Electronic transport in n- and p-type modulation-doped GaInNAs/GaAs quantum wells

We present electronic transport in n- and p-type modulation-doped GaInNAs/GaAs quantum well structures. The Hall mobility of electrons in the n-type material decreases dramatically with increasing nitrogen composition. The mobility of 2D holes in p-modulation-doped quantum wells is significantly higher than that of 2D electrons in n-modulation-doped material with similar nitrogen concentration. The mobility of 2D electrons is discussed using a S-matrix model for N-related alloy scattering. The results indicate that the electron mobility is intrinsically limited by scattering from nitrogen complexes. The high mobility of 2D holes is explained in terms of negligible effect of nitrogen on valance band and the absence of scattering with localized nitrogen complexes.     

Investigation on the emission wavelength of GaInNAs/GaAs strained compressive quantum wells on GaAs substrates

In this paper, we study the effect of the incorporation of nitrogen in strained GaInAs quantum well structures. We evaluate the influence of nitrogen on the conduction band energy by using the band anticrossing model. The incorporation of nitrogen appears to decrease the bandgap energy and increase the emission wavelength. The reduction of energy is due to the interaction of the energy of the conduction band with the level of nitrogen and more the concentration of nitrogen increases, more the energy of the band gap decreases. On the other hand, the emission wavelength increases, the advantage of the incorporation of nitrogen in such structures is to vary the wavelength between 0.980 and 1.3 μm while exploiting of course the composition of gallium, composition of nitrogen and the thickness of the quantum well. Less temperature insensitive devices are so intended to be fabricated.     

Photoluminescence characteristics of GaN/lnGaN/GaN quantum wells

Photoluminescence (PL) characteristics of GaN/lnGaN/GaN single quantum wells (QWs) and an InGaN/GaN single heterojunction were studied using continuous wave (CW) and pulsed photoluminescence in both edge and surface emitting configurations. Samples were grown on c-plane sapphire substrates by atmospheric pressure metalorganic chemical vapor deposition (MOCVD). Room temperature and 77K PL measurements were performed using a CW Ar-ion laser (305 nm) and a frequency tripled (280 nm), pulsed, mode-locked Ti: sapphire laser. CW PL emission spectra from the quantum wells (24, 30, 80Å) were all blue shifted with respect to the reference sample. The difference (i. e., the blue shift) between the measured value of peak emission energy from the QW and the band-edge emission from the reference sample was attributed to quantum size effects, and to strain arising due to a significant lattice mismatch between InGaN and GaN. In addition, stimulated emission was observed from an InGaN/GaN single heterojunction in the edge and surface emitting configu-ration at 77K. The narrowing of emission spectra, the nonlinear dependence of output emission intensity on input power density, and the observation of a strongly polarized output are presented.     

Photoluminescence and electroreflectance studies of modulation-doped pseudomorphic AlGaAs/InGaAs/GaAs quantum wells

In this study, we describe the correlations between the photoluminescence (PL) spectra and electrical properties of pseudomorphic modulation-doped AlGaAs/InGaAs/GaAs quantum wells (MDQWs) grown by molecular beam epitaxy. In MDQWs, the presence of a large sheet carrier density contributes significantly to the PL linewidth. At low temperatures (4.2 K), free carrier induced broadening of the PL linewidth is influenced by the material quality of the structure. At higher temperatures (77 K), differences in the material quality do not affect the linewidth significantly, and under these conditions the PL linewidth is a good measure of the sheet carrier density. The ratio of the 77 K to 4.2 K PL linewidths provides useful information about the crystalline quality of the MDQW structures as illustrated by the correlation with 77 K Hall mobility data and a simple model. We present results of Electron Beam Electroreflectance (EBER) to characterize MDQWs and undoped quantum wells in the AlGaAs/InGaAs/GaAs material system. Several transitions have been observed and fitted to excitonic Lorentzian lineshapes, providing accurate estimates of transition energy and broadening parameter at temperatures of 96 K and 300 K.     

Photoluminescence characterization of the effects of rapid thermal annealing on AlGaAs/GaAs modulation-doped quantum wells

In this study, we describe the effects of rapid thermal annealing on the electrical and optical properties of modulation-doped quantum wells (MDQWs). The sheet carrier concentration in MDQW structures which have been annealed in contact with a piece of GaAs tends to decrease with increasing annealing time due to Si auto-compensation in the doped AlGaAs regions. The high energy cut-off point of 4.2 K PL spectra, which occurs at the Fermi energy, and the 77 K PL linewidth are accurate measures of sheet carrier density. These two parameters track variations in carrier density produced by annealing. Photoluminescence spectra also provide additional insight into annealing-induced changes such as Si migration, which causes a degradation in the mobility of the two-dimensional electron gas.     

GaInNAs/GaAs量子阱激光器的发展与未来

ＧａＩｎＮＡｓ是一种直接带隙半导体材料,在长彼长（１．３０和 １．５５μｍ）光通信系统 中具有广阔的应用前景．通过调节 Ｉｎ和 Ｎ的组分,既可获得应变 ＧａＩｎＮＡｓ外延材料,也可制 备ＧａＩｎＮＡｓ与ＧａＡｓ匹配的异质结构,其波长覆盖范围为０．９－Ｎ２．０μｍ．ＧａＩｎＮＡｓ／ＧａＡｓ 量子阱激光器的特征温度为 ２００ Ｋ,远大于现行 ＧａＩｎＮＡｓＰ／ＩｎＰ激光器的特征温度（Ｔ０＝５０ Ｋ）． ＧａＩｎＮＡｓ光电子器件的此优异特性,对于提高光纤通信系统的稳定性、可靠寿命具有特 别重要的意义．由于ＧａＩｎＮＡｓ和具有高反射率（高达９９％）ＡＩ（Ｇａ）Ａｓ／ＧａＡｓ的分布布拉格 反射镜（ＤＢＲ）可生长在同－ＧａＡｓ衬底上,因此它是长波长（１．３０和 １．５５ μｍ）垂直腔面 发射激光器（ＶＣＳＥＬ）的理想材料．垂直腔面发射激光器是光纤通信、互联网和光信号处理的 关键器件． ＧａＡｓ基的超高速集成电路（ＩＣ）已有相当成熟的工艺．如果 ＧａＩｎＮＡｓ－ＶＣＳＥＬ 与 ＧａＡｓ－ＩＣ相结合,将使光电集成电路（ＯＥＩＣ）开拓出崭新的局面．本文还报道我们课题 组研制高质量 ＧａＮＡｓ／ＧａＡｓ超晶格和大应变 ＩｎＧａＡｓ／ＧａＡｓ量子阱结构取     

Extremely strong and sharp photoluminescence lines from nitrogen atomic-layer-doped GaAs,AlGaAs and AlGaAs/GaAs single quantum wells

We have performed nitrogen atomic-layer doping into GaAs, AlGaAs, and AlGaAs/GaAs single quantum wells using atomic nitrogen cracked by a hot tungsten filament. While the atomic-layer-doped GaAs layers show a series of sharp and strong photoluminescence lines relating to excitons bound to nitrogen atoms at 8K, atomic-layer-doped AlGaAs layers show several broad nitrogen-related lines. For the atomic-layer-doped single quantum well at the center of the GaAs layer, the quantum well luminescence itself disappears and a dominant and sharp luminescence is observed at a longer wavelength. It is found that the As pressure during the atomic-layer doping greatly affects the luminescence characteristics.     

应变GaInNAs/GaAs量子阱光增益特性研究

采用近似方法对GaInNAs材料的能带结构进行了分析,并计算了应变GaInNAs/GaAs量子阱能级,在此基础上进一步计算了应变GaInNAs/GaAs量子阱的材料光增益谱.对计算结果的分析表明,应变GaInNAs/GaAs量子阱材料是一种可以应用于1 300 nm波段的新型长波长半导体光电子材料.     

Process parameter dependence of impurity-free interdiffusion in GaAs/AlxGa1−xAs and InxGa1−yAs/GaAs multiple quantum wells

The dependence of the impurity-free interdiffusion process on the properties of the dielectric cap layer has been studied, for both unstrained GaAs/Al_xGa_1−xAs and pseudomorphic In_y Ga_1−yAs/GaAs MQW structures grown by molecular beam epitaxy. The influence of the cap layer thickness, composition, and deposition technique on the degree of interdiffusion were all systematically investigated. Electron-beam evaporated SiO₂ films of varying thickness, chemical-vapor-deposited SiO_xN_y films of varying composition, and spin-on SiO₂ films were used as cap layers during rapid thermal annealing (850-950°C). Photoluminescence at 10K has been employed to determine the interdiffusioninduced bandgap shifts and to calculate the corresponding Al-Ga and In-Ga interdiffusion coefficients. The latter were found to increase with the cap layer thickness (e-beam SiO₂) up to a limit determined by saturation of the outdiffused Ga concentration in the SiO₂ caps. A maximum concentration of [Ga] = 4–7 ×10¹⁹ cm⁻³ in the SiO₂ caps was determined using secondary ion mass spectroscopy profiling. Larger band-edge shifts are also obtained when the oxygen content of SiO_xN_y cap layers is increased, although the differences are not sufficiently large for a laterally selective interdiffusion process based on variations in cap layer composition alone. Much larger differences are obtained by using different deposition techniques for the cap layers, indicating that the porosity of the cap layer is a much more important parameter than the film composition for the realization of a laterally selective interdiffusion process. For the calculated In_0.2Ga_0.8As/GaAs interdiffusion coefficients, activation energies E_A and prefactors D_o were estimated to ranging from 3.04 to 4.74 eV and 5 × Kh⁻³ to 2 × 10⁵ cm²/s, respectively, dependent on the cap layer deposition technique and the depth of the MQW from the sample surface.     

Femtosecond bandedge excitations in modulation-doped quantum wells

Optical excitations near the bandedge of GaAs quantum wells have revealed interesting information about carrier scattering and renormalization. The extension of these studies to modulation-doped quantum wells is discussed.     

GaAs/InGaAs应变异质结构临界厚度的Raman散射和PL谱分析

采用室温Raman散射和低温光致发光(PL)谱,对以TMG,固体As和固体In作为分子束源的MOMBE法生长的GaAs/In_xGa_(1-x)As(x=0.3)单层异质结构和多量子阱结构中InGaAs应变层的临界厚度进行了实验研究。由应变引起的Raman散射峰位移,以及PL谱峰位置与应变和无应变状态下一维有限深势阱跃迁能量计算结果的比较可见,在In组分含量x=0.3的情况下,临界厚度H_c≤5nm,小于能量平衡理论的结果,而与力学平衡模型的理论值相近。     

掺杂GaAs/Al0.3Ga0.7As超晶格的光致发光特性分析

在室温下,通过光致发光实验研究了用MBE生长的GaAs/Al0.3Ga0.7As超晶格材料的光致发光特性,对测得的发光峰进行了指认.理论计算和实验结果符合很好.     

Critical thickness of GaAs/InGaAs and AlGaAs/GaAsP strained quantum wells grown by organometallic chemical vapor deposition

In this paper we describe a study of strained quantum wells (QWs) as a means to experimentally observe the critical thickness (h _c) for the formation of interfacial misfit dislocations. Two material systems were investigated: GaAs/In_0.11Ga_0.89As, in which the QW layers are under biaxialcompression, and Al_0.35Ga_0.65As/GaAs_0.82P_0.18, in which the QW layers are under biaxialtension. Samples were grown by atmospheric pressure organometallic chemical vapor deposition, and characterized by low-temperature photoluminescence (PL), x-ray diffraction, optical microscopy, and Hall measurements. For both material systems, the observed onset of dislocation formation agrees well with the force-balance model assuming a double-kink mechanism. However, overall results indicate that the relaxation is inhomogeneous. Annealing at 800–850° C had no significant effect on the PL spectra, signifying that even layers that have exceededh _c and have undergone partial relaxation are thermodynamically stable against further dislocation propagation.     

Radiative recombination in modulation-doped GaAs/AlGaAs heterostructures in the presence of an electric field

The radiative recombination processes involving two dimensional (2D) carriers from the notch potential formed at the interface of modulation doped GaAs/AlGaAs heterostructures have been studied by means of photoluminescence (PL) and photoluminescence excitation spectroscopy in the presence of an external electric field applied perpendicular to the layers via a gate electrode. Two PL bands related to the 2D electron gas are interpreted as the radiative recombination between 2D electrons and holes from the valence band (HB1) and from residual acceptors (HB2), respectively. The band bending in the active layer, which determines the energy positions of these H-bands, can be controlled by applying an external electric field. However, also the separation between the Fermi edge, E_F, and the second 2D electron subband is deliberately varied by applying an electric field. At a sufficiently small separation, an efficient scattering path near k=0 is available for electrons at the Fermi energy. This can be observed in the PL spectra as a striking enhancement of the many-body excitonic transition, usually referred to as the Fermi edge singularity (FES). The enhancement of the FES is usually explained in terms of an efficient scattering for electrons at the Fermi edge via the nearly resonant adjacent subband. The efficiency of this process is dependent on the separation between the Fermi edge, E_F, and the next subband, which can be controlled via the applied field in our experiments.     

AlGaAs/GaAs多量子阱红外探测器暗电流特性

介绍了AlGaAs/GaAs多量子阱红外探测器(QWIP)暗电流与噪声的关系和降低暗电流的途径:基于湿法化学腐蚀工艺制作了300μm×300μm台面单元器件,并用变温液氦杜瓦测试系统在不同温度下对红外探测器暗电流进行了测试并分析.在温度小于40 K时,随着温度的改变暗电流没有明显的变化;当温度大于40 K时,暗电流随着温度的升高迅速变大,正、负偏压下QWIP暗电流具有不对称特性.     

Uniform intermixing of quantum wells in p-i-n modulator structures by impurity free vacancy diffusion

We present the results of an investigation of impurity free vacancy diffusion (IFVD) post-growth treatments of p-i-n modulator structures. The investigation is in two parts. We first establish that gallium vacancies (V_Ga) are produced during IFVD (by measuring the intensity of the low temperature 1.2 eV signal from Si-V_Ga complexes) in a thick Si-doped GaAs sample. The second part of this work investigates the degree of intermixing of three 80Å GaAs quantum wells embedded in the intrinsic region of a p-i-n modulator at depths between 1–2 μm from the surface. Photoluminescence studies on etched samples and cathodoluminescence showed that no significant depth dependence occurs as a result of IFVD.     

Photoluminescence Evaluation of p and n Type 6H—SiC

Photoluminescence evaluation of p and n type 6H-SiC samples has been done.Results show that at low temperature the photoluminescence of 6H-SiC is clearly dominated by donor-acceptor pair transitions,in some case,free-to-donor transition could be observed at higher temperature.The thermal quenching processes of the photoluminescence have been investigated to determine the possible ionization nenergies of the impurities.     

Interdiffusion and relaxation in metalorganic vapor phase epitaxy grown InGaAs/GaAs strained layer quantum wells

Low pressure metalorganic vapor phase epitaxy grown strained InGaAs/GaAs quantum well structures have been characterized by photoluminescence and x-ray diffraction. It is shown that beyond the pseudomorphic limit, these structures show considerable gallium/indium interdiffusion at the interfaces and partial strain relaxation in the quantum well layers.     

Photoluminescence study of single-side doped n-AlGaAs/GaAs structures with quantum wells

Photoluminescence spectra of single-side doped n-AlGaAs/GaAs structures have been studied at different quantum well widths and temperatures. The sharp growth of the photoluminescence intensity due to the resonant capture of photoexcited holes by a quantum well has been observed for the first time in such structures. A theoretical model for calculating the quantum states in single-side doped structures is proposed. The self-consistent solution of the system of Schrödinger and Poisson equations is obtained by the perturbation method.