共查询到18条相似文献,搜索用时 140 毫秒
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相移掩模方法及其一维数值模拟 总被引:1,自引:0,他引:1
相移掩模方法是一种新的光刻技术,它可以提高现有光刻设备的分辨率,使超大规模集成电路及二元光学的制作迈上一个新台阶。本文介绍了相移掩模方法的基本原理,用部分相干光成象理论分析了用于光刻的投影照相系统的成象特性,导出了一维成象的简化公式,对一维光栅结构进行了计算机数值模拟并给出了模拟结果。 相似文献
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研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响,在3/4环形照明和3/4四极照明方式下,分别选用传统掩模和交替型相移掩模,研究65nm线宽的密集线条、半密集线条、孤立线条在较大的曝光系统参数范围内,对光刻工艺窗口的改善。并对在不同的照明方式、掩模结构下获得的工艺窗口进行了比较,结果表明:①在较大焦深(DOF)范围内,满足光刻性能要求可以有较大范围的曝光系统参数配置;②相时于传统照明和传统掩模,采用交替型相移掩模或者离轴照明,焦深均可提高100%-150%。 相似文献
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用于大面积周期性图形制造的激光干涉光刻 总被引:13,自引:5,他引:8
用两束或多束相干激光束以不同的组合形式对光致抗蚀剂曝光,可在大面积范围内产生精细的二维周期性图形,这个方法特别适合于产生光电子器件和生电子器件的周期性结构。介绍激光干涉光刻的基本原理,对几种光束组合干涉方法给出了理论推导结果,并进行了计算机模拟。初步的实验结果表明,用激光干扰光刻技术产生大面积的亚微米级周期性孔、柱、锥图形是可行的。该方法不需要掩模、昂贵的光刻成像透镜、新的短波长光源和新型的抗蚀剂,提供了得到高分辨、无限焦深、大面积光刻的可能性。 相似文献
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Unno Y 《Applied optics》2003,42(16):3259-3267
The resolution limit for two-dimensional crossed-grating patterns created by projecting mask objects by using a coherent beam has been investigated. We consider first two conventional mask types, a binary-amplitude mask and a two-level phase-shifting mask, in analyzing relationships between a diffraction-beam configuration and an image-intensity distribution. Then we derive, as a mask that overcomes the resolution limit of the conventional ones, a four-level phase-shifting structure with which the minimum image period can be reduced to square root(2)/2 time that of the two-level phase-shifting mask. 相似文献
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We have designed a novel atomic layer deposition (ALD) Al(2)O(3) spacer mask technique for fabricating large area high density nanoscale magnetic rings by photolithography for magnetic random access memory applications. A simple mask design and a low temperature ALD process were utilized to simplify the process. Dry etching of Al(2)O(3) and cobalt was investigated for optimizing the nanostructure dimension control. A ring array with density and dimensions below the limits for photolithography tools has been achieved. The magnetic behavior of the ring array was characterized using a SQUID (superconducting quantum interference device). The switching distribution and effects of interaction among ring arrays were studied by correlating simulation with experimental results. 相似文献
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We propose a new simple, low-cost method for providing all-round metal contacts to one-dimensional structures such as carbon nanotubes and nanowires on a transparent substrate. The nanostructures are first positioned in place to bridge a electrode gap by dielectrophoresis. The electrode structure is then used as a self-aligned mask during the subsequent photolithography through illumination from the substrate backside. This is followed by metallization and lift-off. Our measurements on multi-walled carbon nanotubes thus contacted show reasonable yield and good electrical contacts for the process carried out on a glass slide as the substrate. 相似文献
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The technical applications of three-dimensional (3D) nanostructures demand a fabrication technique that is convenient and yet offers design flexibility. We describe here a nanofabrication technique called surface-plasmon-assisted three-dimensional nanolithography (3D-SPAN). By utilizing optical near-field interference patterns generated by surface plasmons (SPs), we have fabricated different 2D/3D periodic polymeric nanostructures in a typical photolithography setup. We have also shown here that the nanostructures fabricated by 3D-SPAN can be controlled easily in terms of size, layout, and defects by designing the SPAN mask. Because of its design flexibility and fabrication convenience, 3D-SPAN could be used to develop "photonics on a chip", where signal processing is carried out by photons instead of electrons and be extended to other applications of direct-writing 3D functional nanostructures. 相似文献
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用灰度曝光技术改善数字光刻图形轮廓 总被引:1,自引:0,他引:1
基于空间光调制器(SLM)数字光刻技术可用于IC掩模制作或直接作为微结构的加工工具,但用数字投影光刻系统加工某些结构的二元图形时,往往难以获得预期的图形轮廓,即图形边缘处有一定畸变,特别是较低缩小倍率时。本文提出优化设计图形边缘灰度的方法来校正光刻图形的畸变。文中分析了数字光刻制作这些二元光刻图形时空间像畸变产生的物理机制,详细讨论了设计图形边缘灰度优化的规则,并以加工圆孔滤波器为例,模拟了它的数字光刻成像过程。结果表明,设计图形的边缘采用灰度曝光可使其空间像畸变减小约8个百分点,光场分布更为均匀。数字灰度曝光技术简单易行,可为改善光刻图形质量提供了新途径。 相似文献