共查询到18条相似文献,搜索用时 140 毫秒
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研究了非故意掺杂和掺Si的n型GaN外延材料持续光电导的光淬灭.实验发现,非故意掺杂GaN的持续光电导淬灭程度远大于掺Si的n型GaN;撤去淬灭光后前者的持续光电导几乎没有变化,后者却明显减小;稍后再次加淬灭光,前者的持续光电导仍无变化,而后者却明显增加.作者认为两者持续光电导的形成都与空穴陷阱有关,用空穴陷阱模型解释了非故意掺杂GaN持续光电导的形成以及淬灭过程;掺Si的n型GaN的持续光电导是电子陷阱(杂质能级)和空穴陷阱共同作用的结果,并且在持续光电导发生的不同阶段其中一种陷阱的作用占主要地位. 相似文献
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用数值方法将室温n型GaN补偿度θ表示为Caughey-Thomas解析模型函数.对大多数非故意掺杂样品,该模型值θChin与Chin等人的理论值及普遍采用的变温霍耳测量拟合值比较表明,三者具有较好的一致性.对掺Si样品及有氧或Si污染的非故意掺杂样品,基于Chin理论的补偿度值与普遍采用的实验拟合值常有一定偏差,通过理论计算及数值方法,得到了掺硅GaN补偿度的解析模型函数θSi,在室温载流子浓度3×1016~1018 cm-3范围内,该模型值与普遍采用的实验拟合值符合得较好,与基于Chin理论的补偿度θChin也有很好的相容性.该模型对GaN材料分析及器件的计算机模拟、器件仿真有重要意义. 相似文献
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用数值方法将室温n型GaN补偿度θ表示为Caughey-Thomas解析模型函数.对大多数非故意掺杂样品,该模型值θChin与Chin等人的理论值及普遍采用的变温霍耳测量拟合值比较表明,三者具有较好的一致性.对掺Si样品及有氧或Si污染的非故意掺杂样品,基于Chin理论的补偿度值与普遍采用的实验拟合值常有一定偏差,通过理论计算及数值方法,得到了掺硅GaN补偿度的解析模型函数θSi,在室温载流子浓度3×1016~1018 cm-3范围内,该模型值与普遍采用的实验拟合值符合得较好,与基于Chin理论的补偿度θChin也有很好的相容性.该模型对GaN材料分析及器件的计算机模拟、器件仿真有重要意义. 相似文献
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研究了金属有机物化学气相外延(MOVPE)方法生长的非故意掺杂的立方相GaN的持续光电导效应.在六方相GaN中普遍认为持续光电导效应与黄光发射有关,而实验则显示在立方GaN中,持续光电导效应与其中的六方相GaN夹杂有关系,而与黄光发射没有关系.文中提出,立方相GaN与其中的六方相GaN夹杂之间的势垒引起的空间载流子分离是导致持续光电导现象的物理原因.通过建立势垒限制复合模型,解释了立方相GaN的持续光电导现象的物理过程,并对光电导衰减过程的动力学作了分析.对实验数据拟合的结果证明以上的模型和推导是与实验相符的. 相似文献
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在低温下观察到P型CuInSe_2薄膜的瞬态光电导现象,并进行了理论和实验研究。认为该现象是由陷阱引起的光电导衰减使陷阱位垒妨碍光生电子和空穴的复合,通过隧道效应实现了光生电子和空穴的复合。理论与实验结果一致。 相似文献
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立方相GaN的持续光电导 总被引:1,自引:1,他引:0
研究了金属有机物化学气相外延 (MOVPE)方法生长的非故意掺杂的立方相 Ga N的持续光电导效应 .在六方相 Ga N中普遍认为持续光电导效应与黄光发射有关 ,而实验则显示在立方 Ga N中 ,持续光电导效应与其中的六方相 Ga N夹杂有关系 ,而与黄光发射没有关系 .文中提出 ,立方相 Ga N与其中的六方相 Ga N夹杂之间的势垒引起的空间载流子分离是导致持续光电导现象的物理原因 .通过建立势垒限制复合模型 ,解释了立方相 Ga N的持续光电导现象的物理过程 ,并对光电导衰减过程的动力学作了分析 .对实验数据拟合的结果证明以上的模型和推导是与实验相符的 . 相似文献
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Wu L.W. Chang S.J. Wen T.C. Su Y.K. Chen J.F. Lai W.C. Kuo C.H. Chen C.H. Sheu J.K. 《Quantum Electronics, IEEE Journal of》2002,38(5):446-450
A detailed study on the effects of Si-doping in the GaN barrier layers of InGaN-GaN multiquantum well (MQW) light-emitting diodes (LEDs) has been performed. Compared with unintentionally doped samples, X-ray diffraction results indicate that Si-doping in barrier layers can improve the crystal and interfacial qualities of the InGaN-GaN MQW LEDs. It was also found that the forward voltage is 3.5 and 4.52 V, the 20-mA luminous intensity is 36.1 and 25.1 mcd for LEDs with a Si-doped barrier and an unintentionally doped barrier, respectively. These results suggests that one can significantly improve the performance of InGaN-GaN MQW LEDs by introducing Si doping in the GaN barrier layers 相似文献
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采用卢瑟福背散射/沟道技术,X射线双晶衍射技术和光致发光技术对几个以MOCVD技术生长的蓝带发光差异明显的未掺杂GaN外延膜和GaN:Mg外延膜进行了测试。结果表明,未掺杂GaN薄膜中出现的2.9eV左右的蓝带发光与薄膜的结晶品质密切相关。随未掺杂GaN的蓝带强度与带边强度之比增大,GaN的卢瑟福背散射/沟道谱最低产额增大,X射线双晶衍射峰半高宽增大。未掺杂GaN薄膜的蓝带发光与薄膜中的某种本征缺陷有关。研究还表明,未掺杂GaN中出现的蓝带与GaN:Mg外延膜中出现的2.9eV左右的发光峰的发光机理不同。 相似文献
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Yan-Kuin Su Sun-Chin Wei Ruey-Lue Wang Shoou-Jinn Chang Chih-Hsin Ko Ta-Ming Kuan 《Electron Device Letters, IEEE》2003,24(10):622-624
Aluminum gallium nitride/gallium nitride (AlGaN/GaN) heterostructure field effect transistors (HFETs) with and without Si-doped AlGaN layer were fabricated and investigated. HFETs with the Si-doped AlGaN carrier-injection layer show better DC performance, and the transconductance is 150 mS/mm. However, the HFETs with Si-doped AlGaN layer present the deviation from the 1/f noise at low frequency. The Lorentz shape was observed in the noise spectrum. It suggests that traps might be more pronounced in this kind of structure. Therefore, the DC characteristics of HFETs can be improved by the insertion of Si-doped AlGaN layer, but it can result in more low-frequency noise with the carrier-injection layer. 相似文献
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Dmitri N. Zakharov Zuzanna Liliental-Weber Yan Gao Evelyn Hu 《Journal of Electronic Materials》2006,35(7):1543-1546
Transmission electron microscopy has been used to study undoped and Si-doped InGaN/GaN layers. The doped layers show formation
of extrinsic dislocation loops. These defects are not formed in the undoped samples. The highly Si-doped layers show failure
of selective photoelectrochemical wet-etching used for device fabrication. This loss of etching selectivity is attributed
to Si-induced defects evenly distributed in the InGaN layers and their vicinities. 相似文献
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Mg- and Si-doped GaN and AlGaN films were grown by metalorganic chemical vapor deposition and characterized by room-temperature
photoluminescence and Hall-effect measurements. We show that the p-type carrier concentration resulting from Mg incorporation
in GaN:Mg films exhibits a nonlinear dependence both on growth temperature and growth pressure. For GaN and AlGaN, n-type
doping due to Si incorporation was found to be a linear function of the silane molar flow. Mg-doped GaN layers with 300K hole
concentrations p ∼2×1018 cm−3 and Si-doped GaN films with electron concentrations n∼1×1019 cm−3 have been grown. N-type Al0.10Ga0.90N:Si films with resistivities as low as p ∼6.6×10−3 Ω-cm have been measured. 相似文献
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P. Pearah T. Henderson J. Klem W. T. Masselink N. Chand H. MorkoÇ 《Journal of Electronic Materials》1985,14(1):1-7
A short period 15 Å/15 Å GaAs/AlxGa1?xAs superlattice where only the GaAs layers are doped with Si donors has been incorporated in a GaAs/AlxGa1?xAs molecular beam epitaxial modulation doped heterostructure in place of the doped high bandgap ternary alloy. The removal of the donors from the AlxGa1?xAs eliminates the component of light sensitivity resulting from the deep persistent photoconductivity (PPC) traps present in this material. This results in a reduction in overall light sensitivity and an elimination of the PPC effect at 77K. 相似文献