GaN基肖特基结构紫外探测器

在蓝宝石(0001)衬底上采用低压金属有机物化学气相沉积(MOCVD)方法生长GaN外延层结构,以此为材料制作了GaN基肖特基结构紫外探测器.测量了该紫外探测器的暗电流曲线、C-V特性曲线、光响应曲线和响应时间曲线.该紫外探测器在5V偏压时暗电流为0.42nA,在10V偏压时暗电流为38.5nA.在零偏压下,该紫外探测器在250nm～365nm的波长范围内有较高的响应度,峰值响应度在363nm波长处达到0.12A/W,在365nm波长左右有陡峭的截止边;当波长超过紫外探测器的截止波长(365nm左右),探测器的响应度减小了三个数量级以上.该紫外探测器的响应时间小于2μs.     

GaN基金属-半导体-金属探测器

采用MOCVD方法在蓝宝石衬底上生长出非故意掺杂的GaN外延层,并在GaN层上制作Ni/Au肖特基电极形成金属-半导体-金属(MSM)结构的探测器.对探测器暗电流进行了测试分析,发现在大电压下老化以后暗电流减小,小电压下出现电流反向,经白光照射后能够恢复.光谱响应测量中发现带隙内368nm处有光电导性质的异常峰值响应,808nm的激光对其有明显的淬灭作用,并根据陷阱模型对这些现象做出了解释.     

GaN基金属-半导体-金属探测器

采用MOCVD方法在蓝宝石衬底上生长出非故意掺杂的GaN外延层,并在GaN层上制作Ni/Au肖特基电极形成金属-半导体-金属(MSM)结构的探测器.对探测器暗电流进行了测试分析,发现在大电压下老化以后暗电流减小,小电压下出现电流反向,经白光照射后能够恢复.光谱响应测量中发现带隙内368nm处有光电导性质的异常峰值响应,808nm的激光对其有明显的淬灭作用,并根据陷阱模型对这些现象做出了解释.     

GaN基肖特基结构紫外探测器

在蓝宝石 (0 0 0 1)衬底上采用低压金属有机物化学气相沉积 (MOCVD)方法生长GaN外延层结构 ,以此为材料制作了GaN基肖特基结构紫外探测器 .测量了该紫外探测器的暗电流曲线、C V特性曲线、光响应曲线和响应时间曲线 .该紫外探测器在 5V偏压时暗电流为 0 4 2nA ,在 10V偏压时暗电流为 38 5nA .在零偏压下 ,该紫外探测器在2 5 0nm～ 36 5nm的波长范围内有较高的响应度 ,峰值响应度在 36 3nm波长处达到 0 12A/W ,在 36 5nm波长左右有陡峭的截止边 ;当波长超过紫外探测器的截止波长 (36 5nm左右 ) ,探测器的响应度减小了三个数量级以上 .该紫外探测器的响     

高性能背照式GaN/AlGaN p-i-n紫外探测器的制备与性能

研究了GaN/AlGaN异质结背照式P-i-n结构可见盲紫外探测器的制备与性能.GaN/MGaN外延材料采用金属有机化学气相沉积(MOCVD)方法生长,衬底为双面抛光的蓝宝石,缓冲层为AiN,n型层采用厚度为0.8 μm的Si掺杂Al0.3Ga0.7形成窗口层,i型层为0.18 μm的非故意掺杂的GaN,P型层为0.15 μm的Mg掺杂GaN.采用C12、Ar和BCl3感应耦合等离子体刻蚀定义台面,光敏面面积为1.96×10-3cm2.可见盲紫外探测器展示了窄的紫外响应波段,响应区域为310-365 nm,在360 nm处响应率最大,为0.21 A/W,在考虑表面反射时,内量子效率达到82%;优质因子R0A为2.00×108 Ω·cm2,对应的探测率D*=2.31×1013·Hz1/2·W-1;且零偏压下的暗电流为5.20×10-13A.     

4H-SiC金属-半导体-金属结构紫外探测器的模拟与分析

用MEDICI软件对金属-半导体-金属(MSM)结构4H-SiC紫外(UV)探测器的I-V特性以及光谱响应等特性进行了模拟与分析,并探讨了金属电极的宽度、电极间距以及外延层厚度对探测器响应度的影响.结果表明,室温下该探测器的暗电流线性密度达到10-13A/μm,且在不同电压下光电流至少比暗电流大两个数量级;探测器的光谱响应范围为200~400 nm,在347 nm处响应度达到极大值;增大指宽或者减小指间距可以提高探测器的响应度;当波长小于峰值波长时外延层厚度对探测器的响应度基本没影响,而当波长大于峰值波长时随着外延层厚度的增大探测器的响应度有所增大.     

应用于深紫外波段的AlGaN光电探测器研究

本文报道了肖特基二极管深紫外光电探测器的制备.此器件制作在GaN外延层上,其中外延层利用金属有机化学汽相沉积(MOCVD)的方法生长在4in的Si(111)片上.利用光谱响应度测量法确定GaN的截止波长在近紫外波段(200～400 nm);在紫外波段(5～20 nm),利用位于Berliner Elektronen speicherring-Gesellschaft ftir Synchrotronstrahlung (BESSY)的PhysikalischTechnische Bundesanstah(PTB)设备完成了绝对光谱响应度测量与同步加速器辐射.此工作是在欧洲空间局(ESA)支持的盲区太阳探测器项目框架下完成的.     

高性能背照式GaN/AlGaN p-i-n紫外探测器的制备与性能

研究了GaN/AlGaN异质结背照式p-i-n结构可见盲紫外探测器的制备与性能。GaN/AlGaN外延材料采用金属有机化学气相沉积（MOCVD）方法生长，衬底为双面抛光的蓝宝石，缓冲层为AlN，n型层采用厚度为0.8 μm的Si掺杂Al0.3Ga0.7N形成窗口层，i型层为0.18 μm的非故意掺杂的GaN，p型层为0.15 μm的Mg掺杂GaN。采用Cl2、Ar和BCl3感应耦合等离子体刻蚀定义台面，光敏面面积为1.96×10-3 cm2。可见盲紫外探测器展示了窄的紫外响应波段，响应区域为310~365 nm，在360 nm处响应率最大，为0.21 A/W，在考虑表面反射时，内量子效率达到82％；优质因子R0A为2.00×108 Ω·cm2，对应的探测率D*=2.31×1013 cm·Hz1/2·W-1；且零偏压下的暗电流为5.20×10-13 A。     

应用于深紫外波段的AIGaN光电探测器研究

本文报道了肖特基二极管深紫外光电探测器的制备。此器件制作在GaN外延层上，其中外延层利用金属有机化学汽相沉积(MOCVD)的方法生长在4in的Si(111)片上。利用光谱响应度测量法确定GaN的截止波长在近紫外波段(200～400 nm)；在紫外波段(5～20 nm)，利用位于Berliner Elektronen speicherring－Gesellschaft für Synchrotronstrahlung(BESSY)的PhysikalischTechnische Bundesanstalt(PTB)设备完成了绝对光谱响应度测量与同步加速器辐射。此工作是在欧洲空间局(ESA)支持的盲区太阳探测器项目框架下完成的。     

基于银纳米薄膜欧姆接触的高波长选择性紫外探测器研究

常规的半导体紫外探测器波长响应范围宽,而紫外光的应用具有较强的波长选择性,如320nm波段的紫外光在医学方面有重要的应用,因此,具有高波长选择性的紫外探测器的研制有重要意义。文章采用GaN基p-i-n探测器结构,通过在p区覆盖银纳米薄膜作为欧姆接触层和波长选择透射层,成功制备了对320nm波段紫外光高选择性探测的紫外探测器,器件性能如下:70nm银层的紫外光透射率峰值超过30%,器件在-5V偏压下的暗电流为10-12 A量级,响应峰值为0.06A/W,响应峰发生在325nm处,光谱响应峰半高宽约30nm。     

p-GaN-i-GaN/AlGaN multiple-quantum well n-AlGaN back-illuminated ultraviolet detectors

The spectral response of back-surface-illuminated p-GaN-i-GaN/AlGaN multiplequantum well (MQW)-n-AlGaN ultraviolet (UV) photodetector is reported. The structure was grown by molecular-beam epitaxy on a c-plane sapphire substrate. A MQW is introduced into the active region of the device to enhance the quantum efficiency caused by the high absorption coefficient of the two-dimensional (2-D) system. Another advantage of using MQW in the active region is the ability to tune the cutoff wavelength of the photodetector by adjusting the well width, well composition, and barrier height. The zero-bias peak responsivity was found to be 0.095 A/W at 330 nm, which corresponds to 36% quantum efficiency from as-grown p-i-n GaN/AlGaN MQW devices. An anomalous effect, occurring in responsivity as a negative photoresponse in the spectra peaked at 362 nm because of poor ohmic contact to p-type GaN, was also observed. Etching the sample in KOH for 30 sec before fabrication removed the surface contaminants and improved the surface smoothness of the as-grown sample, resulting in significant improvement in the device performance, giving a peak responsivity of 0.12 A/W. The device has a quantum efficiency of 45% at 330 nm without the anomalous negative photocurrent.     

Improvement of metal-semiconductor-metal GaN photoconductors

Metal-semiconductor-metal photoconductors made on GaN usually exhibit a slow response time and a low responsivity. We have carried out a systematic study on the performance of the photoconductors made from GaN grown by metalorganic chemical vapor deposition using different growth conditions and have found that both response time and responsivity of the GaN detector are improved when the material is grown using increased ammonia flow rates. The best GaN ultraviolet photoconductive detector shows a response time of 0.3 ms and a responsivity of 3200 A/W at 365 nm under an operation bias of 10 V. We attribute this improvement to the reduction of the point defects in GaN.     

Performance of Deep Ultraviolet GaN Avalanche Photodiodes Grown by MOCVD

We report high-performance GaN ultraviolet (UV) p-i-n avalanche photodiodes (APDs) fabricated on bulk GaN substrates. The fabricated GaN p-i-n diodes demonstrated optical gains > 10⁴ and low dark current densities operating at wavelengths from 280 to 360 nm. The result is among the highest III-N-based APD gains at the deep UV wavelength of 280 nm reported to date.     

Realization of Erythemal UV Detectors Using Ni/GaN Schottky Junctions

In this paper, we present the design, fabrication, and characterization of a novel UV photodetector with a cutoff wavelength of 300 nm without utilizing AlGaN-based junctions or multilayer optical filters. The active region of the device consists of a pair of Ni/GaN Schottky junctions connected in antiparallel configuration. Each junction, by itself, exhibits a cutoff wavelength of 360 nm—characteristic of band-to-band absorption in GaN. A polymer film, which exhibits strong absorption of photons at about 320 nm and below, is deposited on top of one of the Schottky junctions. Due to the antiparallel connection of the two junctions, the overall photocurrent is the difference between the two individual junctions. Our experimental results clearly demonstrate the photocurrent cancellation effect. Using this novel design, we have successfully pushed the cutoff wavelength of the complete device down to approximately 300 nm.      

InGaN/GaN multi-quantum-well-based light-emitting and photodetective dual-functional devices

In this study, we fabricated and characterized an InGaN/GaN multi-quantum-well (MQW)-based p-n junction photodetector (PD) for voltage-selective light-emitting and photo-detective applications. The photode-tector exhibits a cutoff wavelength at around 460nm which is close to its electroluminescence (EL) peak position. The rejection ratio was determined to be more than three orders of magnitude. Under zero bias, the responsivity of the device peaks at 371 nm, with a value of 0.068 A/W, corresponding to a 23% quantum efficiency.The overall responsivity gradually rises as a function of reverse bias, which is explained by the enhanced photocarrier collection efficiency.     

TiO2薄膜紫外探测器的光电特性

采用溶胶-凝胶法（Sol-Gel），在Si衬底上生长了TiO2纳米薄膜，并用此材料制备了光电导型的TiO2薄膜紫外光探测器．通过测量探测器的光电流与照射光波长的关系，可以看出，TiO2探测器在紫外波段230～280nm有很明显的光响应，光电流谱线近乎平坦；在280nm处光响应出现明显下降，且跨度较大，直至360nm又再次趋于平坦．测量了250nm波长处的响应度和外加偏压的关系，发现响应度随外加偏压的增加而增加，5V时达到饱和．     

p-GaN/Al0.35Ga0.65N/GaN应变量子阱肖特基紫外探测器

报道了p-GaN/Al0.35Ga0.65N/GaN应变量子阱结构的肖特基紫外探测器的制备及性能.器件的测试结果表明,在p-GaN/Al0.35Ga0.65N/GaN双异质结中强烈的压电极化和Stark效应共同作用下使得器件在正偏和反偏时的响应光谱都向短波方向移动了10nm.零偏下器件在280nm时的峰值响应为0.022A/W,在反向偏压为1V时,峰值响应增加到0.19A/W,接近理论值.在正向偏压下器件则呈平带状态,并在283和355nm处分别出现了两个小峰.在考虑极化的情况下,通过器件中载流子浓度分布的变化解释了器件在不同偏压下的响应特性,发现p-GaN/Al0.35Ga0.65N/GaN中的极化效应对器件的响应特性影响很大,通过改变偏压和适当的优化设计可以使探测器在紫外波段进行选择性吸收.     

高响应度InGaAs PIN光电探测器的研制

分析了影响探测器响应度的各因素,在此基础上设计了InGaAs/InP PIN探测器的外延材料结构并优化了增透膜厚度和p-InP区欧姆接触电极图形的设计,以达到提高响应度的目的。采用MOCVD技术和闭管扩散等工艺制备了器件并测量了其响应度。结果显示,器件的光谱响应范围为1000~1600nm,在1500nm激光的辐照下,5V反向偏压时器件的响应度可达0.95A/W以上。     

高响应度InGaAs PIN光电探测器的研制

分析了影响探测器响应度的各因素，在此基础上设计了InGaAs/InP PIN探测器的外延材料结构并优化了增透膜厚度和p-InP区欧姆接触电极图形的设计，以达到提高响应度的目的。采用MOCVD技术和闭管扩散等工艺制备了器件并测量了其响应度。结果显示，器件的光谱响应范围为1000-1600nm，在1500nm激光的辐照下，5V反向偏压时器件的响应度可达0.95A/W以上。