纯氮气氛下活性屏离子渗氮处理及其影响因素

利用活性屏离子渗氮(ASPN)技术对38CrMoAl钢在纯氮气氛下进行离子渗氮处理,对渗氮层的硬度、深度、组织结构以及收集粒子的形貌、结构等进行了分析研究.结果表明,电压较低时,Fe主要与O结合生成大量的氧化铁而不能进行ASPN处理,氧起主导作用;只有在电压较高、Fe与N的结合能力较强时才主要生成吸附大量活性氮原子的氮化铁进行ASPN处理.     

纯氮离子渗氮工艺及机理研究

采用高电压低气压、闭炉保温的渗氮工艺对合金钢在纯氮气氛下进行离子渗氮，测定了渗氮层的硬度梯度、渗层深度和相组成。在相同的渗氮时间里，纯氮离子渗氮获得了比以氨气作为渗氮气源进行离子渗氮更好的效果。而且克服了氨气渗氮容易产生环境污染的缺点。通过对纯氮渗氮不同工艺的对比试验，发现只有在足够高的电压下才有明显的渗氮效果。分析了离子渗氮过程中阴极位降区离子的行为，也对渗氮电压如何影响活性氮原子的产生进行了定量的计算，探讨了纯氮离子渗氮的机理。     

纯氮气氛下铜制活性屏离子渗氮试验

铁-氮化合物微粒被认为是活性屏离子渗氮过程中活性氮原子的主要输运载体,试验采用既不吸附氮也不与氮反应生成化合物的铜制活性屏和纯氮气氛,在没有铁-氮化合物微粒的情况下,对45钢试样进行渗氮处理.结果表明,在此条件下,45钢存在渗氮层,渗氮过程除依托铁-氮化合物输运外,活性氮原子还有其它重要的不可忽视的输运方式.     

双相不锈钢等离子表面硬化技术的进展

双相不锈钢兼具奥氏体和铁素体不锈钢的特点，塑性和耐蚀性好，但硬度低，耐磨性差。等离子表面硬化处理能提高双相不锈钢的表面硬度和耐磨性，包括离子渗氮、直流辉光等离子渗氮、活性屏等离子渗氮、空心阴极辅助离子渗氮、等离子沉积薄膜(物理气相沉积、化学气相沉积)、等离子热喷涂、离子注入以及表面复合处理等。     

高速钢的活性屏离子渗氮

利用活性屏离子渗氮技术对W18Cr4V高速钢进行渗氮处理,对其组织、硬度和渗层深度进行分析,并与普通直流离子渗氮作比较.结果表明,经活性屏离子渗氮处理后.渗氮层硬度梯度变得平缓.且最高硬度不在表面,而是在距表面一定距离处,这将能提高高速钢的耐疲劳性能,改善高速钢的内在质量.     

活性屏离子渗氮技术的研究

在真空室内放置一个钢制网状圆筒，并与直流高压电的负极相接，在直流电场的作用下，通过气体离子对圆筒的轰击溅射，产生了一些纳米数量级的活性粒子，利用这些高活性的纳米粒子簇可以对放置在圆筒内的钢件表面进行渗氮处理。试验证明，这些活性粒子是中性的Fe4N粒子，被处理的工件既可以处于悬浮电位，也可以接地。活性屏离子渗氮可以获得和直流离子渗氮同样的处理效果，并解决了直流离子渗氮技术多年来一直存在的许多难以克服的问题。     

工件电位对奥氏体不锈钢活性屏离子渗氮的影响

用活性屏离子渗氮技术分别对处于悬浮电位和阳极电位的AISI 316L奥氏体不锈钢进行低温渗氮处理.并对渗氮层的组织、形貌、相结构、显微硬度和耐蚀性能进行分析.结果表明,在这两种电位状态下处理的试样均可获得具有S相结构特征的单相硬化层.渗氮层不仅具有高的硬度,还有良好的耐蚀性能.在活性屏离子渗氮过程中,从活性屏上溅射下来的中性S相粒子也可以起到氮载体的作用.活性屏空间中性粒子和电子的撞击足以消除不锈钢表面钝化膜对氮的阻隔作用.     

阴极电压和供氮方式对纯氮离子渗氮的影响

分别研究了在500、600、650和700 V阴极电压条件下采用连续供气抽真空和间歇供氮闭炉的方式进行纯氮离子渗氮的工艺及机理.通过对间歇供氮闭炉离子渗氮层显微组织、相组成和硬度梯度的测定与分析,计算和验证了该工艺中N2分子临界离解能.结果表明,纯氮离子渗氮的活性氮原子来自于经阴极位降区加速的高能N 2与中性N2分子间的非弹性碰撞,离解N2分子的N 2离子临界能为48.64 eV,相应的阴极电压门槛值为650 V.纯氮离子渗氮工艺除要求阴极电压高于650 V外,间歇供气闭炉渗氮也是必备条件,在一定温度和足够高的阴极电压下,只有采用间歇供氮闭炉方式进行离子渗氮,从N2分子才能离解出足够多的活性氮原子,使试样表面产生明显的渗氮效果.     

无氢离子渗氮Ti6Al4V合金摩擦学性能的研究

以纯氮气为气源,在Ti6Al4V合金表面进行离子渗氮而形成渗氮层。对渗氮层的显微组织、相结构及显微硬度等进行了分析,并用MMW-1A摩擦磨损试验机对渗氮层的摩擦学性能进行了研究。结果表明:在纯氮气、850℃的渗氮条件下,渗氮层主要由化合物Ti N、Ti2N和α-Ti等相组成;渗氮层的硬度较基体材料有较大提高;在滑动摩擦磨损试验中,渗氮层虽无减摩效果,但其耐磨性较基材大幅提高;未渗氮处理试样的磨损机理是磨粒磨损和局部的粘着磨损,渗氮后试样的磨损机理是磨粒磨损和局部的疲劳剥落。     

离子渗氮的电源问题

离子渗氮电源性能对整个工艺过程有着至关重要的影响。因此，探讨离子渗氮电源设计上的一些问题，以便提高其性能，充分发挥离子渗氮技术的优越性，具有现实意义。1工艺过程对设备的基本要求离子渗氮是通过辉光放电产生的物理场对材料表面的作用使元素渗入材料表面。离子渗氮过程必须处在辉光放电伏安特性曲线的异常辉光区。为使离子渗氮顺利进行，必须解决好以下两个问题：丑．且严格控制工件表面电流密度离子渗氮过程中要保证工艺参数稳定，就必须控制好工件表面电流密度。在异常辉光区电流随电压变化显著，离子渗氛过程中存在的微小气压…     

Study of the Active Screen Plasma Nitriding

Active screen plasma nitriding (ASPN) is a novel nitriding process, which overcomes many of the practical problems associated with the conventional DC plasma nitriding (DCPN). Experimental results showed that the metallurgical characteristics and hardening effect of 722M24 steel nitrided by ASPN at both floating potential and anodic (zero) potential were similar to those nitrided by DCPN. XRD and high-resolution SEM analysis indicated that iron nitride particles with sizes in sub-micron scale were deposited on the specimen surface in AS plasma nitriding. These indicate that the neutral iron nitride particles, which are sputtered from the active screen and transferred through plasma to specimen surface, are considered to be the dominant nitrogen carder in ASPN. The OES results show that NH could not be a critical species in plasma nitriding.     

High frequency and low voltage plasma immersion ion implantation of nitrogen on industrial pure iron at different Rf power

Traditional plasma ion immersion implantation (PIII) can effectively improve material mechanical property and corrosion resistance. But the modified layer by PIII is too thin for many industrial applications. High frequency and low voltage plasma immersion ion implantation (HLPIII) has advantages of PIII and nitriding. Comparing with traditional ion nitriding, HLPIII can obtain higher implantation energy and create a thick modified surface layer. In the present paper nitriding layers were synthesized on industrial pure iron using high frequency and low voltage plasma immersion ion implantation with different RF power (400 W, 600 W, and 800 W). The microstructure of the nitriding layers was characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The mechanical properties such as microhardness and wear resistance were analyzed using HXD1000 microhardness and CSEM pin-on-disk wear testing machine. The anodic polarization characteristics were measured in a 0.9% NaCl solution at room temperature to examine the corrosion resistance of the nitriding layer. The results reveal that Fe₂N, Fe₃N and Fe₄N coexist in the nitriding layer. The nitriding layer is a corrosion protective coating on industrial pure iron in 0.9% NaCl solution. The hardness, wear resistance and corrosion resistance of the nitrided layers on industrial pure iron increase with RF power.     

Investigation of nitrogen mass transfer within an industrial plasma nitriding system II: Application of a biased screen

Active screen plasma nitriding (ASPN) was conceived in order to reduce negative effects observed in direct current plasma nitriding arising from the application of bias to the components. The mechanism of nitrogen mass transfer in ASPN is still not fully understood. Here, we compare the microstructure, composition and hardness response of AISI P20 and H13 steels after nitriding. A set of samples was nitrided with sample bias applied directly and another set was nitrided at floating potential under an active screen. Similar nitrogen content and hardness profiles were obtained for the samples treated using a bias and under an active screen separated from the samples by 12 mm. When the sample-screen separation was increased from 12 to 70 mm the hardness response improved. The principle processes occurring during ASPN are proposed based on the experimental results. In ASPN, a flux of energetic nitrogen species is generated by the active screen which, provided that the samples are within the range of the energetic species, bombards the surface of the samples being treated. This flux is critical in establishing a nitrogen potential and a satisfactory response in the components.     

富氮层快速离子渗氮工艺及机理研究

利用正交试验法对活性屏快速离子渗氮工艺参数进行优化,并对正交试验预测的优化工艺参数进行了验证。利用Fick第二扩散定律对快速离子渗氮优化工艺的富氮层进行了氮浓度、氮浓度梯度的计算。试验及计算结果表明,高温渗氮温度、高温渗氮时间和低温渗氮时间对渗层厚度的影响较大,选择合适的参数可以在渗氮时间不变、渗层硬度不降低的前提下显著增加渗层厚度。当富氮层厚度为8μm时,采用快速渗氮技术得到试样内表面与基体之间的氮浓度梯度,为传统渗氮模式的20倍以上。     

Progress in control of nitriding potential in ASPN process

Abstract

A novel active screen plasma nitriding (ASPN) process provided excellent temperature homogeneity in the load and showed further progress in the control of nitriding potential. In addition to a variation of the nitrogen partial pressure in the process gas commonly used in the conventional plasma nitriding, the applied bias power strongly impacted the nitriding results. In the present work, an application of both methods for the control of nitriding potential in the ASPN process was systematically investigated for a wide range of process parameters to meet the treatment requirements for different types of engineering steel. A two-stage technique based on proper choice of process temperature and required nitriding potential in each stage has been applied in the ASPN process to avoid unnecessary compromises between sufficient thickness of the compound layer, the maximum case hardness and the acceptable nitriding hardness depth.     

Differences in nitrided layer between classic active screen plasma nitriding and active screen plasma nitriding with hemispherical cathodic cage

Abstract

Active screen plasma nitriding (ASPN) is commonly used when regular surface hardening is necessary. The ASPN technique produces a more homogeneous surface coating than direct current plasma nitriding (DCPN) due to different process principles. The term active screen in plasma nitriding refers to a cathodic cage with a defined geometry. The purpose of this work was to study the differences between ASPN using a hemispherical cathodic cage and ASPN using a normal cylindrical cathodic cage. Following some trials using similar parameters, the tests were carried out with three conditions: with DCPN, with a cylindrical cathodic cage in ASPN and with a hemispherical cathodic cage in ASPN. X-ray diffraction and scanning electron microscopy analysis together with energy dispersive spectroscopy were applied to characterise the nitrided layers. The nitrided layers are not the same for each of the conditions used. The ASPN with a hemispherical cathodic cage produced a layer of almost Fe₃N alone, while the other processes gave significant amounts of Fe₄N in the nitrided layer. Scanning electron microscopy analysis showed different surface morphology for each condition.     

不锈钢表面含Cu功能梯度复合改性层的制备及抗菌性能

为提高奥氏体不锈钢(ASS)的耐磨性及赋予其抗菌性能,应用改进的活性屏离子渗氮(ASPN)技术,将纯铜冲孔板置于不锈钢冲孔板上面作为活性屏的顶盖,对316奥氏体不锈钢在低温下(430℃)进行表面渗氮处理,在其表面形成由含Cu抗菌沉积层和S相(氮在奥氏体中的过饱和固溶体γ_N)硬质支撑层组成的功能梯度复合改性层。用扫描电镜(SEM)及其所附能谱仪(EDS)、X射线衍射仪(XRD)表征复合改性层的组织形貌、成分及相结构。用显微硬度计和往复摩擦磨损试验机测试了基体和复合改性层的显微硬度和摩擦磨损性能,用金黄色葡萄球菌进行体外抗菌试验评价复合改性层的抗菌性能。结果表明,在偏压达到250 V后,形成了连续分布的硬质S相扩散层和含Cu沉积层组成的复合改性层。改性层表面最高硬度可达928 HV0.05,与Si₃N₄小球对磨时比磨损率较基体降低约57.76%,显著提高了不锈钢的耐磨性。抗菌试验表明,复合改性层与金黄色葡萄球菌接触24 h后,对金黄色葡萄球菌抗菌率提高到98.5%。改进的活性屏离子渗氮技术制备的功能梯度复合改性层可以有效提高...     

材料的活性屏等离子渗氮

近年来,等离子渗氮技术的迅速发展和在表面工程领域的应用呈现出减缓的趋势,其原因是传统的直流等离子体技术存在一些固有的缺点,例如,炉温难以保持均匀,等离子体不够稳定以及因打弧而引起工件表面损伤等。克服这些不足之处的努力促使了活性屏等离子渗氮(ASPN)技术的发展。本文从技术和环境优势角度证明,ASPN可以应用于低合金钢、工具钢、不锈钢以及能进行传统直流等离子渗氮的其他钢种。此外,ASPN可以处理不适合直流等离子渗氮的非导电材料,如经氧化处理的钢和高分子材料。从长远看,对环境友好且技术先进的等离子渗氮比传统的盐浴和气体渗氮更有优势。活性屏等离子渗氮技术是充分发挥等离子体技术在化学热处理及有关表面工程中应用潜力的新方法。     

Optimization of the ASPN Process to Bright Nitriding of Woodworking Tools Using the Taguchi Approach

The subject of the research is optimization of the parameters of the Active Screen Plasma Nitriding (ASPN) process of high speed steel planing knives used in woodworking. The Taguchi approach was applied for development of the plan of experiments and elaboration of obtained experimental results. The optimized ASPN parameters were: process duration, composition and pressure of the gaseous atmosphere, the substrate BIAS voltage and the substrate temperature. The results of the optimization procedure were verified by the tools’ behavior in the sharpening operation performed in normal industrial conditions. The ASPN technology proved to be extremely suitable for nitriding the woodworking planing tools, which because of their specific geometry, in particular extremely sharp wedge angles, could not be successfully nitrided using conventional direct current plasma nitriding method. The carried out research proved that the values of fracture toughness coefficient K _Ic are in correlation with maximum spalling depths of the cutting edge measured after sharpening, and therefore may be used as a measure of the nitrided planing knives quality. Based on this criterion the optimum parameters of the ASPN process for nitriding high speed planing knives were determined.