The study of 1.06 μm laser characteristics of Nd:KGd(WO4)2 crystal

This paper presents laser characteristics of neodymium-doped potassium gadolinium tungstate (KGW) crystals grown in our institute. The maximum laser output was 358.4 mJ a pulse at wavelength 1.067 μm when a Nd³⁺:KGW rod with dimensions of 3.4 mm×24 mm was pumped by a single xenon flashlamp. The overall and slope efficiencies are 1.7% and 3.3%, respectively. A laser output of 204 mW with an optical to optical efficiency of 60% has been obtained when the KGW:Nd³⁺ crystal with dimensions of 5 mm×5 mm×5 mm was pumped by a sapphire laser.     

Composition and substrate temperature dependence of structural and optical studies on ZnSexCdS1−x alloy films

Thin (t−0.60 μm) films of ZnSe_xCdS_1−x were formed by vacuum evaporation on glass substrates held at 350 and 470 K. XRD studies showed that all the films were polycrystalline in nature. Films with x0.70 were hexagonal whereas films with x0.80 were cubic in structure. The structural transition was in the range 0.70<x<0.80. The lattice parameter was higher in films formed at a higher temperature. The lattice parameter followed Vegard's law. Grain size increased with substrate temperature. From the optical transmission spectra recorded in the wavelength range 300–2500 nm, the extinction coefficient, refractive index and band gaps were obtained. Band gap values showed a downward bowing with ‘x' with a bowing parameter of 0.40 eV.     

Effect of hydrogen on SiNx films deposited by Cat-CVD method

This study is aimed at improving the characteristics of silicon nitride (SiNx) film deposited by catalytic chemical vapor deposition (Cat-CVD) method. Cat-CVD method can deposit SiNx films that have low hydrogen content and high density at low temperature without any plasma damage to substrates. Usually silane (SiH₄) and ammonia (NH₃) are used for source gases. Then adding hydrogen (H₂) gas to source gases makes characteristics of Cat-CVD SiNx improved. When using H₂ gas, hydrogen content in SiNx film becomes lower and electronic reliability becomes higher.     

Doping and electrical characteristics of in-situ heavily B-doped Si1−x−yGexCy films epitaxially grown using ultraclean LPCVD

Doping and electrical characteristics of in-situ heavily B-doped Si_1−x−yGe_xC_y (0.22<x<0.6, 0<y<0.02) films epitaxially grown on Si(100) were investigated. The epitaxial growth was carried out at 550°C in a SiH₄–GeH₄–CH₃SiH₃–B₂H₆–H₂ gas mixture using an ultraclean hot-wall low-pressure chemical vapor deposition (LPCVD) system. It was found that the deposition rate increased with increasing GeH₄ partial pressure, and only at high GeH₄ partial pressure did it decrease with increasing B₂H₆ as well as CH₃SiH₃ partial pressures. With the B₂H₆ addition, the Ge and C fractions scarcely changed and the B concentration (C_B) increased proportionally. The C fraction increased proportionally with increasing CH₃SiH₃ partial pressures. These results can be explained by the modified Langmuir-type adsorption and reaction scheme. In B-doped Si_1−x−yGe_xC_y with y=0.0054 or below, the carrier concentration was nearly equal to C_B up to approximately 2×10²⁰ cm⁻³ and was saturated at approximately 5×10²⁰ cm⁻³, regardless of the Ge fraction. The B-doped Si_1−x−yGe_xC_y with high Ge and C fractions contained some electrically inactive B even at the lower C_B region. Resistivity measurements show that the existence of C in the film enhances alloy scattering. The discrepancy between the observed lattice constant and the calculated value at the higher Ge and C fraction suggests that the B and C atoms exist at the interstitial site more preferentially.     

Sintering behavior and microwave dielectric properties of Bi3(Nb1−xTax)O7 solid solutions

Solid solutions of Bi₃(Nb_1−xTa_x)O₇ (x = 0.0, 0.3, 0.7, 1) were synthesized using solid state reaction method and their microwave dielectric properties were first reported. Pure phase of fluorite-type could be obtained after calcined at 700 °C (2 h)⁻¹ between 0 ≤ x ≤ 1 and Bi₃(Nb_1−xTa_x)O₇ ceramics could be well densified below 990 °C. As x increased from 0.0 to 1.0, saturated density of Bi₃(Nb_1−xTa_x)O₇ ceramics increased from 8.2 to 9.1 g cm⁻³, microwave permittivity decreased from 95 to 65 while Q_f values increasing from 230 to 560 GHz. Substitution of Ta for Nb modified temperature coefficient of resonant frequency τ_f from −113 ppm °C⁻¹ of Bi₃NbO₇ to −70 ppm °C⁻¹ of Bi₃TaO₇. Microwave permittivity, Q_f values and τ_f values were found to correlate strongly with the structure parameters of fluorite solid solutions and the correlation between them was discussed in detail. Considering the low densified temperature and good microwave dielectric proprieties, solid solutions of Bi₃(Nb_1−xTa_x)O₇ ceramics could be a good candidate for low temperature co-fired ceramics application.     

Epitaxial growth of strained Si1−yCy films by the hot-wire cell method and its application to metal oxide semiconductor devices

We succeeded in obtaining strained Si_1−yC_y films at a substrate temperature of 200 °C by the hot-wire cell method. The substitutional carbon concentration in films annealed at 700 °C was 0.9%, while it was limited to 0.13% for a sample grown by gas-source molecular beam epitaxy (MBE) at a substrate temperature of 700 °C. We investigated the thermal stability of strained Si_1−yC_y films for device application. Annealing at over 900 °C caused the formation of 3C-SiC and relaxation of the strain occurred. From this result, we found that the process temperature should be lower than 800 °C. A low-temperature MOSFET process, in which all process temperatures after deposition of Si_1−yC_y were lower than 800 °C, was developed and a strained Si_1−yC_y MOSFET was fabricated.     

Optical and electrical properties of p-type AgInSnxS2−x (x = 0–0.04) thin films prepared by spray pyrolysis

AgInSn_xS_2−x (x = 0–0.2) polycrystalline thin films were prepared by the spray pyrolysis technique. The samples were deposited on glass substrates at temperatures of 375 and 400 °C from alcoholic solutions comprising silver acetate, indium chloride, thiourea and tin chloride. All deposited films crystallized in the chalcopyrite structure of AgInS₂. A p-type conductivity was detected in the Sn-doped samples deposited at 375 °C, otherwise they are n-type. The optical properties of AgInSn_xS_2−x (x < 0.2) resemble those of chalcopyrite AgInS₂. Low-temperature PL measurements revealed that Sn occupying an S-site could be the responsible defect for the p-type conductivity observed in AgInSn_xS_2−x (x < 2) thin films.     

On orientation relationship of the Ti5Si3 precipitates in a TiAl alloy

The orientation relationship (OR) and interface structure between ζ-Ti₅Si₃ precipitates and γ-TiAl phase in a Ti–Al based alloy composed of γ-TiAl and ₂-Ti₃Al lamellae have been investigated using transmission electron microscopy. Various orientation relationships defined by a pair of parallel directions and planes are discussed with the method of basic vector transformation matrix in the reciprocal space from γ-TiAl to ζ-Ti₅Si₃ precipitate phase and two new kinds of orientation relationships between ζ-Ti₅Si₃ and γ-TiAl phases have been found. Periodical interface fringes at γ-TiAl/ζ-Ti₅Si₃ interface are analyzed according to the Moiré fringes and interface misfit dislocations.     

Probe microanalysis investigation and electroreflectance spectroscopy of Hg1−xCdxTe PLD films on silicon patterned substrates

Hg_1−xCd_xTe films were prepared on Si-patterned substrates by the pulse laser deposition technique from a Hg_1−xCd_xTe target (x≈0.2). The effects of different substrate temperatures, ranging from 293 to 543 K, different laser shots number in the range of 10–380, and the morphological type of the patterned substrate on the x-composition of films were studied by electron probe microanalysis (EPMA) and electroreflectance (ER) spectroscopy. The correlation between a film composition measured by EPMA and one determined from ER spectra data was observed.     

Enhanced photoluminescence of CaTiO3:Pr phosphor films deposited on SiO2 buffered Si substrates

CaTiO₃:Pr³⁺ films have been prepared by pulsed-laser deposition method on SiO₂-buffered Si substrates, and their microstructure and photoluminescence properties have been compared with those of the films deposited directly on bare Si substrates. The SiO₂ buffer layers were prepared using thermal oxidization and HF-etching. Photoluminescence intensities of CaTiO₃:Pr³⁺ films on the SiO₂-buffered Si substrates are significantly higher (up to 800%) than those of the films on bare Si substrates, which is attributed to the low refractive index and low light absorption of the SiO₂ buffer layer. This study reveals that the presence of the buffer layer is effective in improving the red emission brightness of CaTiO₃:Pr³⁺ films without sacrificing the surface roughness.     

Characterization of CuIn1 − xAlxS2 thin films prepared by thermal evaporation

Ingots containing single crystals of the quaternary alloys CuIn_1 − xAl_xS₂ (CIAS) were grown by a horizontal Bridgman method for compositions with x = 0, 0.2 and x = 0.4. (CIAS) thin films were prepared by thermal evaporation technique on to glass substrates. Structural and optical properties of the films were studied in function of the Al content. Band gap, and absorption coefficients were determined from the analysis of the optical spectra (transmittance and reflectance as a function of wavelength) recorded by a spectrophotometer. The samples have direct bandgap energies of 1.95 eV (x = 0), 2.06 eV (x = 0,2) and 2.1 eV (x = 0,4). These optical results were correlated with the structural analysis by X-Ray diffraction.     

Combinatorial pulsed laser deposition and thermoelectricity of (La1−xCax)VO3 composition-spread films

La_1−xCa_xVO₃ composition-spread film library was fabricated by combinatorial pulsed laser deposition and their thermoelectric properties were evaluated paralelly by the multi-channel probes of Seebeck coefficient and electric conductivity. Concurrent X-ray analysis verified the formation of solid soluted films in the full composition range (0x1) as judged from the linear variation of the lattice constants. The Seebeck coefficients of La_1−xCa_xVO₃ changed from a large negative value to almost zero with the increase of x, due presumably to the variation of valence in vanadium ions.The power factor in this library was as high as 0.6 μW/cm K², which was obtained at x=0, i.e. pure LaVO₃ grown at 800 °C.     

Effects of palladium on the thermal behavior of the γ1-phase of the Ag-Sn-Cu dental amalgam

Effects of the addition of 1 weight percent (w/o) palladium on the thermal behavior of a lathe-cut type of high copper amalgam (13 w/o copper) were studied. Two identical alloys, with and without 1 w/o palladium were fabricated. X-ray diffraction studies of these amalgams have revealed the elimination of the γ₂-phase by palladium addition. DSC thermograms of non-palladium-containing alloy indicated the existence of two γ₁-phases, one with the transition temperature at 88 °C and the other at 109 °C. Aging for 18 months at 37 °C cannot eliminate the presence of the γ₁-phase which has a low transition temperature. The addition of 1 w/o palladium into amalgam produced a more thermally stable amalgam.     

Structural and electronic properties of C3N4−nPn (n=0,1,2,3,4)

First principles electronic structure method based on the density functional theory and the local density approximation is used to investigate the structural and electronic properties of C₃N_4−nP_n (n=0,1,2,3,4). It is found that the N-rich compounds energetically favor structures with sp² bonding, while the pseudocubic structure which is characterized by sp³ bonding is preferred by the P-rich compounds. Even though C₃N₄ is a wide-gap semiconductor, the band gap of C₃N_4−nP_n decreases rapidly when N is gradually substituted with P, and the P-rich compounds are predicted to be metallic or narrow-gap semiconductors.     

Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

In this study, we monitored the HfAlO₃ etch rate and selectivity to SiO₂ as a function of the etch parameters (gas mixing ratio, RF power, DC-bias voltage, and process pressure). A maximum etch rate of 52.6 nm/min was achieved in the 30% BCl₃/(BCl₃ + Ar) plasma. The etch selectivity of HfAlO₃ to SiO₂ reached 1.4. As the RF power and the DC-bias voltage increased, the etch rate of the HfAlO₃ thin film increased. As the process pressure decreased, the etch rate of the HfAlO₃ thin films increased. The chemical state of the etched surfaces was investigated by X-ray Photoelectron Spectroscopy (XPS). According to the results, the etching of HfAlO₃ thin films follows the ion-assisted chemical etching mechanism.     

Combinatorial synthesis and rapid characterization of Mo1−xSnx (0x1) thin films

Thin films of Mo_1−xSn_x, continuously and linearly mapped for 0<x<1, have been prepared by d.c. magnetron sputter deposition under various growth conditions. X-ray diffraction results indicate that as x in high-pressure deposited Mo_1−xSn_x increases from 0 to approximately 0.45, the bcc lattice expands and no new phases are formed. At low deposition pressures, Mo₃Sn, a β-tungsten structured phase, is formed along with the bcc Mo–Sn solid solution for 0.1<x<0.3. The variation of the lattice parameter for this intermetallic phase also indicates that solid solutions, possibly of the form Mo_3+ySn, are being formed. These materials are of special interest as anode candidates in lithium-ion batteries.     

β to ω phase transformation due to aging in a Ti–Mo alloy deformed in impact compression

We investigated the roles of vacancies and their clusters introduced in a Ti–20mass% Mo alloy by high-speed compression in the formation of aged ω-phase crystals. Specimens were deformed by a static compression mode and a high-speed compression mode, and were then aged. The relationships between morphology of aged ω-phase crystals and deformation modes are discussed along with the roles of vacancies and their clusters in the nucleation and growth of aged ω-phase crystals. Aged ω-phase crystals were found to be smaller but of higher density in a high-speed deformation specimen. These results suggest that vacancies and their clusters easily become nucleation sites of aged ω-phase crystals. Several aged ω-phase crystals in a high-speed deformation specimen were of string-like shape. High-resolution electron microscopy confirmed that the string-like crystals have the ω-phase crystal structure. One of the roles of vacancies of and their clusters introduced by high-speed deformation is considered to be relief of compressive stress, which is predicted to arise in the course of transformation.     

Effects of hydrolysis on dodecyl alcohol modified β-CaSiO3 particles and PDLLA/modified β-CaSiO3 composite films

In this research, β-CaSiO₃ particles were surface modified with dodecyl alcohol, and Poly-(DL-lactic acid) (PDLLA)/modified β-CaSiO₃ composite films were fabricated with a homogenous dispersion of β-CaSiO₃ particles in the PDLLA matrix. The aim of the study was to investigate the properties of the composite films before and after hydrolytic treatment. SEM images showed retained homogenous dispersion of β-CaSiO₃ particles after hydrolysis and tensile test also showed maintained mechanical property. Simulated body fluid (SBF) incubation experiment suggested that hydrolytic treatment did not affect the formation of hydroxyapatite on the surface of the composite films. The hydrophilicity of the composites was greatly recovered (from 69.82° to 50.28°) after hydrolysis. In addition, cells cultured on composite films after hydrolysis presented the highest cell proliferation rate and differentiation level. All of these results suggested that the surface modification of silicate particles with dodecyl alcohol along with reversible hydrolytic treatment was an effective and feasible approach to fabricate polymer/silicate composite materials with improved properties.     

Polar nanodomains and relaxor behaviour in (1 − x)Pb(Mg1/3Nb2/3)O3–xPbTiO3 crystals with x = 0.3–0.5

Phase transitions and dielectric properties of the (1 − x)Pb(Mg_1/3Nb_2/3)O₃–xPbTiO₃ crystals with x = 0.3–0.5 are studied. The solid solutions in this composition range are shown to be relaxor ferroelectrics. The crystals with low x demonstrate a diffused maximum in the temperature dependences of the dielectric permittivity at T_m. T_m varies with frequency according to the Vogel–Fulcher law. The polarizing microscopy investigations reveal a first-order phase transition from the relaxor phase to the low-temperature ferroelectric phase at T_C, which is several degrees below T_m. The permittivity peak in the crystals with x = 0.5 is sharp, and T_m is equal to T_C and does not depend on frequency, as is typical of the transition from a ferroelectric to an ordinary paraelectric phase. Nevertheless, the relaxor, but not the paraelectric, phase is observed at T > T_m. This conclusion is confirmed by the observation of the temperature behaviour of complex dielectric permittivity at T > T_m, which is typical of relaxors and related to the existence of polar nanodomains.     

Strong magnetoelastic effect in Pr1−xCaxMnO3

Manganese oxides with distorted perovskite structure have attracted much attention during the last decade due to their colossal magnetoresistance (CMR), and the strong correlations among the various degrees of freedom involved. In particular, Pr_1−xCa_xMnO₃ compounds present in a wide Ca-doping range a charge ordering phenomenon, consisting of real space ordering of Mn³⁺ and Mn⁴⁺ in alternate lattice sites below a certain temperature T_CO. This ordering brings about a lattice distortion and a large hardening of the sound velocity below T_CO. Tomioka et al. have observed that an applied magnetic field can melt this charge ordered state and induce a transition from an insulating to a metallic state. In order to study the effects of this charge order melting, ultrasonic longitudinal sound velocity measurements were performed on polycrystalline Pr_1−xCa_xMnO₃ (x=0.35 and 0.5) as a function of magnetic field and temperature. Interesting anomalies were found related to the melting of the charge ordered phase into a metal-like state even at low temperatures.