MICROSTRUCTURE OF Ti－B－NFILM AND INTERFACEFORMED BY N ION BOMBARDMENTON A Ti－B FILM

ＭＩＣＲＯＳＴＲＵＣＴＵＲＥＯＦＴｉ－Ｂ－ＮＦＩＬＭＡＮＤＩＮＴＥＲＦＡＣＥＦＯＲＭＥＤＢＹＮＩＯＮＢＯＭＢＡＲＤＭＥＮＴＯＮＡＴｉ－ＢＦＩＬＭＹＡＮＧＱｉａｏｑｉｎ;ＺＨＡＯＬｉｈｕａ;ＷＵＬｉｊｕｎ;ＬＩＸｕｅｑｉａｎａｎｄＤＵＨａｉｑｉｎｇ（Ｍ...     

Microstructure and physical properties of PVD TiN/（Ti, Al）N multilayer coatings

Magnetron sputtered （Ti, Al） N monolayer and TiN/（Ti, Al） N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy （EDX）, scanning electron microscopy （SEM）, nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the （Ti, Al）N monolayer and TiN/（Ti, Al）N multilayer coatings perform good affinity to substrate, and the TiN/（Ti, Al）N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the （Ti, Al）N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition （PVD） coating has no effect on the substrate strength.     

Interfacial reactions and diffusion path in partial transient liquid-phase bonding of Si_3N_4/Ti/Ni/Ti/Si_3N_4

1INTRODUCTIONPartialtransientliquid-phasebonding(PTLP),whichhastheadvantagesofbothbrazingandsolid-statediffusionbonding,isanewtechnologyusedforceramicjoining['~'].Recently,theauthorshavebeenstudyingthepartialtransientliquid-phasebondingofSi,N'/Ti/Ni/Ti/SisN'withtheemphasesonthemi-grationbehavi0roftheinterfaceandtheselectionofthebondingparameters[#1.Theinterfacialre-actionsbetweenmetalsandceramicsandthein-terfacestructuresareboththekeyfact0rswhichdeterminetheinterfacialstrength[','J.A…     

气相沉积 Ti / TiN 多层薄膜的力学及耐腐蚀性能研究

目的研究多层薄膜的界面对薄膜性能的影响。方法通过直流磁控溅射法在45#钢表面制备Ti N及Ti/Ti N多层薄膜,采用扫描电镜和XRD衍射分析仪对薄膜表面形貌及相结构进行观察和分析,使用纳米压痕仪、电子薄膜应力分布测试仪对Ti N及Ti/Ti多层薄膜的力学性能以及残余应力大小进行研究,并运用电化学设备对Ti N及不同调制周期的Ti/Ti多层薄膜的耐腐蚀性能进行研究。结果制备的Ti N及Ti/Ti N多层薄膜表面光滑且结构致密,Ti N晶粒细小且为非晶相;薄膜力学性能良好,内部均存在残余压应力。随着调制周期的减小,弹性模量和硬度先减小后增大,内部残余应力逐渐减小且分布不均匀程度逐渐增大。薄膜在H_2SO_4中的腐蚀试验表明:当Ti/Ti N多层薄膜调制周期为1μm时,多层薄膜的耐腐蚀性能不如Ti N薄膜,随着Ti/Ti N多层薄膜随调制周期的减小,多层薄膜的耐腐蚀性能逐渐升高;当调制周期为0.5μm时,Ti/Ti N多层薄膜的耐蚀性能已超过Ti N薄膜。结论 Ti/Ti N多层薄膜界面的增多有助于减小薄膜的残余应力,并且可提高薄膜的耐蚀性能。     

SOLID REACTION BETWEEN PRESSLESS SINTERED Si_3N_4 SUBSTRATE AND Ti-DEPOSITED FILM

The chemical reaction at solid state between the pressless sintered Si_3N_4 substrate and Ti-de-posited film has been studied by X-ray diffraction analysis.The reaction all depends upon thetemperature.It seems no reaction below 973 K:Ti_2N and Ti_5Si_3 form from 1073 to 1123 K:TiN and Ti_5Si_3 form at 1173 K,TiN and Ti_5Si_4 form at 1273 K;while the titanium film di-minishes completely.The lattice parameter of Si_3N_4 is unchanging thrioughout postannealing.This implies that the Ti atoms never dissolve into the Si_2N_4 lattice.     

铁基体等离子体增强磁控溅射离子镀Ti－TiN涂层的组织结构

利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ），先在铁基体上镀一层很薄的钛中间层，继之沉积ＴｉＮ。对膜层进行俄歇电子能谱（ＡＥＳ）分析和透射电镜（ＴＥＭ）分析。结果表明，膜与基体之间有厚约５０ｎｍ的过渡层；膜基界面处有ＦｅＴｉ相；中间层与后继膜交接处Ｔｉ２Ｎ与α－Ｔｉ有取向关系。     

稀土钇改性离子镀Ti(Y)N膜与A3钢基材界面的结构特性SCIEI

采用透射电子显微镜及微衍射技术,研究了稀土钇改性的离子镀Ti(Y)N膜与A3钢基材之间的界面精细结构。结果表明:Ti(Y)N/A3系统界面是由三个亚层构成,由于Y的添加导致了界面三个亚层中形成了Y_6Fe_(23),Y和YN相,其中Y_6Fe_(23)和Y与α-Fe,FeTi及Ti_2N相之间存在一定的位向关系。本文还讨论了该界面形成机理。     

MICROSTRUCTURE OF INTERFACE BETWEEN Y-MODIFIED REACTIVE ION PLATED Ti(Y)N COATING AND SUBSTRATE STEEL A3

The fine rnicrostrueture of the Y-modified ion plated Ti(Y)N coating/substrate steel A3system has been examined by means of TEM and microdiffraction technique.It was revealedthat the interface consists of 3 sublayers,i.e.α-Fe+Y_6Fe_(23),Ti+Y+FeTi and Ti_2N+YN+Ti_xN_y.The thicknesses of them are about 200,50 and 120 nm respectively.The phases inthe transition area seem to have certain orientation relations.The mechanism of interfaceformation has also been discussed.     

无压烧结Si3N4与表面镀钛膜之间的固态化学反应过程

用X射线衍射技术研究了在Si_3N_4陶瓷与表面镀钛膜之间的固态化学反应过程,当反应温度不超过973K时,Ti与Si_3N_4之间不反应;温度在1073—1123K时,反应产物为Ti_2N和Ti_5Si_3,温度达到1173K时,反应产物为TiN和Ti_5Si_4,温度达到1273K时,反应产物为TiN和Ti_5Si_4。在整个反应过程中,Si_3N_4陶瓷基体相的晶格常数未发生变化,说明Ti原子不能溶入Si_3N_4陶瓷的晶格之中。     

低模量Ti6Al4V表面Ti(Al/Pt)N薄膜强化改性

为解决硬质薄膜因与软基体硬度和模量差较大导致的薄膜失效问题,提高硬质薄膜在Ti6Al4V(TC4)钛合金基体上的适应性,使用掺杂氮化钛（TiN）陶瓷薄膜对低模量Ti6Al4V合金表面强化。采用热丝增强等离子体磁控溅射技术在Ti6Al4V合金表面制备Ti(Al/Pt)N薄膜：包括本征TiN、Al&Pt掺杂TiAlN和TiAl(Pt)N薄膜。采用扫描电子显微镜、X-射线衍射仪、纳米压痕仪、洛氏硬度计和摩擦磨损测试仪分别表征三种薄膜组织形貌、能谱分析、相结构和内应力、纳米硬度和模量及耐磨性。结果表明：Al元素掺杂使TiN薄膜柱状晶细化,截面形貌柱状晶更致密;同时微量Pt掺杂后,截面断口呈韧性撕裂。本征TiN和TiAlN薄膜衍射峰图谱呈现TiN(111)取向,TiAl(Pt)N薄膜的衍射峰呈TiN(200)主峰位。Al元素掺杂使TiN薄膜晶格畸变增多,内应力从-13 MPa增大到-115 MPa,导致膜-基结合力恶化,洛氏压痕和摩擦磨损实验中均出现薄膜剥落。Pt掺杂后薄膜内应力降低到-66 MPa,在洛氏压痕试验中TiAl(Pt)N薄膜与基体结合良好,仅有少许环形裂纹。摩擦磨损试验中本...     

Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C,N) multilayer coatings

1　ＩＮＴＲＯＤＵＣＴＩＯＮＶａｒｉｏｕｓｃｏａｔｉｎｇｓｄｅｐｏｓｉｔｉｏｎｔｅｃｈｎｉｑｕｅｓ ,ｓｕｃｈａｓＰＶＤ ,ＣＶＤ ,ＰＣＶＤ ,ＩＢＥＤａｎｄＰＳＩＩｈａｖｅｂｅｅｎｕｓｅｄｔｏｉｍｐｒｏｖｅｔｈｅｗｅａｒ ｒｅｓｉｓｔａｎｃｅ ,ｃｏｒｒｏｓｉｏｎ ｒｅｓｉｓｔａｎｃｅａｓｗｅｌｌａｓｅｌｅｖａｔｅｄａｎｔｉ ｏｘｉｄａｔｉｏｎｂｅｈａｖｉｏｒｏｆｓｕｒｆａｃｅｏｆｓｔｅｅｌｓ ,ｆｏｒｉｎｓｔａｎｃｅ ,ｃｕｔｔｉｎｇｔｏｏｌｏｒｄｉｅｓｔｅｅｌｓａｎｄｎｏｎ ｆｅｒｒｏｕｓｍｅｔａｌｓｉｎ…     

Deposition,microstructure and hardness of TiN/(Ti,Al)N multilayer films

In this work, TiN/(Ti,Al)N multilayer films were deposited on stainless steel substrates with alternatively switching Ti and TiAl alloy targets sources on and off by pulse biased arc ion plating. The crystallography structures and cross-sectional structures of TiN/(Ti,Al)N multilayer films were evaluated by X-ray diffraction analysis (XRD) and by TEM, respectively. The hardness and film/substrate adhesion were determined by nanoindentation and scratch test, respectively. A complex set of microstructures has been found between TiN and (Ti,Al)N layers, at the interface, another layered interfacial region which consists of extremely fine sub-layers, which results from the rotation of the specimen in the deposition chamber. The hardness values of the multilayers exhibit higher hardness compared with that of monolithic (Ti,Al)N film.     

TiN单层和TiN/Ti(C,N)多层涂层的结构和性能研究

借助XRD、SEM、纳米压痕和划痕仪研究了采用磁控溅射在硬质合金基体上沉积的TiN单层和TiN/Ti(C,N)多层涂层的组织结构和力学性能。研究表明:TiN与TiN/Ti(C,N)多层涂层的晶粒形貌均呈柱状晶结构,而TiN/Ti(C,N)多层涂层形成了TiN、Ti(C,N)交替的调制结构。由于界面强化作用,TiN/Ti(C,N)多层涂层表现出比TiN更高的硬度及与基体更好的结合力。     

Fretting wear behavior of Ti/TiN multilayer film on uranium surface under various displacement amplitudes

Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy (SEM), X-ray diffractometry (XRD) and Auger electron spectroscopy (AES). Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime (PSR) to slip regime (SR). The coefficient of friction (COF) increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.     

真空退火对TC4钛合金表面Ti/TiN多层复合涂层性能的影响

金属基体材料表面硬质膜层在服役过程中,残余应力在膜基界面以及膜层内部界面之间的积聚会导致膜层发生界面剥落失效。以TC4钛合金基体表面Ti/TiN多层复合膜层为研究对象,探讨真空退火对复合膜层结构及性能的影响,并表征退火前后复合膜层的界面划痕失效以及抗粒子冲蚀性能。结果表明,真空退火促进了膜层内部以及膜基界面两侧原子的热扩散,使得界面结构特征明显弱化。界面状态的改变使得复合膜层的表面显微硬度降低以及膜基结合强度提高。在划痕载荷作用下,复合膜层抵抗裂纹沿界面扩展的能力得到增强。真空退火有助于提高膜层的强韧性匹配,可有效抵抗小角度冲蚀粒子的犁削以及大角度粒子冲蚀下的疲劳,因此Ti/TiN多层复合膜层表现出较好的抗冲蚀性能。     

Wear of PVD Ti/TiN multilayer coatings

The wear characteristics of PVD Ti/TiN multilayer coatings subjected to two-body abrasion and particle erosion have been studied using diamond slurry and silicon carbide particles as abrasive medium and erodant, respectively. The abrasive wear rate of the Ti/TiN multilayer coatings was found to increase with the relative amount of metallic Ti in the coatings. In erosion, the lowest wear rate was recorded for the homogeneous TiN coating. For the Ti/TiN multilayer coatings the erosion rate was found to decrease with an increasing relative amount of metallic Ti in the coatings. It is concluded that the concept of multilayered coatings offers a potent means to tailor the properties of tribological coatings. In particular, demands of different applications can be met by adjusting the relative thickness of metallic Ti in Ti/TiN coatings. The amount of metallic Ti can, for example, be used to control the coating residual stress state. Multilayered Ti/TiN coatings seem promising for combined wear and corrosion protection.     

调制周期对TiN/Ti多层膜组织结构和结合力的影响

为了阐明调制周期对薄膜微观组织及薄膜与基体结合力的影响,采用反应磁控溅射在Ti6Al4V基板上交替沉积了Ti层及TiN层制备了TiN/Ti多层膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、显微硬度仪和划痕仪测量分析了薄膜的晶体结构、微观组织、硬度以及薄膜与基体之间的结合力。研究结果表明:TiN/Ti多层膜中均存在TiN,Ti和Ti2N 3种相。TiN/Ti多层膜均以柱状晶方式生长,在调制周期较大(5层)时,TiN和Ti层的界面清晰;随着调制周期的减小(层数增加),TiN和Ti层的界面逐渐消失。与单层TiN薄膜相比,多层TiN/Ti薄膜的硬度显著提高;但随着薄膜层数的增加,多层TiN/Ti薄膜硬度略微降低。当调制周期为80nm(30层)时,薄膜与基体的结合力明显提高,达到73N。     

离子束辅助沉积TiN膜的摩擦学特性

用ＸＰＳ，ＡＥＳ和ＸＲＤ分析厚约２μｍ离子束辅助沉积ＴｉＮ膜的成分和结构．实验表明：膜的表面成分主要是ＴｉＯ_２，膜内是轻微择优取向晶粒较细的ＴｉＮ．膜与衬底的界面存在混合区，用阶梯加载法测定润滑条件下ＧＣｒ１５钢与ＴｉＮ膜对磨时的临界载荷－速度关系．试验发现ＴｉＮ膜可显著扩大边界润滑区，承受较大载荷而不致发生擦伤．     

Surface characterization and mechanical property of TiN/Ti-coated NiTi alloy by PIIID

A hard and adherent TiN/Ti thin film of approximately 3 μm in thickness was deposited on the surface of Ti-50.6 at.% Ni alloy by the PIIID technique. The surface composition and chemical state of the coated samples were evaluated by XPS. The XPS results indicate that titanium oxide and titanium oxynitride were present on the TiN surface. The spectra of Ti 2p, N 1s, O 1s and C 1s electrons before and after the film being sputter etched were also discussed. Scanning electron microscopy (SEM) and energy disperse spectroscopy (EDS) analyses demonstrate that an interfacial layer, containing Ti, N and Ni, was formed at the interface between the TiN and Ti coatings. Sliding wear tests show that the TiN coating significantly reduces the friction coefficient and improves wear resistance of the NiTi alloy.     

EFFECT OF BORON ON MICROSTRUCTURE AND PROPERTIES OF Ti-N FILM

ＥＦＦＥＣＴＯＦＢＯＲＯＮＯＮＭＩＣＲＯＳＴＲＵＣＴＵＲＥＡＮＤＰＲＯＰＥＲＴＩＥＳＯＦＴｉＮＦＩＬＭ①ＹａｎｇＱｉａｏｑｉｎ，ＺｈａｏＬｉｈｕａ，ＸｉａｏＨａｎｎｉｎｇＭａｔｅｒｉａｌＴｅｓｔａｎｄＲｅｓｅａｒｃｈＣｅｎｔｅｒ，ＨｕｎａｎＵｎｉｖ...