基于InP基HEMTs的W波段高增益低噪声放大MMIC（英文）

基于自主研发的InP基高电子迁移率晶体管工艺设计并制作了一款W波段单级低噪声放大单片毫米波集成电路.共源共栅拓扑结构和共面波导工艺保证了该低噪声放大器紧凑的面积和高的增益,其芯片面积为900μm×975μm,84~100 GHz频率范围内增益大于10 dB,95 GHz处小信号增益达到最大值为15.2dB.根据调查对比,该单级放大电路芯片具有最高的单级增益和相对高的增益面积比.另外,该放大电路芯片在87.5 GHz处噪声系数为4.3 dB,88.8 GHz处饱和输出功率为8.03 dBm.该低噪声放大器芯片的成功研制对于构建一个W波段信号接收前端具有重要的借鉴意义.     

硅基毫米波高增益LNA技术研究

针对W波段硅基工艺电路面临的功率增益低、效率低以及噪声差等挑战,本文研究硅基毫米波高增益低噪声放大器（Low Noise Amplifier,LNA）技术。该LNA采用带有射极电感反馈的共射放大器,并通过五级共射放大器级联构成。第一级电路通过提供最小噪声偏置电流,并利用最小噪声匹配实现低噪声性能,后级电路通过提供高增益偏置电流实现高增益性能。另外,为了减小射频信号到衬底的损耗以及信号与旁路元件的耦合,有效提高低噪声放大器的性能,用于匹配电路的电感全部采用传输线形式—接地共面波导。低噪声放大器在中心频率94 GHz处的增益S21达到25.2 dB,噪声系数NF小至5.1dB。在90～100 GHz频段内,输入反射系数S11小于-10 dB,输出反射系数S22稳定在-20 dB左右,芯片面积为500 μm×960 μm。     

InAlAs/InGaAs/InP基PHEMTs小信号建模及低噪声应用

利用改进的小信号模型对采用100nmInAlAs/InGaAs/InP工艺设计实现的PHEMTs器件进行建模, 并设计实现了一款W波段单片低噪声放大器进行信号模型的验证。为了进一步改善信号模型低频S参数拟合差的精度, 该小信号模型考虑了栅源和栅漏二极管微分电阻, 在等效电路拓扑中分别用Rfs和Rfd表示.为了验证模型的可行性, 基于该信号模型研制了W波段低噪声放大器单片.在片测试结果表明:最大小信号增益为14.4dB@92.5GHz, 3dB带宽为25GHz@85-110GHz.而且, 该放大器也表现出了良好的噪声特性, 在88GHz处噪声系数为4.1dB, 相关增益为13.8dB.与同频段其他芯片相比, 该放大器单片具有宽3dB带宽和高的单级增益.     

InAlAs/InGaAs/InP基PHEMTs小信号建模及低噪声应用（英文）

利用改进的小信号模型对采用100nmInAlAs/InGaAs/InP工艺设计实现的PHEMTs器件进行建模,并设计实现了一款W波段单片低噪声放大器进行信号模型的验证。为了进一步改善信号模型低频S参数拟合差的精度,该小信号模型考虑了栅源和栅漏二极管微分电阻,在等效电路拓扑中分别用Rfs和Rfd表示.为了验证模型的可行性,基于该信号模型研制了W波段低噪声放大器单片.在片测试结果表明:最大小信号增益为14.4dB@92.5GHz,3dB带宽为25GHz@85-110GHz.而且,该放大器也表现出了良好的噪声特性,在88GHz处噪声系数为4.1dB,相关增益为13.8dB.与同频段其他芯片相比,该放大器单片具有宽3dB带宽和高的单级增益.     

基于GaAs pHEMT的1.0～2.4 GHz放大衰减多功能芯片

基于0.25 μm GaAs赝高电子迁移晶体管(pHEMT)工艺,研制了一种1.0～2.4 GHz的放大衰减多功能芯片,该芯片具有低噪声、高线性度和增益可数控调节等特点。电路由第一级低噪声放大器、4位数控衰减器、第二级低噪声放大器依次级联构成,同时在片上集成了TTL驱动电路。为获得较大的增益和良好的线性度,两级低噪声放大器均采用共源共栅结构(Cascode)。测试结果表明,在1.0～2.4 GHz频带范围内,该芯片基态小信号增益约为36 dB,噪声系数小于1.8 dB,输出1 dB压缩点功率大于16 dBm,增益调节范围为15 dB,调节步进1 dB,衰减RMS误差小于0.3 dB,输入输出电压驻波比小于1.5。其中放大器采用单电源+5 V供电,静态电流小于110 mA,TTL驱动电路采用-5 V供电,静态功耗小于3 mA。整个芯片的尺寸为3.5 mm×1.5 mm×0.1 mm。     

Ka波段单片低噪声放大器

利用0.25 μm GaAs PHEMT工艺设计并制作了一种Ka波段低噪声放大器芯片.提出了适用于低噪声放大器的PHEMT器件特征.电路采用四级级联结构.利用微带电路实现输入、输出和级间匹配.通过对电路增益、噪声系数和驻波比等指标进行多目标优化,确定了器件参数.该放大器测试结果为:26.5～36 GHz频段内增益大于20 dB;多数测试点噪声系数小于3 dB,其中34 GHz频点噪声仅为1.94 dB;芯片面积2.88 mm×1 mm.     

（英）D波段InP基高增益、低噪声放大芯片的设计与实现

利用90-nm InAlAs/InGaAs/InP HEMT工艺设计实现了两款D波段（110~170 GHz）单片微波集成电路放大器。两款放大器均采用共源结构,布线选取微带线。基于器件A设计的三级放大器A在片测试结果表明：最大小信号增益为11.2 dB@140 GHz,3 dB带宽为16 GHz,芯片面积2.6×1.2 mm2。基于器件B设计的两级放大器B在片测试结果表明：最大小信号增益为15.8 dB@139 GHz,3dB带宽12 GHz,在130~150 GHz频带范围内增益大于10 dB,芯片面积1.7×0.8 mm2,带内最小噪声为4.4 dB、相关增益15 dB@141 GHz,平均噪声系数约为5.2 dB。放大器B具有高的单级增益、相对高的增益面积比以及较好的噪声系数。该放大器芯片的设计实现对于构建D波段接收前端具有借鉴意义。     

D波段InP基高增益低噪声放大芯片的设计与实现（英文）

利用90nmInAlAs/InGaAs/InPHEMT工艺设计实现了两款D波段(110～170GHz)单片微波集成电路放大器.两款放大器均采用共源结构,布线选取微带线.基于器件A设计的三级放大器A在片测试结果表明:最大小信号增益为11.2dB@140GHz,3dB带宽为16GHz,芯片面积2.6mm×1.2mm.基于器件B设计的两级放大器B在片测试结果表明:最大小信号增益为15.8dB@139GHz,3dB带宽12GHz,在130～150GHz频带范围内增益大于10dB,芯片面积1.7mm×0.8mm,带内最小噪声为4.4dB、相关增益15dB@141GHz,平均噪声系数约为5.2dB.放大器B具有高的单级增益、相对高的增益面积比以及较好的噪声系数.该放大器芯片的设计实现对于构建D波段接收前端具有借鉴意义.     

宽带低噪声放大器单片微波集成电路

从行波放大器设计理论出发,研制了一款基于低噪声GaAs赝配高电子迁移率晶体管(PHEMT)工艺设计的2~20 GHz单片微波集成电路(MMIC)宽带低噪声放大器。该款放大器由九级电路构成。为了进一步提高放大器的增益,采用了一个共源场效应管和一个共栅场效应管级联的拓扑结构,每级放大器采用自偏压技术实现单电源供电。测试结果表明,本款低噪声放大器在外加+5 V工作电压下,能够在2~20 GHz频率内实现小信号增益大于16 dB,增益平坦度小于±0.5 dB,输出P-1 dB大于14 dBm,噪声系数典型值为2.5 dB,输入和输出回波损耗均小于-15 dB,工作电流仅为63 mA,低噪声放大器芯片面积为3.1 mm×1.3 mm。     

220GHz低噪声放大器研究

基于IHP锗硅BiCMOS工艺,研究和实现了两种220 GHz低噪声放大器电路,并将其应用于220 GHz太赫兹无线高速通信收发机电路。一种是220 GHz四级单端共基极低噪声放大电路,每级电路采用了共基极（Common Base, CB）电路结构,利用传输线和金属-绝缘体-金属(Metal-Insulator-Metal, MIM)电容等无源电路元器件构成输入、输出和级间匹配网络。该低噪放电源的电压为1.8 V,功耗为25 mW,在220 GHz频点处实现了16 dB的增益,3 dB带宽达到了27 GHz。另一种是220 GHz四级共射共基差分低噪声放大电路,每级都采用共射共基的电路结构,放大器利用微带传输线和MIM电容构成每级的负载、Marchand-Balun、输入、输出和级间匹配网络等。该低噪放电源的电压为3 V,功耗为234 mW,在224 GHz频点实现了22 dB的增益,3 dB带宽超过6 GHz。这两个低噪声放大器可应用于220 GHz太赫兹无线高速通信收发机电路。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.