Second-harmonic generation in ion-implanted KTiOPO/sub 4/ planar waveguides

The first example of second harmonic generation (SHG) in an ion implanted KTiOPO/sub 4/ waveguide is reported. This was formed by helium implantation, and SHG was achieved using zero order mode phase matching at lambda approximately=1.07 mu m. The results indicate that the high nonlinearity remains in the guiding region after implantation. The conversion efficiency in the guide is estimated to be >10% for approximately 1 mu J 20 ns pulsed excitation.<>     

Wavelength dispersion of effective refractive indices of Rb:KTiOPO/sub 4/ optical waveguides

Multimode planar optical waveguides in z-cut KTiOPO/sub 4/ (KTP) substrates have been fabricated using Rb/sup +/:K/sup +/ ion-exchange process. Variations in the refractive index profile and the surface index change with wavelength in these waveguides are approximated by a simple relation. The dispersion characteristics of the effective refractive indices for different guided modes before and after annealing are calculated based on this approximation and the WKB method. Furthermore, the wavelength dispersion can also be expressed using a sellmeier-like equation, and there is an excellent agreement between the calculated values and the measured data.     

Phase-modulated temperature scanning interferometry for measurements of electrooptic coefficients: application to KTiOPO/sub 4/

This work describes an efficient and simple method to determine the effective electrooptic coefficients of crystals, along with the continuous recording of their temperature dependence. A sample with plane and parallel optical end faces acts as a Fabry-Pe/spl acute/rot resonator, which is submitted to a linear ramp of temperature. The thermooptic effect generates a shift of interference fringes that are phase-modulated by applying an appropriate electric field. Residual absorption of the material is considered to achieve the best accuracy. The case of KTiOPO/sub 4/ is given as an example to illustrate the method; first results on the thermal behavior of its effective coefficients r/sub i3/ are presented.     

Properties of Si/sub 3/N/sub 4//Si/sub x/Ge/sub 1-x/ metal-insulator-semiconductor capacitors

The density of fast interface states was studied in Si/sub 3/N/sub 4//Si/sub 0.8/Ge/sub 0.2/ metal-insulator-semiconductor (MIS) capacitors. The interface state density does not appear to be strongly affected by the presence of a thin Si interlayer between the nitride and SiGe alloy. This is in contrast to the results when SiO/sub 2/ is used as the insulator material in similar structures.<>     

Optical activity induced in Bi/sub 4/Ge/sub 3/O/sub 12/ waveguides by ion implantation

The authors report data for ion implanted Bi/sub 4/Ge/sub 3/O/sub 12/ in which the modified material becomes optically active. The optical rotary power, after implantation and annealing, increases from zero to some 90 degrees /mm. The effect is attributed to an ion beam induced relaxation to a modified BiGeO phase.<>     

Polarisation-insensitive Si/sub 3/N/sub 4/ strip-loaded BaTiO/sub 3/ thin-film waveguide with low propagation losses

A low-loss and polarisation-insensitive singlemode BaTiO/sub 3/ thin-film waveguide is reported. Polarisation-dependent loss as low as 0.1 dB/cm at a wavelength of 1.55 /spl mu/m has been achieved by a novel Si/sub 3/N/sub 4/ strip-loaded BaTiO/sub 3/ waveguide structure. Propagation loss of less than 0.9 dB/cm for both TE and TM polarisations was measured     

A TaN-HfO/sub 2/-Ge pMOSFET with NovelSiH/sub 4/ surface passivation

In this letter, we demonstrate a novel surface passivation process for HfO/sub 2/ Ge pMOSFETs using SiH/sub 4/ surface annealing prior to HfO/sub 2/ deposition. By using SiH/sub 4/ passivation, a uniform amorphous interfacial layer is formed after device fabrication. Electrical results show that the HfO/sub 2/ Ge MOSFET with Si-passivation exhibits less frequency dispersion, narrower gate leakage current distribution, and a /spl sim/140% higher peak mobility than that of the device with surface nitridation.     

Diode-pumped femtosecond Yb:NaY(WO/sub 4/)/sub 2/

Pulses as short as 97 fs for an average power of 70 mW were obtained directly from a SESAM modelocked diode pumped laser based on the tetragonal NaY(WO₄)₂, a locally disordered double tungstate, doped with Yb. An extracavity prism pair helped to reduce the pulse duration to 90 fs with a corresponding time-bandwidth product of 0.321.     

Laser operation of epitaxially grown Yb:KLu(WO/sub 4/)/sub 2/--KLu(WO/sub 4/)/sub 2/ composites with monoclinic Crystalline structure

Epitaxial monoclinic double tungstate composites based on the strongly anisotropic KLu(WO/sub 4/)/sub 2/ (KLuW) were grown with high crystalline quality and laser operation of ytterbium was demonstrated for the first time. Highly efficient CW laser emission of an Yb:KLuW-KLuW crystal was achieved near 1030 nm. The 100-/spl mu/m-thick Yb:KLuW layer was pumped at wavelengths near 980 nm by a tapered diode laser as well as by a Ti:sapphire laser. More than 500 mW of CW output power and slope efficiencies up to 66% were obtained at room temperature without cooling.     

Effect of Mg doping on the superconducting properties of Cu/sub 1-x/Tl/sub x/Ba/sub 2/Ca/sub 3-y/Mg/sub y/Cu/sub 4/O/sub 12-/spl delta//

Superconducting properties of Cu/sub 1-x/Tl/sub x/Ba/sub 2/Ca/sub 3-y/Mg/sub y/Cu/sub 4/O/sub 12-/spl delta// (Cu/sub 1-x/Tl/sub x/Mg/sub y/-1234) material have been studied in the composition range y=0,1.5,2.25. The zero resistivity critical temperature [T/sub c/(R=0)] was found to increase with the increased concentration of Mg in the unit cell; for y=1.5 [T/sub c/(R=0)]=131 K was achieved which is hitherto highest in Cu/sub 1-x/Tl/sub x/-based superconductors. The X-ray diffraction analyses have shown the formation of a predominant single phase of Cu/sub 0.5/Tl/sub 0.5/Ba/sub 2/Ca/sub 3-y/Mg/sub y/Cu/sub 4/O/sub 12-/spl delta// superconductor with an inclusion of impurity phase. It is observed from the convex shape of the resistivity versus temperature measurements that our as-prepared material was in the region of carrier over-doping, and the number of carriers was optimized by postannealing experiments in air at 400/spl deg/C, 500/spl deg/C, and 600/spl deg/C. The T/sub c/(R=0) was found to increase with postannealing and the best postannealing temperature was found to be 600/spl deg/C. The mechanism of increased T/sub c/(R=0) is understood by carrying out infrared absorption measurements. It was observed through softening of Cu(2)-O/sub A/-Tl apical oxygen mode that improved interplane coupling was a possible source of enhancement of T/sub c/(R=0) to 131 K.     

Thermal CVD of homoepitaxial diamond using CF/sub 4/ and F/sub 2/

For the first time, diamond has been grown using low-pressure thermal CVD. No additional excitation such as plasmas or filaments was used. The authors report the homoepitaxial growth of diamond on type II-A diamond     

5 inch MgAl/sub 2/O/sub 4/ phosphor screen for projection display

A new kind of MgAl/sub 2/O/sub 4/ phosphor screen for projection display is reported. The 5 inch phosphor screen is fabricated by depositing powder on MgAl/sub 2/O/sub 4/ substrate. Because MgAl/sub 2/O/sub 4/ has the characteristics of higher heat conductivity than the conventional glass faceplate, the phosphor screen achieves very high brightness, good contrast ratio, high resolution and long lifetime, and therefore realises large-screen projection display.     

Damage induced in p-GaAs due to RIE in CH/sub 4//H/sub 2/ mixture

Damaged induced in p-GaAs due to RIE in pure H/sub 2/ and a mixture of CH/sub 4//H/sub 2/ has been investigated by I-V and C-V measurements on Au/p-GaAs Schottky diodes fabricated following the RIE process. The ideality factor, barrier height, depletion width and carrier concentration of the etched samples were compared with those of a control sample. Considerable eradication of induced damage was observed for the sample which was etched in CH/sub 4//H/sub 2/ mixture and was annealed prior to diode fabrication.<>     

Ultrathin stacked Si/sub 3/N/sub 4//SiO/sub 2/ gate dielectrics prepared by rapid thermal processing

Ultrathin (58 AA equivalent oxide thickness) stacked Si/sub 3/N/sub 4//SiO/sub 2/ (NO) films with the bottom oxide prepared by rapid thermal oxidation (RTO) in O/sub 2/ and the top nitride deposited by rapid thermal processing chemical vapour deposition (RP-CVD) were fabricated and studied. Results show that the charge trapping and leakage current of the stacked films are comparable to those of pure SiO/sub 2/ and low-field breakdown events are significantly reduced. By scaling down the top nitride thickness the commonly observed flat-band voltage instability of MNOS devices was minimised, but the low-defect property was still preserved.<>     

Submicron gate Si/sub 3/N/sub 4//AlGaN/GaN-metal-insulator-semiconductor heterostructure field-effect transistors

We present the characteristics of a quarter-micron gate metal-insulator-semiconductor heterostructure field-effect transistor (MISHFET) with Si/sub 3/N/sub 4/ film as a gate insulator. A detailed comparison of the MISHFET and an identical geometry HFET shows them to have the same radio frequency (RF) power gain and cut-off frequency, while the MISHFET has much lower gate-leakage currents and higher RF powers at operating frequencies as high as 26 GHz. The MISHFET gate-leakage currents are well below 100 pA at gate bias values from -10 V to +8 V. At zero gate bias, the drain saturation current is about 0.9 A/mm and it increases to 1.2 A/mm at +8 V gate bias. The output RF power of around 6 W/mm at 40 drain bias was found to be frequency independent in the range of 2 to 26 GHz. This power is 3 dB higher than that from HFET of the same geometry. The intrinsic cutoff frequency is /spl sim/63 GHz for both the HFET and the MISHFET. This corresponds to an average effective electron velocity in the MISHFET channel of 9.9/spl times/10/sup 6/ cm/s. The knee voltage and current saturation mechanisms in submicron MISHFETs and heterostructure field-effect transistors (HFET) are also discussed.     

H/sub 3/PO/sub 4/ addition to slurry for Cu and TaN CMP

Phosphoric acid (H/sub 3/PO/sub 4/) was evaluated as an accelerator of the tantalum nitride chemical-mechanical planarisation (CMP) process as well as a stabiliser of the hydrogen peroxide (H/sub 2/O/sub 2/). Also estimated were the dispersion stability and zeta potential of the abrasive with the contents of phosphoric acid. This approach may be useful for the development of the second step copper CMP slurry and hydrogen peroxide stability.     

Performance improvement in tensile-strained In/sub 0.5/Al/sub 0.5/As/In/sub x/Ga/sub 1-x/As/In/sub 0.5/Al/sub 0.5/As metamorphic HEMT

This paper proposes a In/sub 0.5/Al/sub 0.5/As/In/sub x/Ga/sub 1-x/As/In/sub 0.5/Al/sub 0.5/As (x=0.3-0.5-0.3) metamorphic high-electron mobility transistor with tensile-strained channel. The tensile-strained channel structure exhibits significant improvements in dc and RF characteristics, including extrinsic transconductance, current driving capability, thermal stability, unity-gain cutoff frequency, maximum oscillation frequency, output power, power gain, and power added efficiency.     

Refractive index step and optical confinement in Ga/sub 0.86/In/sub 0.14/As/sub 0.13/Sb/sub 0.87//Ga/sub 0.73/Al/sub 0.27/As/sub 0.02/Sb/sub 0.98/ double heterostructure lasers emitting at 2.2 mu m

Using theoretical fitting to measured transverse far field patterns in Ga/sub 0.86/In/sub 0.14/As/sub 0.13/Sb/sub 0.87//Ga/sub 0.73/Al/sub 0.27/As/sub 0.02/Sb/sub 0.98/ DH lasers emitting at 2.2 mu m the authors estimated the value of the active layer refractive index as 3.78. This value, higher than assumed earlier based on theoretical calculations, ensures good optical confinement for this kind of heterostructure and provides a good theoretical fit with the authors' experimental data of threshold current density against active layer thickness.<>     

(Al/sub 0.5/Ga/sub 0.5/)/sub 0.65/In/sub 0.35/P/Ga/sub 0.65/In/sub 0.35/P double-heterostructure orange light-emitting diodes

Visible light-emitting diodes (LEDs) emitting at 615 nm and employing the AlGaInP/GaInP double heterostructure (DH) grown on a lattice-matched GaAs/sub 0.7/P/sub 0.3/ substrate have been fabricated for the first. The external quantum efficiency of 0.156% for the orange LEDs can be achieved by introducing the GaP material as the current spreader and window layer for the DH LEDs.<>