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Heterostructure n‐GaAs/InGaP/p‐GaAs core‐multishell nanowire diodes are synthesized by metal‐organic vapor‐phase epitaxy. This structure allows a reproducible, selective wet etching of the individual shells and therefore a simplified contacting of single nanowire p‐i‐n junctions. Nanowire diodes show leakage currents in a low pA range and at a high rectification ratio of 3500 (at ±1V). Pronounced electroluminescence at 1.4 eV is measured at room temperature and gives evidence of the device quality. Photocurrent generation is demonstrated at the complete area of the nanowire p‐i‐n junction by scanning photocurrent microscopy. A solar‐conversion efficiency of 4.7%, an open‐circuit voltage of 0.5 V and a fill factor of 52% are obtained under AM 1.5G conditions. These results will guide the development of nanowire‐based photonic and photovoltaic devices.  相似文献   

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