铀表面全方位离子注入渗氮处理研究

利用全方位离子注入技术在金属铀表面进行渗氮处理。结果表明,离子注入温度和脉宽是关键工艺参数;提高基体温度,明显增加氮离子在铀中的注入深度。利用俄歇电子能谱（AES）分析注入工艺参数与渗氮层深度间的关系,增加注入脉宽能明显提升含氮层深度。在其它工艺参数不变的情况下,采用60μs脉宽的渗氮层深度比40μs有显著增加,而80μs注入脉宽的渗氮层深度比低温氮离子注入深度提高一个数量级。脉冲负高压对渗氮层深度影响并不明显,但会提高氮的保持剂量。     

铍表面离子注入层硬度的研究

对金属铍进行了不同剂量的离子注入表面处理。测量了注入处理后的金属铍表面的显微硬度;将测量的硬度值,利用Jonsson硬度模型计算了注入表面层的硬度;分析了注入表面层的硬度值与注入剂量的关系及注入强化机理。结果表明,离子注入层硬度是铍本身硬度值的9倍。     

[例48]全方位离子注入与沉积在航天精密运动部件表面强化中的应用

<正>在火箭、卫星等研制中,渗氮、喷涂等表面强化方法很容易导致零件尺寸变差,因此必须在精密部件表面制备出高尺寸精度和高性能的强化层。而传统表面强化技术难以同时满足这两个要求。全方位离子注入与沉积技术利用离子鞘层来实现离子的加速,克服了传统束线离子注入的直射性效应;当离子鞘层与工件之间"保形"时,可在复杂形状零件表面获得均匀的表面强化层,在高精度表面强     

中频交流磁控溅射制备氧化锌铝(ZAO)薄膜的研究

等离子体浸没离子注入与沉积技术可实现复杂形状零件表面垂直、均匀地离子注入与沉积处理,在材料表面改性领域具有广泛的应用前景。在技术发明后的20年间,该技术得到了快速的发展,但是也遇到了如何提高离子注入效率和注入均匀性、内表面注入、大面积注入等一系列问题。若上述问题得到解决,将极大的推进等离子体浸没离子注入与沉积技术的工业应用进程。     

银基体上铜等离子体基离子注入层的成分分布

研究了银基体上铜等离子体基离子注入 (CuPBII)层成分深度分布与试验工艺参数的关系。选择影响注入离子能量的脉冲偏压和注入剂量的不平衡磁控靶放电电流和靶基距作为试验参数 ,用X射线光电子谱 (XPS)进行注入层成分深度分析。结果表明 ,对较高的脉冲偏压 (80kV)、中等的磁控靶电流 (75mA)和近的靶基距 (2 0 0mm) ,容易形成厚的银铜过渡层 (7.6μm) ,且铜离子注入、铜原子的反冲注入与铜的沉积很好地匹配。与气体等离子体基离子注入不同 ,铜的沉积速率成为影响银铜过渡层的又一决定因素。     

Zr合金的几种Nb表面合金化工艺的耐蚀性能研究

运用直流磁控溅射的方法在Zr-4合金表面预置Nb层,然后对其表面运用激光束、电子束和离子注入3种工艺在Zr-4合金表面添加了Nb元素,研究了相应的组织和性能,发现合金化后样品中Nb元素分布不均匀.对表面改性后的合金作了相应的热处理后,进行了极化曲线研究,结果发现:电子束合金化后形成的β-Zr相阻碍了氧的扩散,提高了合金耐蚀能力;Nb离子注入合金后,注入层中生成了ZrO2和NbN,当注入剂量在1×1017～3×1017个/cm2范围内时,随着注入剂量的增加,耐腐蚀能力增强.     

离子注入剂量对工程塑料表面纳米硬度的影响

研究了离子注入剂量和剂量率对工程塑料表面纳米硬度提高效果的影响，分别将不同剂量的C离子注入尼龙6和PET以及Al离子注入PPO，并将不同剂量率的Al离子注入PET。纳米硬度测量显示：随着注入剂量和剂量率的增加，尼龙6、PET、PPO的纳米硬度升高；未注入以及低剂量和剂量率注入塑料的载荷一位移曲线呈现弹塑性变形特征，而高剂量和剂量率注入的呈现出弹性变形特征。     

N^＋注入GCr15钢表面形态变化研究

详细测量和分析了ＧＣｒ１５钢经离子注入处理后的二维和三维表面粗糙度．结果表明．随注入能量和剂量的不同各评定参数的变化趋势也不同。离子注入使粗糙度高度参数值普遍下降，间距参数值有时增大，有时减小；通过溅射作用有时使粗糙峰数减少，有时又产生新峰；形状参数上峰态也发生变化。同时，对不同参数的注入表面尚进行了自相关函数和功率谱函数分析。     

N^＋注入提高GCr15钢抗接触疲劳性能研究

采用离子注入技术对GCr15轴承钢进行氮离子注入 ,用JP 5 2接触疲劳试验机考察了氮离子注入后GCr15钢的抗接触疲劳性能 ;用SEM、TEM、AES、XPS等现代测试技术考察了改性层的相组成及改性机理。结果表明 ,离子注入引起注入层显微硬度提高 ,表面残留压应力增大 ,表面粗糙度降低 ,以及注入层形成了大量细小弥散分布的硬质析出相ε Fe2 3 N等 ,使材料的抗接触疲劳性能大大提高。通过正交实验发现 ,氮离子注入对GCr15钢抗接触疲劳性能的改善程度与注入能量、注入剂量不成正比 ,而是有一最佳值 ,在本实验条件下最佳注入参数为 :注入能量 10 0keV、注入剂量 4× 10 1 7ions cm2 。     

N+注入提高 GCr15钢抗接触疲劳性能研究

采用离子注入技术对GCr15轴承钢进行氮离子注入,用JP-52接触疲劳试验机考察了氮离子注入后GCr15钢的抗接触疲劳性能;用SEM、TEM、AES、XPS等现代测试技术考察了改性层的相组成及改性机理.结果表明,离子注入引起注入层显微硬度提高,表面残留压应力增大,表面粗糙度降低,以及注入层形成了大量细小弥散分布的硬质析出相ε-Fe2-3N等,使材料的抗接触疲劳性能大大提高.通过正交实验发现,氮离子注入对GCr15钢抗接触疲劳性能的改善程度与注入能量、注入剂量不成正比,而是有一最佳值,在本实验条件下最佳注入参数为注入能量100keV、注入剂量4×1017ions/cm2.     

Uniformity enhancement of incident dose on concave surface in plasma immersion ion implantation assisted by beam-line ion source

Plasma immersion ion implantation (PIII) is a promising surface treatment technique for the irregular-shaped components. However, it is difficult to achieve uniform implantation along the surface of a concave sample due to the propagation and overlapping effect of plasma sheath. In this paper, a new ion implantation process is presented for improving the dose uniformity, especially for enhancing the lateral dose of the samples with concavities. In PIII enhanced by beam-line ions process, a beam-line ion source with certain energy is introduced from an external source into the concavity to suppress the sheath propagation and consequently to improve the dose uniformity. The time-dependent evolution of the potential, electrical field and the particle movement surrounding the surface of concave sample is studied by a particle-in-cell/Monte Carlo collision (PIC/MCC) simulation during a single bias high voltage (HV) pulse. The simulation results show that the plasma sheath propagation surrounding the concave sample is suppressed effectively by beam-line ions, and can be quasi-steady state during a single HV pulse. The influence of the energy of induced beam-line ions on the incident ion dose and energy distribution is discussed. Compared with the traditional PIII process, the dose uniformity of the sample surface is improved obviously due to the increase of the ions implanted into the lateral surface.     

9Cr18轴承钢的金属离子加氮离子复合注入处理新工艺

简单地叙述了金属等离子体浸没离子注入与沉积（ＭｅＰⅢＤ）表面处理新工艺的发展,以及ＭｅＰⅢＤ工艺对于脉冲阴极弧金属等离子体源的要求。详细报导了９Ｃｒ１８轴承钢样品的氮离子注入表面处理工艺及金属离子加氮离子复合注入处理新工艺,对被处理和未被处理试样进行了显微硬度、磨痕、摩擦因数及腐蚀特性测试后表明：用金属离子加氮离子复合注入处理的９Ｃｒ１８钢试样的表面特性改善明显优于只有氮离子处理的试样,证明脉冲阴     

COMPUTATIONAL SCHEME FOR SIMULATING PLASMA DYNAM-ICS DURING PLASMA-IMMERSION ION IMPLANTATION

Plasma--immersionionimplantation(Pill)isapowerfultechniqueforsurfacemodificationofmaterials[1'2].InthePillprocess)theobjectbeingimplantedisimmersedinaplasmaandrepeatedlypulsedtoahigh,negativevoltage(scallto--100kV).AtypicaltargetgeometryisshowninFig.la.Theapplicationofthisbiascreatesasheaththatexpandsintothesurroundingplasma,uncoveringpositiveionsandacceleratingthemtothetargetsurfaCe,wheretheymaybeimplanted.Theseimplantedionsmodifythesurfacewhiletightdimensionaltolerancesaremaintained.Aprin…     

Effect of pulse rise time on charging effects in plasma immersion ion implantation with dielectric substrates with planar and cylindrical geometries

Using a one-dimensional self-consistent fluid model, the effect of pulse rise time on charging effects at dielectric surfaces is investigated during plasma immersion ion implantation (PIII) with planar and cylindrical geometries. The numerical results demonstrate that the pulse rise time plays an important role in PIII process with dielectric substrates. It is found that the charge dose accumulated on the dielectric surface is significant as decreasing pulse rise time, and the surface potential decreases at the later stage of the pulse, which results in the lower ion impact energy. On the other hand, the longer pulse rise time would lead to the lower charge dose accumulated on the dielectric surface and higher ion impact energy at the later stage of the pulse, which would elevate the effective implanted dose and introduce the ions to the depth deep enough for surface modification.     

Plasma immersion ion implantation into cylindrical bore using internal inductively-coupled radio-frequency discharge

Plasma immersion ion implantation (PIII) is a potentially excellent interior surface treatment technique due to no line-of-sight restriction. However, some problems have been encountered due to the low ion energy and ion fluence non-uniformity especially for treatment of the interior wall of a thin tube. In this paper, a new method for inner surface PIII using internal inductively-coupled radio-frequency (RF) discharge is described. A cylindrical inductive coil inserted inside the tube serves as both the plasma source and grounded electrode to avoid overlapping of the plasma sheath fronts propagating from opposite sides. The effects of the gas species, gas pressure, RF power, and number of coil turns are investigated. Our results demonstrate the feasibility of this novel inner surface treatment method and the number of turns in the coil has a critical influence on the discharge behavior. If the number of turns is little, the plasma density is low and non-uniform inside the tube due to the relatively intense capacitively-coupled RF discharge at the two ends. In contrast, the plasma density and uniformity are evidently improved by using more turns in the coil.     

Characteristics of Cu implantation into Si by PBII using UBMS cathode

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Reduction in surface resistivity of polymers by plasma source ion implantation

The surface resistivity of several polymers such as poly(styrene/butadiene copolymer), modified poly(phenyleneoxide), poly(ethylene terephthalate), and polyimide was improved by the argon gas plasma source ion implantation (Ar-PSII) technique equipped with a mesh-type conducting grid. With the grid, the surface resistivities of the modified polymers decreased up to 11 orders of magnitudes at a high ion dose, and remained nearly at the same values after 3 months. The PSII treated polymer sample with the grid provided more uniformly modified surface and lower surface resistivity than that treated without the grid. The extent of the decrease in surface resistivity depended on the polymer structures and physical properties. However, the surface resistivity was independent of the sample thickness, the grid size, and the grid height. Surface analyses using scanning electron microscopy, time-of-flight secondary ion mass spectrometry, and Raman spectroscopy provided the useful information on modified surfaces.     

MEVVA源金属离子注入和金属等离子体浸没注入

ＭＥＶＶＡ源金属离子注入技术和金属等离子体浸没注入技术ＭｅＰＩＩＩ的共同特性是强流金属离子注入。它们各具长处,相互补充,共同发展。前者因无鞘层重叠问题和其方向强的特点,特别适用于小件、简单件的大批量金属离子注入处理,能保证处理的均匀性和高效率。后者因无视线加工限制并克服了保持剂量问题,特别适用于处理体积较大、形状复杂的工件,能保证工件所有暴露表面的加工均匀性,调整工作参数,还能进行金属膜沉积和各种     

ION HEATING PROCESS DURING PLASMA IMMERSION ION IMPLANTATION

1.IntroductionIonbombardmelltusingplasmaimmersionmethodhasprovenaneffectivesurfacemodificationtechnique[2,3].Plasmaimmersionionimplantation(Pill)cansignificantlyimprovethesurfacepropertiesofthecomponents,suchashardness,friction,wear--resistanceandcorrosion--resistanceofthematerials.Meanwhileitsbiggestadvantageistheabilitytotreatirregularlyshapedobjectswithoutthenecessityoftargetmanipulation.Pillprocesscanbeconductedbyeitheratalowtemperature(<100'C)orelevatedtemperatureconditions(usually300'C…     

Effect of nitrogen ion implantation dose on torsional fretting wear behavior of titanium and its alloy

Various doses of nitrogen ions were implanted into the surface of pure titanium, Ti6Al7Nb and Ti6Al4V, by plasma immersion ion implantation. Torsional fretting wear tests involving flat specimens of no-treated and treated titanium, as well as its alloys, against a ZrO₂ ball contact were performed on a torsional fretting wear test rig using a simulated physiological medium of serum solution. The treated surfaces were characterized, and the effect of implantation dose on torsional fretting behavior was discussed in detail. The results showed that the torsional fretting running and damage behavior of titanium and its alloys were strongly dependent on the dose of the implanted nitrogen ions and the angular displacement amplitude. The torsional fretting running boundary moved to smaller angular displacement amplitude, and the central light damage zone decreased, as the ion dose increased. The wear mechanisms of titanium and its alloys were oxidative wear, abrasive wear and delamination, with abrasive wear as the most common mechanism of the ion implantation layers.