MOCVD growth and Mg-doping of InAs layers

Epitaxial layers of Mg-doped InAs were grown by MOCVD, and electrical properties of these layers were studied. The doping with magnesium in the course of MOCVD growth allows one to obtain strongly compensated p-InAs with a high hole density (p≈2×10¹⁸ cm^?3) and a low carrier mobility (μ≈50 cm²/(V s)) at T=300 K. When the samples are lightly doped with Mg, neutral impurities are bound with Mg, and n-type InAs layers with a carrier mobility exceeding that in undoped samples are formed.     

Localization of holes in an InAs/GaAs quantum-dot molecule

Deep-level transient spectroscopy is used to study the emission of holes from the states of a vertically coupled system of InAs quantum dots in p-n InAs/GaAs heterostructures. This emission was considered in relation to the thickness of a GaAs interlayer between two layers of InAs quantum dots and to the reversebias voltage U_r. It is established that hole localization at one of the quantum dots is observed for a quantum-dot molecule composed of two vertically coupled self-organized quantum dots in an InAS/GaAs heterostructure that has a 20-Å-thick or 40-Å-thick GaAs interlayer between two layers of InAs quantum dots. For a thickness of the GaAs interlayer equal to 100 Å, it is found that the two layers of quantum dots are incompletely coupled, which results in a redistribution of the hole localization between the upper and lower quantum dots as the voltage U_r applied to the structure is varied. The studied structures with vertically coupled quantum dots were grown by molecular-beam epitaxy using self-organization effects.     

Study of optical characteristics of structures with strongly strained In<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>As quantum wells

Results of photoluminescence (PL) studies of heterostructures with strongly strained InxGa_{1 ? x} As quantum wells (QWs) are presented. It is shown that the dependence of the PL intensity on the QW thickness has a maximum whose position depends on the composition of the In _x Ga_{1 ? x} As solid solution. The PL wavelength at the maximum intensity is 1.13 µm at a QW thickness of 60 µm at a QW thickness of 50 Å for x = 0.39 and 0.42, respectively.     

Chromium diffusion in gallium arsenide

Chromium diffusion in GaAs was studied by measuring the thickness of high-resistivity layers formed during diffusion of chromium (a deep acceptor) in n-GaAs. The dependence of the chromium diffusivity in GaAs on the temperature, arsenic-vapor pressure, conductivity type, and carrier density was determined. The temperature dependence of the diffusivity is described by the Arrhenius equation with the parameters D₀=8×10⁹ cm²/s and E=4.9 eV. The dependence of the diffusivity on the arsenic-vapor pressure is described by the expression \(D \propto P_{As_4 }^{ - m} \), where m≈0.4. The experimental data obtained are interpreted in terms of the concept of the dissociative mechanism of migration of Cr atoms in GaAs.     

Microwave Dielectric Properties of BiCu<Subscript>2</Subscript>PO<Subscript>6</Subscript> Ceramics with Low Sintering Temperature

A BiCu₂PO₆ microwave dielectric ceramic was prepared using a solid-state reaction method. As the sintering temperature increased from 800°C to 880°C, the bulk density of BiCu₂PO₆ ceramic increased from 6.299 g/cm³ to 6.366 g/cm³; the optimal temperature was 860°C. The best microwave dielectric properties [permittivity (? _r ) = ～16, a quality factor (Q × f) = ～39,110 GHz and a temperature coefficient of resonant frequency (τ _f ) = ～?59 ppm/°C] were obtained in the ceramic sintered at 860°C for 2 h. Then, TiO₂ with a positive τ _f (～+400 ppm/°C) was added to compensate the τ _f value. The composite material was found to have a near-zero τ _f (+2.7 ppm/°C) and desirable microwave properties (? _r  = 19.9, Q × f = 24,885 GHz) when synthesized at a sintering temperature of 880°C. This system could potentially be used for low-temperature co-fired ceramics technology applications.     

Rashba effect in inversion and accumulation InAs layers

Self-consistent calculations of the Rashba splitting both in inversion and accumulation InAs layers were carried out using a method based on reducing 6×6 and 8×8 Kane matrix equations to a Schrödinger-type equation. Disregarding the Γ₇-band contribution yielded a splitting magnitude overestimated by 50%. The essentially nonlinear dependence of splitting on the two-dimensional (2D) wavevector k restricts the applicability of the Rashba parameter α (coefficient at the k-linear term in the spectrum), including its value at the Fermi level, because of a strong dependence of the latter on the approximations applied to the two-dimensional spectrum. The relative differences Δn/n of the spin-split subband populations, calculated for the inversion layer, were found to be 2–3 times lower than those measured by Matsuyama et al. (see text). The experimental study of accumulation InAs layers showed that the corresponding value Δn/n does not exceed the calculated one, ～0.02. The approach employed to describe the 2D spectrum (including spin-orbit splitting) was also shown to be adequate when applied to the case of quasi-classical quantization in a classically self-consistent surface potential.     

Radiative recombination in Ge<Superscript>+</Superscript>-implanted SiO<Subscript>2</Subscript> films annealed under hydrostatic pressure

Photoluminescence (PL) spectra and PL excitation spectra were recorded at room temperature from SiO₂ films implanted with Ge⁺ ions and annealed at temperature T _a =450–1100°C under hydrostatic pressure P=12 kbar. The emergence of features in the violet and green bands of the PL and PL excitation spectra correlates with the formation of hydrostatically strained Ge nanocrystals. The shift of the PL bands to higher energies, which occurs as the annealing temperature is raised to T _a ≥800°C, can be attributed to a shift of the energy levels related to the radiative recombination centers, which is caused by the increasing deformation potential. The observed PL is accounted for by the enhanced probability of direct radiative transitions in Ge nanocrystals with an X-like conduction band.     

Electrical properties of InAs irradiated with protons

The results of studying the electrical properties of InAs irradiated with 5-MeV H⁺ ions at a dose of 2×10¹⁶ cm^?2 are reported. It is shown that, independently of the doping level and the conductivity type of the as-grown InAs, InAs always has the n⁺-type conductivity after irradiation (n≈(2–3)×10¹⁸ cm^?3). The phenomenon of pinning of the Fermi level in the irradiated material is discussed. The thermal stability of radiation damage in InAs subjected to postirradiation annealing at temperatures as high as 800°C was studied.     

Transition from the type-II broken-gap heterojunction to the staggered one in the GaInAsSb/InAs(GaSb) system

Conditions for the transition from the staggered heterojunction to the type-II broken-gap one were considered for isolated Ga_1?x In_xAs_ySb_1?y /InAs(GaSb) heterostructures in relation to the quaternary alloy composition. Energy-band diagrams of such heterojunctions were estimated and energy band offsets Δ at the heterointerface were determined. It was experimentally found that the type-II broken-gap heterojunction in the Ga_1?x In_xAs_ySb_1?y /p-InAs structure is observed in the entire range of composition parameters under study, 0.03 < x < 0.23, and becomes staggered in the range 0.3 < x < 1. In p-Ga_1?x In_xAs_ySb_1?y /p-GaSb heterostructures with the indium content 0.85 < x < 0.92 in the solid phase, the p-type conductivity is observed, which is indicative of the staggered heterojunction. At x > 0.92, the contribution of electrons of the semimetal channel at the heterointerface to the total conductivity was observed, as well as the transition from the staggered heterojunction to the type-II broken-gap one.     

Characterization of <Emphasis Type="Italic">n</Emphasis>-Type and <Emphasis Type="Italic">p</Emphasis>-Type Long-Wave InAs/InAsSb Superlattices

The influence of dopant concentration on both in-plane mobility and minority carrier lifetime in long-wave infrared InAs/InAsSb superlattices (SLs) was investigated. Unintentially doped (n-type) and various concentrations of Be-doped (p-type) SLs were characterized using variable-field Hall and photoconductive decay techniques. Minority carrier lifetimes in p-type InAs/InAsSb SLs are observed to decrease with increasing carrier concentration, with the longest lifetime at 77 K determined to be 437 ns, corresponding to a measured carrier concentration of p ₀ = 4.1 × 10¹⁵ cm^?3. Variable-field Hall technique enabled the extraction of in-plane hole, electron, and surface electron transport properties as a function of temperature. In-plane hole mobility is not observed to change with doping level and increases with reducing temperature, reaching a maximum at the lowest temperature measured of 30 K. An activation energy of the Be-dopant is determined to be 3.5 meV from Arrhenius analysis of hole concentration. Minority carrier electrons populations are suppressed at the highest Be-doping levels, but mobility and concentration values are resolved in lower-doped samples. An average surface electron conductivity of 3.54 × 10^?4 S at 30 K is determined from the analysis of p-type samples. Effects of passivation treatments on surface conductivity will be presented.     

Electron transport in unipolar heterostructure transistors with quantum dots in strong electric fields

A model for the explaining specific features of the electron transport in strong electric fields in the quantum-dot unipolar heterostructure transistor (AlGaAs/GaAs/InAs/GaAs/InAs) is presented. It is shown that the two-step shape of the output current-voltage characteristic I _D (V _D ) and the anomalous dependence of the drain current I _D on the gate voltage V _G are caused by the ionization of quantum dots in the strong electric field at the drain gate edge. The ionization of quantum dots sets in at the drain voltage V _D that exceeds the V_D1 value, at which the I _D (V _D ) dependence is saturated (the first step of the I-V characteristic). With the subsequent increase in V _D , i.e., for V _D >V_D1, the I _D (V _D ) dependence has a second abrupt rise due to the ionization of quantum dots, and then, for V _D =V_D2>V_D1, the current I _D is saturated for the second time (the second step in the current-voltage characteristic). It is suggested to use this phenomenon for the determining the population of quantum dots with electrons. The model presented also describes the twice-repeated variation in the sign of transconductance g _m =dI _D /dV _G as a function of V _G .     

Characterization of Double-Junction GaAsP Two-Color LED Structure

The structural, optical, electrical and electrical–optical properties of a double-junction GaAsP light-emitting diode (LED) structure grown on a GaP (100) substrate by using a molecular beam epitaxy technique were investigated. The p–n junction layers of GaAs_1?xP_x and GaAs_1?yP_y, which form the double-junction LED structure, were grown with two different P/As ratios. High-resolution x-ray diffraction (HRXRD), photoluminescence (PL), and current–voltage (I–V) measurements were used to investigate the structural, optical and electrical properties of the sample. Alloy composition values (x, y) and some crystal structure parameters were determined using HRXRD measurements. The phosphorus compositions of the first and second junctions were found to be 63.120% and 82.040%, respectively. Using PL emission peak positions at room temperature, the band gap energies (E_g) of the first and second junctions were found to be 1.867 eV and 2.098 eV, respectively. In addition, the alloy compositions were calculated by Vegard’s law using PL measurements. The turn-on voltage (V_on) and series resistance (R_s) of the device were obtained from the I–V measurements to be 4.548 V and 119 Ω, respectively. It was observed that the LED device emitted in the red (664.020 nm) and yellow (591.325 nm) color regions.     

On the Significance of the Thermoelectric Figure of Merit <Emphasis Type="Italic">Z</Emphasis>

When the electrical conductivity, σ, thermal conductivity, λ, and thermopower, S, of a material are all assumed to be constant over the temperature range of interest, then the well-known thermoelectric (TE) figure of merit, Z = σS ²/λ, arises as part of the derivation of conversion efficiency in a TE generator. However, there are an infinite number of parameter sets (σ, λ, S) that yield any given Z. So, are they truly equivalent? This paper reviews the historical basis for Z as a metric for TE quality and discusses results of simulations on three systems having different parameter sets but the same Z. The three systems exhibit different power generation capabilities, illustrating that Z is not sufficient to specify the likely performance of a TE material in a system. Instead, a systems analysis is required that incorporates, at a minimum, source and sink temperatures and thermal resistances.     

Analysis of the magnetic properties of (La<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>Sr<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>)<Subscript>0.93</Subscript>MnO<Subscript>3</Subscript> manganites at high temperatures

For the first time, the Faraday method is used to measure the temperature dependence of paramagnetic susceptibility χ(T) of (La_{1 ? x} Sr _x )_0.93MnO₃ (x = 0.2, 0.25, or 0.3) manganites in the temperature interval 60–850°C. It is demonstrated that the dependences have two kinks and three linear sections. The kink of curve χ^?1(T) is related to polymorphic transformations (Q′ → Q* and Q* → R) that take place in the crystal lattices of the samples. The main magnetic characteristics of the samples are determined with the least-squares processing of curve χ^?1. Is is demonstrated that dependence χ^?1(T) obeys the Curie-Weiss law. The energy state of the magnetoactive manganese atom in the Q′-and Q*-phase samples is close to the energy state of a free Mn²⁺ ion. In the R phase, this state is close to the state of a free Mn³⁺ ion.     

Electrical properties of silicon layers implanted with erbium and oxygen ions in a wide dose range and thermally treated in different temperature conditions

The electrical properties of silicon implanted with Er and O ions in a wide dose range have been studied. The dependence of electron mobility on the concentration of electrically active centers is determined for Si:Er layers with Er concentrations in the range of 9×10¹⁵–8×10¹⁶ cm^?3. Sharp bends related to specific features of Er segregation in solid-phase epitaxial recrystallization are observed in the concentration profiles of electrically active centers, n(x), and Er atoms, C(x), at Er ion implantation doses exceeding the amorphization threshold. The n(x) and C(x) profiles virtually coincide near the surface. A linear rise in the maximum concentration of electrically active centers at approximately constant effective coefficient of their activation, k, is observed at Er implantation doses exceeding the amorphization threshold. At an Er concentration higher than 7×10¹⁹ cm^?3, the concentration of electrically active centers levels off and k decreases.     

The effect of thickness fluctuations on the static electrical conductivity of a semiconductor quantum wire

Expressions for the relaxation time, electron mobility, and static electrical conductivity along a semiconductor quantum wire are derived in relation to a random field of Gaussian fluctuations in the wire’s thickness. In the case of nondegenerate statistics for charge carriers at relatively low temperatures (T), electron mobility is given by u _n ∝ T^1/2. In the limiting case of a strong magnetic field H directed along the wire, the factor H^?1/2 appears in the mobility expression. It is shown that the considered mechanism of charge-carrier relaxation is important for the electrical conductivity of a fairly thin and pure quantum wire at low temperatures.     

On the Dielectric Study of Se<Subscript>80−<Emphasis Type="Italic">x</Emphasis></Subscript>Te<Subscript>20</Subscript>Pb<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> (<Emphasis Type="Italic">x</Emphasis> = 0, 1 and 2) Glasses

In the present paper, the dielectric parameters such as the dielectric constant ε′(ω), dielectric loss ε″(ω) and alternating current (ac) conductivity have been investigated for bulk amorphous chalcogenide Se_80?x Te₂₀Pb _x (x = 0, 1 and 2) glasses in the frequency range 10 Hz to 500 kHz and within the temperature range from 300 K to 320 K. Dielectric constant ε′(ω) and dielectric loss ε″(ω) are found to be highly frequency (ω) and temperature dependent, and this behavior is interpreted on the basis of Guintini’s theory of dielectric dispersion. The ac conductivity (σ _ac) is found to be temperature independent and obey the power law ω ^s , where s < 1 and decreases as temperature rises. The obtained results are discussed in terms of the correlation barrier hopping model proposed by Elliot. The composition dependence of the dielectric constant, dielectric loss and ac conductivity are also discussed and reported here.     

Interaction of charge carriers with the localized magnetic moments of manganese atoms in <Emphasis Type="Italic">p</Emphasis>-GaInAsSb/<Emphasis Type="Italic">p</Emphasis>-InAs:Mn heterostructures

Transport properties of p-Ga_1?xIn_xAs_ySb_1?y/p-InAs:Mn heterostructures with undoped layers of solid solutions similar in composition to GaSb (x?0.22) grown by liquid-phase epitaxy on substrates with a Mn concentration of (5–7)×10¹⁸ cm^?3 are studied. It is ascertained that there is an electron channel at the interface (from the InAs side). The anomalous Hall effect and negative magnetoresistance are observed at relatively high temperatures (77–200) K. These phenomena can be attributed to the s-d-exchange interaction between Mn ions of the substrate and s electrons of the two-dimensional channel. The effective magnetic moment of Mn ions was evaluated as μ=200µ_B at T=77 K.     

Type II broken-gap GaSb<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>As<Emphasis Type="Italic">x</Emphasis>/InAs heterojunction (<Emphasis Type="Italic">x</Emphasis> < 0.15): Evolution of the band diagram for the ternary solid solution

Layers of the GaSb_{1 ? x} As _x alloy with arsenic content in the range x = 0.06–0.15 have been grown for the first time on InAs (100) substrates by metal-organic vapor-phase epitaxy. A new approach to the calculation of the band diagram of the GaSbAs alloy is suggested. It is demonstrated on the basis of magnetotransport measurements in p-GaSbAs/p-InAs heterostructures and with the method suggested by the authors for the calculation of band diagrams for alloys in the GaSbAs system that, in the composition range under study, the GaSbAs/InAs heterojunction is a type II broken-gap heterojunction.     

Specific features of conductivity of Cd<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Zn<Subscript>x</Subscript>Te and Cd<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Mn<Subscript>x</Subscript>Te single crystals

The electrical characteristics of p-type Cd_1?xZn_xTe (x=0.05) and Cd_1?xMn_xTe (x=0.04) single crystals with a resistivity of 10³–10¹⁰ Ω cm at 300 K are studied. The conductivity and its variation with temperature are interpreted on the basis of statistics of electrons and holes in a semiconductor with deep acceptor impurities (defects), with regard to their compensation by donors. The depth of acceptor levels and the degree of their compensation are determined. The problems of attaining near intrinsic conductivity close to intrinsic are discussed.