Angular dependence of electronic sputtering from HOPG

We have studied the angular distribution of 120 MeV Au ion beam induced sputtering yield for three cases: from crystalline highly oriented pyrolytic graphite (HOPG) for (A) normal and (B) 70° incidence and from (C) amorphous carbon sample for normal incidence. An anisotropic distribution of sputtering is observed for HOPG samples studied with a distribution Y = Acosⁿθ + Bexp[−(θ − μ)²σ²]. Though the over-cosine function dependence is observed for all the cases, the anomalous peak observed at 53° for normal incidence for HOPG sample is found to shift to 73° when the sample is tilted by 20°. No peak is observed in the amorphous carbon sample which further confirms that the anisotropy observed is due to the crystal structure and formation of a pressure pulse. The high exponent of over-cosine distribution of sputtering yield (n = 3.2-3.8) signifies formation of intense pressure pulse induced jet like sputtering.     

Sputtering and crystalline structure modification of bismuth thin films deposited onto silicon substrates under the impact of 20-160 keV Ar ions

The sputtering of bismuth thin films induced by 20-160 keV Ar⁺ ions has been studied using Rutherford backscattering spectrometry, scanning electron microscopy and X-ray energy dispersive and diffraction spectroscopy. These techniques revealed increasing modifications of the Bi film surfaces with increasing both ion beam energy and fluence up to their complete deterioration under irradiation conditions E = 160 keV and φ = 1.5 × 10¹⁶ cm⁻², leaving isolated islands of preferred (0 1 2) orientation on the Si substrate. The observed surface morphology and crystalline structure evolutions are likely due to a complex interplay of interaction mechanisms involving both elastic nuclear collisions and inelastic electronic ones. The measured Bi sputtering yields versus Ar⁺ ion fluence for a fixed ion energy exhibit a significant depression at very low φ-values followed by a steady state regime above ∼2.0 × 10¹⁴ cm⁻². Measured sputtering yields versus Ar⁺ ion energy with fixing ion fluence to 1.2 × 10¹⁶ cm⁻² in the upper part of the yield saturation regime are also reported. Their comparison to theoretical model and SRIM 2008 Monte Carlo simulation predictions is discussed.     

Proton sputtering from polycrystalline Al surface interacting with highly charged ions at grazing incidence angle

Sputtering processes of protons from a polycrystalline Al surface interacting with Ar^q+ (q = 3-14) ions at a grazing incidence angle (∼0.5°) were investigated. The intensity of protons (I_H) detected in coincidence with scattered Ar atoms was measured as a function of q. I_H saturated at q ? 10, although it increased rapidly with q at 3 ? q ? 8. The angular distribution of protons with low kinetic energy (?2 eV) began to deviate from the cosine distribution and assumed a rather flat equidistribution as q increased. To analyze the sputtering processes of protons at the grazing incidence angle, a modified model of the “above-surface potential sputtering model” was proposed by considering image acceleration of projectile ions.     

Competition of terrace and step-edge sputtering under oblique-incidence ion impact on a stepped Pt(1 1 1) surface

Using molecular-dynamics simulation, we study the sputtering of a Pt(1 1 1) surface under oblique and glancing incidence 5 keV Ar ions. For incidence angles larger than a critical angle ?_c, the projectile is reflected off the surface and the sputter yield is zero. We discuss the azimuth dependence of the critical angle ?_c with the help of the surface corrugation felt by the impinging ion. If a step exists on the surface, sputtering occurs also for glancing incidence ?>?_c. We demonstrate that for realistic step densities, the total sputtering of a stepped surface may be sizable even at glancing incidence.     

Incidence-angle dependent Cs incorporation in Si during low-energy bombardment: A dynamic computer simulation study

The implantation of Cs atoms in silicon was investigated by dynamic computer simulations using the Monte-Carlo code T-DYN that takes into account the gradual change of the target composition due to the Cs irradiation. The incorporation of Cs atoms was studied for incidence angles ranging from 0° to 85° and for four impact energies (0.2, 0.5, 1 and 3 keV). The total implantation fluences were (1-2) × 10¹⁷ Cs/cm², well above the values required to reach a stationary state. The steady-state Cs surface concentrations exhibit a pronounced dependence on impact angle and energy. At normal incidence, they vary between ∼0.57 (at 0.2 keV) and ∼0.18 (3 keV), but decrease with increasing incidence angle. Under equilibrium, the partial sputtering yield of Si exhibits the typical dependence on incidence angle, first increasing up to a maximum value (at ∼70°-75°) and declining sharply for larger angles. For all irradiation conditions a strongly preferential sputtering of Cs as compared to Si atoms is found, increasing with decreasing irradiation energy (from 4.6 at 3 keV to 7.2 at 0.2 keV) and for nearer-normal incidence.     

Erosion of carbon fiber composites under high-fluence heavy ion irradiation

The ion-induced erosion, determining by sputtering yield Y and surface evolution including structure and morphology changes of the modified surface layers, of two commercial carbon fiber composites (CFC) with different reinforcement - KUP-VM (1D) and Desna 4 (4D) have been studied under 30 keV Ar⁺ high fluence (φt ∼ 10¹⁸-10²⁰ ion/cm²) irradiation in the temperature range from room temperature to 400 °C. Ion-induced erosion results in the changes of carbon fiber structure which depend on temperature and ion fluence. Monitoring of ion-induced structural changes using the temperature dependence of ion-induced electron emission yield has shown that for Desna 4 and KUP-VM at dynamic annealing temperature Т_а ≈ 170 °С the transition takes place from disordering at T < T_a to recrystallization at T > T_a. The annealing temperature Т_а is close to the one for polycrystalline graphites. Microscopy analysis has shown that at temperatures Т < T_a the etching of the fibers results in a formation of trough-like longitudinal cavities and hillocks. Irradiation at temperatures T > T_a leads to a crimped structure with the ribs perpendicular to fiber axis. After further sputtering of the crimps the fiber morphology is transformed to an isotropic globular structure. As a result the sputtering yield decreases for Desna 4 more than twice. This value is almost equal to that for KUP-VM, Desna 4, polycrystalline graphites and glassy carbons at room temperature.     

Sputtering and ion-induced electron emission of graphite under high-dose nitrogen bombardment

The dependence of the sputtering yield Y and the electron emission coefficient γ of isotropic graphites (POCO-AXF-5Q and Russian MPG-LT) on ion fluence and ion incidence angle θ at near room temperatures and the dependence of γ on target temperature under high dose 30 keV N₂⁺ ion irradiation were measured. It was found that Y and γ are stabilized at fluences F?1×10¹⁹ N/cm². A specific target surface topography develops. At steady-state conditions, the N concentration in MPG-LT is 19 at.% and in POCO16 at.%. In the angular range θ=0-80°, Y and γ increase and the angular dependence of Y is slightly stronger than that of γ. Sputtering yields of POCO are 1.5 times higher than those of MPG-LT. The reasons of the difference between the experimental and calculated sputtering yields using the TRIM.SP code are discussed. The dependence of γ on the target temperature manifests a step-like increase at ?250 °C which may be due to radiation induced structure transformation in the modified surface layer.     

Erosion of Ag surface by continuous irradiation with slow, large Ar clusters

Molecular dynamics computer simulations are employed to probe processes taking place during continuous irradiation of Ag(1 1 1) surface by keV Ar₈₇₂ projectiles. Surface modification, the total sputtering yield, and the angular distributions of ejected species are calculated at fluences ranging from 0 up to ∼6 × 10¹³ impacts/cm². It has been shown that two trends can be identified in the development of surface roughness. At the beginning surface roughness increases fast. This fast increase terminates around 1 × 10¹³ impacts/cm² and is followed by a slow increase that finally saturates. The effect of the surface roughness on the sputtering yield depends on the impact angle. At normal incidence the sputtering yield is rather insensitive to the development of the surface topography. Modification of the surface morphology has, however, a significant influence on the total sputtering yield at large impact angles. Both the shape of the sputtering yield dependence on the impact angle and the angular spectra of ejected particles are sensitive to the surface roughness.     

Ion-induced electron emission monitoring of the structure and morphology evolution in HOPG

The temperature dependences of the ion-induced electron emission yield γ of highly-oriented pyrolytic graphite (HOPG) under high-fluence (10¹⁸-10¹⁹ ions/cm²) 30 keV Ar⁺ ion irradiation at ion incidence angles from θ = 0^o (normal incidence) to 80^o have been measured to trace both the structure and morphology changes in the basal oriented samples. The target temperature has been varied during continuous irradiation from T = −180 to 400 ^oC. The surface analysis has been performed by the RHEED and SEM techniques. The surface microgeometry was studied using laser goniophotometry (LGF). The dependences of γ(T) were found to be strongly non-monotonic and essentially different from the ones for Ar⁺ and N₂⁺ ion irradiation of the polygranular graphites. A sharp peak at irradiation temperature T_p ≈ 150 ^oC was found. A strong influence of electron transport anisotropy has been observed, and ion-induced microgeometry is discussed.     

On the emission of MoCs molecular ions from Cs irradiated molybdenum surface

The present paper deals with the emission of atomic and molecular ions from elemental molybdenum surface under Cs⁺ bombardment to explore the MCs⁺ formation mechanism with changing Cs surface coverage. Integrated count of MoCs⁺ shows a monotonic increase with increasing primary ion energy (1-5 keV). Change in MoCs⁺ intensity is attributed to the variation of surface work function ? and cesium surface concentration c_Cs due to varying impact energies. Variation of c_Cs has been obtained from the expression, c_Cs ∝ 1/(1 + Y) where Y is the elemental sputtering yield estimated from TRIM calculations. Systematic study of the energy distributions of all species emerging from Mo target has been done to measure the changes in surface work function. Changing slopes of the leading parts of Cs⁺ energy distributions suggest a substantial depletion in surface work function ? with decreasing primary ion energies. Δ? shows a linear dependence on c_Cs. The maximum reduction in surface work function Δ?_max = 0.69 eV corresponds to the highest value of c_Cs = 0.5. A phenomenological model, based on the linear dependence of ? on c_Cs, has been employed to explain the MoCs⁺ data.     

Alkali ion scattering from Ag(0 0 1) and Ag thin films at low and hyperthermal energies

We have investigated the scattering of K⁺ and Cs⁺ ions from a single crystal Ag(0 0 1) surface and from a Ag-Si(1 0 0) Schottky diode structure. For the K⁺ ions, incident energies of 25 eV to 1 keV were used to obtain energy-resolved spectra of scattered ions at θ_i = θ_f = 45°. These results are compared to the classical trajectory simulation safari and show features indicative of light atom-surface scattering where sequential binary collisions can describe the observed energy loss spectra. Energy-resolved spectra obtained for Cs⁺ ions at incident energies of 75 eV and 200 eV also show features consistent with binary collisions. However, for this heavy atom-surface scattering system, the dominant trajectory type involves at least two surface atoms, as large angular deflections are not classically allowed for any single scattering event. In addition, a significant deviation from the classical double-collision prediction is observed for incident energies around 100 eV, and molecular dynamics studies are proposed to investigate the role of collective lattice effects. Data are also presented for the scattering of K⁺ ions from a Schottky diode structure, which is a prototype device for the development of active targets to probe energy loss at a surface.     

Fundamentals of surfactant sputtering

We introduce a new sputter technique, utilizing the steady-state coverage of a substrate surface with up to 10¹⁶ cm⁻² of foreign atoms simultaneously during sputter erosion by combined ion irradiation and atom deposition. These atoms strongly modify the substrate sputter yield on atomic to macroscopic length scales and therefore act as surfactant atoms (a blend of “surface active agent”). Depending on the surfactant-substrate combination, the novel technique allows enhanced surface smoothing, generation of novel surface patterns, shaping of surfaces and formation of ultra-thin films. Sputter yield attenuation is demonstrated for sputtering of Si and Fe substrates and different surfactant species using 5 keV Xe ions at different incidence angles and fluences up to 10¹⁷ cm⁻². Analytical approaches and Monte Carlo simulations are used to predict the sputtering yield attenuation as function of surfactant coverage. For sputtering of Si with Au surfactants we observe high sputter yields despite a steady-state surfactant coverage, which can be explained by strong ion-induced interdiffusion of substrate and surfactant atoms and the formation of a buried Au_xSi surfactant layer in dynamic equilibrium.     

Temperature dependence of liquid Sn sputtering by low-energy He and D bombardment

Absolute sputtering yields of liquid tin from 240 to 420 °C due to irradiation by low-energy helium and deuterium have been measured. For ion energies ranging from 300 to 1000 eV, temperature enhancement of liquid tin sputtering was noted. These measurements were obtained by IIAX (the Ion-surface InterAction eXperiment) using a velocity-filtered ion beam at 45° incidence to sputter material from a liquid tin target onto deposition monitors. Sputtering yields from 500 eV ion bombardment at 45° incidence increase from 0.1 ± 0.03 and 0.019 ± 0.008 Sn particles/ion at room temperature, for He⁺ and D⁺ ions respectively, to 0.30 ± 0.12 and 0.125 ± 0.05 Sn particles/ion for 380 °C. Temperature enhanced sputtering has been seen in other liquid metals (namely lithium, tin-lithium, and gallium) using both ion beam and plasma irradiation.     

Structural and magnetic characterization of cobalt implanted GaN films

Cobalt ions were implanted into GaN films with multiple energies between 50 keV and 380 keV with two total fluences, 1.25 × 10¹⁶ and 1.25 × 10¹⁷ cm⁻², followed by annealing at temperatures between 600 and 850 °C. The crystal quality and surface morphology of as-implanted and subsequently annealed films were investigated by X-ray diffraction (XRD) 2θ scans, ω-rocking curve measurements and atomic force microscopy (AFM). The profiles of impurities and defects were analyzed by Rutherford backscattering spectrometry (RBS) in random and channeling configurations. The virgin GaN films have an excellent crystal quantity (χ_min = 1.4%) and in the implanted samples 60% disorder induced by ion implantation was recovered after annealing. The annealed sample become ferromagnetic, with a spontaneous magnetization of 0.1 emu/g and a coercive magnetic field of 100 Oe at 10 K, and the Curie point was found to be higher than room temperature.     

Electronic and atomic structure modifications of copper nitride films by ion impact and phase separation

We have studied electronic and atomic structure modifications of Cu₃N films under 100 keV Ne and 100 MeV Xe ion impact. Cu₃N films were prepared on R(11-2 surface)-cut-Al₂O₃ substrates at 250 °C by using a RF-magnetron sputter deposition method. X-ray diffraction (XRD) shows that unirradiated films are polycrystalline with (1 0 0) orientation of cubic structure. We find that the electrical resistivity (∼10 Ω cm before ion impact) decreases by more than two orders of magnitude after the Ne impact at a fluence of ∼10¹³ cm⁻², where no Cu phase separation is observed. For further ion impact (larger than ∼10¹⁵ cm⁻²), XRD shows Cu diffraction peak (Cu phase separation), and the resistivity decreases further (three orders of magnitude). Decomposition and phase separation are discussed based on these results, as well as temperature dependence of the resistivity and optical absorption. The results of 100 MeV Xe ion impact are compared with those of Ne ion impact.     

Structural studies of silicon oxynitride layers formed by low energy ion implantation

Silicon oxynitride (Si_xO_yN_z) layers were synthesized by implanting ¹⁶O₂⁺ and ¹⁴N₂⁺ 30 keV ions in 1:1 ratio with fluences ranging from 5 × 10¹⁶ to 1 × 10¹⁸ ions cm⁻² into single crystal silicon at room temperature. Rapid thermal annealing (RTA) of the samples was carried out at different temperatures in nitrogen ambient for 5 min. The FTIR studies show that the structures of ion-beam synthesized oxynitride layers are strongly dependent on total ion-fluence and annealing temperature. It is found that the structures formed at lower ion fluences (∼1 × 10¹⁷ ions cm⁻²) are homogenous oxygen-rich silicon oxynitride. However, at higher fluence levels (∼1 × 10¹⁸ ions cm⁻²) formation of homogenous nitrogen rich silicon oxynitride is observed due to ion-beam induced surface sputtering effects. The Micro-Raman studies on 1173 K annealed samples show formation of partially amorphous oxygen and nitrogen rich silicon oxynitride structures with crystalline silicon beneath it for lower and higher ion fluences, respectively. The Ellipsometry studies on 1173 K annealed samples show an increase in the thickness of silicon oxynitride layer with increasing ion fluence. The refractive index of the ion-beam synthesized layers is found to be in the range 1.54-1.96.     

Simulation of energy spectra of slow He ions scattered from a copper surface

Scattering of low energy (2 keV) He⁺ ions from a polycrystalline copper surface is studied. Experimental Time-Of-Flight (TOF) spectra are presented for different values of the angle of incidence α and a fixed scattering angle θ = 129°. Using Monte Carlo simulation, based on the TRIM (TRansport of Ions in Matter [6]) code, energy spectra are calculated and compared to experimental data. The influence of different combinations of interaction potential and inelastic energy loss on the spectrum shape and on the angular distribution of the scattering yield is considered in the simulation. Simulations show very good agreement with the experiment for all investigated geometries. An analysis of the experimental yield of scattered particles in different parts of the spectrum is performed to gain information on the relative contributions of surface single scattering and multiple scattering.     

Elastic electron scattering by silver atom

The experimental and theoretical studies of elastic electron scattering by silver atom have been carried out. The experimental investigation was based on crossed beam technique with effusive atomic beam being perpendicularly crossed by electron beam. The measurements were performed at electron-impact energies (E₀) of 10, 20, 40, 60, 80 and 100 eV and for a range of scattering angles (θ) from 10° up to 150°. The absolute differential cross sections (DCSs) have been obtained from the elastic-to-inelastic (the unresolved silver resonant lines 4d¹⁰5p²P_{1/2, 3/2}) intensity ratio at θ = 10° at each E₀. Calculations have been performed using the parameter-free complex optical potential (OP) with the inclusion of spin-orbit interaction for the same E₀. Comparison between present experiment and theory has been made.     

Argon ion impact desorption cross sections of chlorine and carbon from molybdenum

Total desorption cross sections have been measured for Cl (σ_Cl) and C(σ_C) on molybdenum by argon ion bombardment for an incidence angle of 60° from the surface normal. For the bombardment an ion gun with low current density (i₀ ~ 1 × 10 ^?7 A cm^?2) at low system pressure (~10^?9 Torr) was used. The detection was performed by AES and the data were sensitivity factor corrected. The AES analysis of the surface after adsorption showed that Mo, C and Cl contributed to more than 94% of the atomic composition. With known i₀, it is possible to obtain σ from the adsorbate signal vs ion bombardment time curve. For ion energies between 0.2 keV to 1.0 keV the measured value for σ_Cl and σ_C are 0.5?3 × 10^?15 cm² and 0.2?4 × 10^?15 cm², respectively. The possible effects of the surface roughness due to prebombardment are discussed.     

Low-energy electron elastic collision cross sections for ground and excited Tm, Lu and Hf atoms

Low-energy 0 ? E ? 1.0 eV electron elastic scattering from ground and excited Tm, Lu and Hf atoms has been investigated. Both total and differential cross sections have been calculated; the latter at the scattering angles θ = 0°, 90° and 180°. The recent Regge-pole methodology has been used for the calculations. In the method the crucial electron-electron correlation effects are accounted for through the Mulholland formula. We find that the total cross sections are characterized generally by shape resonances, Ramsauer-Townsend minima and dramatically sharp long-lived resonances from which we extract the binding energies of the negative ions. Our extracted binding energy of the Hf⁻ negative ion from the total cross section is compared with that of Pan and Beck [14].