室温固相法合成ZnO纳米棒及其光学特性

在氯化钠存在下,以硫酸锌和氢氧化钠为原料,采用一步室温固相法制备了纳米氧化锌.XRD、TEM分析结果表明:所得纳米氧化锌为棒状,直径约10nm左右,长度约100～160nm.利用紫外-可见分光光度计测试了光吸收性能,发现ZnO纳米棒对200～380nm波长范围的光有很强吸收性,在可见光范围内,也有较强的吸收.ZnO纳米棒在550nm左右具有较弱的荧光发光峰且ZnO纳米棒较普通氧化锌发光峰波长发生了明显的红移.     

Optical and electrical properties of zinc oxide films prepared by spray pyrolysis

Zinc oxide thin films were prepared on glass substrates from an aqueous solution of zinc acetate by spray pyrolysis. These films were characterized using X-ray diffraction, scanning electron microscopy and optical transmission. The films were highly transparent to the visible radiation and electrically conductive. Films deposited at optimum conditions exhibited a resistivity of 3·15×10⁻³ Ωm along with a transmittance of 98% at 550 nm.     

Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition

Recently, transparent conducting oxide thin films have attracted attention for the application to transparent conducting electrodes. In this work, we evaluated the uniformity of electrical, optical and structural properties for gallium doped zinc oxide thin films prepared on the 10 × 10 cm² silica glass substrate by pulsed laser deposition. The resistivity, carrier concentration, mobility, bonding state and atomic composition of the film were uniform along in-plane and depth direction over the 10 × 10 cm² area of the substrate. The film showed the average transmittance of 81-87%, resistivity of 1.4 × 10^− 3 Ω cm, carrier concentration of 9.7 × 10²⁰/cm³ and mobility of 5 cm²/Vs in spite of the amorphous X-ray diffraction pattern. The gradual thickness distribution was found, however, the potential for large-area and low temperature deposition of transparent conducting oxide thin film using pulsed laser deposition method was confirmed.     

Synthesis,Crystal Structural and Electrical Conductivity Properties of Fe-Doped Zinc Oxide Powders at High Temperatures

The synthesis,crystal structure and electrical conductivity properties of Fe-doped ZnO powders(in the range of 0.25-15 mol%) were reported in this paper.I-phase samples,which were indexed as single phase with a hexagonal(wurtzite) structure in the Fe-doped ZnO binary system,were determined by X-ray diffraction(XRD).The solubility limit of Fe in the ZnO lattice is 3 mol% at 950℃.The above mixed phase was observed.And the impurity phase was determined as the cubic-ZnFe 2 O 4 phase when compared with standard XRD data using the PDF program.This study focused on single I-phase ZnO samples which were synthesized at 950℃ because the limit of the solubility range is the widest at this temperature.The lattice parameters a and c of the I-phase decreased with Fe-doping concentration.The morphology of the I-phase samples was analyzed with a scanning electron microscope.The grain size of the I-phase samples increased with heat treatment and doping concentration.The electrical conductivity of the pure ZnO and single I-phase samples was investigated using the four-probe dc method at 100-950℃ in air atmosphere.The electrical conductivity values of pure ZnO,0.25 and 3 mol% Fe-doped ZnO samples at 100℃ were 2×10-6,1.7×10-3 and 6.3×10-4 S.cm-1,and at 950℃ they were 3.4,8.5 and 4 S.cm-1,respectively.     

Optical and electrical properties of ZnO films prepared by URT-IP method

Optical and electrical properties were studied on thin polycrystalline ZnO films (200-nm thick) deposited on glass substrates at 200 °C by a DC-arc ion plating method (URamoto-Tanaka-type ion plating method). Effects of the oxygen flow rate (OFR) on film properties were examined. The resistivity of undoped films changed from 4.2×10⁻³ to 9.6×10⁻¹ Ω cm, corresponding to the carrier concentration of 1.0×10²⁰-1.2×10¹⁸ cm⁻³, depending on the increase in OFR from 0 to 40 sccm. The Hall mobility tends to be the maximum value of 28 cm² (V s)⁻¹ at OFR of 10 sccm. Photoluminescence (PL) spectra exhibited a dominant near-band-edge (NBE) emission together with weak PL bands at 2.2 and 3.2 eV. Intensity of NBE was maximum at OFR of 10 sccm. Intensity of the PL band at 2.2 eV increased with increase in OFR. As a result of Ga-doping, the resistivity decreased and the carrier concentration increased by one order of magnitude. The optical transmittance was more than 90% in 400-1200 nm. The ZnO:Ga (3 and 4 wt.% Ga-doped) thin films with the lowest resistivity of 2.6×10⁻⁴ Ω cm, the highest mobility of 25 cm² (V s)⁻¹, and the highest PL intensity were obtained at OFR of 10 sccm. Further increase of OFR led to the decrease in both mobility and PL intensity.     

Effect of deposition distance and temperature on electrical, optical and structural properties of radio-frequency magnetron-sputtered gallium-doped zinc oxide

Films of gallium-doped zinc oxide (GZO) were deposited on glass substrates by radio-frequency magnetron sputtering using a ceramic target of Ga:ZnO (4 at.% Ga vs. Zn). Both the substrate temperature (T_s) and the target-substrate distance (d_ts) were varied and the effect on electrical, optical and structural properties of the resulting films were measured. The highest conductivity of 3200 S/cm was obtained at a deposition temperature of 250 °C, at a d_ts of 51 mm. This sample had the highest carrier concentration in this study, 9.6 × 10²⁰/cm³. Optical transmittance of all films was <90% in the visible range. The grain size of the film grown at d_ts = 51 mm was smaller than the grain size for films grown with a shorter d_ts; moreover, the films with d_ts = 51 mm exhibited the smoothest surface, with a root mean square surface roughness of 2.7 nm. Changes in T_s have a more pronounced effect on conductivity compared to changes in d_ts; however, variations in structure do not appear to be well-correlated with conductivity for samples in the 2000-3200 S/cm range. These results suggest that incorporation and activation of Ga is of key importance when attempting to obtain GZO films with conductivities greater than 2000 S/cm.     

Effect of aluminum and indium co-doping on zinc oxide films prepared by dc magnetron sputtering

Aluminum and indium co-doped zinc oxide (AIZO) thin films were prepared by direct current (dc) magnetron sputtering on glass substrate in pure argon atmosphere. Three inches of zinc oxide ceramic with 0.5 wt.% of aluminum and indium doping was used as a target in static mode. The influence of sputtering conditions i.e. substrate-target distance, pressure and power on AIZO films was studied. The electrical resistivity and microstructure of thin films were investigated by the four point probe technique and the scanning electron microscope, respectively. The optical transmittance of AIZO films was measured by UV visible spectrophotometer in the wavelength of 300-1100 nm. Depending on the deposited conditions, highly transparent films up to 80% with low resistivities in the range of 2.6-7.9 × 10^− 4 Ω cm were achieved at room temperature. Possible mechanism in the processing which, ultimately, determines the physical properties of AIZO films will be discussed.     

The effect of dopants on the morphology, microstructure and electrical properties of transparent zinc oxide films prepared by the sol-gel method

The influence of doping on the morphology, physical and electrical properties of zinc oxide produced by the sol-gel method was examined. Undoped zinc oxide was observed to form relatively porous films. Addition of an Al dopant influenced the sheet resistance, but did not result in a change in morphology, examined by atomic force microscopy when compared to undoped films. In the case of electrical measurements, undoped ZnO films were extremely resistive. A minimum dopant concentration of 2 at.%. Al was required to produce materials which were more conductive, as observed by sheet resistance measurements, which were shown to vary with annealing temperature. The versatile nature of sol-gel processing was demonstrated by selective ink-jet deposition of sol-gel droplets which were annealed to form oxide materials.     

Structural, electrical and optical properties of zirconium-doped zinc oxide films prepared by radio frequency magnetron sputtering

Transparent and conducting zirconium-doped zinc oxide films have been prepared by radio frequency magnetron sputtering at room temperature. The ZrO₂ content in the target is varied from 0 to 10 wt.%. The films are polycrystalline with a hexagonal structure and a preferred orientation along the c axis. As the ZrO₂ content increases, the crystallinity and conductivity of the film are initially improved and then both show deterioration. Zr atoms mainly substitute Zn atoms when the ZrO₂ content are 3 and 5 wt.%, but tend to cluster into grain boundaries at higher contents. The lowest resistivity achieved is 2.07 × 10^− 3 Ω cm with the ZrO₂ content of 5 wt.% with a Hall mobility of 16 cm² V^− 1 s^− 1 and a carrier concentration of 1.95 × 10²⁰ cm^− 3. All the films present a high transmittance of above 90% in the visible range. The optical band gap depends on the carrier concentration, and the value is larger at higher carrier concentration.     

Amorphous structure and electrical performance of low-temperature annealed amorphous indium zinc oxide transparent thin film transistors

The effect of low-temperature (200 °C) annealing on the threshold voltage, carrier density, and interface defect density of amorphous indium zinc oxide (a-IZO) thin film transistors (TFTs) is reported. Transmission electron microscopy and x-ray diffraction analysis show that the amorphous structure is retained after 1 h at 200 °C. The TFTs fabricated from as-deposited IZO operate in the depletion mode with on-off ratio of > 10⁶, sub-threshold slope (S) of ~ 1.5 V/decade, field effect mobility (μ_FE) of 18 ± 1.6 cm²/Vs, and threshold voltage (V_Th) of − 3 ± 0.7 V. Low-temperature annealing at 200 °C in air improves the on-current, decreases the sub-threshold slope (1.56 vs. 1.18 V/decade), and increases the field effect mobility (μ_FE) from 18.2 to 23.3 cm²/Vs but also results in a V_Th shift of − 15 ± 1.1 V. The carrier density in the channel of the as-deposited (4.3 × 10¹⁶ /cm³) and annealed at 200 °C (8.1 × 10¹⁷ /cm³) devices were estimated from test-TFT structures using the transmission line measurement methods to find channel resistivity at zero gate voltage and the TFT structures to estimate carrier mobility.     

Effect of the interface on the electrical properties of an indium zinc oxide/SiOx multilayer

In this work, indium zinc oxide (IZO) films have been deposited on a polyethylene terephthalate substrate coated with an SiO_x film. Based on a comparative investigation of an IZO monolayer and an IZO/SiO_x multilayer, it is shown that oxygen has a great effect on the electrical properties of the thin films. A mechanism is described to explain the influence of the introduced SiO_x buffer layer. It is considered that an interfacial layer has come into being at the interface between the SiO_x layer and IZO layer, and the properties of this layer have been evaluated. Moreover, the electrical properties of the IZO/SiO_x multilayer have been successfully improved by controlling the oxygen content of the interfacial layer.     

Optical and electrical properties of zinc oxide/indium/zinc oxide multilayer structures

Zinc oxide/indium/zinc oxide multilayer structures have been obtained on glass substrates by magnetron sputtering. The effects of indium thickness on optical and electrical properties of the multilayer structures are investigated. Compared to a single zinc oxide layer, the carrier concentration increases from 8 × 10¹⁸ cm⁻³ to 1.8 × 10²⁰ cm⁻³ and Hall mobility decreases from 10 cm²/v s to 2 cm²/v s for the multilayer structure at 8 nm of indium thickness. With the increase of indium thickness, the transmittance decreases and optical band gap shifts to lower energy in multilayer structures. Results are understood based on Schottky theory, interface scattering mechanism and the absorption of indium layer.     

直接沉淀法制备纳米ZnO

以ZnCl2 为原料 ,直接沉淀法制备ZnO纳米粒子 ;研究了制备过程中Zn2 + 浓度、焙烧温度等条件对ZnO纳米晶体粒径的影响 ,并对其机理进行了分析。实验结果表明 ,较小的反应浓度可以获得较小的晶体粒径 ;在其它反应条件相同的情况下 ,制备的纳米ZnO粒子 ,其晶粒尺寸随着焙烧温度的增加 ,晶粒逐渐增大 ,与体相ZnO粒子相比 ,纳米ZnO粒子在紫外区光吸收能力显著增强 ,为ZnO的应用开辟了更为广阔的前景。     

Optical and structural properties of zinc oxide films with different thicknesses prepared by successive ionic layer adsorption and reaction method

In this work, zinc oxide semiconducting films belonging to the II-VI group have been produced by successive ionic layer adsorption and reaction (SILAR) method on glass substrates with 10, 15, 20 and 25 cycles at room temperature. Following the deposition, the samples were dried in air at 400 °C for 1 h. The films were characterized by X-ray diffraction, field emission scanning electron microscopy and optical absorption measurement techniques. The X-ray diffractions of the films showed that they are hexagonal in structure. The crystallite size of ZnO films varied between 34 and 38 nm accordingly with the number of SILAR cycles. The material has exhibited direct band gap transition with the band gap values lying in the range between 3.13 and 3.18 eV. The red shift is observed in the absorption edge as the cycles increased. Transmission of the films decreased from 65 to 40% with increasing the number of cycles.     

Optical and structural properties of porous zinc oxide fabricated via electrochemical etching method

We investigated the optical and structural properties of porous zinc oxide (ZnO) thin film fabricated by ultraviolet light-assisted electrochemical etching. This fabrication process used 10 wt% potassium hydroxide solution as an electrolyte. Hillock-like porous ZnO films were successfully fabricated according to the field emission scanning electron microscopy results. The cross-sectional study of the sample indicated that anisotropic-dominated etching process occurred. However, the atomic force microscopic results showed an increase in surface roughness of the sample after electrochemical etching. A resonance hump induced by the porous structure was observed in the infrared reflectance spectrum. Using theoretical modeling technique, ZnO porosification was verified, and the porosity of the sample was determined.     

Effects of Al doping on the optical and electrical properties of pre-synthesized ZnO powders by solid state method

White and fluffy Al-doped zinc oxide powders were fabricated using ZnO and Al(C₃H₇O)₃ powders by a solid state method. The effects of Al doping on microstructure, electrical and optical properties were systematically studied. XRD and Raman results show that the Al-doped powders have a pure hexagonal wurtzite structure. The resistivity of ZnO could be decreased from 10⁸ to 10² Ω?cm with the Al doped concentration of 3?at.%. Meanwhile, the obtained powders exhibited high diffuse reflectance in visible region, intense UV emission without deep level emission and good environmental stability. Results reveal that the optical property of the powders has an intimate relationship with the electrical property. The decline of the diffuse reflectance at visible wavelengths and the strong IR absorption were due to the increase of the free electron concentration. Al doping leads to quenching of defect related visible band emission, and we surmise that the defect centers are mainly related to oxygen vacancies (V _O ) and zinc vacancies (V _Zn ). Al doping mechanism was also tentatively explored.     

Effects of substrate on the structural, electrical and optical properties of Al-doped ZnO films prepared by radio frequency magnetron sputtering

Transparent and conductive Al-doped ZnO (AZO) thin films were deposited on substrates including alkali-free glass, quartz glass, Si, and SiO₂ buffer layer on alkali-free glass by using radio frequency magnetron sputtering. The effects of different substrates on the structural, electrical and optical properties of the AZO films were investigated. It was found that the crystal structures were remarkably influenced by the type of the substrates due to their different thermal expansion coefficients, lattice mismatch and flatness. The AZO film (100 nm in thickness) deposited on the quartz glass exhibited the best crystallinity, followed sequentially by those deposited on the Si, the SiO₂ buffer layer, and the alkali-free glass. The film deposited on the quartz glass showed the lowest resistivity of 5.14 × 10^− 4 Ω cm among all the films, a carrier concentration of 1.97 × 10²¹ cm^− 3 and a Hall mobility of 6.14 cm²/v·s. The average transmittance of this film was above 90% in the visible light spectrum range. Investigation into the thickness-dependence of the AZO films revealed that the crystallinity was improved with increasing thickness and decreasing surface roughness, accompanied with a decrease in the film resistivity.     

Structural,optical and magnetic properties of Cu doped CdSe powders prepared by solid state reaction method

Cu doped CdSe powders were synthesized by solid state reaction method and studied the effect of Cu doping concentration on structural, optical and magnetic properties of the prepared samples. From XRD study it was found that the lattice constant increased with increase of Cu doping concentration. A clear blue shift was observed in the samples from optical studies. From the magnetic measurements, it was found that the samples were room temperature ferromagnetic in nature and strength of magnetic moment increased with increase of doping concentration. These synthesized powders are dilute magnetic semiconductors and are very promising candidates for ‘Spintronic’ device applications.     

Influence of assistant ion beam on the opto-electrical properties of molybdenum doped zinc oxide films deposited on polyethersulfone via dual ion beam sputtering

An alternative transparent conductive oxide, molybdenum doped zinc oxide (MZO) was deposited onto a flexible polyethersulfone (PES) substrate by using a dual ion beam sputtering system. One argon ion beam was used to sputter a MZO target and another assistant argon ion beam was for bombarding deposits simultaneously. The assistant ion source discharge voltage and current were changed respectively for investigating their influences on the conductivity of deposited MZO films. Changing the discharge voltage shows that, the film crystallinity, carrier concentration and mobility in films all increase with the discharge voltage and subsequently decrease when the applied voltage is over 100 V. Changing the discharge current also shows a similar trend. The film crystallinity and carrier concentration initially increase with the discharge current, and thereafter a minimum for 1.4 A, and a subsequent increase in resistivity is observed. According to the results, properly raising the discharge voltage and current of assistant ion source can improve both electrical conductivity and optical transparency of deposited MZO films, but the excess discharge voltage and current will cause the grain refinement which may retard the carrier mobility and result in the lower conductivity of MZO films.     

Study on physical properties of indium-doped zinc oxide deposited by spray pyrolysis technique

Transparent conducting indium doped zinc oxide (IZO) thin films have been deposited on soda-lime glass substrates by the spray pyrolysis technique. The structural, electrical, and optical properties of these films were investigated as a function of substrate temperature. In this work the substrate temperature was varied between 350 °C and 500 °C. X-ray diffraction pattern reveals that at 350 °C dominant peak is (100) orientation. By increasing substrate temperature from 350 °C to 450 °C, sheet resistance decreases, from 302 Ω/□ to 26 Ω/□, then at 500 °C increases to 34 Ω/□. In the useful range for deposition (i.e. 450 °C to 500 °C), the orientation of the films was predominantly (002). The lowest sheet resistance (26Ω/□) is obtained at substrate temperature of about 450 °C with the transmittance of about 75%. Study of scanning electron microscopy images shows that films deposited at 400 °C, have grain size as large as 574 nm, while with increasing substrate temperature to 450 °C, grain size becomes smaller and reaches to a value of about 100 nm with spherical shape. At 500 °C grain size value would be around 70 nm with the same spherical shape.