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1.
基于南京电子器件研究所0.5μm GaAs PHEMT工艺,研制了一种高增益级联式光接收机前置放大器.作为前级的跨阻抗放大器的-3dB带宽为10GHz,小信号增益为9dB;作为后级的分布式放大器的-3dB带宽接近20GHz,小信号增益为12dB;级联前置放大器小信号增益达21.3dB,跨阻增益为55.3dBΩ,在输入10Gb/s非归零伪随机二进制序列下,放大器输出眼图清晰、对称、信噪比优于跨阻放大器,分布放大器不能校正的输入波形失真也得到显著改善.  相似文献   

2.
基于0.18 μm BiCMOS工艺,设计了一种适用于光纤通信的10 Gbit/s光接收机前置放大器。电路由跨阻放大器、两级可变增益放大器、缓冲器、直流偏移消除电路、峰值探测器和自动增益控制环路组成。跨阻放大器采用并联-并联负反馈结构,在满足增益、带宽要求前提下实现低噪声特性。后级放大器引入了增益可变控制,获得宽输入动态范围,同时采用电容简并技术提升带宽。版图后仿真结果表明,在小信号光电流输入下,放大器的差分跨阻增益为10.7 kΩ,-3 dB带宽为7.4 GHz,平均等效输入噪声电流密度为16.9 pA/Hz。可调增益范围在25.2~80.6 dBΩ内,输入动态范围超过40 dB。在3.3 V电压下,静态功耗为166 mW,版图尺寸为764 μm540 μm。  相似文献   

3.
设计了一种的低成本、低功耗的10 Gb/s光接收机全差跨阻前置放大电路。该电路由跨阻放大器、限幅放大器和输出缓冲电路组成,其可将微弱的光电流信号转换为摆幅为400 mVpp的差分电压信号。该全差分前置放大电路采用0.18 m CMOS工艺进行设计,当光电二极管电容为250 fF时,该光接收机前置放大电路的跨阻增益为92 dB,-3 dB带宽为7.9 GHz,平均等效输入噪声电流谱密度约为23 pA/(0~8 GHz)。该电路采用电源电压为1.8 V时,跨阻放大器功耗为28 mW,限幅放大器功耗为80 mW,输出缓冲器功耗为40 mW,其芯片面积为800 m1 700 m。  相似文献   

4.
光通信用宽动态范围10 Gb/s CMOS跨阻前置放大器   总被引:1,自引:0,他引:1  
刘全  冯军 《半导体光电》2009,30(2):264-267
采用UMC 0.13 μm CMOS工艺,设计了一种应用于SDH系统STM-64(10 Gb/s)光接收机前置放大器.该前置放大器采用具有低输入阻抗特点的RGC形式的跨阻放大器实现.同时,引入消直流电路来扩大输入信号的动态范围.后仿真结果表明:双端输出时中频跨阻增益约为57.6 dBΩ,-3 dB带宽为10.7 GHz,平均等效输入噪声电流谱密度为18.76 pA/sqrt(Hz),1.2V单电压源下功耗为21 mW,输入信号动态范围40 dB(10 μA~1 mA).芯片面积为0.462 mm×0.566 mm.  相似文献   

5.
12 Gb/s GaAs PHEMT跨阻抗前置放大器   总被引:1,自引:0,他引:1       下载免费PDF全文
采用0.5 μ m GaAs PHEMT工艺研制了一种单电源偏置光接收机跨阻抗前置放大器.放大器-3dB带宽约为9.5GHz;在50MHz~7.5GHz范围内,跨阻增益为43.5±1.5dB Ω ,输入输出回波损耗均小于-10dB;带内噪声系数在4dB~6.5dB之间,由此得到的最小等效输入噪声电流密度约为17.6pA/ Hz ;输入12Gb/s NRI伪随机序列时,放大器输出眼图清晰,眼开良好.  相似文献   

6.
采用TSMC0.18μmCMOS工艺设计了光接收机宽带前置放大器。该前置放大器采用具有反馈特性的跨阻放大器实现,采用了RGC(RegulatedCasacoe)电路作为输入级,同时在电路中引入电感并联补偿的技术,以拓展前置放大器的带宽。仿真结果表明:1.8V单电压源供电情况下,电路功耗15.2mW,中频互阻增益为58.4dBΩ,-3dB带宽可达到10.2GHz,可工作在10Gb/s速率。  相似文献   

7.
2.5Gb/Scmos光接收机跨阻前置放大器   总被引:6,自引:0,他引:6  
给出了一种利用0.35μm CMOS工艺实现的2.5Gb/s跨阻前置放大器。此跨阻放大器的增益为59 dB*Ω,3dB带宽为2GHz,2GHz处的等效输入电流噪声为0.8×10-22 A2/Hz。在标准的5V电源电压下,功耗为250mW。PCML单端输出信号电压摆幅为200mVp-p。整个芯片面积为1.0mm×1.1mm。  相似文献   

8.
采用0.5μm GaAs PHEMT工艺和台面光刻互连工艺研制了一种850nm光接收机前端单片电路,包括金属-半导体-金属光探测器和跨阻前置放大器。探测器光敏面积约2000μm2,电容小于0.15pF,4V偏压下的暗电流小于14nA。跨阻前置放大器-3dB带宽接近10GHz,跨阻增益约43dBΩ。光接收机前端在输入2.5Gb/s非归零伪随机二进制序列调制的850nm光信号下得到较为清晰的输出眼图。  相似文献   

9.
20GHz宽带GaAs PHEMT分布式前置放大器   总被引:3,自引:0,他引:3       下载免费PDF全文
采用0.5μm GaAs PHEMT工艺研制了一种光接收机分布式前置放大器.该放大器-3dB带宽接近20GHz,跨阻增益约46dBΩ;在50MHz~16GHz范围内,输入、输出电压驻波比(VSWR)均小于2;带内噪声系数在3.03~6.5dB之间,平均等效输入噪声电流密度约为14.6pA/ Hz ;在输入10Gb/s非归零(NRZ)伪随机二进制序列(PRBS)信号下,放大器输出眼图清晰,具有12ps的定时抖动和166mV峰峰电压.  相似文献   

10.
基于国内的材料和工艺技术,研制出850 nm单片集成光接收机前端,集成形式包括PIN/TIA、PIN/DA、MSM/TIA和MSM/DA等.对光探测器和电路分别进行了研究和优化.通过Silvaco软件,建立了探测器器件模型,并通过实验数据验证.分布放大器-3 dB带宽接近20 GHz,跨阻增益约46 dBΩ,输入、输出驻波比均小于2,噪声系数在3.03~6.5 dB之间.跨阻前置放大器-3 dB带宽接近10 GHz,跨阻增益约43 dBΩ,输入、输出驻波比均小于3.5,噪声系数在4~6.5 dB之间.集成芯片最高工作速率达到5 Gb/s.  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

13.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

14.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

15.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

16.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

17.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

18.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

19.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

20.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

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