Photoluminescence Studies of Si-Doped Epitaxial GaAs Films Grown on (100)- and (111)A-Oriented GaAs Substrates at Lowered Temperatures

The electrical properties and photoluminescence features of uniformly Si-doped GaAs layers grown on GaAs substrates with the (100) and (111)A crystallographic orientations of the surface are studied. The samples are grown at the same As₄ pressure in the growth temperature range from 350 to 510°C. The samples grown on GaAs(100) substrates possess n-type conductivity in the entire growth temperature range, and the samples grown on GaAs(111)A substrates possess p-type conductivity in the growth temperature range from 430 to 510°C. The photoluminescence spectra of the samples exhibit an edge band and an impurity band. The edge photoluminescence band corresponds to the photoluminescence of degenerate GaAs with n- and p-type conductivity. The impurity photoluminescence band for samples on GaAs(100) substrates in the range 1.30–1.45 eV is attributed to V_As defects and Si_As–V_As defect complexes, whose concentration varies with sample growth temperature. Transformation of the impurity photoluminescence spectra of the samples on GaAs(111)A substrates is interpreted as being a result of changes in the V_As and V_Ga defect concentrations under variations in the growth temperature of the samples.     

Photoreflectance Spectroscopy Study of LT-GaAs Layers Grown on Si and GaAs Substrates

The mechanical strains and densities of surface charge states in GaAs layers grown by low-temperature (LT) molecular-beam epitaxy on Si(100) and GaAs(100) substrates are investigated by photoreflectance spectroscopy. Lines corresponding to the fundamental transition (E _g ) and the transition between the conduction band and spin-orbit-split valence subband (E _g + Δ _SO ) in GaAs are observed in the photoreflectance spectra of Si/LT-GaAs structures at 1.37 and 1.82 eV, respectively. They are shifted to lower and higher energies, respectively, relative to the corresponding lines in GaAs/LT-GaAs structures. Comparing the spectra of the Si/LT-GaAs and GaAs/LT-GaAs structures, it is possible to estimate mechanical strains in LT-GaAs layers grown on Si (by analyzing the spectral-line shifts) and the density of charge-carrier states at the GaAs/Si heterointerface (by analyzing the period of Franz–Keldysh oscillations).     

Localization of holes in an InAs/GaAs quantum-dot molecule

Deep-level transient spectroscopy is used to study the emission of holes from the states of a vertically coupled system of InAs quantum dots in p-n InAs/GaAs heterostructures. This emission was considered in relation to the thickness of a GaAs interlayer between two layers of InAs quantum dots and to the reversebias voltage U_r. It is established that hole localization at one of the quantum dots is observed for a quantum-dot molecule composed of two vertically coupled self-organized quantum dots in an InAS/GaAs heterostructure that has a 20-Å-thick or 40-Å-thick GaAs interlayer between two layers of InAs quantum dots. For a thickness of the GaAs interlayer equal to 100 Å, it is found that the two layers of quantum dots are incompletely coupled, which results in a redistribution of the hole localization between the upper and lower quantum dots as the voltage U_r applied to the structure is varied. The studied structures with vertically coupled quantum dots were grown by molecular-beam epitaxy using self-organization effects.     

Genesis of nanoscale defects and damage in GaAs subjected to multipulse quasi-static photostrains in micrometer-sized regions of semiconductor

Atomic-force microscopy and analysis of both photothermal (quasi-static) strains of surfaces and the kinetics of intensity of specularly reflected light were used to study special features of defect production in GaAs in relation to the number N of focused laser pulses incident on the surface. Irradiation of the semiconductor was accompanied by its electronic excitation, local heating, and deformation of surface layers. It is shown for the first time that the genesis of surface defects and damage in semiconductors (within the laser spot with a micrometer diameter) has a multistage character in the vicinity of the plasticity threshold. The defect-induced and plastic nanometer-scale surface displacements ΔU _z increase with increasing N only if the shearing surface strains ? exceed the previously determined values 10^?50<10^?4 for deformation-related elasticity (quasi-elasticity) limits in GaAs. The origination of nanoscale defects and their self-organization at the early stages of photostrains in the semiconductor is discussed. The possible relation between the defects observed and the subsequent catastrophic damage to micrometer-sized regions of GaAs at large values of N is considered.     

Optical properties of porous nanosized GaAs

The optical properties of porous GaAs layers obtained by electrochemical etching of single-crystal n-and p-GaAs(100) wafers are studied. It is shown that the shape of the nanocrystals, their mean diameter, and their surface states depend on the conductivity type of the initial crystal. A shift of the peaks corresponding to the main optical phonons to lower frequencies in the Raman spectra is observed. Surface-phonon frequencies determined from the Raman spectra coincide with those determined from the reflection spectra in the infrared spectral region. The forms of the spectral dependences of the reflection coefficient in the phonon-resonance region in bulk GaAs differ from those in porous GaAs. This is caused by the appearance of additional oscillators related to spatially confined lattice vibrations in GaAs nanocrystals. Atomic-force microscopy is used to study the surface morphology of porous GaAs samples formed on the n-GaAs substrates, and a nanosized surface profile is observed. Estimations made for the mean diameter of GaAs nanocrystals based on data from the Raman scattering, infrared spectroscopy, photoluminescence, and atomic-force microscopy yield results that are in good agreement with each other.     

Resonant Γ-<Emphasis Type="Italic">X</Emphasis> tunneling in single-barrier GaAs/AlAs/GaAs heterostructures

The electron transport through single-barrier GaAs/AlAs/GaAs heterostructures is studied. This transport is caused by resonant tunneling between the two-dimensional states related to the Γ valley of the GaAs conduction band and various two-or zero-dimensional donor states related to the lower X valleys of the AlAs conduction band. The resonant electron tunneling both via various two-dimensional states related to the X_z and X_xy valleys in AlAs (the X_z and X_xy states) and via related states of Si donors X _z ^D and X _xy ^D was observed. This circumstance made it possible to determine the binding energies of these states (E_B(X _z ^D )≈50 meV and E_B(X _xy ^D )≈70 meV, respectively) directly from the results of identification of resonance features in transport characteristics. An analysis of the structure of experimental resonances corresponding to tunneling between the Γ and X Landau levels in a magnetic field made it possible to determine the transverse effective mass in the X valleys of AlAs (m_t=(0.2±0.02)m₀). An additional fine structure of donor resonances is observed in experimental transport characteristics. This fine structure is caused by resonant tunneling of electrons through the states of the donors that are located in various atomic layers of the AlAs barrier (in the growth direction) and therefore have different binding energies.     

High-efficiency dual-junction GaInP/GaAs tandem solar cells obtained by the method of MOCVD

Monolithic dual-junction GaInP/GaAs solar cells grown by the MOCVD method were studied. The conditions of the growth of ternary Ga _x In_1?x P and Al _x In_1?x P alloys lattice-matched to GaAs are optimized. Technology for fabrication of a tunneling diode with a high peak current density of 207 A/cm² on the basis of heavily doped n ⁺⁺-GaAs:Si and p ⁺⁺-AlGaAs:C layers is developed. Cascade GaInP/GaAs solar cells obtained as a result of relevant studies featuring a good efficiency of the solar-energy conversion both for space and terrestrial applications. The maximum value of the GaInP/GaAs solar-cell efficiency was 30.03% (at AM1.5D, 40 suns).     

The detection limit of curved InGaAs/AlGaAs/GaAs hall bars

The work is devoted to the study of noise characteristics of curved Hall bars based on InGaAs/AlGaAs/GaAs semiconductor heterostructures. The noise spectral density S_N(f) was investigated experimentally and the magnetic field detection limit B_N of a flat and similar Hall bar rolled in a tube was defined. The low-frequency spectra of 1/f noise were studied and the dimensionless Hooge noise parameter α_H was determined. The ability to use the curved Hall bars in the devices for measuring weak magnetic fields (<1 μT) was predicted.     

Photoconverters based on gallium arsenide diffused <Emphasis Type="Italic">p-n</Emphasis> junctions formed on a microprofile GaAs surface

The p-n junctions promising for photoconverters have been fabricated using diffusion from the gaseous phase and studied with the analysis of mass transport of the doping impurity (Zn) through the microprofile GaAs surface taken into account. Depending on the conditions of diffusion (the diffusant’s mass and diffusion duration), the formation of both a p-n junction in a microprofile and a planar p-n junction in the GaAs bulk with a heavily doped near-surface p ⁺ type layer is possible. Photoelectric characteristics of device structures with textured p-n junction and a thin wide-gap Al _x Ga_{1 ? x} As window obtained by liquid-phase epitaxy are reported.     

Molecular state of <Emphasis Type="Italic">A</Emphasis><Superscript>+</Superscript> centers in GaAs/AlGaAs quantum well

Along with the separate A ⁺ centers in the GaAs/AlGaAs quantum wells, there exist paired molecular states of the centers. The molecular states manifest themselves as the second peak of photoluminescence associated with the A ⁺ centers. This statement is based on data on the specific features of circular-polarized photoluminescence and on the characteristic dependences of the amplitudes of photoluminescence peaks on the degree of doping and temperature. The binding energy of holes in the molecular states is determined. It is suggested that the paired state of two positively charged A ⁺ centers is possible due to the polaron effect.     

Photoluminescence of electron-hole plasma in semi-insulating undoped GaAs

The dependence of the photoluminescence spectrum of electron-hole plasma in semi-insulating undoped GaAs on the concentration of the background carbon impurity N_C(3×10¹⁵ cm^?3≤N_C≤4×10¹⁶ cm^?3) is studied at 77 K. It is established that the density of the electron-hole plasma, which is equal to n _e?h ≈1.1×10¹⁶ cm^?3 in crystals with the lowest impurity concentration at an excitation intensity of 6×10²² photons/(cm² s), decreases considerably as the value of N_C increases in the range mentioned above. A decrease in the density of the electron-hole plasma with increasing N_C is attributed to the effect of fluctuations in the carbon concentration N_C, which give rise to a nonuniform distribution of interacting charge carriers and to localization of holes in the tails of the density of states of the valence band.     

GaAs/InGaAsN heterostructures for multi-junction solar cells

Solar-cell heterostructures based on GaAs/InGaAsN materials with an InAs/GaAsN superlattice, grown by molecular beam epitaxy, are studied. A p-GaAs/i-(InAs/GaAsN)/n-GaAs p–i–n test solar cell with a 0.9-μm-thick InGaAsN layer has an open-circuit voltage of 0.4 V (1 sun, AM1.5G) and a quantum efficiency of >0.75 at a wavelength of 940 nm (at zero reflection loss), which corresponds to a short-circuit current of 26.58 mA/cm² (AM1.5G, 100 mW/cm²). The high open-circuit voltage demonstrates that InGaAsN can be used as a material with a band gap of 1 eV in four-cascade solar cells.     

The <Emphasis Type="Italic">U</Emphasis> peak in the DLTS spectra of <Emphasis Type="Italic">n</Emphasis>-GaAs irradiated with fast neutrons and 65-MeV protons

The origin of a broad U band in spectra obtained using deep-level transient spectroscopy (DLTS) of n-GaAs irradiated with fast neutrons and 65-MeV protons was investigated. It is believed that this band is presumably a superposition of two peaks related to two defects P2 and P3 which have been well documented in GaAs and reside within defect clusters. The DLTS spectra were calculated taking into account the nonuniform distribution of these defects in a sample and the built-in electric fields induced by corresponding inhomogeneities.     

Wannier-stark effect in Ge/Si quantum dot superlattices

Deep level transient spectroscopy (DLTS) measurements were performed to study electron emission from quantum states in a 20-layer Ge quantum-dot superlattice (QDSL) in a Ge/Si p-n heterostructure. It was established that the changes in the DLTS spectra depend heavily on the magnitude of the applied reverse bias U _r . Three regions of the reverse bias U _r were identified, corresponding to the manifestation of the three modes of the Wannier-Stark effect: Wannier-Stark ladder mode, Wannier-Stark localization, and nonresonant Zener tunneling mode. Furthermore, it was found that the appearance of DLTS peaks for all three modes is associated with electron emission from deep-level defects via Wannier-Stark localized states arising as a result of the splitting of the electron miniband of the Ge/Si QDSL.     

Study of deep levels in GaAs <Emphasis Type="Italic">p–i–n</Emphasis> structures

An experimental study of the capacitance–voltage (C–V) characteristics and deep-level transient spectroscopy (DLTS) of p⁺–p⁰–i–n⁰ structures based on undoped GaAs, grown by liquid-phase epitaxy at two crystallization-onset temperatures T_o (950 and 850°C), with optical illumination switched off and on, are performed. It is shown that the p⁰, i, and n⁰ layers of epitaxial structures are characterized by the presence of defects with deep donor- and acceptor-type levels in concentrations comparable with those of shallow donors and acceptors. Interface states are found, which manifest themselves in the C–V characteristics at different measurement temperatures and optical illumination; these states form an additive constant. A distinct temperature dependence of the steady-state capacitance of the structures is revealed. It is found that the injection of minority carriers under an applied positive filling pulse and optical recharging lead to modification of the structure and, correspondingly, the DLTS spectra of the p⁺–p⁰–i–n⁰ structures. It is revealed that the p⁺–p⁰–i–n⁰ GaAs structures grown at T_o = 850°C are characterized by a lack of interface states and that the recharging of acceptor-type deep traps under illumination does not change the C–V characteristics. The conventionally measured DLTS spectra reveal the presence of two hole traps: HL5 and HL2, which are typical of GaAs layers.     

Resonant Raman scattering and atomic force microscopy of InGaAs/GaAs multilayer nanostructures with quantum dots

The transition from two-dimensional (2D) pseudomorphic growth to the three-dimensional (3D) (nanoisland) growth in In_xGa_1?xAs/GaAs multilayer structures grown by molecular-beam epitaxy was investigated by atomic force microscopy, photoluminescence, and Raman scattering. The nominal In content x in In_xGa_1?xAs was varied from 0.20 to 0.50. The thicknesses of the deposited In_xGa_1?xAs and GaAs layers were 14 and 70 monolayers, respectively. It is shown that, at these thicknesses, the 2D-3D transition occurs at x ≥ 0.27. It is ascertained that the formation of quantum dots (nanoislands) does not follow the classical Stranski-Krastanov mechanism but is significantly modified by the processes of vertical segregation of In atoms and interdiffusion of Ga atoms. As a result, the In_xGa_1?xAs layer can be modeled by a 2D layer with a low In content (x < 0.20), which undergoes a transition into a thin layer containing nanoislands enriched with In (x > 0.60). For multilayer In_xGa_1?xAs structures, lateral alignment of quantum dots into chains oriented along the \([\overline 1 10]\) direction can be implemented and the homogeneity of the sizes of quantum dots can be improved.     

Effect of Dislocation-related Deep Levels in Heteroepitaxial InGaAs/GaAs and GaAsSb/GaAs <Emphasis Type="Italic">p</Emphasis>–<Emphasis Type="Italic">i</Emphasis>–<Emphasis Type="Italic">n</Emphasis> Structures on the Relaxation time of Nonequilibrium Carriers

The results of an experimental study of the capacitance–voltage (C–V) characteristics and deep-level transient spectroscopy (DLTS) spectra of p⁺–p⁰–i–n⁰ homostructures based on undoped dislocationfree GaAs layers and InGaAs/GaAs and GaAsSb/GaAs heterostructures with homogeneous networks of misfit dislocations, all grown by liquid-phase epitaxy (LPE), are presented. Deep-level acceptor defects identified as HL2 and HL5 are found in the epitaxial p⁰ and n⁰ layers of the GaAs-based structure. The electron and hole dislocation-related deep levels, designated as, respectively, ED1 and HD3, are detected in InGaAs/GaAs and GaAsSb/GaAs heterostructures. The following hole trap parameters: thermal activation energies (E _t ), capture cross sections (σ _p ), and concentrations (N _t ) are calculated from the Arrhenius dependences to be E _t = 845 meV, σ _p = 1.33 × 10^–12 cm², N _t = 3.80 × 10¹⁴ cm^–3 for InGaAs/GaAs and E _t = 848 meV, σ _p = 2.73 × 10^–12 cm², N _t = 2.40 × 10¹⁴ cm^–3 for GaAsSb/GaAs heterostructures. The concentration relaxation times of nonequilibrium carriers are estimated for the case in which dislocation-related deep acceptor traps are involved in this process. These are 2 × 10^–10 s and 1.5 × 10^–10 s for, respectively, the InGaAs/GaAs and GaAsSb/GaAs heterostructures and 1.6 × 10^–6 s for the GaAs homostructures.     

Study of the photoelectric properties of Ge quantum dots in a ZnSe matrix on GaAs

The current-voltage (I–V) and spectral characteristics of a photocurrent are studied at T=4.2 and 300 K for an unstrained GaAs/ZnSe/QD-Ge/ZnSe/Al structure with tunneling-transparent ZnSe layers and Ge quantum dots (QDs). Features such as the Coulomb staircase were observed in I–Vcharacteristics at room temperature and in the absence of illumination. An energy-band diagram of the structure is constructed based on an analysis of the experimental data. In the GaAs/ZnSe/QD-Ge/ZnSe/p-Ge transistor structure with a p-Ge channel and Ge-QD floating gate, the total current of the channel both increased and decreased under exposure to light with various spectra. These variations in channel current are associated with the capture of a positive and negative charge at QDs during different optical transitions. The charge accumulation changes the state of a channel at the heterointerface from depletion to inversion and either decreases or increases the total current.     

Impact-ionization wave breakdown and generation of picosecond pulses in the ultrahigh-frequency band in GaAs drift step-recovery diodes

It is shown experimentally for the first time that the operation of GaAs drift step-recovery diodes produced on the basis of p⁺-p⁰-n⁰-n⁺ is accompanied by the generation of ultrahigh-frequency oscillations in the form of trains of short pulses with a duration of ～10 ps. The amplitude and repetition frequency of these pulses are as high as ～100 V and ～(10–100) GHz, respectively. The phenomena of delayed reversible wave breakdown and excitation of ultrahigh-frequency oscillations in the structures of GaAs step-recovery diodes are found to open up new avenues for progress both in the physics and technology of semiconductor devices based on GaAs structures and in the technology of ultrahigh-frequency systems and devices that deal with pulsed signals of picosecond-scale duration.