Effects of Ag layers on the SiO2/FePt thin films deposited by magnetron sputtering

The effects of Ag layers with different locations and thicknesses on the structural and magnetic property of SiO2/FePt multilayer films were investigated.The non-magnetic Ag layer plays an important role in inducing（001） orientation and ordering of FePt grains,as well as the SiO2-doping reducing the grain size and the magnetic exchange coupling between grains.When the 10 nm Ag layer is moved from the bottom to the top of the SiO2/FePt multilayer film,the coercivity gradually decreases;the largest difference between the out-of-plane coercivity and the in-plane one is obtained in the sample of [SiO2（2 nm）/FePt（3 nm）]3/Ag（10 nm）/[SiO2（2 nm）/FePt（3 nm）]2.Furthermore,the location of Ag layers was fixed and the thickness was changed.The XRD curves suggest that the intensity of the（001） peak becomes the strongest with the addition of 10 nm Ag layers.     

（001）-oriented FePt/Ag composite films for perpendicular recording

FePt/Ag thin films were deposited by magnetron sputtering onto 7059 glass substrates, then were annealed at 550 ℃ for 30 min. Nanostructured FePt/Ag films were successfully obtained with the magnetic easy axis of L10 FePt perpendicular to the film plane. It was found that the development of (001) texture depended strongly on the thicknesses of FePt magnetic layer and Ag underlayer. The L10 ordered FePt(15 nm)/Ag(50 nm) with (001) orientation can be obtained. And the perpen-dicular coercivity of FePt(15 nm)/...     

Magnetic properties and structure of （001）-oriented [CoPt/C]n/Ag nanocomposite films on the glass substrates

The highly （1301） oriented triple system of [CoPt/C]n/Ag films was deposited on glass substrates by DC and RF magnetron sputtering. After annealing at 600℃ for 30 min, thin films become magnetically hard with coercivities in the range of 160-875 kA/m because of high anisotropy associated with the L10 ordered phase. C doping plays an important role in improving （001） texture and reducing the intergrain interactions. The oriented growth of CoPt films was influenced strongly by the number of repetitions （n） of CoPt/C. By controlling the C content and the number of repetitions （n） of CoPt/C, nearly perfect （001） orientation can be obtained in the [CoPt3nm/C3nm]5/Ag50 nm.     

[FePt/C]n多层膜的结构和磁学性能

采用磁控溅射方法制备FePt（50nm）和[FePt（2nm，3nm，5nm）／C（1nm）]。膜，并在550℃退火30min，研究了周期数（n）对FePt／C系列多层膜结构及磁学性能的影响。结果表明：退火后多层膜的矫顽力在总膜层厚度约为30nm时出现最大值；随着n的增大，多层膜的饱和磁化强度和晶粒尺寸均不断增大；C的加入可以有效降低晶粒间交换耦合作用。刚此可以通过控制周期数得到县仃合适的微观结构和高的磁学性能的FePt／C多层膜，从而满足超高密度磁记录介质的要求。     

FePt/Cu多层膜化降低L10-FePt有序化温度

采用直流磁控溅射方法制备FePt／Cu多层膜,再经不同温度下真空热处理得到有序L10-(FePt)100-xCux薄膜．结果表明,Cu的添加可以降低FePt薄膜有序化温度．[FePt(4nm)／Cu(0．2nm)10多层膜在350℃热处理1h后,有序度增至0．6,矫顽力达到421kA／m．对插入极薄Cu层促进有序化在较低的温度下进行的热力学和动力学因素进行了讨论.     

Preparation of TiAlN/ZrN and TiCrN/ZrN multilayers by RF magnetron sputtering

Titanium-based nitride coatings on cutting tools, press molds and dies can be used to prolong their life cycle because of their superior corrosion and oxidation resistance. TiAlN/ZrN and TiCrN/ZrN multilayer coatings were prepared by RF magnetron sputtering, and their microstructural evolution and corrosion resistance during heat treatment were investigated. The TiAlN/ZrN and TiCrN/ZrN multilayer coatings are degraded by heating up to 600 °C with the formation of oxides particles on the surface. During the heat treatment, the TiCrN/ZrN and TiAlN/ZrN multilayer coatings show the lowest corrosion current density and the highest polarization resistance at temperature range of 400–500 °C. Consequently, the TiAlN/ZrN and TiCrN/ZrN multilayer coatings show good corrosion resistance at temperature range of 400–500 °C during heating.     

Effect of Ag（Ti） underlayers on CoCrPt thin film media

1　INTRODUCTIONMany works have been done in recent years onCo based granular alloys for potential applicationsas recording magnetic media[1 5]. The ideal granu lar media should consist of small and uniformgrains. High anisotropy magnetic grains embeddedin a robust non magnetic matrix are required. Highcoercivity, large squareness and negative nuclea tion field are very important for magnetic recordingfilms.The addition of Pt to the recording layer canincrease the anisotrop…     

磁控溅射制备NiO/Ni多层膜的结构和光电性能

利用反应磁控溅射和常规磁控溅射方法交替沉积了NiO/Ni纳米多层膜,研究了不同退火环境下多层膜的相结构、微观结构演化及光电性能。XRD和TEM结果表明,沉积态薄膜呈现明显的NiO和Ni交替多层结构;大气退火的NiO/Ni多层膜被氧化成沿(111)晶面择优生长的NiO薄膜;而真空退火的NiO/Ni薄膜仍然保持着明显的多层结构,各层膜的结晶程度提高。沉积态和真空退火态的NiO/Ni多层膜呈现低可见光透过率和低电阻率的特点,电阻率达到10-5?·cm数量级;大气退火的NiO/Ni多层膜呈现49.3%可见光平均透过率和高的电阻特性。     

NdFeB表面磁控溅射沉积Ti/Al多层膜的结构及耐腐蚀性能

采用直流磁控溅射技术在烧结NdFeB磁体表面沉积Ti/Al多层膜,并研究其结构及在NaCl溶液中的耐腐蚀性能。在Ti/Al多层膜中,Ti层为密排六方结构,成功打断了Al层(面心立方结构)的柱状晶结构生长。与纯Al膜相比,Ti/Al多层膜具有更致密的表面,且周期数增加,表面越平整致密。动电位极化曲线结果发现,纯Al膜试样的自腐蚀电流密度为1.9×10-5 A/cm-2左右,5周期Ti/Al多层膜试样的自腐蚀电流密度约为1.1×10-7 A/cm2,比纯Al膜小近两个数量级,且随着多层膜周期数的增加,其腐蚀电流密度进一步减小。这些结果表明在快速且破坏性强的腐蚀情况下,Ti/Al多层膜抗腐蚀能力比纯Al膜好,且随着周期数的增加进一步提高。NaCl溶液中长期腐蚀试验时,Ti/Al多层膜的耐腐蚀性能不如纯Al膜,这可能是由Ti层和Al层间形成原电池且多层膜应力较大导致。     

退火[Co＼Cu]多层膜的固相反应与磁性

用双对向靶溅射方法制备了两种成分的「Ｃｏ（１．２ｎｍ）／Ｃｕ（ｔＣｕ）」（ｔＣｕ＝１．０ｎｍ，３．４ｎｍ）纳米多层膜。分别用ＴＥＭ和ＴＧ方法研究了「Ｃｏ／Ｃｕ」多层膜结构和磁怀随温度的变化。结果表明：ｔＣｕ＝１．０ｎｍ的多层样品出现了两个磁性转变点，这是因为样品中存在的两种磁性物质。ＴＥＭ分析结果证明这两种铁磁相为ｈｃｐＣｏ－Ｃｕ固溶体。     

Effect of overall composition on thermally induced solid-state transformations in thick EB PVD Al/Ni multilayers

Multilayered Ni/Al samples 20–70 μm thick of different average stoichiometries were prepared by electron-beam physical vapour deposition technique. The periodicity in the multilayers varied between 0.2 μm and 0.8 μm. The course of the solid-state transformations initiated by heating the samples at a constant rate has been studied. Intermetallic Al₃Ni was found to be the first phase to form upon heating of all samples studied. Further reactions were dependent on the average composition of the sample so that Al–Ni compounds increasingly richer in Ni formed as the nickel content increased. In general, the phases Al₃Ni, Al₃Ni₂, AlNi, and AlNi₃ have been observed upon heating the samples to 600 °C. The phases were more likely to form in succession rather than to grow simultaneously.     

铁氧体表面Cr/Ni/Ag复合薄膜制备及性能研究

目的利用真空镀膜技术对铁氧体电磁感芯表面进行金属化处理,对金属薄膜的结构及性能进行综合分析,为其实现工程应用提供一定的理论基础。方法采用多腔一体式磁控溅射设备在铁氧体磁体表面依次沉积Cr、Ni、Ag,作为铁氧体表面复合金属薄膜。采用扫描电镜对复合薄膜表面、截面形貌进行表征;利用原子力显微镜对复合薄膜表面粗糙度进行测量;利用划格法对复合薄膜附着力进行测试;利用冲压试验对复合薄膜剥离强度进行测试;利用拉伸试验对复合薄膜结合强度进行测试;利用浸锡试验对复合薄膜耐焊性进行测试。结果试验制备的Cr/Ni/Ag复合薄膜各层厚度分别为420、4200、550 nm,Cr层与Ni层有明显柱状晶结构,层间界面清晰、无明显孔隙,Ag层与Ni层紧密结合。复合薄膜表面粗糙度为13 nm,附着力达0B级,结合力为30 N,抗拉强度达42 MPa。复合薄膜经过450℃浸锡18 s后,表面金属薄膜无脱焊或露底。结论采用磁控溅射技术制备的Cr(420 nm)/Ni(4200 nm)/Ag(550 nm)复合金属薄膜结构致密均匀,综合性能优异,达到铁氧体电感磁芯表面金属薄膜技术要求。     

[Co／Ti],[Co／Cu（Ni）]多层膜的结构与磁性

用双对向靶溅射方法制备了具有非晶磁性的「Ｃｏ／Ｔｉ」３０，「Ｃｏ／Ｃｕ（Ｎｉ）３０」两组多层膜，分别用Ｘ射线衍射，透射电镜和振动样品磁强计做了结构和磁性测量，在以非晶Ｃｏ和Ｃｉｕ－Ｎｉ合金构成的「Ｃｏ／Ｃｕ（Ｎｉ）」多层膜中，发现饱和磁化强度Ｍｓ随非磁性层厚度ｄｓ的增国发生振荡变化；在以非晶Ｃｏ和Ｔｉ构成的「Ｃｏ／Ｔｉ」多层膜中，ＭＳ和则随ｄｓ的增加而减小。     

沉积温度对NiCrAlY/Ag复合薄膜结构及性能的影响

目的改善GH4169合金的表面性能,制备摩擦学性能优良的复合薄膜。方法采用离子源辅助直流磁控溅射技术制备NiCrAlY/Ag复合薄膜,研究沉积温度分别为60、120、180℃对薄膜结构和性能的影响。利用能谱仪(EDS)、扫描电子显微镜(SEM)、原子力显微镜(AFM)、X射线衍射仪(XRD)进行薄膜元素成分含量、表面形貌、截面形貌、粗糙度和相结构的检测。采用纳米压痕仪、划痕法、球-盘式摩擦磨损试验机对薄膜的硬度、结合力、摩擦磨损性能进行分析。结果 NiCrAlY/Ag复合薄膜的表面致密度、晶粒尺寸以及表面粗糙度随沉积温度的升高而增大,物相组成主要为Ni3Al、Ag和Cr,薄膜的硬度在5.67～6.41GPa之间。复合薄膜的膜/基结合力随沉积温度的增加而降低,其中沉积温度为60℃时的膜基结合力最佳(33.1N),并且在此沉积温度下的复合薄膜具有最佳的室温摩擦学性能,其平均摩擦系数为0.24,磨损率为3.52×10–5 mm3/(N·m),磨损机制为氧化磨损和磨粒磨损。结论沉积温度对NiCrAlY/Ag复合薄膜的结构性能影响显著,当沉积温度为60℃时,薄膜综合性能最好。     

电压引线距离对Bi2223/Ag带材I_c和n值测量结果的影响

研究了采用四引线法测量Bi2223/Ag带材的Ic和n值时,电压引线距离对测量结果的影响。实验结果表明,对于同一根Bi2223/Ag带材,在不同的电压引线距离下,采用四引线法测得的Ic和n值(尤其是最小值)结果不同;n值弱点对带材端对端n值的影响比Ic弱点对带材端对端Ic的影响更大;对于百米量级的长带,通过测量带材端对端以及抽样短样的Ic和n值,很难检测出弱点,必须采用四引线法在较小的电压引线距离下逐段检测或者采用非接触连续磁测法进行检测。     

磁控溅射法制备碳/碳复合材料 SiC/MoSi2-ZrB2 涂层的结构及抗氧化性能研究

通过磁控溅射法在碳/碳复合材料表面成功制得了SiC/MoSi2-ZrB2陶瓷涂层并对结构及其在高温有氧环境中的抗氧化性能进行了研究。结果表明制备的SiC/MoSi2-ZrB2陶瓷涂层呈柱状晶结构且均匀性良好,其在1273K和1773K的有氧环境中氧化60min失重率分别是5.6×10-2 g/cm2 和 6.3×10-2 g/cm2。     

Modification of residual stress in Al-[AlBO]_w/Al compound plate

1　ＩＮＴＲＯＤＵＣＴＩＯＮＴｈｅｍｅｔａｌｍａｔｒｉｘｃｏｍｐｏｓｉｔｅｓｔａｋｅａｄｖａｎｔａｇｅｓｏｆｈｉｇｈｅｒｓｐｅｃｉｆｉｃｓｔｒｅｎｇｔｈ ,ｈｉｇｈｅｒｓｐｅｃｉｆｉｃｍｏｄｕｌｅ,ｌｏｗ ｅｒｔｈｅｒｍａｌｃｏｅｆｆｉｃｉｅｎｔｏｆｅｘｐａｎｓｉｏｎｅｔｃ[1 ,2 ] ,ｒｅｓｕｌｔｉｎｇｉｎａｔｙｐｉｃａｌｅｎｇｉｎｅｅｒｉｎｇｍａｔｅｒｉａｌｗｉｔｈｇｏｏｄｐｒｏｓｐｅｃｔｓ.Ｄｕｅｔｏｔｈｅｈｉｇｈｃｏｓｔ,ｔｈｅａｐｐｌｉｃａｔｉｏｎａｎｄｐｏｐｕｌａｒｉｚａ ｔｉｏｎｏｆｔｈｅｃｏ…     

Effects of protecting layer [Li,La]TiO3 on electrochemical properties of LiMn2O4 for lithium batteries

A sample of LiMn₂O₄ spinel oxide was surface-modified with lithium lanthanum titanate ([Li,La]TiO₃), which was developed as a lithium ionic conductor, by means of hydrothermal processing and subsequent heat treatment at 400 °C. The surface coating layers were analyzed by morphology observation using a transmission electron microscopy. Energy-dispersive spectrometry and X-ray photoelectron spectroscopy were used for element investigation. The surface modification effects on rate capability during cycling and capacity retention for the LiMn₂O₄ spinel oxide were confirmed. Then Mn dissolution during storage at elevated temperatures of the pristine, coated sample was characterized. The Mn dissolution characterization was based on the idea that Mn dissolution is one of the most significant reasons for capacity loss for LiMn₂O₄ spinel oxide, and this phenomenon is especially severe at elevated temperatures. Our experimental results indicate that the surface-modified sample shows much a better initial capacity and rate capability compared with the pristine sample. The [Li,La]TiO₃ coating effectively enhances the structural stability of LiMn₂O₄ at elevated temperatures, most likely because the [Li,La]TiO₃-modifying layers play a definitive role in suppressing Mn dissolution in the electrolyte during storage.