Resonant Γ-<Emphasis Type="Italic">X</Emphasis> tunneling in single-barrier GaAs/AlAs/GaAs heterostructures

The electron transport through single-barrier GaAs/AlAs/GaAs heterostructures is studied. This transport is caused by resonant tunneling between the two-dimensional states related to the Γ valley of the GaAs conduction band and various two-or zero-dimensional donor states related to the lower X valleys of the AlAs conduction band. The resonant electron tunneling both via various two-dimensional states related to the X_z and X_xy valleys in AlAs (the X_z and X_xy states) and via related states of Si donors X _z ^D and X _xy ^D was observed. This circumstance made it possible to determine the binding energies of these states (E_B(X _z ^D )≈50 meV and E_B(X _xy ^D )≈70 meV, respectively) directly from the results of identification of resonance features in transport characteristics. An analysis of the structure of experimental resonances corresponding to tunneling between the Γ and X Landau levels in a magnetic field made it possible to determine the transverse effective mass in the X valleys of AlAs (m_t=(0.2±0.02)m₀). An additional fine structure of donor resonances is observed in experimental transport characteristics. This fine structure is caused by resonant tunneling of electrons through the states of the donors that are located in various atomic layers of the AlAs barrier (in the growth direction) and therefore have different binding energies.     

On the photoconductivity of TlInSe<Subscript>2</Subscript>

The current–voltage (I–V) and photocurrent–light intensity (I _pc –Φ) characteristics and the photoconductivity relaxation kinetics of TlInSe₂ single crystals are investigated. Anomalously long relaxation times (τ ≈ 10³ s) and some other specific features of the photoconductivity are observed, which are explained within the barrier theory of inhomogeneous semiconductors. The heights of the drift and recombination barriers are found to be, respectively, E _dr ≈ 0.1 eV and E _r ≈ 0.45 eV.     

Surface roughness and magnetic properties of Co/SiO<Subscript>2</Subscript>/Si(100) polycrystalline films deposited via DC magnetron sputtering

For polycrystalline films of cobalt that have the thickness t ≈ 1.3–133 nm and that are deposited via DC magnetron sputtering on SiO₂(0.1 μm)/Si(100) substrates, surface-roughness root-mean-square amplitude σ and surface correlation length ξ, which characterize the roughness of film surfaces, as well as saturation magnetization 4πM ₀, width of ferromagnetic-resonance line ΔH, coercitivity H _C, and saturation fields H _S, are studied as functions of film thickness t. It is shown that the behavior of dependences H _C(t) and H _S(t) coincides with the behavior of dependence σ(t)/t, whereas the behavior of 4πM ₀(t) depends on ratio t/σ(t). The dependence of the FMR line width on the film thickness, ΔH(t), is characterized by a minimum of ΔH ≈ 60 Oe present in the region of thicknesses of 30 to 60 nm. The behavior of dependence ΔH(t) is determined by ratio σ(t)/t at small thicknesses t ≤ 5 nm and by the behavior of σ(t) at t ≥ 5 nm.     

<Emphasis Type="Italic">C-V</Emphasis> and <Emphasis Type="Italic">I-V</Emphasis> characteristics of ultrathin-oxide MOS structures: Identification and analysis

For an NMOS structure with 3.7-nm-thick oxide, dynamic I-V characteristics are digitally measured by applying an upward and a downward gate-voltage ramp. An averaging procedure is employed to deduce the tunneling (active) current component and the quasi-static C-V characteristic (CVC). Analyzing the depletion segment of the CVC provides reliable values of the semiconductor doping level, the oxide capacitance and thickness, and the sign and density of oxide-fixed charge, as well as estimates of the dopant concentration in the poly-Si region. These data are used to identify the Ψ_s(V _g), V _i(V _g), and I _t(V _i) characteristics, where Ψ_s is the n-Si surface potential, V _i is the voltage drop across the oxide, V _g is the gate voltage, and I _t is the tunneling current; the gate-voltage range explored extends to prebreakdown fields (～13 MV cm^?1). The results are obtained without recourse to fitting parameters and without making any assumptions as to the energy spectrum of electrons tunneling from the n-Si deep-accumulation region through the oxide. It is believed that experimental I _t-V _i and Ψ_s-V _g characteristics will provide a basis for developing a theory of tunneling covering not only the degeneracy and size quantization of the electron gas in the semiconductor but also the nonclassical profile of the potential barrier to electron tunneling associated with the oxide-fixed charge.     

A study of recombination centers in irradiated <Emphasis Type="Italic">p</Emphasis>-Si crystals

p-Si samples irradiated with 8-Mev electrons are studied. It is suggested that the multicomponent V₃+O or V₂+O₂ complexes are not recombination centers on the basis of an analysis of the dependences of the minority-carrier lifetime τ, the resistivity ρ, the concentration p, and the Hall mobility μ_H on the temperature of isochronous annealing T_ann. Deep donors with energy levels at ΔE_i=E_v+0.40 eV and the V₃+O₃ and the V₃+O₂ complexes affect the values of μ_H and τ. The curves of isochronous annealing are used to determine the annealing-activation energies E_ann for defects such as K centers, interstitial carbon atoms C_i, the V+B and V₂+O₂ complexes, divacancies V₂, and defects with a level at ΔE_i=E_v+0.20 eV. These energies were found to be equal to E_ann=0.9, 0.25, 1.6, 2, 1.54, and 2.33 eV, respectively.     

Optical Properties of K<Subscript>2</Subscript>O-Li<Subscript>2</Subscript>O-WO<Subscript>3</Subscript>-B<Subscript>2</Subscript>O<Subscript>3</Subscript> Glasses: Evidence of Mixed Alkali Effect

Glass with compositions xK₂O-(30 ? x)Li₂O-10WO₃-60B₂O₃ for 0 ≤ x ≤ 30 mol.% have been prepared using the normal melt quenching technique. The optical reflection and absorption spectra were recorded at room temperature in the wavelength range 300–800 nm. From the absorption edge studies, the values of the optical band gap (E _opt) and Urbach energy (ΔE) have been evaluated. The values of E _opt and ΔE vary non-linearly with composition parameter, showing the mixed alkali effect. The dispersion of the refractive index is discussed in terms of the single oscillator Wemple Di-Domenico model.     

Surface states on the <Emphasis Type="Italic">n</Emphasis>-InN-electrolyte interface

Dependences of differential capacitance of the electrolyte-n-InN (0001) contact on the bias voltage are studied. Their analysis of the basis of a model similar to a model of the MIS structure shows that the energy spectrum of surface states of InN above the conduction band bottom can be represented by two, relatively narrow, bands of deep levels described by the Gaussian distribution. Parameters of these bands are as follows: the average energy counted from the conduction band bottom, ΔE ₁ ≈ 0.15 eV and ΔE ₂ ≈ 0.9 eV; and the mean-square deviation, ΔE ₁ ≈ 0.15–0.25 eV and ΔE ₂ ≈ 0.05–0.1 eV. The total density of states in the bands are (1–2.5) × 10¹² and (0.2–4) × 10¹² cm^–2.     

Photoreflectance Spectroscopy Study of LT-GaAs Layers Grown on Si and GaAs Substrates

The mechanical strains and densities of surface charge states in GaAs layers grown by low-temperature (LT) molecular-beam epitaxy on Si(100) and GaAs(100) substrates are investigated by photoreflectance spectroscopy. Lines corresponding to the fundamental transition (E _g ) and the transition between the conduction band and spin-orbit-split valence subband (E _g + Δ _SO ) in GaAs are observed in the photoreflectance spectra of Si/LT-GaAs structures at 1.37 and 1.82 eV, respectively. They are shifted to lower and higher energies, respectively, relative to the corresponding lines in GaAs/LT-GaAs structures. Comparing the spectra of the Si/LT-GaAs and GaAs/LT-GaAs structures, it is possible to estimate mechanical strains in LT-GaAs layers grown on Si (by analyzing the spectral-line shifts) and the density of charge-carrier states at the GaAs/Si heterointerface (by analyzing the period of Franz–Keldysh oscillations).     

Temperature dependences of the electrical parameters of anisotype NiO/CdTe heterojunctions

The I–V characteristics of NiO/CdTe heterostructures fabricated by reactive magnetron sputtering are measured at different temperatures. It is established that current transport through the NiO/CdTe heterojunction is mainly controlled via generation–recombination and tunneling under forward bias and via tunneling under reverse bias. The investigated heterostructures generate an open-circuit voltage of V _oc = 0.26 V and a short-circuit current density of I _sc = 58.7 μA/cm² at an illumination intensity of 80 mW/cm².     

Growth,structure, and properties of GaAs-based (GaAs)1–x–y (Ge2) x (ZnSe) y epitaxial films

The possibility of growing the (GaAs)_1–x–y (Ge₂) _x (ZnSe) _y alloy on GaAs substrates by the method of liquid-phase epitaxy from a tin solution–melt is shown. X-ray diffraction shows that the grown film is single-crystal with the (100) orientation and has the sphalerite structure. The crystal-lattice parameter of the film is a _f = 0.56697 nm. The features of the spectral dependence of the photosensitivity are caused by the formation of various complexes of charged components. It is established that the I–V characteristic of such structures is described by the exponential dependence I = I ₀exp(qV/ckT) at low voltages (no higher than 0.4 V) and by the power dependence J ~ V ^α, where the exponent α varies with increasing voltage at high voltages (V > 0.5 V). The results are treated within the framework of the theory of the drift mechanism of current transfer taking into account the possibility of the exchange of free carriers within the recombination complex.     

Electrical and thermoelectric properties of <Emphasis Type="Italic">p</Emphasis>-Ag<Subscript>2</Subscript>Te in the β phase

The conductivity σ, Hall coefficient R, and thermoelectric power α₀ of p-Ag₂Te were studied in the temperature range of 300–550 K. Inconsistency between the signs of R and α₀ was observed at 420–550 K. These results are interpreted within the two-phase model with spherical constant energy surfaces. It is established that the inconsistency between the R and α₀ signs is due to the emergence of the scattering mechanisms with the parameters r_0ac, r₀₀, and r_0d an increase of about 50% in the ratio of the effective electron and hole masses as a result of the transition α → β.     

Electrical and photoelectric properties of <Emphasis Type="Italic">n</Emphasis>-TiN/<Emphasis Type="Italic">p</Emphasis>-Hg<Subscript>3</Subscript>In<Subscript>2</Subscript>Te<Subscript>6</Subscript> heterostructures

n-TiN/p-Hg₃In₂Te₆ heterostructures are fabricated by depositing a thin n-type titanium nitride (TiN) film onto prepared p-type Hg₃In₂Te₆ plates using reactive magnetron sputtering. Their electrical and photoelectric properties are studied. Dominant charge-transport mechanisms under forward bias are analyzed within tunneling-recombination and tunneling models. The fabricated n-TiN/p-Hg₃In₂Te₆ structures have the following photoelectric parameters at an illumination intensity of 80 mW/cm²: the open-circuit voltage is V_OC = 0.52 V, the short-circuit current is I_SC = 0.265 mA/cm², and the fill factor is FF = 0.39.     

On Measurements of the Electrons and Holes Impact-Ionization Coefficients in 4<Emphasis Type="Italic">H</Emphasis>–SiC

All published results of measurements (at 300 K) of the impact ionization coefficients for electrons α_n and holes α_p in 4H–SiC are analyzed. It is shown that the most plausible approximations of dependences of α_{n, p} on electric-field strength E have the usual form α_{n, p} = a_{n, p} exp(–E_{n, p}/E) at fitting-parameter values of a_n = 38.6 × 106 cm^–1, E_n = 25.6 MV/cm, a_p = 5.31 × 106 cm^–1, and E_p = 13.1 MV/cm. These dependences α_{n, p}(E) are used to calculate the highest field strength E_b and thickness w_b of the space-charge region at the breakdown voltage U_b. A number of new formulas for calculating α_{n, p}(E) are obtained from the results of measuring the avalanche-multiplication coefficients and the excess-noise factors under the single-sided illumination of photodiodes with stepped doping.     

Formation kinetics of various types of hydrogen-related donors in proton-implanted silicon

The method of C-V characteristics has been used to study the accumulation kinetics of double and shallow hydrogen-related donors in proton-implanted epitaxial silicon. It is shown that the kinetics corresponds to the first-order reactions. The activation energies ΔE ₁ = 2.3 eV and ΔE ₂ = 1.4 eV and the pre-exponential factors τ₀₁ = 9.1 × 10^?17 s and τ₀₂ = 4.2 × 10^?9 s were determined for both types of the donors, respectively. It was shown that the bistability of the electric properties of silicon is due to the double hydrogen-related donor.     

The temperature and concentration dependences of the charge carrier mobility in PbTe-MnTe solid solutions

The temperature dependences of conductivity (σ), the Hall coefficient (R_H), and the charge carrier mobility (μ_H) for cast and pressed samples of PbTe-MnTe solid solutions (0–2.5 mol % of MnTe) were studied in the temperature range of 80–300 K. The mobility of cast samples varies only slightly in the temperature range of 80–140 K. At higher temperatures, μ_H decreases according to the power law μ_H=aT^?v. The mobility μ_H of pressed samples exponentially increases with temperature in the temperature range of 100–160 K, which is related to the energy barriers ΔE_a formed by oxide films at the grain boundaries. The dependences of μ_H, ν, and ΔE_a on the MnTe content have anomalies in the composition range of 0.75–1.25 mol %, which are related to the concentration phase transition of the percolation type.     

Conductivity of Ga<Subscript>2</Subscript>O<Subscript>3</Subscript>–GaAs Heterojunctions

The effect of annealing in argon at temperatures of T_an = 700–900°C on the I–V characteristics of metal–Ga₂O₃–GaAs structures is investigated. Samples are prepared by the thermal deposition of Ga₂O₃ powder onto GaAs wafers with a donor concentration of N _d = 2 × 10¹⁶ cm^–3. To measure theI–V characteristics, V/Ni metal electrodes are deposited: the upper electrode (gate) is formed on the Ga₂O₃ film through masks with an area of S _k = 1.04 × 10^–2 cm² and the lower electrode in the form of a continuous metallic film is deposited onto GaAs. After annealing in argon at T_an ≥ 700°C, the Ga₂O₃-n-GaAs structures acquire the properties of isotype n-heterojunctions. It is demonstrated that the conductivity of the structures at positive gate potentials is determined by the thermionic emission from GaAs to Ga₂O₃. Under negative biases, current growth with an increase in the voltage and temperature is caused by field-assisted thermal emission in gallium arsenide. In the range of high electric fields, electron phonon-assisted tunneling through the top of the potential barrier is dominant. High-temperature annealing does not change the electron density in the oxide film, but affects the energy density of surface states at the GaAs–Ga₂O₃ interface.     

Improvement in the accuracy of determining impurity compensation in pure weakly compensated germanium from breakdown-field strength

It is shown that measurement of the electric-breakdown field E _br in a classically high magnetic field (H) at T = 4.2 K makes it possible to determine the value of the degree of compensation K in pure germanium with K < 50% much more precisely than at H = 0. The parameter S = E _br/H is introduced and its dependence S = f(K) is calculated; the obtained curve makes it possible to determine K if H and E _br are known. To decrease the resistance of the samples, it is recommended that measurements be carried out under “impurity” illumination. It is shown that the value of E _br is invariable at low intensities of such excitation.     

Valence-band offsets in strained SiGeSn/Si layers with different tin contents

Admittance spectroscopy is used to study hole states in Si_0.7–y Ge_0.3Sn _y /Si quantum wells in the tin content range y = 0.04–0.1. It is found that the hole binding energy increases with tin content. The hole size-quantization energies in structures containing a pseudomorphic Si_0.7–y Ge_0.3Sn _y layer in the Si matrix are determined using the 6-band kp method. The valence-band offset at the Si_0.7–y Ge_0.3Sn _y heterointerface is determined by combining the numerical calculation results and experimental data. It is found that the dependence of the experimental values of the valence-band offsets between pseudomorphic Si_0.7–y Ge_0.3Sn _y layers and Si on the tin content is described by the expression ΔE _V ^exp = (0.21 ± 0.01) + (3.35 ± 7.8 × 10^–4)y eV.     

Study of the electrical properties of Cd<Subscript>x</Subscript>Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Te

On the basis of the temperature and field dependences of the Hall coefficient R _H , it was found that samples with a low electron density are, as a rule, compensated, and the degree of compensation changes upon thermal conversion of the conductivity of the sample to p type. For n-Cd_xHg_1?xTe, the ionization energy of the donor level was found from the temperature dependences of resistivity ρ(T): E _d =24–32 meV. For the same samples, after their thermal conversion to p type, the ionization energies of acceptors, which are related to doubly charged vacancies V _Hg ⁺⁺ , were determined: E _a =32 and 48 meV. In addition, a deep level E _t , related to an unknown amphoteric impurity, was found (E _t ?E _v ≈0.7E _g ).     

The effects of monovacancies on the terrace width during sublimation from the (111) surface of a diamond-like crystal

Using the three-dimensional Monte Carlo model, the effect of monovacancies on the diffusion exchange between the steps on the (111) surface of a diamond-like crystal during sublimation was investigated. The critical terrace width L_cr (the distance from the step edge to the nearest stable vacancy islands) was determined as a function of the relationship between the energy of adatom formation at the smooth terrace E_n and the energy of adatom desorption from the terrace E_d with retention of the sum of these energies E_sub=E_n+E_d, which characterizes the sublimation of a substance. A well-pronounced maximum exists in the dependences L_cr(E_n) obtained. The formula is suggested which well describes the dependences L_cr(E_n) for various values of E_sub. The extrapolation of the dependence L_cr(E_n) to the value E_sub=4.2 eV, which is characteristic of Si, permits us to compare the model results with the experimental data of other authors. The explanation of a threefold increase in the terrace width, which is observed experimentally at about 1500 K, is suggested.