Substrate temperature effects on the structural and photoelectric properties of ZnS：In films

Indium doped ZnS （ZnS：In） films were prepared on glass substrate using thermal evaporation technol- ogy. It was found that the structural, optical and electrical properties of ZnS：ln films strongly depend on the substrate temperature （Ts）. By X-ray diffraction （XRD）, atomic force microscopy （AFM）, transmittance spectroscopy, and electric performance measurements, the effect of Ts on ZnS：In film is studied in detail. It reveals that Ts has impor- tant effect on ZnS grain size, crystallinity, lattice disorder, etc., which further leads to the obvious influence on its optical and electrical performance. Under the optimized Ts, the performance, especially the conductivity, achieved in this work is far higher than that reported for other n-type ZnS films.     

Fabrication and electrical properties of p-CuAlOe/（n-, p-）Si heterojunctions

CuA1O2 thin films have been prepared by the chemical solution deposition method on both n-Si and p-Si substrates. X-ray diffraction analysis indicates that the obtained CuA1O2 films have a single delafossite structure. The current transport properties of the resultant p-CuA1O2/n-Si and p-CuA1O2/p-Si heterojunctions are investigated by current-voltage measurements. The p-CuA1O2/n-Si has a rectifying ratio of -35 within the applied voltages of -3.0 to ＋3.0 V, while the p-CuA1O2/p-Si shows Schottky diode-like characteristics, dominated in forward bias by the flow of space-charge-limited current.     

Preparation and characterization of ZnS thin films prepared by chemical bath deposition

Zinc sulfide thin films were prepared by chemical bath deposition technique using zinc sulfate (ZnSO₄·7H₂O) and thiourea [SC(NH₂)₂] as sources of Zn²⁺ and S^2– ions, and ammonia (NH₃) and hydrazine hydrate (N₂H₄) as complexing agents. The structural, stoichiometric proportion, morphology and optical properties of the ZnS thin films were investigated as a function of thiourea and ammonia concentrations using X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), scanning electron microscopy (SEM) and UV-visible spectrophotometry measurements. The deposition mechanism is discussed. The results reveal that the ZnS films exhibit poor crystallinity. The ammonia concentration had an obvious effect on the surface morphology, optical properties and deposition mechanism. The S/Zn atomic ratio and optical bandgap of the ZnS thin films first increased and then decreased with increasing ammonia or thiourea concentration.     

Si(111)和Si(100)衬底上磁控反应溅射制备AlN薄膜

采用射频磁控反应溅射法在Si(111)和Si(100)两种衬底上制备了AlN薄膜,用X射线衍射(XRD)对AlN薄膜进行了表征,研究了衬底Si(111)、Si(100)取向以及N2百分比对AlN(002)薄膜c-轴择优取向的影响。实验结果表明,Si(100)较适合生长c-轴择优取向AlN薄膜,而且N2百分比为40%时,AlN薄膜的c-轴取向最好,具有尖锐的XRD峰,此时对应于AlN(002)晶向。计算了(002)取向AlN和两种Si衬底的失配度,Si(111)面与AlN(002)面可归结为正三角形晶系之间的匹配,失配度为23.5%;而Si(100)面与AlN(002)面可归结为正方形晶系与正三角形晶系之间的匹配,失配度为0.8%,可以认为完全共格。理论分析和实验结果相符。     

ZnS上HfON保护膜及增透膜系的制备和性能研究

用氮氧化铪薄膜作为CVDZnS衬底的保护膜、由YbF3和ZnS组成的增透膜系分别在CVDZnS的两面制备了保护膜和增透膜,研究了镀膜前后CVDZnS在8~12 μm波段的光学性能,单面镀制增透膜之后CVDZnS在此波段的平均透过率由未镀膜前的74%提高到了82%,峰值透过率大于83.5%。在CVDZnS上镀制HfON保护膜后,其8~12 μm波段透过率没有明显的降低,同时硬度测试表明HfON薄膜的硬度约为11.6 GPa,远大于衬底CVDZnS的硬度。胶带实验和泡水试验表明,制备的保护膜和增透膜均和衬底有     

Formation of silicon nanocrystals with preferred (100) orientation in amorphous Si:H films grown on glass substrates and exposed to nanosecond pulses of ultraviolet radiation

Using Raman scattering, it was ascertained that silicon nanocrystals with sizes exceeding 2 nm are formed in amorphous silicon films exposed to nanosecond ultraviolet laser radiation with energy densities ranging from 75 to 150 mJ/cm²; it is shown that these nanocrystals have sizes no smaller than 2 nm and have preferred (100) orientation along the normal to the film surface. In a system of mutually oriented Si nanocrystals, anisotropic behavior of the Raman scattering intensity was experimentally detected in various polarization configurations, which made it possible to determine the volume fraction of oriented nanocrystals. The orientational effect is presumably caused by both the macroscopic fields of elastic stresses in the film and the local fields of elastic stresses around the nanocrystals.     

ZnO Grown on (111) ZnS Substrates by Plasma-Assisted Molecular Beam Epitaxy

ZnO thin films have been grown by plasma-assisted molecular beam epitaxy on (111) ZnS substrates. The films grown on Zn-face substrates showed better structural and optical properties compared with those grown on S-face substrates, as demonstrated by x-ray diffraction and photoluminescence measurements. Scanning electron microscopy measurements indicated that ZnO films grown on Zn-face substrates also have smoother surface morphology. It is also found that higher growth temperature yields films with better quality.     

Preparation and characterization of SiO2 films with different techniques

The SiO₂ films were prepared by rf-sputtering and sol-gel techniques. The influences of film preparing methods on the characteristics including refractive index, film thickness, composition, morphology, and shrinkage were investigated. Atomic force microscopy was used to examine the surface morphology of films deposited.     

脉冲激光沉积制备NiO(111)外延薄膜及其结构研究

采用脉冲激光沉积法(PLD)在具有六方纤锌矿结构的蓝宝石衬底上制备了NiO外延薄膜,研究了沉积温度、氧分压对薄膜结构和形貌的影响。在650℃、20Pa氧分压的条件下制得了高结晶质量的单晶NiO薄膜。高能电子衍射分析发现,该NiO薄膜沿Al2O3[11–20]方向入射的衍射图像为清晰的斑点,说明NiO薄膜的生长模式为岛状模式,薄膜与衬底的外延匹配关系为:(111)[11–2]NiO//(0001)[11–20]Al2O3。     

Preparation and Photo—properties of Nanosize ZnS and Zn（en）2S

The precursore Zn(en)2 S (en=ethylenediamine) were prepared via a solvothermal process from elemental sulfur and zinc using ethylenediamine as a solvent. Detailed characterizations of the infrared (IR) absorption spectrum, powder X-- ray diffraction (XRD) and thermogravimetric analysis (TG) confirmed two en coordinated with Zn^2 to form a complex cation. The morphological property was also characterized by transmission electron microscopy (TEM) and electron diffraction analysis (ED). Phase—pure hexagonal wurtzite ZnS products were obtained by annealing the precursor in nitrogen stream at about 900 ℃ Zn(en)2S showed a nanosize of about 30 nm, and ZnS of about 60 nm. The fluorescence spectra were also studied. PL results showed that Zn(en)2S excited a fluorescence at 452 nm.     

Ge诱导晶化多晶Si薄膜的制备及结构表征

采用测控溅射,通过Ge诱导晶化法在Si衬底上制备多晶Si薄膜.采用Raman光谱、X射线衍射(XRD)、原子力显微镜(AFM)及场发射扫描电镜(FESEM)等对所制备的薄膜进行表征.结果表明,当生长温度为800℃时,Ge有诱导非晶Si(a-Si)薄膜晶化的作用,所制备的多晶Si薄膜在(200)方向具有择优取向,且在此方...