Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition

The influence of nitrogen plasma generated by electron cyclotron resonance (ECR) microwave discharge on deposition of carbon nitride films by means of ECR plasma assisted reactive pulsed laser deposition was investigated by a comparative study on the optical emission of the plume produced by pulsed laser ablation of a graphite target in ECR nitrogen plasma, in vacuum and in low-pressure nitrogen gas ambient. Spatial and temporal spectroscopic measurements show that in vacuum optical emission lines originating from carbon atoms and ions dominate the plume emission, while in low-pressure N₂ ambient weak CN emissions appear. In nitrogen plasma, the plume emission exhibits itself very differently. It evolves from consisting of emissions almost from mono-atomic carbon atoms and ions to being dominated by emissions from CN molecules. The presence of the reactive nitrogen plasma greatly enhanced the CN emissions and eliminated the emission lines from carbon atoms and ions. The appearance of the CN emissions occurs after the emissions from carbon atoms and ions have decayed considerably, indicating that the dominant mechanism for the formation of CN molecules is gaseous phase reaction. Carbon nitride films with nitrogen content of about 40 at.% were obtained. Possible processes for CN molecule formation in gaseous phase and mechanisms responsible for efficient nitrogen incorporation and carbon nitride film deposition were suggested.     

Diamond-like carbon thin films prepared by ECR argon plasma assisted pulsed laser deposition

Diamond-like carbon films were prepared by pulsed laser ablation of graphite target in argon plasma produced from electron cyclotron resonance (ECR) microwave discharge and analyzed by Raman spectroscopy and Fourier transform infrared (FTIR) spectroscopy. The analysis shows that the films prepared with argon plasma assistance have different chemical structure compared with the films prepared in vacuum without plasma assistance. The structure of the films prepared with plasma assistance depends strongly on the bias voltages applied on the substrate. Surface morphology observation shows that the films prepared with argon plasma assistance have a smoother surface than the films prepared without plasma assistance. The re-sputtering of the growing film due to the bombardment of the plasma stream results in reduction of the deposition rate. The ablation plumes during film preparation with and without plasma assistance were examined through optical emission spectroscopy. In vacuum, emission lines from mono-atomic carbons and carbon ions dominate the plume emission. In argon plasma, the plume emission exhibits different behavior in its temporal and spatial evolution. It is initially dominated by strong lines from mono-atomic carbons and carbon ions and then evolves to consist mainly of emissions from C₂ molecules superposed on a featureless continuum. It is also found that the emission intensity of the C₂ molecules as well as the continuum varies with the bias voltages.     

Fast deposition of diamond-like hydrogenated carbon films

Diamond-like hydrogenated carbon films have been formed at low temperatures using methane and acetylene as precursor gases. The source used was of a cascaded arc type employing Ar and Ar/H₂ as carrier gases. Energies of ion species and ion densities in the plasma were measured with a mass energy probe and a Langmuir probe.The films produced were characterized in terms of sp³ content, refractive index, relative hydrogen content, hardness and adhesion. The variation of these parameters is presented as functions of precursor gas flow, process pressure, and surface temperature.Deposition rates up to 30 nm/s have been achieved using acetylene as precursor gas at substrate temperatures below 100 °C. Experiments with acetylene showed deposition rates seven times greater than with methane. The typical sp³ content of 55–78% in the films was determined by X-ray-Excited Auger Electron Spectroscopy (XAES) technique. The hardness and reduced modulus were determined by nanoindentation. Preliminary Atomic Force Microscopy (AFM) studies of the films showed a roughness below 3 nm (R_a).     

Atmospheric plasma deposition of diamond-like carbon coatings

The atmospheric pressure plasma-enhanced chemical vapor deposition of diamond-like carbon (DLC) has been investigated. The DLC coatings were grown with a mixture of acetylene, hydrogen and helium that was fed through a linear plasma source. The plasma was driven with radio frequency power at 27.12 MHz. Deposition rates exceeded 0.10 µm/min at substrate temperatures between 155 and 200 °C. Solid-state carbon-13 nuclear magnetic resonance revealed that the coatings contained approximately 43% sp²-bonded carbon and 57% sp³-bonded carbon. Coefficient of friction values for the coatings were found to be 0.24 ± 0.02, which is within the range observed for vacuum deposited DLC.     

Influence of nitrogen plasma post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition

DLC films were synthesized by RF plasma enhanced chemical vapor deposition and the effects of nitrogen plasma post-treatment at different pressures on the structure and properties of DLC films were investigated. Higher roughness was obtained after plasma post-treatment at higher pressures (0.3 and 0.9 torr) and plasma post-treatment at a lower pressure (0.15 torr) resulted in lower roughness than that of original films. The hardness of DLC films decreased with the decrease of post-treatment pressure, which is consistent with the Raman results of I_D/I_G ratio and G peak position. Compared to the original DLC film, the residual stress after plasma post-treatment decreased slightly due to the relatively thin region involved in the plasma post-treatment.     

液相沉积类金刚石膜的沉积机理研究

根据电化学的相关理论,提出了钛合金表面液相沉积DLC膜的反应机理,给出了可能电极过程,认为膜是通过甲基阳离子的亲电取代反应而不断生长。讨论了氢原子对金刚石结构的稳定作用,并解释了实验条件对膜结构和性能的影响。     

X-Ray reflectometry study of diamond-like carbon films obtained by plasma-assisted chemical vapor deposition

X-Ray reflectivity is used to determine the electron density profiles normal to the surface of diamond-like carbon (DLC) films prepared by plasma-enhanced chemical vapor deposition (PE-CVD). Average values of the scattering lengths obtained from the specular reflection data and elastic recoil detection analysis (ERDA) hydrogen measurements are used to calculate the average mass density of the films. The density is shown to be strongly dependent on the hydrogen content. This depends on the plasma parameters. Argon diluted methane plasma produces homogeneous DLC films but generally with a lower density than the films prepared from pure or He diluted plasmas. These later plasmas produce films with a high density contrast and higher densities.     

Effect of oxygen plasma treatment on non-thrombogenicity of diamond-like carbon films

The non-thrombogenicity of oxygen-plasma-treated DLC films was investigated as surface coatings for medical devices. DLC films were deposited on polycarbonate substrates by a radio frequency plasma enhanced chemical vapor deposition method using acetylene gas. The deposited DLC films were then treated with plasma of oxygen gas at powers of 15 W, 50 W, and 200 W. Wettability was evaluated by water contact angle measurements and the changes in surface chemistry and roughness were examined by X-ray photoelectron spectroscopy and atomic force microscope analysis, respectively. Each oxygen-plasma-treated DLC film exhibited a hydrophilic nature with water contact angles of 11.1°, 17.7° and 36.8°. The non-thrombogenicity of the samples was evaluated through the incubation with platelet-rich plasma isolated from human whole blood. Non-thrombogenic properties dramatically improved for both 15 W- and 50 W-oxygen-plasma-treated DLC films. These results demonstrate that the oxygen plasma treatment at lower powers promotes the non-thrombogenicity of DLC films with highly hydrophilic surfaces.     

Effect of temperature on sulfur-doped diamond-like carbon films deposited by pulsed laser ablation

In this study, S-DLC films were deposited using pulsed laser ablation of a novel sulfur-graphite (SG) mixture target using an ArF excimer laser (193 nm). The SG targets were made by mixing sulfur and graphite powders at different sulfur molar percentages from 0% to 25%. The S-DLC films were deposited at room temperature, 150 °C and 250 °C. The optical and electronic properties of the doped films were studied. Laser Raman spectroscopy indicated increased graphitic behavior with temperature but decreased with higher sulfur content. Spectroscopic ellipsometry analyses found that the optical band-gap energy, extinction coefficient and reflective index, clearly depended on deposition temperature and sulfur content. Hall Effect measurements indicated n-type carrier with concentration in the range of 1 × 10¹⁴ to 2 × 10¹⁷ cm^− 3, strongly depended upon the deposition temperature and amount of sulfur.     

Surface energy of the plasma treated Si incorporated diamond-like carbon films

Surface energy and surface chemical bonds of the plasma treated Si incorporated diamond-like carbon films (Si-DLC) were investigated. The Si-DLC films were prepared by r.f. plasma assisted chemical vapor deposition using benzene and diluted silane (SiH₄/H₂ = 10:90) as the precursor gases. The Si-DLC films were subjected to plasma treatment using various gases like N₂, O₂, H₂ and CF₄. The plasma treated Si-DLC films showed a wide range of water contact angles from 13.4° to 92.1°. The surface energies of the plasma treated Si-DLC films revealed a high polar component for O₂ plasma treated Si-DLC films and a low polar component for CF₄ plasma treated Si-DLC films. The CF₄ plasma treated Si-DLC films indicated the minimum surface energy. X-ray photoelectron spectroscopy (XPS) revealed that the polarizability of the bonds present on the surface explains the hydrophilicity and hydrophobicity of the plasma treated Si-DLC films. We also suggest that the O₂ plasma treated surface can provide an excellent hemocompatible surface from the estimated interfacial energy between the plasma treated Si-DLC surface and human blood.     

Characteristics and surface energy of silicon-doped diamond-like carbon films fabricated by plasma immersion ion implantation and deposition

Diamond-like carbon (DLC) films doped with different silicon contents up to 11.48 at.% were fabricated by plasma immersion ion implantation and deposition (PIII-D) using a silicon cathodic arc plasma source. The surface chemical compositions and bonding configurations were determined by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The results reveal that the sp³ configuration including Si–C bonds increases with higher silicon content, and oxygen incorporates more readily into the silicon and carbon interlinks on the surface of the more heavily silicon-doped DLC films. Contact angle measurements and calculations show that the Si-DLC films with higher silicon contents tend to be more hydrophilic and possess higher surface energy. The surface states obtained by silicon alloying and oxygen incorporation indicate increased silicon oxycarbide bonding states and sp³ bonding states on the surface, and it can be accounted for by the increased surface energy particularly the polar contribution.     

Thermal stability of metal-doped diamond-like carbon fabricated by dual plasma deposition

Metal incorporation into amorphous diamond-like carbon films can provide superior properties as metal nano-clusters or nanocrystalline metallic carbides can be embedded in the carbon network. In this work, a filtered metal plasma cathodic arc technique is used to generate a metal plasma and acetylene is introduced to the metal plasma plume to deposit metal-containing DLC (Me-DLC) films and form nanocrystalline carbide phases in the amorphous carbon matrix. The films exhibit high thermal stability up to annealing temperatures of 500 °C as revealed by X-ray diffraction, transmission electron microscopy, and Raman spectroscopy. At treatment temperature over 500 °C, a large amount of hydrogen is lost from the Me-DLC films as shown by elastic recoil detection. Breakdown and structural collapse of the film at high temperature can be attributed to the breaking of C–H bonds. Consequently, the C–C networks become more graphite-like to facilitate the formation of volatile C–O and metal oxides phases.     

Phase transformation of diamond-like carbon/silver composite films by sputtering deposition

This study fabricated hydrogenated diamond-like carbon/silver bioceramic films on glass substrates using radio frequency magnetron sputtering with a single silver target in an atmosphere of Ar/CH4 mixture. The effects of applied power on the composition and microstructure of bioceramic film were evaluated. A phase transformation, amorphous diamond-like carbon → nano-silver precipitation → nano-silver growth in the amorphous diamond-like carbon matrix was observed during sputtering. The film growth rate, surface roughness, silver content and size of silver nanoclusters in the films all increased with the silver target power due to the higher flux of sputtered silver species toward the substrate.     

Electrical and optical properties of diamond-like carbon films deposited by pulsed laser ablation

Pulsed laser ablation of a graphite target was carried out by ArF excimer laser deposition at a laser wavelength of 193 nm and fluences of 10 and 20 J/cm² to produce diamond-like carbon (DLC) films. DLC films were deposited on silicon and quartz substrates under 1 × 10^? 6 Torr pressure at different temperatures from room temperature to 250 °C. The effect of temperature on the electrical and optical properties of the DLC films was studied. Laser Raman Spectroscopy (LRS) showed that the DLC band showed a slight increase to higher frequency with increasing film deposition temperature. Spectroscopic ellipsometry (SE) and ultraviolet–visible absorption spectroscopy showed that the optical band gap of the DLC films was 0.8–2 eV and decreased with increasing substrate temperature. These results were consistent with the electrical resistivity results, which gave values for the films in the range 1.0 × 10⁴–2.8 × 10⁵ Ω cm and which also decreased with deposition temperature. We conclude that at higher substrate deposition temperatures, DLC films show increasing graphitic characteristics yielding lower electrical resistivity and a smaller optical band gap.     

Effects of hydrogen on the properties of Si-incorporated diamond-like carbon films prepared by pulsed laser deposition

We have deposited unhydrogenated and hydrogenated Si-incorporated DLC (Si-DLC) films by pulsed laser deposition using KrF excimer laser, and systematically examined the structure and the mechanical and tribological properties of the films. Hydrogenated Si-DLC films were prepared by atomic-hydrogen irradiation during deposition. The Si/(Si+C) ratio in DLC films increased by atomic-hydrogen irradiation during deposition, indicating that the hydrogen etching is more effective for C atoms compared with Si atoms. The formation of Si–C bonds in the films and silicon oxides only at the surfaces was confirmed by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was found that the atomic-hydrogen irradiation led to the formation of Si–H bonds to prevent the surface oxidation of the Si-DLC films. The scratch tests revealed that the critical loads of the films deposited with hydrogen were higher than those of the films deposited without hydrogen. We found that the moderately hydrogen-irradiated Si-DLC films tended to have higher wear resistance than the unhydrogenated Si-DLC films.     

A rectilinear plasma filtering system for vacuum-arc deposition of diamond-like carbon coatings

A study of the operation of an electric-arc carbon-plasma source for DLC deposition with the use of a rectilinear filter has revealed that the operating efficiency of plasma flux passage through the filter is determined by the shape of the cathode used.It is demonstrated experimentally that the use of a shaped cathode makes it possible to increase the filter efficiency by no less than 20% compared with that for a standard cathode. The growth rate of a uniformly thick coating, attained during operation with a shaped cathode, was measured to be 3 μm h⁻¹ on a diameter of 18 cm. These results are four times higher (in ion current value) and an order of magnitude greater (in the diameter of a uniformly thick coating) than the previous results obtained with a curvilinear filter.     

Structural characterization of dual-metal containing diamond-like carbon nanocomposite films by pulsed laser deposition

Two metal dopants were simultaneously added into a diamond-like carbon (DLC) matrix using a KrF pulsed laser system at room temperature with no post-processing. The nanometer thin films were fabricated from carbon source targets containing the two metals of interest, Ti and Ni, in atomic percentages 2.5%, 5%, 7.5% and 10% each. Films from carbon targets containing only 5% Ni or 5% Ti were also deposited for comparison against the dual-metal containing films. Microstructure analysis shows that each individual metal reacted independently and uniquely with carbon as confirmed by XPS and surface analysis shows the presence of TiC bonds and Ni⁰. Therefore, there was no reaction between Ti and Ni as metals confirmed by XPS. Through this independent interaction, a superposition of microstructural properties was obtained as if the metals were doped separately into DLC. The separate interactions of the two metals with carbon were important as they were able to play separate and different roles in enhancing the properties of DLC. In addition, TEM analysis confirmed a unique self-assembly state where the nickel ions converge into nanosized clusters of ～ 5 nm in diameter and predominantly oriented in a (200) direction. The resultant films were also extremely smooth with RMS roughness of about 0.1 nm, thus retaining the inherent smoothness of DLC films. The combined Ti/Ni films could be used as substrates to grow carbon nanotubes with controlled density which could be used as cold electron emitters. Thus, it is interesting to study the growth mechanism and microstructure of the composite films.     

Optical and microstructural properties of diamond-like carbon films grown by pulsed laser deposition

Diamond-like carbon films have been fabricated using 308 nm excimer laser ablation in vacuum followed by deposition at temperatures between 77 K and 573 K. Optical band gap energies are obtained from UV/optical spectroscopy. Raman spectra and X-ray photoelectron spectra (XPS) show that the sp³/(sp² + sp³) ratio in these films is in excess of 0.7 in films deposited at 77 K and 300 K. This ratio decreases to 0.2 in films deposited at 573 K. It is found that films deposited at cryogenic temperatures consist of a matrix structure assembled from embedded nanometer clusters, while films deposited at 300 K or higher temperature are amorphous and atomically flat. Microstructural features in cryogenic films are discussed in relation to the mechanism of deposition and possible phase transitions during assembly of these films.     

Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films

In present paper we studied the optical constants of the diamond-like carbon (DLC) films and their changes with annealing. The multisample modification of combined variable angle spectroscopic ellipsometry and near normal spectroscopic reflectometry was used. The optical constants of the DLC films were simulated by our recently published six-parameter dispersion model employing a parameterization of the density of electronic states (DOS). Based on the dispersion model parameters the density of π and σ electrons were evaluated. We showed that from our model and the independently determined hydrogen atomic fraction of the films before and after annealing the ratio between momentum matrix elements of π → π* and σ → σ* transitions and the correct sp³-to-sp² carbon bonding configuration ratio can be calculated. It is worth to notice that the first quantity is usually assumed to be equal to unity but we showed that this assumption may cause a significant error in the determination of the sp³-to-sp² ratio. Therefore, our suggested method represents a novelty in this field.