Sn0.3Ag0.7Cu焊锡膏的储存稳定性研究

针对焊锡膏在储存过程中的发干、发粘、无法焊接等失效问题,通过研究不同有机酸活性剂与焊锡粉末的室温共存稳定性,对焊锡膏进行了失效分析,并对有机酸活性剂进行了研究。结果表明,不同有机酸室温下的活性有很大差异,水杨酸、丁二酸、戊二酸室温下活性较大,能对焊锡粉造成腐蚀,这是焊锡膏失效的主要原因。苹果酸、己二酸、壬二酸、癸二酸室温下活性较弱,不会对焊锡粉造成腐蚀。用己二酸、壬二酸复配作为活性剂配制的焊锡膏具有优异的焊接性能,高的室温储存稳定性,焊后残留少且无腐蚀性。     

Sn3.8Ag0.7Cu焊料与Fe-Ni镀层的液固界面反应

在流动的还原性气氛中,研究了共晶Sn3.8Ag0.7Cu焊料与不同Fe含量的Fe-Ni合金层的液固界面反应行为。结果表明:低Fe含量的Fe-83Ni镀层与共晶Sn3.8Ag0.7Cu焊料具有较快的液固界面反应速率,高Fe含量的Fe-53Ni镀层与共晶Sn3.8Ag0.7Cu焊料具有较慢的液固界面反应速率,在界面处可以观察到致密的FeSn2白色化合物层。而Fe-74Ni镀层与共晶Sn3.8Ag0.7Cu焊料的液固界面反应速率介于二者之间。当共晶Sn3.8Ag0.7Cu焊料与Fe-Ni镀层反应时,界面处生成的致密的FeSn2白色化合物,可以有效地阻止Fe-Ni镀层的快速消耗。     

共晶Sn3.8Ag0.7Cu焊料在Fe-Ni镀层上的反应润湿行为

用电镀工艺制备了Fe-Ni镀层,研究了还原气氛保护下共晶Sn3.8Ag0.7Cu焊料在Fe-Ni镀层上的反应润湿行为。结果表明:在共晶Sn3.8Ag0.7Cu与Fe-74Ni反应润湿体系观察到了伪部分润湿行为。在铺展球冠的前沿,可以明显地看到有液态膜伸出主液体铺展前沿。随着回流时间的增加,液态膜逐渐长大。共晶Sn3.8Ag0.7Cu焊料与Fe-74Ni电镀合金层的液固界面生成了一层FeSn2化合物,还有大量Cu/Ni/Sn化合物进入焊料内部。     

溶剂对细间距用无铅焊锡膏抗热塌性的影响

焊接后出现桥连、短路是高密度电子组装中经常遇到的问题。通过回流焊接实验和抗热塌性实验,研究了助焊剂中溶剂的复配对焊锡膏抗热塌性的影响。结果表明:四氢糠醇与丙二醇苯醚按质量比3:2复配得到的焊锡膏焊点光亮饱满,铺展率达到84.83%,抗热塌性(150℃)优异。四氢糠醇与聚乙二醇单甲醚250(MPEG250)按质量比1:1复配得到的焊锡膏助焊性良好,焊点铺展率高达86.55%,具有优异的抗热塌性(150℃),并在180℃下仍表现优异,且最小不桥连间距为0.06 mm,满足超细间距条件下的焊接要求。     

Ti对Sn0.7Cu无铅钎料润湿性和界面的影响

研究了Ti的加入对Sn0.7Cu无铅钎料润湿性能以及钎料/Cu界面微观组织的影响.结果表明:在Sn0.7Cu中添加微量Ti,提高了钎料的润湿性能,可使铺展面积提高5％左右,当钎焊时间为3s时,界面金属间化合物(IMC)形貌由原来的扇贝状变为锯齿状;随着钎焊时间延长,Sn0.7Cu/Cu和Sn0.7Cu0.008Ti/C...     

基板稀土微合金化对Sn3Ag0.5Cu/Cu钎焊界面反应的影响

研究了在Cu基板中加入质量分数1%的稀土元素Ce、Er后,与Sn3Ag0.5Cu(SAC305)无铅钎料进行钎焊并时效处理后的界面反应及其化合物(IMC)生长行为。结果表明:钎焊完成后,在SAC305/Cu钎焊界面只观察到Cu_6Sn_5,而SAC305/Cu-1Ce及SAC305/Cu-1Er界面还有Cu_3Sn形成;在时效处理过程中,纯Cu基板上的金属间化合物生长速率最快,Cu-1Ce基板次之,Cu-1Er基板最慢,且形成的IMC厚度也是依次递减;加入质量分数1%的Ce、Er元素对IMC生长均有抑制作用,且Er的抑制作用较Ce强。     

电迁移对Sn3.0Ag0.5Cu无铅焊点剪切强度的影响

通过热风回流焊制备了Cu/Sn3.0Ag0.5Cu/Cu对接互连焊点,测试了未通电及6.5 A直流电下通电36 h和48 h后焊点的剪切强度.结果表明,电迁移显著地降低了焊点的剪切强度,电迁移36 h使剪切抗力降低约30%,电迁移48 h降低约50%.SEM观察断口和界面形貌表明,界面金属间化合物增厚使断裂由韧性向脆性...     

无卤焊锡膏对SMT清洗工艺的影响

根据欧盟的立法和法规,许多公司都努力在电子制造装配中放弃对卤素的使用,特别是溴化物和氟化物。最近Zestron首次就无卤焊锡膏在后续组装件清洗工艺中的影响进行了研究。本研究目的是为了找出替代性活化剂对后续清洗工艺可能造成的影响,确保在切换到无卤免洗焊锡膏后选择正,     

电流密度对Sn3.0Ag0.5Cu焊点蠕变行为的影响

通过观察焊点的电阻变化和显微组织演变,研究了电流密度对Sn3.0Ag0.5Cu焊点蠕变行为的影响。结果表明:焊点在低电流密度条件下蠕变时,其电阻波动大、寿命长,失效机制由蠕变过程主导,损伤逐渐累积导致最终失效;焊点在高电流密度条件下蠕变时,其电阻波动小、寿命短,电迁移作用缓解了焊点的初期蠕变损伤,但是加速了焊点后期脆性断裂失效。     

焊膏印刷技术及无铅化对其的影响

伴随电子组装的高密度和元件的微小化,细间距引脚对焊膏印刷提出了更高要求。为了保证产品质量,制定合理的印刷工艺,针对焊膏印刷技术及工艺参数设定进行了探讨,提出了改进焊膏印刷技术的工艺和方法。     

铜铟铋硫对Sn-Ag基无铅焊料性能的影响

研究了Cu、In、Bi、S元素对Sn-Ag基无铅焊料熔点和铺展性的影响。结果表明:Sn-Ag-Cu三元合金成分为95.5%Sn3.5%Ag1%Cu时具有较低熔点(215℃)和好的铺展性;加入适量的In可降低Sn-Ag合金的熔点和改善铺展性能;随w(Bi)的增加Sn-Ag-Bi三元合金的熔点降低、铺展性变好;Sn-Ag合金的熔点随w(S)的增加而升高,加入少量S能改善Sn-Ag合金的铺展性。     

添加Sb和LaB6对Sn3.0Ag0.5Cu/Cu界面IMC生长的影响

研究了Sb和稀土化合物的添加对Sn3.0Ag0.5Cu无铅焊料焊接界面金属间化合物层生长的影响。研究结果表明,固态反应阶段界面化合物层的生长快慢排序如下:v(SAC0.4Sb0.1LaB6/Cu)v(SAC0.4Sb/Cu)v(SAC0.1LaB6/Cu)v(SAC/Cu)。计算各种界面IMC生长的激活能Q结果表明,Sn3.0Ag0.5Cu/Cu界面IMC生长的激活能最高,为92.789 kJ,其他焊料合金Sn3.0Ag0.5Cu0.4Sb0.1LaB6/Cu,Sn3.0Ag0.5Cu0.1LaB6/Cu和Sn3.0Ag0.5Cu0.4Sb/Cu界面IMC生长的激活能分别为85.14,84.91和75.57 kJ。在老化温度范围内(≤190℃),Sn3.0Ag0.5Cu0.4Sb0.1LaB6/Cu的扩散系数(D)最小,因而其界面化合物的生长速率最慢。     

Effect of cooling rate on microstructure and shear strength of pure Sn,Sn-0.7Cu,Sn-3.5Ag,and Sn-37Pb solders

The microstructure and shear strength characteristics of pure Sn and the eutectic compositions of Sn-37Pb, Sn-0.7Cu, and Sn-3.5Ag prepared under identical reflow conditions but subjected to two different cooling conditions were evaluated at room temperature. For the four solders, the ultimate shear strength increased with increasing strain rate from 10⁻⁵ s⁻¹ to 10⁻¹ s⁻¹. Decreasing the cooling rate tended to decrease the ultimate shear strength for both the Sn-0.7Cu and Sn-3.5Ag solders. The effects of work hardening resulting from increased strain rate were more prevalent in quench-cooled (QC) samples.     

Effect of Cross-Interaction between Ni and Cu on Growth Kinetics of Intermetallic Compounds in Ni/Sn/Cu Diffusion Couples during Aging

The solid-state, cross-interaction between the Ni layer on the component side and the Cu pad on the printed circuit board (PCB) side in ball grid array (BGA) solder joints was investigated by employing Ni(15 μm)/Sn(65 μm)/Cu ternary diffusion couples. The ternary diffusion couples were prepared by sequentially electroplating Sn and Ni on a Cu foil and were aged isothermally at 150, 180, and 200°C. The growth of the intermetallic compound (IMC) layer on the Ni side was coupled with that on the Cu side by the mass flux across the Sn layer that was caused by the difference in the Ni content between the (Cu_1−x Ni _x )₆Sn₅ layer on the Ni side and the (Cu_1−y Ni _y )₆Sn₅ layer on the Cu side. As the consequence of the coupling, the growth rate of the (Cu_1−x Ni _x )₆ Sn₅ layer on the Ni side was rapidly accelerated by decreasing Sn layer thickness and increasing aging temperature. Owing to the cross-interaction with the top Ni layer, the growth rate of the (Cu_1−y Ni _y )₆Sn₅ layer on the Cu side was accelerated at 150°C and 180°C but was retarded at 200°C, while the growth rate of the Cu₃Sn layer was always retarded. The growth kinetic model proposed in an attempt to interpret the experimental results was able to reproduce qualitatively all of the important experimental observations pertaining to the growth of the IMC layers in the Ni/Sn/Cu diffusion couple.