High-performance single CdS nanowire (nanobelt) Schottky junction solar cells with Au/graphene Schottky electrodes

High-performance single CdS nanowire (NW) as well as nanobelt (NB) Schottky junction solar cells were fabricated. Au (5 nm)/graphene combined layers were used as the Schottky contact electrodes to the NWs (NBs). Typical as-fabricated NW solar cell shows excellent photovoltaic behavior with an open circuit voltage of ～0.15 V, a short circuit current of ～275.0 pA, and an energy conversion efficiency of up to ～1.65%. The physical mechanism of the combined Schottky electrode was discussed. We attribute the prominent capability of the devices to the high-performance Schottky combined electrode, which has the merits of low series resistance, high transparency, and good Schottky contact to the CdS NW (NB). Besides, a promising site-controllable patterned graphene transfer method, which has the advantages of economizing graphene material and free from additional etching process, was demonstrated in this work. Our results suggest that semiconductor NWs (NBs) are promising materials for novel solar cells, which have potential application in integrated nano-optoelectronic systems.     

Characteristics of gold/cadmium sulfide nanowire Schottky diodes

Schottky diode junctions were formed between nanowires of cadmium sulfide and nanowires of gold, through sequential cathodic electrodeposition into the pores of anodized aluminum oxide (AAO) templates. Lengths of CdS and Au nanowires were 100-500 nm and 300-400 nm respectively, while the diameter was 30 nm, each. Analysis of Schottky diodes yielded an effective reverse saturation current (J_o), of 0.32 mA/cm² and an effective diode ideality factor (A) of 8.1 in the dark. Corresponding values under one sun illumination were, J_o = 0.92 mA/cm² and A = 10.0. Dominant junction current mechanisms are thought to be tunneling and/or interface state recombination.     

Piezoelectric-potential-controlled polarity-reversible Schottky diodes and switches of ZnO wires

Using a two-end bonded ZnO piezoelectric-fine-wire (PFW) (nanowire, microwire) on a flexible polymer substrate, the strain-induced change in I-V transport characteristic from symmetric to diode-type has been observed. This phenomenon is attributed to the asymmetric change in Schottky-barrier heights at both source and drain electrodes as caused by the strain-induced piezoelectric potential-drop along the PFW, which have been quantified using the thermionic emission-diffusion theory. A new piezotronic switch device with an "on" and "off" ratio of approximately 120 has been demonstrated. This work demonstrates a novel approach for fabricating diodes and switches that rely on a strain governed piezoelectric-semiconductor coupling process.     

Characteristics of CVD graphene nanoribbon formed by a ZnO nanowire hardmask

A graphene nanoribbon (GNR) is an important basic structure to open a bandgap in graphene. The GNR processes reported in the literature are complex, time-consuming, and expensive; moreover, the device yield is relatively low. In this paper, a simple new process to fabricate a long and straight graphene nanoribbon with a high yield has been proposed. This process utilizes CVD graphene substrate and a ZnO nanowire as the hardmask for patterning. 8 μm long and 50-100 nm wide GNRs were successfully demonstrated in high density without any trimming, and ～ 10% device yield was realized with a top-down patterning process. After passivating the surfaces of the GNRs using a low temperature atomic layer deposition (ALD) of Al(2)O(3), high performance GNR MOSFETs with symmetric drain-current-gate-voltage (I(d)-V(g)) curves were demonstrated and a field effect mobility up to ～ 1200 cm(2) V(-1) s(-1) was achieved at V(d) = 10 mV.     

Highly flexible silver nanowire electrodes for shape-memory polymer light-emitting diodes

Shape-memory polymer light-emitting diodes (PLEDs) using a new silver nanowire/polymer electrode are reported. The electrode can be stretched by up to 16% with only a small increase in sheet resistance. Large deformation shape change and recovery of the PLEDs to various bistable curvatures result in minimal loss of electroluminescence performance.     

Au/P polysilicon Schottky diodes

Schottky barrier diodes were fabricated by evaporation of gold layers onto chemically etched polycrystalline silicon wafers. The wafers are p type (resistivityρ _⊥=160 Ωcm, the grains are columnar shape with some orientation). An average potential barrier of 0.087 eV appears to exist across the grain boundary between columns. Ohmic back contacts were made from a Ga-Al alloy. Diodes were investigated with the aid of (a)I-V characteristics at different temperatures, (b)C-V characteristics, (c) spectral response and (d) Fowler's plot of photoelectric measurements. The best diodes had characteristics similar to data typical of monocrystalline silicon. The low series columnar resistance (0.67Ω) of the cells is neglected in the analysis. The barrier height, fromI-V data (including temperature variation) was 0.67 to 0.73 eV. This is much lower than that obtained from Fowler's plot (0.9 eV). However, the barrier height obtained from theC-V graph is in agreement with the value of 0.9 eV. The diffusion potential is 0.4 eV. The value of the diode ideality factor (1.5 to 2.8) indicates that recombination generation processes play a dominant role. The normalized photovoltaic spectral response in the wavelength range 600 to 1300 nm was presented with a comparison from the theory taking into account bulk and surface recombination.     

Structure and cathodoluminescence of individual ZnS/ZnO biaxial nanobelt heterostructures

We report on a controlled synthesis of two novel semiconducting heterostructures: heterocrystalline-ZnS/single-crystalline-ZnO biaxial nanobelts and side-to-side single-crystalline ZnS/ZnO biaxial nanobelts via a simple one-step thermal evaporation method. In the first heterostructure, a ZnS domain is composed of the heterocrystalline superlattice (3C-ZnS) N /(2H-ZnS) M [111]-[0001] with the atomically smooth interface between wurtzite and zinc blende ZnS fragments. High-spatial resolution cathodoluminescence studies on individual heterostructures for the first time reveal a new ultraviolet emission peak ( approximately 355 nm), which is not observed in separate ZnS or ZnO nanostructures. The present hererostructures are expected to become valuable not only with respect to fundamental research but also for a design of new broad-range ultraviolet nanoscale lasers and sensors.     

Graphene/silicon nanowire Schottky junction for enhanced light harvesting

Schottky junction solar cells are assembled by directly coating graphene films on n-type silicon nanowire (SiNW) arrays. The graphene/SiNW junction shows enhanced light trapping and faster carrier transport compared to the graphene/planar Si structure. With chemical doping, the SiNW-based solar cells showed energy conversion efficiencies of up to 2.86% at AM1.5 condition, opening a possibility of using graphene/semiconductor nanostructures in photovoltaic application.     

Barrier reduction and current transport mechanism in Pt/n-InP Schottky diodes using atomic layer deposited ZnO interlayer

Modification of interface properties in Pt/n-InP Schottky contacts with atomic layer deposited ZnO interlayer (IL) (5 and 10 nm) has been carried out and the electrical properties were investigated using current–voltage (I–V) and capacitance–voltage (C–V) techniques. The insertion of ZnO IL in the Pt/n-InP interface reduced the effective barrier height. The barrier heights from C–V method were higher with respect to those from I–V method. The interface state density for 5 nm thick ZnO was higher than that for 10 nm thick ZnO. The barrier heights according to thermionic field emission model showed much closer to those from C–V method. Surface passivation and interfacial dipole were suggested to modulate the Schottky barrier at the Pt/ZnO/n-InP interface.

     

Electrical transport characteristics of Au/n-GaN Schottky diodes

The current–voltage measurements were performed in the temperature range (80–300 K) on Au/ n-GaN Schottky barrier type diodes. The Schottky diode shows non-ideal I(V_G) behaviour with ideality factors n equals to 1.18 and 1.81 at 300 K and 80 K, respectively, and are thought to have a metal-interface layer-semiconductor configuration. Under forward bias and for T ≥ 200 K, the electrical current transport was controlled by the thermionic emission (TE) process. However, for T ≤ 200 K, The current was controlled by the thermionic field emission (TFE). The characteristic energy E₀₀ = 3.48 meV was obtained from the I(V_G, T) measurements and agreed very well with the value of E₀₀ = 3.62 meV calculated theoretically. The zero-bias barrier height ϕ_B0 determined from the I(V_G) measurements was 0.84 eV at 300 K and decreases to 0.49 eV at 80 K.     

Characteristics of Pd/InGaP Schottky diodes hydrogen sensors

Pd/InGaP hydrogen sensors based on the metal-oxide-semiconductor (MOS) and metal-semiconductor Schottky diodes have been fabricated and systematically studied. The effects of hydrogen adsorption on device performances such as the current-voltage characteristics, barrier height variation, hydrogen coverage, and heat of adsorption are investigated. The studied devices exhibit very wide hydrogen concentration detection regimes and remarkable hydrogen-sensing properties. Particularly, an extremely low hydrogen concentration of 15 ppm H/sub 2//air at room temperature can be detected. In addition, under the presence of oxide layers in the studied MOS device structure, the enhancements of barrier height and high-temperature operating capability are observed. The initial heat of adsorption for Pd/oxide and Pd/semiconductor interface are calculated as 355 and 65.9 meV/atom, respectively. Furthermore, the considerably short response times are found in studied devices.     

反应源温度对ZnO纳米线阵列定向性及发光性能的影响

以Au薄膜为催化剂、ZnO与碳混合粉末为反应源,采用碳热还原法在单晶Si衬底上制备了ZnO纳米线阵列.通过扫描电子显微镜( SEM)、X射线衍射仪(XRD)、荧光分光光度计对样品的表征,研究了反应源温度对ZnO纳米线阵列的定向性和光致发光性能的影响.样品在源温度920℃条件下沿(002)方向择优生长,定向性最好,温度过低不利于ZnO纳米线阵列密集生长,而温度过高导致Zn原子二次蒸发,因而也不利于纳米线阵列的定向和择优生长;样品在源温度880℃有最强的近紫外带边发射,表明温度过高和过低都不利于ZnO晶体结构的优化;由于ZnO纳米线在缺氧氛围下生长,氧空位是缺陷存在的主要形式,因此所有样品都有较强的绿光发射.温度升高导致纳米线生长速度提高而增加了氧空位缺陷数量,从而使样品绿峰强度增强并在源温度920℃时达最大值,但温度的进一步升高可导致ZnO纳米线表面Zn元素的蒸发而降低氧空位缺陷的数量,从而抑制绿峰强度.     

Ordered ZnO/AZO/PAM nanowire arrays prepared by seed-layer-assisted electrochemical deposition

An Al-doped ZnO (AZO) seed layer is prepared on the back side of a porous alumina membrane (PAM) substrate by spin coating followed by annealing in a vacuum at 400 °C. Zinc oxide in ordered arrays mediated by a high aspect ratio and an ordered pore array of AZO/PAM is synthesized. The ZnO nanowire array is prepared via a 3-electrode electrochemical deposition process using ZnSO₄ and H₂O₂ solutions at a potential of − 1 V (versus saturated calomel electrode) and temperatures of 65 and 80 °C. The microstructure and chemical composition of the AZO seed layer and ZnO/AZO/PAM nanowire arrays are characterized by field emission scanning electron microscopy (FE-SEM), high-resolution transmission electron microscopy (HR-TEM), and energy-dispersive X-ray spectroscopy (EDS). Results indicate that the ZnO/AZO/PAM nanowire arrays were assembled in the nanochannel of the porous alumina template with diameters of 110–140 nm. The crystallinity of the ZnO nanowires depends on the AZO seed layer during the annealing process. The nucleation and growth process of ZnO/AZO/PAM nanowires are interpreted by the seed-layer-assisted growth mechanism.     

Radiation damage of SiC Schottky diodes by electron irradiation

The impact of radiation damage on the device performance of 4H-SiC Schottky diodes, which are irradiated at room temperature with 2-MeV electrons is studied. After irradiation the reverse current increases, while the forward current and the capacitance decrease with barrier height and carrier density. The decrease of the barrier height is mainly responsible for the increase of the reverse current, while the decrease of the forward current for a high fluence is caused by the increase of the resistance in the bulk of the crystal. Although no electron capture levels are observed before irradiation, three electron capture levels (E₁, E₂, and E₃) are induced after irradiation. It is noted that the decrease in carrier density is partly caused by the contribution of non-observed electron capture level in the DLT spectrum, which compensates the free carriers.     

Monolithic GaAs/InGaP nanowire light emitting diodes on silicon

Vertical light emitting diodes (LEDs) based on GaAs/InGaP core/shell nanowires, epitaxially grown on GaP and Si substrates, have been fabricated. The devices can be fabricated over large areas and can be precisely positioned on the substrates, by the use of standard lithography techniques, enabling applications such as on-chip optical communication. LED functionality was established on both kinds of substrate, and the devices were evaluated in terms of temperature-dependent photoluminescence and electroluminescence.     

Barrier height enhancement in WSi x /GaAs Schottky diodes by rapid thermal annealing

The influence of rapid thermal annealing on WSi₂/GaAs and WSi_0.6/GaAs Schottky diodes was studied by means of Rutherford backscattering spectroscopy (RBS), particle induced X-ray emission spectroscopy (PIXE), X-ray diffraction (XRD) analysis and current-voltage electrical measurement. Despite the amorphicity of the layers remaining after annealing and only relatively minor changes in RBS and PIXE spectra, large barrier enhancements were registered, especially for WSi₂/GaAs diodes. For an explanation of this effect, the barrier height inhomogeneity concept is used.     

ZnO纳米线阵列修饰对材料表面浸润性调控

采用溶胶-凝胶法制备了ZnO薄膜,利用溶剂热沉积法获得大面积均匀ZnO纳米线阵列。通过对水在ZnO材料表面的浸润性研究,发现薄膜材料表面的粗糙度对ZnO膜亲水性有增强作用,而周期性ZnO阵列微结构表面可以实现其疏水性质增强效果。同时从理论上分析了这两种现象的物理机制,讨论了空气填隙对ZnO纳米线阵列表面的浸润性质的敏感性。制备出ZnO纳米线阵列的表观接触角约为103°,具有较强的疏水性质,可为进一步的ZnO光流控研究提供实验基础。