CdTe thin film solar cells with reduced CdS film thickness

A study was performed to reduce the CdS film thickness in CdTe thin film solar cells to minimize losses in quantum efficiency. Using close space sublimation deposition for CdS and CdTe a maximum efficiency of ~ 9.5% was obtained with the standard CdS film thickness of ~ 160 nm. Reduction of the film CdS thickness to less than 100 nm leads to poor cell performance with ~ 5% efficiency, mainly due to a lower open circuit voltage. An alternative approach has been tested to reduce the CdS film thickness (~ 80 nm) by depositing a CdS double layer. The first CdS layer was deposited at high substrate temperature in the range of 520-540 °C and the second CdS layer was deposited at low substrate temperature of ~ 250 °C. The cell prepared using a CdS double layer show better performance with cell efficiency over 10%. Quantum efficiency measurement confirmed that the improvement in the device performance is due to the reduction in CdS film thickness. The effect of double layer structure on cell performance is also observed with chemical bath deposited CdS using fluorine doped SnO₂ as substrate.     

An in-situ chemical reaction deposition of nanosized wurtzite CdS thin films

Nanocrystalline CdS thin films were deposited on glass substrates by an ammonia-free in-situ chemical reaction synthesis technique using cadmium cationic precursor solid films as reaction source and sodium sulfide based solutions as anionic reaction medium. Effects of ethanolamine addition to the cadmium cationic precursor solid films, deposition cycle numbers and annealing treatments in Ar atmosphere on structure, morphology, chemical composition and optical properties of the resultant films were investigated by X-ray diffraction, field emission scanning electron microscope, energy dispersive X-ray analysis and UV-Vis spectra measurements. The results show that CdS thin films deposited by the in-situ chemical reaction synthesis have wurtzite structure with (002) plane preferential orientation and crystallite size is in the range of 16 nm-19 nm. The growth of film thickness is almost constant with deposition cycle numbers and about 96 nm per cycle.     

Optical and structural properties of chemically deposited CdS thin films on polyethylene naphthalate substrates

CdS thin films were deposited on polyethylene naphthalate substrates by means of the chemical bath deposition technique in an ammonia-free cadmium-sodium citrate system. Three sets of CdS films were grown in precursor solutions with different contents of Cd and thiourea maintaining constant the concentration ratios [Cd]/[thiourea] and [Cd]/[sodium citrate] at 0.2 and 0.1 M/M, respectively. The concentrations of cadmium in the reaction solutions were 0.01, 7.5 × 10⁻³ and 6.8 × 10⁻³ M, respectively. The three sets of CdS films were homogeneous, hard, specularly reflecting, yellowish and adhered very well to the plastic substrates, quite similar to those deposited on glass substrates. The structural and optical properties of the CdS films were determined from X-ray diffraction, optical transmission and reflection spectroscopy and atomic force microscopy measurements. We found that the properties of the films depend on both the amount of Cd in the growth solutions and on the deposition time. The increasing of Cd concentration in the reaction solution yield to thicker CdS films with smaller grain size, shorter lattice constant, and higher energy band gap. The energy band gap of the CdS films varied in the range 2.42-2.54 eV depending on the precursor solution. The properties of the films were analyzed in terms of the growth mechanisms during the chemical deposition of CdS layers.     

Structural study of the initial growth of nanocrystalline CdS thin films in a chemical bath

Nanocrystalline cadmium sulfide CdS thin films with relevance for optical applications were synthesized from aqueous solutions by chemical bath deposition. Grazing incidence X-ray diffraction shows that the films formed on glass or silicon substrates are made up of nanocrystalline particles. About 80% of the particles have a diameter of 5 ± 1 nm. The nanoparticles have either sphalerite or wurtzite structure. The presence of the sphalerite phase is a signature of a highly non-equilibrium state of the nanocrystalline film. Kinetic studies show that the size of the nanocrystals and the relative fraction of the two phases do not depend on the deposition time once it exceeds a duration of 30 min. For longer times, the particle characteristics remain constant while the thickness of the film grows. Thermodynamical analysis of ionic equilibria allows to choose the reaction bath composition for the formation of cadmium hydroxide Cd(OH)₂. The experiments provide strong evidence that the beginning of the deposition of CdS is accompanied by a formation of cadmium hydroxide Cd(OH)₂.     

Cadmium sulfide nanotubes thin films: Characterization and photoelectrochemical behavior

Monodisperse cadmium sulfide nanotubes (CdS NTs) with a diameter of 100 nm were synthesized on indium-doped tin oxide glass substrates using chemical bath deposition and self-sacrificial template technique. This CdS thin film was characterized by transmission electron microscope, scanning electron microscope, X-ray diffraction, X-ray photoelectron spectroscopy and UV-vis spectrophotometer. This film gave a short circuit photocurrent of 4.4 mA/cm², an open circuit photovoltage of 0.75 V, a fill factor of 0.49, and an overall conversion efficiency of 1.29% under a simulated solar illumination of 100 mW/cm². All these photoelectrochemical properties of the films were dependent on the microstructure of the nanotubes and the thickness of the film. A facile and efficient way to prepare CdS-based photoelectrodes for photoelectrochemical cells was provided in this report.     

Effect of CdCl2 annealing treatment on thin CdS films prepared by chemical bath deposition

In order to study the CdS recrystallization mechanism, a comparative study was carried out on thin films prepared by chemical bath deposition. The CdS films were annealed in air with or without a CdCl₂ coating layer. In-situ Raman spectra obtained during the annealing showed that both the air- and the CdCl₂-annealing did not cause rearrangement of the neighboring atoms in the CdS clusters below ~ 300 °C. CdS thin film was partially oxidated to CdO and CdSO₄ on the cluster surface when annealed in air. The oxides and the sulfur stoichiometric deficiency prevented the clusters to coalesce at higher temperatures. Coating thin CdS film with a thin CdCl₂ layer protected it from oxidation during annealing in air and promoted formation of Cl_S and V_Cd point defects in CdS. The anti-oxidation was attributed to the incorporation of a significant amount of Cl into CdS to form the Cl_S, which prevented the oxygen in-diffusion and chemical bonding during the annealing. The anti-oxidation at the CdS nano-crystalline surface and the point defects formed in the CdS promoted coalescence of the neighboring clusters without the need of long-range redistribution of the atoms. Large CdS grains with good crystalline quality formed through recrystallization during the CdCl₂ heat treatment, which provided the solid basis for the subsequent CdTe growth and high efficient CdS/CdTe solar cell fabrication.     

Preparation and characterization of Chitosan/Konjac glucomannan/CdS nanocomposite film with low infrared emissivity

Novel organic-inorganic nanocomposite films were prepared with Chitosan (CS), Konjac glucomannan (KGM) and CdS by one-step synthesis. As-prepared films were characterized by IR spectra, transmission electron microscopy (TEM), scanning electron microscopy (SEM) and infrared emissometer (IR). The results indicated that grown CdS dendrites were formed with reaction time of 12 h for Cd²⁺ and CS/KGM, and were well dispersed in CS/KGM with an average diameter of 40 nm. The CS/KGM/CdS nanocomposite films had significantly low infrared emissivity. When the mole ratio of CdS to summation of CS&KGM construction units was 1.0 with CdS size of 10-20 nm, the film got the lowest infrared emissivity value of 0.011, which could be attributed to the strong synergism effect existing between CS/KGM and CdS dendrites.     

Multiple dip deposition of CdS films prepared by oscillating chemical bath

Highly oriented CdS thin films with thicknesses greater than 1 μm were deposited using the oscillating chemical bath deposition technique with multiple dips at 75 °C, and from 15 to 75 min as deposition times. Samples with different thicknesses were deposited by repeating the chemical deposition process one, two and three times. All CdS films present the α-greenockite hexagonal structure with (002) as the preferential orientation. Band-gap energy values ranged from 2.35 to 2.42 eV, being the smaller value for the two dip processes. Energy dispersion spectroscopy measurements show good stoichiometry of the CdS films with 4.3 at.% as the maximum Cd variation.     

Preparation and room temperature photoluminescence characterization of PbS/Si(100) thin films

PbS nanoparticles and smooth nanocrystalline thin films (nc-PbS) were prepared by chemical precipitation from aqueous solutions. Polyethylene oxide and isopropyl alcohol were used as additives in the aqueous solution, which results in the enhancement of the blue luminescence of PbS thin films. The introduction of isopropyl reduced the grain size and increases the optical gap of the PbS particles. The size of PbS particles was estimated to be ~ 3.5 nm. The broad emission bands exhibited were composed by a multiple overlapping peaks. The photoluminescence (PL) intensity was significantly influenced by the excitation wavelength. Indeed, intense blue luminescence was obtained under 230 nm compared to that obtained under 325 nm excitation wavelength. The PL emission from PbS nanoparticles was less intense than the luminescence of PbS thin films. The high PL intensity of the thin films was attributed to the lower density of defects introduced in the thin films during the chemical bath deposition growth process compared the defects density of PbS powder.     

CdS thin films doped with metal-organic salts using chemical bath deposition

CdS thin films doped with metal-organic salts were grown on glass substrates at 90 °C by the chemical bath deposition technique. Metal-organic salts such as zinc acetate, chromium acetylacetonate, ammonium fluoride, aluminum nitrate, tin acetate and indium acetate were used. The chemical bath was prepared with cadmium acetate, ammonium acetate, thiourea and ammonium hydroxide. In the case of un-doped films, the S/Cd ratio was varied by changing the thiourea in the range 1-12. The best optical, structural and electrical properties were found for S/Cd = 2. The doped films were prepared by always keeping the ratio S/Cd constant at 2. The band gap (E_g) of doped and un-doped films was evaluated from transmittance spectra, where films with lower sulfur concentration exhibited higher E_g. X-ray analysis showed that both un-doped and doped films were polycrystalline with preferential orientation along the (111) direction and with the zincblende structure in all cases. The dark electrical results showed that CdS doped with Zn (1 at.%) exhibited the lowest resistivity values of 10 Ω cm.     

Optical studies on chemical bath deposited nanocrystalline CdS thin films

Nanocrystalline cadmium sulphide thin films were prepared by the chemical bath (CB) deposition using a mixed aqueous solution of cadmium chloride, thiourea, and ammonium chloride. The XRD patterns showed that the CdS films were of hexagonal phase with preferred (002) orientation. From ellipsometric measurements, the film thickness was found to be in order of 66 nm and the optical band gap was estimated to be 2.4 eV.     

Chemical bath deposition of SnS films with different crystal structures

SnS (stannous sulfide) films were prepared by chemical bath deposition in which a novel chelating reagent ammonium citrate was used. The film has a zinc blende structure or orthorhombic structure which is determined by the pH value of the deposition solution (zinc blende structure at pH = 5 and orthorhombic structure at pH = 6). The reason for this result may be that SnS films prepared at different pH values have different deposition mechanisms, which results in different structures. The prepared SnS films are all smooth and well adhered. The optical bandgaps of the SnS films are determined to be 1.75 eV and 1.12 eV for zinc blende structure and orthorhombic structure, respectively.     

Effect of inserting a buffer layer on the characteristics of transparent conducting impurity-doped ZnO thin films prepared by dc magnetron sputtering

In transparent conducting impurity-doped ZnO thin films prepared on glass substrates by a dc magnetron sputtering (dc-MS) deposition, the obtainable lowest resistivity and the spatial resistivity distribution on the substrate surface were improved by a newly developed MS deposition method. The decrease of obtainable lowest resistivity as well as the improvement of spatial resistivity distribution on the substrate surface in Al- or Ga-doped ZnO (AZO or GZO) thin films were successfully achieved by inserting a very thin buffer layer, prepared using the same MS apparatus with the same target, between the thin film and the glass substrate. The deposition of the buffer layer required a more strongly oxidized target surface than possible to attain during a conventional dc-MS deposition. The optimal thickness of the buffer layer was found to be about 10 nm for both GZO and AZO thin films. The resistivity decrease is mainly attributed to an increase of Hall mobility rather than carrier concentration, resulting from an improvement of crystallinity coming from insertion of the buffer layer. Resistivities of 3 × 10^− 4 and 4 × 10^− 4Ω cm were obtained in 100 nm-thick-GZO and AZO thin films, respectively, incorporating a 10 nm-thick-buffer layer prepared at a substrate temperature around 200 °C.     

化学水浴沉积时间对CdS薄膜性质的影响

采用CBD法在醋酸镉溶液体系中制备CdS半导体薄膜,通过XRD、XRF、SEM和光学透过率谱等测试手段研究了沉积时间对CdS薄膜沉积过程和性质的影响.结果表明,随着沉积时间的增加,薄膜增厚;S/Cd原子比增加,但都为富Cd的CdS薄膜;XRD研究表明,薄膜结构由立方、六方混合相向立方相转变,(111)方向成为择优生长方向;SEM研究表明,随沉积时间增加,薄膜变致密,薄膜表面出现的白色附着颗粒增多,尺寸增大;沉积时间对薄膜的光学性质也有很大的影响,随着沉积时间的增加薄膜透过率减小,而禁带宽度值增大.     

Electrodeposition of gold thin films from 1-butyl-1-methylpyrrolidinium dicyanamide Au solutions

The electrodeposition of gold from a HAuCl₄.3H₂O solution in 1-butyl-1-methyl-pyrrolidinium dicyanamide is reported in the present paper. A cyclic voltammetry study of the electrochemical behaviour of the plating solution showed that the reduction of gold occurs by a two-step process. Gold thin films were obtained by electrodeposition on nickel substrates under potentiostatic control at a constant potential of − 1 V, for temperatures from 293 to 353 K and deposition times of 1500 and 4500 s. The films prepared at 293 and 333 K consist of 9-15 nm diameter polyhedral particles aggregated in clusters 50-250 nm in diameter. The films deposited at 353 K consist of a quasi-continuous film of nanoparticles covered by nanosized dendrites. This morphology evolves towards a globular structure with increasing deposition time.     

Effect of Bi3+ doping on the properties of chemically deposited GdS films

CdS films were prepared by a chemical bath deposition technique with different Bi concentrations (0.01 to 5 wt %) on glass substrates. Optical and electrical properties were studied with these films. It was observed that the absorption coefficient of the CdS film increases with Bi-doping up to 2 wt % and then decreases. These results are explained in terms of the crystallanity of the film. The optical band gaps (E_g) were determined and found to decrease with Bi-doping. The conductivity and thermoelectric power are higher for doped films than undoped CdS films. These results are explained by considering the existance of Cd²⁺ ions as donor centres in Bi-doped CdS films.     

Influence of alcohol on grain growth of tin oxide in chemical vapor deposition

Morphologies of tin oxide micro-grains in the early stage of film growth were analyzed for films deposited by chemical vapor deposition using tin chloride as a source material. Atomic force microscopy observations revealed increased micro-grain density and decreased size by adding methanol into the reaction system, but X-ray photoelectron spectroscopy analyses suggested that the total deposited volume was unchanged. The relative amount of chlorine contamination at the bottom of alcohol-added films increased in the order of isopropyl alcohol < ethanol < methanol. A model of chlorine desorption through reaction with alcohol, which occurred in the early stage of film growth, can explain the results.     

A three-dimensional electrode for photoelectrochemical cell: TiO2 coated ITO mesoporous film

In this letter, TiO₂ coated ITO mesoporous film was prepared by dipping doctor-blade ITO mesoporous film in TiO₂ sol, followed by sintering at 500 °C for 30 min. The CdS quantum dots (QDs) were deposited on TiO₂ coated ITO mesoporous film using sequential chemical bath deposition (S-CBD) method to form a three-dimensional (3D) electrode. The photo-activity of ITO mesoporous film/TiO₂/CdS electrode was investigated by forming a photoelectrochemical cell, which indicated that the ITO mesoporous film/TiO₂/CdS electrode was efficient in photoelectrochemical cell as a working electrode. The 3D electrode showed lower performance than the conventional electrode of TiO₂ mesoporous film/CdS, and more works are needed to improve the performance of 3D electrode.     

Structural and optical properties of nanocrystalline CdS thin films prepared using microwave-assisted chemical bath deposition

Cadmium sulfide (CdS) nanocrystalline thin films were prepared using the microwave-assisted chemical bath deposition method onto glass substrates at 80 °C. Aqueous solutions of either cadmium chloride or cadmium acetate and thiourea were used as sources of Cd²⁺ and S²⁻ ions, respectively. Two sets of samples with different concentrations were prepared. A microwave oven was used as a heating source to synthesize the nanocrystalline CdS thin films. The prepared thin films had a good adhesion with no pinholes. These films were examined for their structural and surface morphologies by X-ray diffraction (XRD), scanning electron microscopy, and atomic force microscopy. The optical properties were investigated using UV-vis spectrophotometer, photoluminescence, and Raman spectroscopy. Particle size values obtained from XRD were compared with these calculated using effective mass models. The values of optical band gaps according to optical transmission measurements decreased as the ion source molar concentration increased.     

Electroless deposition of CoPtWP magnetic thin films

CoPtWP magnetic thin films were prepared by electroless deposition. The influence of bath pH, deposition temperature and bath composition on the deposition speed, alloy content, microstructure, and magnetic properties of CoPtWP thin films were investigated. It was found that deposition speed increased gradually with the bath pH and deposition temperature. The cobalt content in the CoPtWP thin films varied from 77 at.% to 85 at.% by controlling the bath pH. The microstructure of CoPtWP thin films was dependent on bath pH and deposition temperature: two mixed structures, face centered cubic (fcc) and hexagonal close packed (hcp), were observed at low pH values and low deposition temperature. With the increase of pH values and deposition temperature, the intensity of fcc (111) peak suppressed gradually. The surface morphology was markedly influenced by bath pH, deposition temperature and bath composition. VSM and MFM measurements revealed that perpendicular coercivity had been increased with the bath pH. Unique hard magnetic properties of CoPtWP thin films with large perpendicular magnetic anisotropy were obtained at 90 °C and bath pH 13.0.