散射对量子阱隧穿电流的影响

本文从单带双谷模型出发研究了电子在量子阱内遭到散射时电子状态及隧穿几率的变化。弹性散射使用δ散射势来计算,非弹性散射则用虚散射势来描述。前者使隧穿电流峰向高电压端移动,后者减弱了电流峰的谐振强度。分别讨论了位于势阱和势垒层中的散射中心的不同散射作用。隧穿电流的变化趋势同中子辐照实验数据相吻合。     

双量子阱结构中电子共振隧穿的相干模型

提出了一种新的计算双量子阱结构中电子共振隧穿时间的相干模型,理论计算与报道的实验结果基本一致.进一步的讨论表明,在有电子散射的情况下,随着势垒厚度的增加,对比度存在极大值,而与类Fabry-Perot模型的单调增加趋势明显不同.     

子阱及非对称势垒对GaN RTD电学特性的影响

利用Silvaco软件对Al0.2Ga0.8N/GaN共振隧穿二极管(RTD)进行仿真,重点研究了InGaN子量子阱结构及相应非对称势垒结构设计对其电流特性的影响。对比分析了子量子阱结构中InGaN的In组分和子阱厚度对RTD微分负阻(NDR)特性的影响,得出了提升器件性能的最佳参数范围。为了克服Al0.2Ga0.8N/GaN RTD势垒低对器件电流峰谷比(PVCR)的影响,在子量子阱结构的基础上引入了非对称势垒结构设计,通过改变收集区侧势垒的高度和厚度,将AlGaN/GaN的Ip和PVCR由基本结构的0.42 A和1.25,提高到了0.583 A和5.01,实现了器件性能的优化,并为今后的器件研制提供了设计思路。     

轴向应变对双势垒结构共振隧穿的影响

首先介绍了共振隧穿理论和一种新效应--介观压阻效应,对AlxGa1-xAs/GaAl/AlxGa1-xAs共振隧穿双势垒结构的轴向施加压应变作了分析,然后计算了轴向应变对垒宽和垒高的影响,对透射系数和隧穿电流用Matlab作了仿真.发现压应变可以使隧穿电流线性增加,偏压不同电流增加的速率也不同,为设计共振隧穿器件提供了理论依据.     

电子在半导体多势垒结构中隧穿现象的研究与进展

文中以探索多势垒结构的电子隧穿物理及其器件结构与性能为出发点,论述了多势垒结构隧穿现象的研究与进展。概述了一维半导体异质结构隧穿现象的解析解和数值计算。重点介绍了电子通过半导体双势垒结构产生隧穿现象的研究进展,即电子通过双势垒结构横纵波矢的耦合行为与共振准能级及共振准能级寿命的解析计算。     

三势垒共振隧穿结构中极大增强的光生空穴共振隧穿

研究了电子隧穿出射端嵌入1.2 μm厚n型弱掺杂GaAs层的三势垒双阱隧穿结构,观察到了隧穿峰谷比高达36的光生空穴共振隧穿峰.研究证实1.2 μm厚n型弱掺杂GaAs层在光照下产生的大量光生空穴以及空穴隧穿出射端的23 nm宽的量子阱中量子化的空穴能级对空穴隧穿谷电流的限制作用,是导致高峰谷比的光生空穴隧穿现象的主要原因.     

室温下nc-Si/SiO2多层膜结构中的共振隧穿现象

采用等离子体淀积和原位氧化技术,并结合后续的热退火处理制备了nc-Si/SiO2 多层膜结构。通过电流电压特性对室温下器件中的载流子输运过程进行了表征。在正向和反向偏压下的电流电压特性曲线中都表现出了由于共振隧穿引起的负微分电导。共振隧穿产生的峰值电流对应的电压值与器件结构中的势垒层厚度相关,势垒层越厚,发生隧穿的峰值电压越高。文中通过器件的能带结构简图和等效电路图对正向、反向偏压下的共振隧穿峰值电压差异进行了细致的分析。     

抛物形量子阱的共振隧穿

文中通过求解薛定谔方程得到抛物型形量子阱的变换矩阵与透射系数。利用这一结果计算透射系数可以达到任意高的精度，最后，讨论了结构变化对抛物型量子阱的共振隧穿的影响。     

量子阱中电子隧穿逃逸时间的研究

用波包方法计算了电子从量子阱中的隧穿逃逸时间随外加偏压的变化，与实验结果符合良好，通常半经典近似模型与实验结果偏离较大，通过对两者的比较给出了改进的半经典模型，大大简化了隧穿逃逸时间的计算。     

耦合双量子点中基态电子的隧穿特性

介绍了以Si/SiO2系统构成的量子异或门的工作原理,研究了耦合不对称双量子点所构成的量子比特的电子隧穿特性.研究结果表明,通过栅压可很好地实现控制电子在两个量子点间共振隧穿,其隧穿时间随势垒厚度和量子点尺寸结构参数发生显著的变化.目前模拟的特征变化曲线表明,可获得实验上理想的隧穿时间(工作频率)和相应的栅压(工作电压).     

A study of resonant tunneling in a 3-terminal ballistic device

Preliminary results are presented for a 3-terminal device fabricated by incorporating a narrow quantum well into the collector barrier of a unipolar hot electron transistor. The structure allows unique studies of the mechanism of resonant tunneling in which the carrier injection energy and the bias across the double barrier can be independently varied. The transistor clearly shows an additional current collection threshold representing as much as 10% of the injected current attributable to tunneling via the single subband in the quantum well. This interpretation is confirmed by measurements in perpendicular and parallel magnetic fields despite the fact that theoretical estimates of the resonant tunneling current without scattering are many orders of magnitude smaller, and there are strong indications that elastic scattering in the well is responsible for the enormous discrepancy. The data tend to support proposals (Guéret, 1989a, 1989b; Wolak, 1988) that elastic scattering is responsible for the large valley currents in resonant tunneling diodes, and it appears that the tunnel process may not be completely incoherent as has frequently been assumed up to now.     

一种精确求解超薄栅NMOS器件隧穿电流的模型

提出了一种精确求解隧穿电流的模型。通过自洽求解一维薛定谔方程和泊松方程,得到NMOS器件的半导体表面电势分布、反型层二维电子气的量子化能级以及对应的载流子浓度分布。为计算隧穿电流,采用了多步势垒逼近方法计算栅氧化物势垒层的隧穿几率,从而避免了WKB方法在突变边界处波函数不连续带来的缺陷。通过考虑(100)Si衬底的导带多能谷效应和栅极多晶硅耗尽效应,讨论了不同栅氧化层厚度下隧穿电流与栅压的依赖关系。模拟结果与实验数据吻合。     

半导体量子器件

概述了半导体量子微结构中的量子效应，并介绍了谐振隧道器件，评述了新的量子微结构，如单电子隧道器件，电子波衍射晶体管和量子线量子箱激光器的开发，还讨论了量子微结构的尺寸要求和研究课题。     

多量子阱系统结构变化对电子共振隧穿的影响

文中通过求解薛定谔方程得到由Ｎ个矩形势垒构成的量子系统的变换矩阵和电子透射系数的精确解，研究了多量子阱系统结构变化对电子共振隧穿的影响。     

Single‐Electron Tunneling through Molecular Quantum Dots in a Metal‐Insulator‐Semiconductor Structure

A sigle‐electron tunneling (SET) in a metal‐insulator‐semiconductor (MIS) structure is demonstrated, in which C₆₀ and copper phthalocyanine (CuPc) molecules are embedded as quantum dots in the insulator layer. The SET is found to originate from resonant tunneling via the energy levels of the embedded molecules, (e.g., the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO)). These findings show that the threshold voltages for SET are tunable according to the energy levels of the molecules. Furthermore, SET is observable even near room temperature. The results suggest, together with the fact that these properties are demonstrated in a practical device configuration, that the integration of molecular dots into the Si‐MIS structure has considerable potential for achieving novel SET devices. Moreover, the attempt allows large‐scale integration of individual molecular functionalities.     

Experimental evidence of inelastic tunneling in stress-inducedleakage current

We propose a new experimental technique to study the transport properties of stress-induced leakage current (SILC). Based on the carrier separation measurement for p-channel MOSFETs, the quantum yield of impact ionization for electrons involved in the SILC process is evaluated directly from the change in the source and gate currents of p-MOSFETs before and after stressing. Since the relationship between the electron energy and the quantum yield is established for direct and FN tunneling currents, the electron energy of electrons involved in the SILC process can be determined from the quantum yield. The results reveal that the measured energy of electrons in the SILC process is lower roughly by 1.5 eV than the energy expected in the elastic tunneling process. Trap-assisted inelastic tunneling model is proposed as a conduction mechanism of SILC accompanied by energy relaxation. It is shown, through the evaluation of the substrate hole current in n-channel MOSFETs, that the contribution of trap-assisted valence electron tunneling, another possible mechanism to explain the energy relaxation, to SILC is small     

基于密度梯度理论的MOS量子隧穿解析模型

提出了一种基于物理的MOS电容超薄氧化层量子隧穿解析模型,量子力学效应在应用奇异微扰法求解密度梯度方程时得以体现.将泊松方程和经量子修正的电子势方程同时求解,得出电子和静电势在垂直于沟道方向的分布.结果反映出量子效应明显不同于经典物理学的预测.对解析解结果和精确的数值模拟进行比较,结果表明,在栅极偏压和氧化层厚度的较大变化范围内,二者都能很好地吻合.     

Electron beam pre-patterning for site-control of self-assembled InAs quantum dots on Inp surfaces

A site control technique for individual InAs quantum dots (QDs) formed by self-assembling has been developed, using scanning electron microscope (SEM) assisted nano-deposition and metal organic vapor phase epitaxy (MOVPE). In a first step we characterize a device with randomly distributed InAs QDs on InP, using resonant tunneling and transmission electron microscopy (TEM). Secondly, we use nano-scale deposits, created at the focal point of the electron beam on an InP based heterostructure, as “nano growth masks”. Growth of a thin InP layer produces nano-holes above the deposits. The deposits are removed by oxygen plasma etching. When InAs is supplied on this surface, QDs are self-assembled at the hole sites, while no InAs dots are observed in the flat surface region. A vertical single electron tunneling device is proposed, using the developed technique.     

新型电子器件和光学器件的共振隧穿结构

描述了一种新型共振隧穿结构器件，这种器件包含了通过可变间隙超晶格能量滤波器（ＶＳＳＥＦ）中的耦合量子附态的隧穿过程．论证了通过ＡｌＡｓ／ＧａＡｓＶＳＳＥＦ器件高能态和ＡｌＧａＡｓ／ＧａＡｓ超晶格受激态的共振隧穿，描述了这种器件作为较高功率微波源和共振隧穿晶体管的应用，并讨论了共振隧穿结构作为雪崩探测器和红外发射器等光学器件的潜在应用．