Fabrication and nuclear analysis of isotopic N and N ion-implanted silicon standards

The fabrication of reliable isotopic nitrogen standards is achieved in Si through ¹⁴N and ¹⁵N ion implantation. 60 keV and ions were implanted at 400 °C up to ∼60% peak atomic concentration, yielding nitrogen-saturated silicon layers as measured using resonant nuclear reaction analysis. No isotopic effect has been observed. The nitrogen standards are validated by measurements of stability under ion irradiation. No significant desorption of nitrogen is observed either under a ⁴He⁺ ion fluence of 3.36 × 10¹⁶ cm⁻² or under a ¹H⁺ ion fluence of 8.60 × 10¹⁷ cm⁻², giving strong evidence that isotopic nitrogen standards can be achieved.     

First-principles study on electronic structures and absorption spectra for BaWO4 crystal containing barium vacancy

The electronic structures, dielectric function and absorption spectra for the perfect BaWO₄ (BWO) crystal and the BWO crystal containing barium vacancy () have been studied using density functional theory code CASTEP with the lattice structure optimized. The results indicate that the optical properties of the BWO crystal exhibit anisotropy and its optical symmetry coincide with lattice structure geometry of the BWO crystal. For the BWO crystal containing , there exhibit four absorption bands peaking at 0.71 eV (1751 nm), 1.85 eV (672 nm), 3.43 eV (362 nm) and 3.85 eV (322 nm), respectively. The origins of the 370 nm absorption band should be related to the .     

Comparison of secondary ion emission yields for poly-tyrosine between cluster and heavy ion impacts

Emission yields of secondary ions necessary for the identification of poly-tyrosine were compared for incident ion impacts of energetic cluster ions (0.8 MeV , 2.4 MeV , and 4.0 MeV ) and swift heavy monoatomic molybdenum ions (4.0 MeV Mo⁺ and 14 MeV Mo⁴⁺) with similar mass to that of the cluster by time-of-flight secondary ion mass analysis combined with secondary ion electric current measurements. The comparison revealed that (1) secondary ion emission yields per impact increase with increasing incident energy within the energy range examined, (2) the 4.0 MeV impact provides higher emission yields than the impact of the monoatomic Mo ion with the same incident energy (4.0 MeV Mo⁺), and (3) the 2.4 MeV impact exhibits comparable emission yields to that for the Mo ion impact with higher incident energy (14 MeV Mo⁴⁺). Energetic cluster ion impacts effectively produce the characteristic secondary ions for poly-tyrosine, which is advantageous for highly sensitive amino acid detection in proteins using time-of-flight secondary ion mass analysis.     

Ion implantation in 4H-SiC

Silicon carbide offers unique applications as a wide bandgap semiconductor. This paper reviews various aspects of ion implantation in 4H-SiC studied with a view to optimise ion implantation in silicon carbide. Al, P and Si ions with keV energies were used. Channelling effects were studied in both a-axis and c-axis crystals as a function of tilts along major orthogonal planes and off the major orthogonal planes. Major axes such as [0 0 0 1] and the and minor axis like the showed long channelling tails and optimum tilts for minimising channelling are recommended. TEM analyses of the samples showed the formation of (0 0 0 1) prismatic loops and the loops as well,in both a and c-cut crystals. We also note the presence of voids only in P implanted samples implanted with amorphising doses. The competing process between damage accumulation and dynamic annealing was studied by determining the critical temperature for the transition between crystalline and amorphous SiC and an activation energy of 1.3 eV is extracted.     

The investigation of energy loss and damage in polycarbonate induced by MeV carbon clusters

Carbon cluster ions (n = 1-5) and Cl⁺, Ti⁺, Ni⁺ ions were used to bombard polycarbonate (PC) films. By comparing the electronic energy loss and the number of chromophores at a fixed wavelength, we obtained the electronic energy loss S_e of carbon cluster ions in PC.     

First principle studies on the electronic structures and absorption spectra in KMgF3 crystal with fluorine vacancy

The experiments indicate that the perfect KMgF₃ crystal has no absorption in the visible range, however the electron irradiation induces a complex absorption spectrum. The absorption spectra can be decomposed by five Gaussian bands peaking at 2.5 eV (488 nm), 3.4 eV (359 nm), 4.2 eV (295 nm), 4.6 eV (270 nm) and 5.2 eV (239 nm), respectively. The purpose of this paper is to seek the origins of the absorption bands. The electronic structures and absorption spectra either for the perfect KMgF₃ or for KMgF₃: with electrical neutrality have been studied by using density functional theory code CASTEP with the lattice structure optimized. The calculation results predicate that KMgF₃: also exhibits five absorption bands caused by the existence of the fluorine ion vacancy and the five absorption bands well coincide with the experimental results. It is believable that the five absorption bands are related to in KMgF₃ crystal produced by the electron irradiation.     

Measurement of radiation-enhanced diffusion of La in single crystal thin film CeO2

The diffusion of La, a trivalent cation dopant, actinide surrogate, and high-yield fission product, in CeO₂, a UO₂ nuclear fuel surrogate, during 1.8 MeV Kr⁺ ion bombardment over a temperature range from 673 K to 1206 K has been measured with secondary ion mass spectroscopy. The diffusivity under these irradiation conditions has been analyzed with a model based on a combination of sink-limited and recombination-limited kinetics. This analysis yielded a cation vacancy migration energy of  ∼ 0.4 eV below ∼800 K, were recombination-limited kinetics dominated the behavior. The thermal diffusivity of La in the same system was measured over a range of 873-1073 K and was characterized by an activation enthalpy of . The measurement of both the migration enthalpy and total activation enthalpy separately allows the vacancy formation enthalpy on the cation sublattice to be determined;  ∼ 1 eV. The mixing parameter under energetic heavy-ion bombardment at room temperature was measured as well and found to be ∼4 × 10⁻⁵ nm⁵/eV.     

Preparation of Ne, Mg, Si, S, and Ar targets by ion implantation into thin carbon foils

The preparation of isotopically pure targets of ²⁰Ne, ²⁴Mg, ²⁸Si, ³²S, and ³⁶Ar by the implantation of 25-70 keV ions into carbon foils is described.     

Reflection properties of small hydrocarbons impinging on tungsten and carbon surfaces

Sticking coefficients of deuterium from are quantified on fusion relevant plasma sprayed tungsten and carbon fibre composite in the incident energy range from about 0-100 eV. The samples that were cut from ASDEX-Upgrade tiles are exposed to a beam of of specific incident energy, E_inc, in the tandem mass spectrometer BESTOF in Innsbruck. Nuclear reaction analysis is performed ex-situ at IPP Garching for the quantification of deuterium content. The deuterium content difference measured on a spot before and after ion-beam exposure of the sample is assigned to the above mentioned species of hydrocarbon molecules sticking on the surface, allowing the calculation of the sticking probability of a specific deuterated molecular ion. The sticking coefficient, S, is found to depend on the incident energy and shows a maximum of about S ∼ 0.4 around E_inc = 30 eV on CFC and about S ∼ 0.1 near E_inc = 20 eV in case of PSW.     

Absorption and photoluminescence study of Al2O3 single crystal irradiated with fast neutrons

Colour centers formation in Al₂O₃ by reactor neutrons were investigated by optical measurements (absorption and photoluminescence). The irradiation’s were performed at 40 °C, up to fast neutron (E_n > 1.2 MeV) fluence of 1.4 × 10¹⁸ n cm⁻². After irradiation the coloration of the sample increases with the neutron fluence and absorption band at about 203, 255, 300, 357 and 450 nm appear in the UV-visible spectrum. The evolution of each absorption bands as a function of fluence and annealing temperature is presented and discussed. The results indicate that at higher fluence and above 350 °C the F⁺ center starts to aggregate to F center clusters (F₂, F₂⁺ and ). These aggregates disappear completely above 650 °C whereas the F and F⁺ centers persist even after annealing at 900 °C. It is clear also from the results that the absorption band at 300 nm is due to the contribution of both F₂ center and interstitial ions.     

Radiation induced defects in BaBPO5:Ce and their role in thermally stimulated luminescence reactions: EPR and TSL investigations

Defect centers induced by gamma irradiation in Ce doped BaBPO₅ were investigated using EPR spectroscopy. From EPR studies, three phosphorous centered radicals were characterized on the basis of observed ³¹P hyperfine splitting and g values as , and radicals. In addition to this, two types of boron oxygen hole centers (BOHC) and O⁻ were also formed at room temperature. An intense broad signal in sample annealed in argon (g_⊥ = 1.9258 and g_‖ = 1.8839) was assigned to Ce³⁺ ions associated with the electron trapped at anion vacancy or nearby lattice defect. TSL studies showed two glow peaks, a relatively weaker one at 425 K and an intense one at 575 K. Spectral studies of the TSL glow peaks have shown that Ce³⁺ ion acts as emission center. From the temperature dependence of the EPR spectra of gamma irradiated samples, the glow peaks at 425 K and 575 K were attributed to thermal destruction of /O⁻ and BOHC, respectively, by trapping of electrons from elsewhere. The energy released in electron hole recombination process is used for the excitation of Ce³⁺ ions resulting in these glow peaks at 425 K and 575 K. The spectral studies of the TSL glow peaks have shown emission at 330 nm indicating Ce³⁺ acts as the luminescent centre. The trap depth and the frequency factor for the 425 K and 575 K peaks were determined using different heating rates method.     

Secondary ion emission from Cu(1 0 0) surfaces with atomic adsorbates (N, O, Cl, S and Br)

Several targets that consist of atomic species X (X = N, O, Cl, S, Br) adsorbed at hollow sites on the Cu(1 0 0) surface have been examined with low-fluence secondary ion mass spectrometry (SIMS). The positive and negative secondary ion (SI) abundance distributions, which show a range of characteristics, have been discussed with the aid of thermochemical data derived from ab initio calculations. In positive SIMS, CuX⁺ is never observed, while the only heteronuclear (mixed-atom) SI that is observed for all five systems is Cu₂X⁺. In negative SIMS, the dominant heteronuclear species for all systems is , except for N/Cu(1 0 0), which produces no , ions. Cu⁻ emission is observed only for O/Cu(1 0 0). By analogy with results from laser ablation studies of O/Cu targets, it is conjectured that Cu⁻ is a daughter product of the gas-phase dissociation of polyatomic Cu-O anion clusters.     

Stability and delayed fragmentation of highly charged C60 trapped in a conic-electrode electrostatic ion resonator (ConeTrap)

We employed a conic-electrode electrostatic ion resonator (ConeTrap) to store the recoil ions resulting from collision between 56 keV Ar⁸⁺ ions and C₆₀ in order to study their stability over a long time range (several milliseconds). The originality of our method, based on the trapping of a single ion to preserve the detection in coincidence of all the products of the collision, is presented in detail. Our results show that C₆₀ ions produced in such collisions are stable in the considered observation time. By employing the ConeTrap as a secondary mass spectrometer in order to let the ions oscillate only for a single period, we have been able to observe delayed evaporation of cold ions 20 μs after the collision. We interpret quantitatively the relative yields of daughter ions with a cascade model in which the transition rates are estimated via the commonly used Arrhenius law, taking into account the contribution of the radiative decay.     

Ion beam induced defects in solids studied by optical techniques

Optical methods can provide important insights into the mechanisms and consequences of ion beam interactions with solids. This is illustrated by four distinctly different systems.X- and Y-cut LiNbO₃ crystals implanted with 8 MeV Au³⁺ ions with a fluence of 1 × 10¹⁷ ions/cm² result in gold nanoparticle formation during high temperature annealing. Optical extinction curves simulated by the Mie theory provide the average nanoparticle sizes. TEM studies are in reasonable agreement and confirm a near-spherical nanoparticle shape but with surface facets. Large temperature differences in the nanoparticle creation in the X- and Y-cut crystals are explained by recrystallisation of the initially amorphised regions so as to recreate the prior crystal structure and to result in anisotropic diffusion of the implanted gold.Defect formation in alkali halides using ion beam irradiation has provided new information. Radiation-hard CsI crystals bombarded with 1 MeV protons at 300 K successfully produce F-type centres and V-centres having the structure as identified by optical absorption and Raman studies. The results are discussed in relation to the formation of interstitial iodine aggregates of various types in alkali iodides. Depth profiling of and aggregates created in RbI bombarded with 13.6 MeV/A argon ions at 300 K is discussed.The recrystallisation of an amorphous silicon layer created in crystalline silicon bombarded with 100 keV carbon ions with a fluence of 5 × 10¹⁷ ions/cm² during subsequent high temperature annealing is studied by Raman and Brillouin light scattering.Irradiation of tin-doped indium oxide (ITO) films with 1 MeV protons with fluences from 1 × 10¹⁵ to 250 × 10¹⁵ ions/cm⁻² induces visible darkening over a broad spectral region that shows three stages of development. This is attributed to the formation of defect clusters by a model of defect growth and also high fluence optical absorption studies. X-ray diffraction studies show evidence of a strained lattice after the proton bombardment and recovery after long period storage. The effects are attributed to the annealing of the defects produced.     

Cesium/xenon co-sputtering at different energies during ToF-SIMS depth profiling

In this paper, ToF-SIMS dual beam depth profiles of H-terminated silicon wafers were performed with cesium primary ions and for different beam energies. The aim of this study was to investigate the influence of the cesium beam energy on the secondary ion yields during ToF-SIMS dual beam depth profiling. For this purpose, both the cesium beam energy and the cesium surface concentration were varied but the analysis conditions were kept identical for all depth profiles (i.e. Ga⁺ at 25 keV, 45°). For each sputter beam energy (i.e. 250 eV, 750 eV and 2000 eV), the cesium surface concentration was varied by diluting the cesium sputtering beam by xenon ions. This technique allows performing ToF-SIMS depth profiles with cesium surface concentration varying from zero (for pure xenon beam) to a maximum value (for pure Cs beam), depending on the bombardment conditions. For all the beam energies, the Si⁺ signals were found to decrease with the increasing cesium coverage and the lower the energy, the faster the decrease. The Cs⁺, the SiCs⁺ and the signals were found to exhibit a maximum for well defined Cs/Xe mixtures, which were found to depend on the secondary ion species and on the beam energy. Moreover, the maxima were found to shift to higher Cs beam content with the increasing energy. This effect is due to the variation of the cesium surface concentration with the varying beam energy. XPS analysis of the Cs/Xe craters and DYNTRIM computer simulations allowed us to convert the cesium beam scale to a cesium surface concentration scale and to interpret our results.