非掺杂n型氮化镓外延层的光致发光

研究了热处理对非掺杂n型氮化镓外延层光致发光谱的影响和光谱中各发光带强度与温度之间的关系．热处理后,光谱中的带边峰和黄光峰的强度较热处理前都有明显降低．黄光峰强度随温度升高的衰减速度要比带边峰慢得多．由这些实验结果得出结论：光谱中的带边峰是由自由激子和束缚在一浅施主能级的束缚激子的谱线重合而成,这个浅施主能级很有可能是由氮空位产生;黄色荧光的机制应为自由电子或施主能级向深受主能级的跃迁,并且黄色荧光肯定和氮化镓中的一内部缺陷产生的深受主能级有关,该内部缺陷很有可能是镓空位．     

氧化锌纳米颗粒缺陷能级发光特性研究

报道了在室温下用荧光光谱仪和飞秒脉冲激光激发诱导光致发光．获得氧化锌纳米颗粒(平均直径约为10nm)缺陷发光光谱的实验，验证了氧化锌纳米颗粒缺陷能级的位置。锌填隙缺陷在距离导带底0．4eV处产生浅施主能级．锌空位缺陷在价带顶0．3eV处产生浅受主能级，氧锌替位缺陷在价带顶1．08eV处产生深受主能级，在导带底1．56eV处有氧空位缺陷引起的深杂质能级产生．氧填隙缺陷在价带顶1．35eV处产生深受主能级。     

掺氮ZnSe外延层的光致发光研究

报导了掺氮ＺｎＳｅ外延层的光致发光,研究了与氮受主有关的发光峰随温度和激发强度的变化关系．１０Ｋ下施主－受主对发光峰随激发强度的增加向高能方向移动,且峰强呈现饱和趋势．在１０～３００Ｋ温度范围光致发光谱表明,随着温度增加,由于激子在受主束缚激子态和施主束缚激子态之间转移,施主束缚激子发光峰强度相对受主束缚激子发光峰强度增加     

纳米ZnO光学性质研究进展

介绍了纳米ZnO常见发光谱的发光机制。在室温光致发光谱(PL)中,一般在380 nm处出现紫外发光,也有报道在357和377 nm处的紫外发光,列举了几种不同的发光解释。对于深能级发光,一般在400～550 nm出现连续的发光带,也有观察到深能级的声子伴线和声子复制现象。在低温光致发光谱的紫外发射中,一般观察到由自由激子发射(FX)、中性施主束缚激子发射(D0X)、施主-受主对跃迁峰(DAP)、中性施主束缚激子对应的双电子卫星峰(TES)以及声子伴线。综述了纳米ZnO的喇曼光谱、透射光谱、电致发光谱(EL)的特征,最后展望了纳米ZnO的光学性能研究前景。     

ZnSe薄膜的激子光谱

采用分子束外延 (MBE)技术 ,在 Ga As(1 0 0 )衬底上生长了厚度从 0 .0 4 5到 1 .4μm的 Zn Se薄膜 .X射线衍射谱证实 ,随着薄膜厚度的增加 ,应变逐步弛豫 .测量了低温下样品的反射谱和光致发光谱 ,观察到轻重空穴的能级在不同应变下的分裂、移动和反转 ,以及激子极化激元 (Po-lariton)对反射谱的影响 .也观察到束缚激子发光随着薄膜厚度的变化规律 :束缚在中性受主杂质上的束缚激子发光 (I1峰 )随着薄膜厚度的增加逐渐变弱直至消失 ,而束缚在中性施主杂质上的束缚激子发光 (I2 峰 )则随着厚度增加逐渐增强 .     

ZnSe薄膜的激子光谱

采用分子束外延(MBE)技术,在GaAs(100)衬底上生长了厚度从O.045到1.4μm的ZnSe薄膜.X射线衍射谱证实,随着薄膜厚度的增加,应变逐步弛豫.测量了低温下样品的反射谱和光致发光谱,观察到轻重空穴的能级在不同应变下的分裂、移动和反转,以及激子极化激元(Polariton)对反射谱的影响.也观察到束缚激子发光随着薄膜厚度的变化规律:束缚在中性受主杂质上的束缚激子发光(I1峰)随着薄膜厚度的增加逐渐变弱直至消失,而束缚在中性施主杂质上的束缚激子发光(I2峰)则随着厚度增加逐渐增强.     

等电子施、受主杂质共掺的磷化镓发光特性和能量转移

本文研究了液相外延生长的不同掺Bi,N浓度GaP∶(Bi_7N)材料的低温光致荧光光谱,观察到了N谱线“猝灭”和Bi束缚激子发光增强的现象.这可以解释为束缚激子由等电子受主N向等电子施主Bi隧穿能量转移的结果.变激发密度下各中心发光强度的变化关系以及与GaP∶(Bi)材料的实验结果比较,为这一能量转移过程提供了进一步的论据.     

Ar等离子体处理对GaAs纳米线发光特性的影响

采用Ar等离子体处理GaAs纳米线,通过光致发光测试研究了等离子体偏压功率对GaAs纳米线发光性能的影响。在不同测试温度和不同激发功率密度下,研究了发光光谱各个发光峰的来源和机制。研究结果表明:随着功率增加,GaAs自由激子发光逐渐消失,束缚激子发光强度先减小后增大;当功率增加到200 W时,出现施主-受主对(DAP)发光。通过对比不同样品在283℃下的发光光谱,得到了等离子体处理过程中GaAs纳米线的结构变化:当处理功率较小时,Ar等离子体在消除表面态的同时将空位缺陷引入GaAs中;当处理功率较大时,GaAs的晶体结构遭到破坏,形成施主类型的缺陷,出现DAP发光。     

金属有机物化学气相沉积GaAs／Si外延层中1.13eV发光带特性研究

用不同温度和激发强度下的近红外光致发光研究了金属有机物化学气相沉积方法在Ｓｉ衬底上生长的ＧａＡｓ外延层中的１．１３ｅＶ发光带的发光特性，表明此发光带为施主－受主对复合发光．根据１．１３ｅＶ发光带的峰值能量和发光强度随温度和激发强度的变化关系，确定施主和受主的束缚能分别为５和２９５ｍｅＶ，并证实ＧａＡｓ／Ｓｉ外延层中的１．１３ｅＶ发光为硅施主－镓空位受主对的复合发光．     

自催化方式制备ZnO纳米线及光致发光特性

采用化学气相沉积法,不用催化剂,在Si(111)基片上制备了ZnO纳米线。扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在100nm左右。X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰。室温下光致发光谱(PL)中出现了389nm和357nm的紫外峰以及五个蓝光峰(450,468,474,481和491nm)。389nm峰为自由激子复合发射357nm峰是在LO声子的参与下,自由载流子碰撞形成自由激子过程的发光行为;468nm峰系电子从氧空位形成的浅施主能级向价带跃迁发光;450nm峰系电子从导带向锌空位形成的浅受主能级跃迁发光;474,481和491nm峰是声子伴线。     

Photoluminescence of V-doped GaN thin films grown by MOVPE technique

This work reports the photoluminescence (PL) study of vanadium-doped GaN (GaN: V) in the 9-300 K range. Samples have been successfully prepared on sapphire substrates by metalorganic vapour phase epitaxy technique (MOVPE). At room temperature (RT) the PL spectra of GaN: V are dominated by a blue band (BB) in the 2.6 eV range. This BB emission is very strong and its intensity increases with increasing V doping level. We also observed that the peak position of the blue luminescence shifted at lower energy with decreasing excitation density. Upon V-doping, the yellow luminescence band shows a drastic reduction in integrated intensity. This observation is explained by a reaction involving V and gallium vacancy (_√Ga). PL spectra at low temperature exhibited a series of peaks. The donor-acceptor (D-A) pair emission peak at 3.27 eV was strongly pronounced, as the temperature was decreased. On the other hand, the intensity of the BB emission decreased. This BB emission is due to a radiative transition from a shallow donor with a depth of 29 meV to a deep acceptor with a depth of 832 meV.     

未掺杂GaN外延膜的结晶特性与蓝带发光关系的研究

采用卢瑟福背散射／沟道技术，X射线双晶衍射技术和光致发光技术对几个以MOCVD技术生长的蓝带发光差异明显的未掺杂GaN外延膜和GaN：Mg外延膜进行了测试。结果表明，未掺杂GaN薄膜中出现的2．9eV左右的蓝带发光与薄膜的结晶品质密切相关。随未掺杂GaN的蓝带强度与带边强度之比增大，GaN的卢瑟福背散射／沟道谱最低产额增大，X射线双晶衍射峰半高宽增大。未掺杂GaN薄膜的蓝带发光与薄膜中的某种本征缺陷有关。研究还表明，未掺杂GaN中出现的蓝带与GaN：Mg外延膜中出现的2．9eV左右的发光峰的发光机理不同。     

Si离子注入和退火温度对GaN黄光的影响

对光致发光谱中无黄光和有强黄光的两组GaN样品作了Si离子注入 ,研究了Si离子注入及退火温度对其黄光的影响 .当退火温度升高时 ,不管是哪一组样品 ,其黄光强度和黄光强度与带边发光带强度之比都是增强的 .无黄光的GaN样品在注入Si离子并经退火后出现明显的黄光 ;而有强黄光的GaN样品经相同处理后 ,其黄光强度较原生样品大大降低 .实验结果表明离子注入加上适当退火会在GaN中引入与黄光有关的深受主缺陷从而使黄光强度增加 ,此外 ,在离子注入过程中GaN表面不仅可以吸附离子注入引入的点缺陷 ,而且还能够吸附GaN中原有的与黄光有关的点缺陷 ,这种吸附作用随离子注入剂量增加而变强 .     

Effect of thermal annealing on the luminescence properties of ZnCdSe/ZnSe quantum-well structures

The thermal stability and luminescence properties of ZnCdSe/ZnSe quantum-well structures grown by molecular-beam epitaxy are investigated. A comparative analysis is made of the photoluminescence spectra of the structures before and after annealing. In the sample spectra after annealing (at 500 °C) a decrease in the intensity of the exciton luminescence line by more than two orders of magnitude, accompanied by an increase in the intensity of the deep levels, is observed. As a result of annealing at a lower temperature (about 400 °C), a narrowing of the exciton luminescence, accompanied by a shift of the maximum toward longer wavelengths, was detected. Fiz. Tekh. Poluprovodn. 31, 296–298 (February 1997)     

Photoluminescence properties of GaN with dislocations induced by plastic deformation

Fresh (a/3)[1120] dislocations on the (1100) prismatic plane were introduced into GaN bulk crystals by plastic deformation at 950–1000°C. In photoluminescence studies at 11 K, the near-band-edge (3.48 eV) luminescence intensity decreased remarkably in the deformed GaN, which was attributed to the introduction of high-density nonradiative recombination centers during plastic deformation. The yellow-band luminescence (2.22 eV) decreased due to plastic deformation, while several luminescence bands centered at 1.79, 1.92, and 2.4 eV developed. The dependence of PL features on deformation and annealing suggests that yellow luminescence is not related to the native structure of edge dislocations in GaN.     

Hydrogen Induced Yellow Luminescence in GaN Grown by Halide Vapor Phase Epitaxy

Strong yellow luminescence (YL) was found in GaN grown by the halide vapor phase epitaxy technique, using an NH₃-HCl-GaCl-N₂-H₂ growth chemistry. The low-temperature (less than 100K) thermal activation energy of the yellow luminescence was determined to be ∼18 meV, which indicates that a shallow donor, rather than a ‘shallow’ acceptor, was involved in observed radiative transition. The temperature dependence of the YL peak energy and the shape of the YL band imply that there are multiple recombination channels involved in the YL band. The ratio of integrated intensity of yellow-to-bandedge luminescence decreased with an increase of HCl (and hence GaCl and growth rate) in the growth ambient.     

载气流量对HVPE外延生长GaN膜光学性质的影响

研究了利用水平氢化物气相外延 (HVPE)系统在蓝宝石衬底上外延氮化镓 (Ga N)的生长规律 ,重点研究了作为载气的氮气流量对 Ga N膜的结构及光学性质的影响。观察到载气流量对预反应的强弱有很大影响 ,外延膜的质量和生长速度对载气流量极为敏感。当载气流量较小时 ,样品的 X射线衍射谱 (XRD)中出现了杂峰(1 0 -1 1 )和 (1 1 -2 0 ) ,相应的光致发光谱 (PL)中出现了黄带 (YL) ,靠近带边有杂质态。而当载气流量增大时 ,样品质量改善。Ga N外延膜的结构和光学性质的相关性表明深能级的黄带与生长过程中产生的非 c轴方向晶面有关 ,据此我们推测 :Ga空位与束缚在 (1 0 -1 1 )和 (1 1 -2 0 )等原子面上的杂质构成复合结构 ,这些复合结构所产生的深能级对黄带的发射有贡献 ;由于预反应使生长过程中混入的附加产物及杂质对带边发射有重要影响     

Analysis of defect related optical transitions in biased AlGaN/GaN heterostructures

The optical transitions in AlGaN/GaN heterostructures that are grown by metalorganic chemical vapor deposition (MOCVD) have been investigated in detail by using Hall and room temperature (RT) photoluminescence (PL) measurements. The Hall measurements show that there is two-dimensional electron gas (2DEG) conduction at the AlGaN/GaN heterointerface. PL measurements show that in addition to the characteristic near-band edge (BE) transition, there are blue (BL) and yellow luminescence (YL) bands, free-exciton transition (FE), and a neighboring emission band (NEB). To analyze these transitions in detail, the PL measurements were taken under bias where the applied electric field changed from 0 to 50 V/cm. Due to the applied electric field, band bending occurs and NEB separates into two different peaks as an ultraviolet luminescence (UVL) and Y₄ band. Among these bands, only the yellow band is unaffected with the applied electric field. The luminescence intensity change of these bands with an electric field is investigated in detail. As a result, the most probable candidate of the intensity decrease with an increasing electric field is the reduction in the radiative lifetime.