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采用直流电沉积法在高锰铝青铜基体上制得Cu-Ni合金镀层,镀液组成和工艺条件为:CuSO4·5H2O 20 g/L,NiSO4·6H2O 84 g/L,C6H5O7Na3·2H2O 75 g/L,十二烷基硫酸钠0.5 g/L,H3BO320 g/L,电流密度15~30 mA/cm^2,pH 7,温度55℃,搅拌速率300 r/min,时间60 min。研究了电流密度对Cu-Ni合金镀层元素成分、微观形貌和耐蚀性的影响。结果表明,在电流密度30 mA/cm^2下所得到的Cu-Ni合金镀层最厚,为25μm,耐蚀性最好,经乙酸盐雾试验168 h后表面仅有几个微小的腐蚀坑。 相似文献
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以低碳钢圆饼为基体,在焦磷酸盐溶液体系中滚镀制备厚度为20μm以上的低锡铜锡合金。研究了Sn2P2O7的质量浓度、K4P2O7的质量浓度、添加剂JZ-1的用量、阴极电流密度及镀液温度对铜锡合金镀层组成和性能的影响。结果表明,这些因素对镀层的组成、性能和持续增厚都有一定的影响。低锡铜锡合金镀层可持续增厚的镀液组成与工艺条件为:K4P2O7 350~400g/L,Cu2P2O7·4H2O 20~25g/L,Sn2P2O7 1.5~2.0g/L,K2HPO4·3H2O 60g/L,添加剂JZ-10~0.5mL/L,pH8.5,阴极电流密度0.34~0.46A/dm2,镀液温度25~35℃,滚筒转速15r/min,循环过滤。在上述条件下对钢铁基体滚镀4h可获得平均厚度为20μm以上、锡的质量分数为12%~16%的铜锡合金镀层,该镀层与钢铁基体之间的结合力良好、耐蚀性能好,具有较好的机械性能与物理性能。 相似文献
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以羧基类物质作配位剂,在A3钢板表面电沉积制备Ni–P合金镀层。镀液基础组成和工艺参数为:NiSO4·6H2O 240 g/L,NiCl2·6H2O 45 g/L,NaH2PO2·H2O 50 g/L,H3BO3 35 g/L,NaF30 g/L,pH 2.0,温度70°C,电流密度2.5 A/dm2,时间20 min。研究了镀液中羧基配位剂含量对Ni–P镀层沉积速率和耐蚀性的影响。结果表明,随羧基配位剂含量增大,沉积速率减小,镀层耐蚀性先改善后变差。其适宜含量为20~30 g/L。羧基配位剂含量为25 g/L时,镀层外观光亮、结合力良好,耐蚀性和耐磨性优于未加配位剂的镀层。镀层的P含量为18.11%,属于高磷非晶态Ni–P镀层。羧基配位剂具有细化镀层晶粒的作用,使镀层表面更为平整、致密。 相似文献
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采用电沉积方法在Q235钢表面制备了Ni–Cr–Co合金镀层。探讨了不同三价铬盐,添加剂和糖精用量以及镀液pH和温度对镀层组成的影响,利用扫描电镜(SEM)和X射线衍射(XRD)方法对镀层的晶体结构和表面形貌进行了表征,并对镀层进行了中性盐雾试验。结果表明,只有在硫酸铬和含添加剂的镀液中才能沉积出铬,在以下工艺条件下可以得到组成为10.25%Cr–21.20%Co–68.55%Ni的三元合金镀层:Cr2(SO4)3·6H2O 90 g/L,NiSO4·6H2O 10 g/L,CoCl21.5 g/L,添加剂8 g/L,糖精1 g/L,pH 2.5,镀液温度25°C,电流密度6 A/dm2。镀层为镍基固溶体晶体结构,平均晶粒尺寸为6.9~10.6 nm。在中性盐雾试验100 h后镀层表面光亮、无腐蚀,表现出优良的耐腐蚀性能。 相似文献
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通过复合电刷镀在20钢基体表面制备镍铁–立方氮化硼(CBN)复合镀层。研究了施镀电压、镀液温度及镀笔速率对复合镀层中CBN含量的影响,分析了镀层中CBN含量与耐磨性之间的关系。复合电刷镀NiFe–CBN的镀液组成和最佳工艺条件为:NiSO4·6H2O 270~300 g/L,FeCl2·2H2O 23~27 g/L,H3BO326~30 g/L,Na3C6H5O7·2H2O 20~30 g/L,糖精2~3 g/L,十六烷基三甲基溴化铵0.2~0.3 g/L,pH 3.2~4.0,电压14 V,温度50°C,镀笔速率15 m/min,时间100~120 min。在最佳工艺下所得镀层的CBN质量分数为9.8%,显微硬度为770 HV,耐磨性和结合力良好。 相似文献
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《电镀与涂饰》2017,(1)
采用喷射电沉积法在45钢棒表面制备Co-P合金镀层。镀液组成和工艺参数为:CoSO_4·7H_2O 200 g/L,H_3PO_4 50g/L,H_3BO_3 30 g/L,NaCl 25 g/L,pH=1.0,温度50℃,喷头移动速率1.2 mm/s,电流密度10~70A/dm~2。研究了电流密度对Co-P合金镀层的表面形貌、相结构、显微硬度和耐磨性的影响。结果表明:在10~70A/dm~2电流密度范围内,随电流密度从10A/dm~2增大到70 A/dm~2,Co-P合金镀层的厚度变化不大,晶粒细化,显微硬度升高,耐磨性改善,但电流密度高于40A/dm~2时所得镀层的表面平整度下降。 相似文献
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研究了配位剂CH3COONa和NH4Cl对GH202合金酸性化学镀镍镀速和镀层磷含量的影响,分析了化学镀过程中镍离子和次磷酸根离子的消耗量。镀液的组成和工艺条件为:NiSO4·7H2O 80 g/L,NaH2PO2·H2O 24 g/L,H3BO3 8 g/L,CH3COONa·H2O 6~15 g/L,NH4Cl 3~6 g/L,pH 5.0,温度85°C,时间2 h。随镀液中CH3COONa含量增加,沉积速率先增大后减小,镀层磷含量则在6.19%~10.45%范围内呈小幅波动。随镀液中NH4Cl含量增大,沉积速率变化不大,但镀层磷含量减小。随化学镀时间延长,镀液中镍离子和次磷酸根离子的消耗速率均减小。镀液中CH3COONa与NH4Cl的较优质量浓度分别为12 g/L和6 g/L。采用该体系化学镀所得Ni–P镀层表面平整,厚度约为50μm,磷的质量分数为6.19%,结合力良好,综合性能基本满足GH202合金表面预镀镍层的要求。 相似文献
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通过赫尔槽试验与直流电解试验,研究了添加剂在焦磷酸盐溶液体系无氰电镀铜-锡合金(低锡)工艺中的作用。该体系镀液组成与工艺条件为:Cu2P2O7·3H2O25g/L,Sn2P2O71.0g/L,K4P2O7·3H2O250g/L,K2HPO4·3H2O60g/L,温度25℃,pH8.5,电流密度1.0A/dm2。采用扫描电镜(SEM)、X射线衍射(XRD)、能谱(EDS)、中性盐雾试验等方法研究了添加剂对镀层组成结构、外观、耐腐蚀性能及微观形貌的影响。结果表明,焦磷酸盐溶液体系无氰电镀铜-锡合金(低锡)时使用有机胺类添加剂可抑制Sn的析出,使合金镀层致密均匀,耐蚀性能好。镀层结晶主要为Cu13.7Sn结构,镀层中Sn含量为9%~11%。镀液中添加剂的使用量增加,则合金镀层中的Sn含量降低。 相似文献
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乙烯酮(双乙烯酮)是十分重要的化工中间体,其下游产品较多。江苏某化工厂开发生产乙烯酮(双乙烯酮)下游产品三十多个,年生产规模三万多吨,是国内以乙烯酮(双乙烯酮)为中间体生产精细化学品的综合骨干企业。针对乙烯酮(双乙烯酮)下游产品废水特点,该厂结合企业实际,开展了产品优化,结构调整,清洁生产,资源循环利用,节水降耗等工作,从源头削减了污染物的生产。同时投资二千多万元新建预处理装置三套,6000m3/d废水生化处理装置一套,使全厂乙烯酮(双乙烯酮)下游产品的废水得到了有效的治理。 相似文献
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D. G. Gordeev L. F. Gudarenko M. V. Zhernokletov V. G. Kudel’kin M. A. Mochalov 《Combustion, Explosion, and Shock Waves》2008,44(2):177-189
A semi-empirical equation of state for metals is described. Its capabilities are demonstrated by the example of the equation
of state for aluminum. New experimental data are presented on the location of the isentrope of aluminum for unloading from
the state at p = 229.71 GPa on the shock adiabat to an aerogel (SiO2) of density 0.08 g/cm3.
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Translated from Fizika Goreniya i Vzryva, Vol. 44, No. 2, pp. 61–75, March–April, 2008. 相似文献
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Jorge Marcelo Romero Soledad Bustillo Hugo Enrique Ramirez Maisuls Nelly Lidia Jorge Manuel Eduardo Gómez Vara Eduardo Alberto Castro Alicia H. Jubert 《International journal of molecular sciences》2007,8(7):688-694
A thermochemical rather simple experimental technique is applied to determine the enthalpy of formation of Diperoxide of ciclohexanone. The study is complemented with suitable theoretical calculations at the semiempirical and ab initio levels. A particular satisfactory agreement between both ways is found for the ab initio calculation at the 6–311G basis This set level. Some possible extensions of the present procedure are pointed out. 相似文献
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The objective of the study was to explore the effect of the degree of deacetylation (DD) of the chitosan used on the degradation rate and rate constant during ultrasonic degradation. Chitin was extracted from red shrimp process waste. Four different DD chitosans were prepared from chitin by alkali deacetylation. Those chitosans were degraded by ultrasonic radiation to different molecular weights. Changes of the molecular weight were determined by light scattering, and data of molecular weight changes were used to calculate the degradation rate and rate constant. The results were as follows: The molecular weight of chitosans decreased with an increasing ultrasonication time. The curves of the molecular weight versus the ultrasonication time were broken at 1‐h treatment. The degradation rate and rate constant of sonolysis decreased with an increasing ultrasonication time. This may be because the chances of being attacked by the cavitation energy increased with an increasing molecular weight species and may be because smaller molecular weight species have shorter relaxation times and, thus, can alleviate the sonication stress easier. However, the degradation rate and rate constant of sonolysis increased with an increasing DD of the chitosan used. This may be because the flexibilitier molecules of higher DD chitosans are more susceptible to the shear force of elongation flow generated by the cavitation field or due to the bond energy difference of acetamido and β‐1,4‐glucoside linkage or hydrogen bonds. Breakage of the β‐1,4‐glucoside linkage will result in lower molecular weight and an increasing reaction rate and rate constant. © 2003 Wiley Periodicals, Inc. J Appl Polym Sci 90: 3526–3531, 2003 相似文献
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A perturbation viscometer is a differential capillary viscometer that measures the logarithmic viscosity gradient of the viscosity-composition curve for gas mixtures. Measurements are made at different gas mixture compositions. Integration of the logarithmic viscosity gradients measured over the full composition range gives the mixture viscosity relative to the viscosity of one of the pure components of the gas mixture. This method is attractive because, for measurements of equal precision, integration of the gradients is potentially an order of magnitude more precise than measurement of the viscosities directly. It can also work at high and low temperatures and perhaps high pressures.The perturbation viscometer has been used to make measurements on ideal gas mixtures at ambient and elevated temperatures. The situation is more complicated when the gas mixtures are non-ideal. Extra effects due to density differences, molar volume change on mixing and differential thermal expansion may be measured in addition to the desired viscosity change producing systematic errors in the results. Thus, a more sophisticated apparatus is required. The standard perturbation viscometer has been modified to separate out the extra effects to permit measurement of the true change in viscosity. In addition, the theoretical operation of the modified apparatus has been revised to account for the design changes to permit calculation of the viscosity-composition profiles from the results.The apparatus has been tested using helium-HFC-125 mixtures and two new viscosity-composition profiles are presented for these mixtures at 23 and . Internal consistency tests have been used to confirm that the data produced are of high quality with an estimated uncertainty in the viscosity ratio data at of 0.9% and at of 1.5%. 相似文献