small tunability can be interpreted as a result of in-plane compressive stress of BaTiO₃ film exhibiting large dielectric anisotropy. For the improvement of tunability and dielectric loss in the interdigital BaTiO₃ capacitor, the tetragonality (c/a) of epitaxial BaTiO₃ film and design of interdigital capacitor should be modified.     

Retention Characteristics of (Bi,La)4Ti3O12 Films on Si(100) Substrates Using LaAlO3 Buffer Layers

We demonstrate the ferroelectric behavior of (Bi,La)₄Ti₃O₁₂ (BLT) films deposited on Si(100) substrates by using LaAlO₃ buffer layers. LaAlO₃ films were prepared by molecular beam deposition method. Then, they were subjected to ex situ dry N₂ annealing in a rapid thermal annealing furnace. From the capacitance-voltage measurement, the dielectric constant of LaAlO₃ was estimated to be 20 to 26. On these structures, BLT films were deposited by sol-gel method and they were characterized by X-ray diffraction analysis. It was found from capacitance-voltage measurements that the characteristics showed a hysteresis loop and the memory window was about 0.5 V for the voltage sweep of ±9 V. It was also found from the retention measurement that the higher and lower capacitance values in the hysterisis loop could be distinguished at least for 3 days. It is concluded from these results that the BLT/LaAlO₃/Si(100) structure is one of the most promising structures for realizing MFISFETs (metal-ferroelectric-insulator-semiconductor field effect transistors).     

Inverse Capacitance-Voltage Characteristics of Bi3.25La0.75Ti3O12 Thin Film Pulsed Laser Deposited on Thermally Oxidized n-Type Si Substrates

Comparative studies on the electrical properties of a metal-ferroelectric-insulator-semiconductor field effect transistor were conducted using pulsed laser ablated ferroelectric Bi_3.25La_0.75Ti₃O₁₂ (BLT) thin films deposited on SiO₂/Si substrates with different SiO₂ thicknesses. The SiO₂ layer was prepared on n-type Si substrates by dry oxidation at a temperature of 800°C. Small angle x-ray reflectivity studies were used to measure the SiO₂ thickness. The capacitance-voltage (C-V) measurements revealed that the films showed good interfacial properties. Shifts in flatband voltages were observable, but were effectively reduced by deposition of the ferroelectric films. Au/BLT/SiO₂/Si diodes with 8 nm SiO₂ layer showed to be stable with relatively large memory window values of about 0.3 V, 2.5 V, 5.0 V, and 7.0 V, at increasing bias voltages of ±5 V, ±7 V, ±10 V, and ±12 V, respectively.     

Pulsed laser deposition (PLD) of oriented bismuth titanate films for integrated electronic applications

Abstract

In this paper we describe recent successes of growth of epitaxial bismuth titanate (BTO) films by pulsed laser deposition (PLD) suitable for electro-optic and electrical switching device structures, and fabrication of an improved gate structure for a ferroelectric memory FET (FEMFET). TEM and x-ray results indicate that excellent crystalline quality BTO films were achieved on LaAlO₃. Polarization switching was demonstrated for BTO capacitors with epitaxial superconducting YBa₂Cu₃O₇ as the lower electrode. Using an SiO₂ buffer layer, a BTO/Si structure was fabricated and direct charge modulation in the Si by polarization reversal in the BTO was demonstrated.     

Characterization of hetero-epitaxial PZT capacitor

Abstract

A hetero-epitaxial Au/PbZr_0.48Ti_0.52O₃(PZT)/SrRuO₃(SRO) capacitor was fabricated on a single crystal SrTiO₃ (STO) substrate by pulsed laser deposition. An SRO buffer layer (a nucleation layer) was formed at the SRO/STO interface to ensure the highly epitaxial growth of the PZT and SRO films. An X-ray diffraction measurement revealed that the (00l) planes of the PZT and SRO grew parallel to the substrate surface. A transition layer of ～ 5 nm thickness was observed at the SRO/STO interface by high-resolution transmission electron microscopy (HR-TEM). This transition layer corresponds to the nucleation layer intentionally grown at the interface. Remanent polarization of the capacitor was 32.1 μC/cm² due to the good epitaxial growth of the films.     

Thin film BaxSr1-xTiO3 ku- and k-band phase shifters grown on MgO substrates

Abstract

We report measurements of gold circuits fabricated on four Ba_xSr_1-xTiO₃ ferroelectric films doped with 1% Mn grown on MgO substrates by laser ablation. Low frequency (1 MHz) measurements of σ_T and tanδ on interdigital capacitors are compared with high frequency measurements of phase shift and insertion loss on coupled microstrip phase shifters patterned onto the same films. The variation in temperature of both high and low frequency device parameters is compared. Annealed with amorphous buffer layer and unannealed films are compared. Room temperature figures of merit of phase shift per insertion loss of up to 58.4°/dB at 18 GHz and 400 V dc bias were measured.     

Microwave Dielectric Properties of Ferroelectric Pb(Zr1 − x Ti x )O3 Thin Films Using Interdigital Capacitors

Ferroelectric Pb(Zr_{1 ? x} Ti _x )O₃ (PZT) films were deposited on (001) MgO single crystals using sol-gel method. Structural properties and surface morphologies of PZT films were investigated using an X-ray diffractometer and a scanning electron microscopy, respectively. The dielectric properties of PZT films were investigated with the dc bias field of 0–135 kV/cm using interdigitated capacitors (IDC) which were fabricated on PZT films using a thick metal layer by photolithography and etching process. The small signal dielectric properties of PZT films were calculated by a modified conformal mapping method with low and high frequency data, such as capacitance measured by an impedance gain/phase analyzer at 100 kHz and reflection coefficient (S-parameter) measured by a HP 8510C vector network analyzer at 1–20 GHz. The IDC on PZT films exhibited about 67% of capacitance change with an electric field of 135 kV/cm at 10 GHz. These PZT thin films can be applied to tunable microwave devices such as phase shifters, tunable resonators and tunable filters.     

Properties of PbZrxTi1−xO3/CeO2/SiO2/Si structure

Abstract

We report the crystalline quality and electrical properties of PbZr_xTi_1?xO₃ (PZT) films on n-type Si(100) substrates with CeO₂/SiO₂ dual buffer layers. PZT films and CeO₂ buffer layers were prepared by pulsed laser deposition technique, and SiO₂ buffer layers were formed by thermal dry oxidation. It was found that CeO₂/SiO₂ dual buffer layers effectively prevented Si and Pb interdiffusion between PZT and Si substrates. Furthermore, the capacitance-voltage (C-V) characteristics of the PZT/CeO₂/SiO₂/Si heterostructures demonstrated ferroelectric switching properties, showing a memory window as large as 2.7 V at 1 MHz.     

Epitaxial La0.5Sr0.5CoO3 electrode films for ferroelectric device applications

Abstract

We have grown high quality La_0.5Sr_0.5CoO₃ thin films by Pulsed Laser Deposition. This material is a electrically conducting perovskite which can be used as structurally compatible electrodes for devices using ferroelectric materials such as Pb-La-Zr-Ti-O (PLZT). Oxygen stability was investigated under various annealing conditions. LSCO/PLZT/LSCO heterostructures were grown epitaxially on SrTiO₃ (STO) and MgO substrates. P-E hysteresis loop was observed with P_r = 20 μC/cm² and E_c = 24 kV/cm. Direct observation of the piezoelectric effect in PLZT was made by measuring the PLZT c-axis lattice constant under various electric fields. LSCO/STO superlattice was also grown by PLD. The superlattice showed excellent crystallinity with a Rutherford Backscattering (RBS) channeling minimum yield of only 3.6%.     

Fabrication of MFIS diodes using sol-gel derived SBT films and LaAlO3 buffer layers

Abstract

We demonstrate the ferroelectric behavior of Sr_0.8Bi_2.2Ta₂O₉ (SBT) films grown on Si(100) substrates by using lanthanum aluminate (LaAlO₃) buffer layers. LaAlO₃ films were prepared by vacuum evaporation method. Then, they were subjected to ex situ dry N₂ annealing in a rapid thermal annealing (RTA) furnace. From the capacitance-voltage (C-V) measurement, the dielectric constant of LaAlO₃ was estimated to be 20～25. On these substrates, SBT films (210nm) were deposited by sol-gel method and they were characterized by XRD analysis after annealing under various conditions. It was found from C-V characteristics that the memory window of an SBT film annealed at 750°C for 30min in O₂ atmosphere was about 3.0V for the voltage sweep of ±10V. It was also found from the retention measurement that the capacitance values of the SBT film annealed at 750°C did not change over 12hours. It is concluded from these results that the SBT/LaAlO₃/Si(100) structure is one of the most promising structures for realizing MFISFETs (metal-ferroelectric-insulator-semiconductor field-effect-transistors).