高稳定性无氰镀银工艺研究

针对传统氰化镀银工艺存在的毒性及职业健康风险,开展了无氰镀银工艺研究。通过Hull Cell试验以及对试验现象的观察比较,确定并优化了无氰镀银的工艺参数。结果表明：该工艺在35～45℃,pH值为9.0～10.0,0.1～1.2 A/dm²的电流密度下,可以获得外观平整、纯度高、均匀光亮的镀银层,且镀液具有稳定性好、电流效率高等优点,具有市场应用潜力。     

高性能无氰镀银工艺研究

该文研制了一种的无氰镀银工艺技术,通过试验测试镀液的PH值、镀液温度、添加剂含量、镀液状态等对镀层性能的影响,进而得到最优的无氰镀银工艺技术参数。测定了镀液的深镀能力、分散能力、电流效率等镀液性能,结果显示无氰镀银镀液性能与氰化镀银镀液性能基本相当,甚至优于传统的氰化镀银槽液。该无氰镀银工艺能够获得结晶均匀、细致、呈银白色且具有良好结合力、抗变色性能、氢脆性能的镀银层。     

双向脉冲无氰镀银工艺研究

对无氰镀银工艺参数进行了优选,得出最佳双向脉冲参数如下:正向脉宽为1ms,占空比为10%,电流密度为0.8A/dm2,工作时间为100ms;反向脉宽为1ms,占空比为5%,电流密度为0.2A/dm2,工作时间为20ms,同时施加一与电场方向正交的磁场.在最佳工艺参数下得到的银镀层镜面光亮,与单向脉冲镀银和直流镀银相比,抗变色性和耐蚀性均显著提高,并通过扫描电镜观察了镀层的表面形貌.     

丁二酰亚胺的乳化作用与应用

本文介绍了一种新型的乳化炸药乳化剂,讨论了该乳化剂的乳化作用、稳定原理,以及它在制备乳化炸药中的应用情况。     

丁二酰亚胺乳化机理的探讨

文中讨论了用于制备乳化炸药的丁二酰亚胺的乳化机理，根据丁二酰亚胺的分子结构，认为油溶性丁二酰亚胺作为油相和水相的媒介，与水之间除存生物在物理吸附之外，还存在以氢键为主的化学吸附，从而能显著地降低油水两相界面张力，构成稳定的乳胶颗粒。     

新型无氰镀银性能及生产应用

新型无氰镀银1986年获第三十五届布鲁赛尔尤里卡世界发明银质奖。我厂引进用于生产已达五年之久,经生产验证,该工艺具有如下特点:镀液具有高稳定性,对光、热适应性和抗杂质干扰都很好;对镀件的适应范围宽,如锌白铜、铍青铜、磷青铜等镀件都能获得结合牢固的银镀层;镀层结晶致密,呈银白色,理化性能可与氰化镀银层媲美,抗硫、抗盐雾腐蚀、抗变色、导电、焊接等性能均优于氰化镀银层;在同一镀液中即可滚镀又可挂镀,有良好的分散件和深镀能力;镀液无毒,配制     

丁二酰亚胺类乳化剂在乳化炸药中相容性的研究

文章对丁二酰亚胺类乳化剂在乳化炸药中的物理相容性和化学相容性两个方面进行了详细的研究,得出该类乳化剂在乳化炸药中与诸材料的相容性比常用的Span-80乳化剂更好的结论。     

脉冲无氰电镀银(微)电极

采用恒电流方波脉冲电流对晶体管芯银电极的电镀槽液及脉冲参数进行了研究.作者通过调整槽液配方采用无毒菸酸无氰镀银液和经脉冲参数的最佳控制(认为脉冲电流和脉冲宽度的影响导致阴极过电位大小变化,为此选择适当的脉冲幅值和脉冲宽度是镀层致密的关键因素),得到结晶细致、结合力好的镀层;与直流氰化镀液相比,不但镀层质量优异,而且沉积速度快,提高工效2倍以上,镀层质量达到国外同类进口样品水平(法国和日本).解决了硅稳压二极管等管芯国产化,为国内电子器件采用脉冲无氰电镀新技术开辟了新途径.     

质子交换膜燃料电池不锈钢双极板无氰脉冲镀银

质子交换膜燃料电池不锈钢双极板直流氰化镀银,污染环境、耐蚀性不理想,为此,使用无氰脉冲镀银对不锈钢双极板进行了表面改性。采用XRD,SEM,界面接触电阻测试、模拟燃料电池环境腐蚀等方法,研究了无氰脉冲镀银对不锈钢双极极性能的影响。结果表明：无氰脉冲镀银改善了镀层的微观结构,其接触电阻为镀银处理前的1／10,同时腐蚀电流...     

脉冲激光沉积(PLD)的研究动态与新发展

介绍了脉冲激光沉积薄膜技术的原理、特点,详细探讨了脉冲激光沉积的研究动态和发展趋势.大量研究表明,PLD技术是目前制备薄膜的最好方法之一.     

钛合金上直接镀银工艺

概述了一种钛合金上直接镀银获得良好结合力镀层的工艺，并对其机理进行了探讨。     

Pulsed Laser Deposition of Superhard Nitride Coatings

Nitrides coatings have a large number of applications in high-technology industries due to many unique physical, chemical, and mechanical properties. Thin films of aluminum nitride (AIN), silicon nitride (Si₃N₄), and carbon nitride (CN_x) were deposited on Si (100) substrates using the pulsed laser deposition (PLD) method. The seeding of titanium nitride (TiN) before the CN_x deposition has promoted the growth of the predominantly crystalline CN_x films. The laser deposition parameters and substrate temperature play an important role in fabricating high quality films. The structural and microstructural properties of these films have been characterized using x-ray diffraction, and scanning electron microscope techniques. The Fourier Transform Infrared (FTIR) and x-ray photoelectron spectroscopy (XPS) have been used to investigate the bonding properties in CN_x films. The mechanical properties of the films were evaluated to correlate with the processing parameters of the deposited films. It has been shown that the films with crystalline quality structure have higher hardness and modulus values.     

脉冲激光沉积有机薄膜

脉冲激光沉积(PLD)技术是一门新兴的薄膜制备技术,在无机薄膜的制备和研究方面取得了令人满意的成果,技术也比较成熟.但利用脉冲激光沉积技术制备和研究有机膜方面的工作开展较晚,工作也比较少,尚未形成一个比较系统的体系.因此开展有机薄膜的脉冲激光沉积研究将具有重要的意义.     

Silver Deposition In the Diffusion Process

A theoretical explanation is offered to account for the dependence of the density and colour of a silver-gelatin coating on the packing density of the single silver particles. Experimental results concerning the use of silver coatings are communicated.

1. Coatings with a very high volume concentration of silver (>3 per cent) show a high density and a shift of the colour tone to black. The particle size is not of great influence.

2. Coatings with a small volume concentration of silver show a colour tone which depends on the size of the single aggregates and can approximately be calculated according to Mie’s theory.

3. In the experiments performed the addition of blue toners was always connected with the formation of zones with a high volume concentration of silver so that a genuine shift of colour tone cannot be separated from the effect of a high volume concentration. A blue toning effect caused by poisoning of the nuclei also happens and is to be explained.

4. The existence of genuine blue toners remains open. It can only be said to be established when coatings of the same volume concentration and of the same particle size look yellow to brown without additive and blue black with additive.     

脉冲激光沉积(PLD)薄膜技术的研究现状与展望

综述了脉冲激光沉积 (PLD)薄膜技术的研究现状 ,并按照研究方向将整个研究领域分为三个部分 :PLD法沉积薄膜的机理 ,PLD的工艺研究以及PLD法沉积的主要薄膜材料 ,分别进行了阐述 ,对相关的研究工作提出了建议 ,并对PLD技术的应用前景做了展望     

Magnetic Perovskite Superlattices Grown by Pulsed Laser Deposition

Magnetic multilayers of (SrRuO₃) _m (SrMnO₃) _n were grown artificially using the pulsed laser deposition technique on (001)-oriented SrTiO₃ substrates. The temperature and magnetic field dependent reisistivity of the superlattices consisting of ferromagnetic (FM) SrRuO₃ and antiferromagnetic (AFM) SrMnO₃ are studied as a function of the SrRuO₃ unit cells. We observed a pinned/biased moment instead of the biased field in the superlattices and we redefine the structure as AFM/FM(Pin)/FM(Free)/FM(Pin) units below a critical field.     

Beschichtung von metallischen Membranen mittels Pulsed Laser Deposition

Coating of metallic membranes by pulsed laser deposition There is increasing demand to functionalize meso‐ and nano‐porous materials by coating and make the porous substrate biocompatible or environment friendly. However, coating on a meso‐porous substrate poses great challenges, especially if the pore aspect ratio is high. In the current work the pulsed laser deposition (PLD) method is used for coating Ni₃Al‐based meso‐porous membranes with diamond‐like carbon (DLC) layers of high thickness homogeneity and adhesion.     

Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

Pulsed reactive sputtering is a novel process used to deposit some compound films,which are not deposited by traditional D.C.reactive sputtering are presented.The hysteresis phenomenon of the sputtaring voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.     

脉冲激光沉积氢化锂薄膜(英文)

用脉冲激光沉积制备了氢化锂薄膜,对薄膜的结构和表面形貌进行了,给出了氢气压和靶基距与沉积速率的关系。运用扫描电镜和X射线衍射仪测试薄膜的性质。测试结果显示,氢气压为10-1mbar时,薄膜表面粗糙且呈现多晶态。对薄膜粗糙度与氢气压的关系进行了讨论。